JPH0142350B2 - - Google Patents

Info

Publication number
JPH0142350B2
JPH0142350B2 JP13682185A JP13682185A JPH0142350B2 JP H0142350 B2 JPH0142350 B2 JP H0142350B2 JP 13682185 A JP13682185 A JP 13682185A JP 13682185 A JP13682185 A JP 13682185A JP H0142350 B2 JPH0142350 B2 JP H0142350B2
Authority
JP
Japan
Prior art keywords
magnetic field
target
target surface
cathode
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13682185A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61295368A (ja
Inventor
Minoru Oomoto
Takashi Ito
Akira Odagiri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHINKU KIKAI KOGYO KK
Original Assignee
SHINKU KIKAI KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHINKU KIKAI KOGYO KK filed Critical SHINKU KIKAI KOGYO KK
Priority to JP13682185A priority Critical patent/JPS61295368A/ja
Publication of JPS61295368A publication Critical patent/JPS61295368A/ja
Publication of JPH0142350B2 publication Critical patent/JPH0142350B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP13682185A 1985-06-25 1985-06-25 マグネトロンスパツタ用カソ−ド Granted JPS61295368A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13682185A JPS61295368A (ja) 1985-06-25 1985-06-25 マグネトロンスパツタ用カソ−ド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13682185A JPS61295368A (ja) 1985-06-25 1985-06-25 マグネトロンスパツタ用カソ−ド

Publications (2)

Publication Number Publication Date
JPS61295368A JPS61295368A (ja) 1986-12-26
JPH0142350B2 true JPH0142350B2 (enrdf_load_stackoverflow) 1989-09-12

Family

ID=15184294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13682185A Granted JPS61295368A (ja) 1985-06-25 1985-06-25 マグネトロンスパツタ用カソ−ド

Country Status (1)

Country Link
JP (1) JPS61295368A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0774438B2 (ja) * 1985-12-17 1995-08-09 ローム株式会社 マグネトロンスパッタにおける膜厚調整方法
US5399253A (en) * 1992-12-23 1995-03-21 Balzers Aktiengesellschaft Plasma generating device
CN101375366B (zh) * 2005-12-13 2011-04-27 欧瑞康太阳Ip股份公司 改良溅射靶应用
CN116855909B (zh) * 2023-09-05 2024-10-01 苏州迈为科技股份有限公司 提高靶材利用率的溅射方法、溅射阴极装置及溅射设备

Also Published As

Publication number Publication date
JPS61295368A (ja) 1986-12-26

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