JPH0140800B2 - - Google Patents
Info
- Publication number
- JPH0140800B2 JPH0140800B2 JP4046984A JP4046984A JPH0140800B2 JP H0140800 B2 JPH0140800 B2 JP H0140800B2 JP 4046984 A JP4046984 A JP 4046984A JP 4046984 A JP4046984 A JP 4046984A JP H0140800 B2 JPH0140800 B2 JP H0140800B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon
- pulling
- crystal
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4046984A JPS60186498A (ja) | 1984-03-05 | 1984-03-05 | 半導体単結晶の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4046984A JPS60186498A (ja) | 1984-03-05 | 1984-03-05 | 半導体単結晶の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60186498A JPS60186498A (ja) | 1985-09-21 |
JPH0140800B2 true JPH0140800B2 (en, 2012) | 1989-08-31 |
Family
ID=12581492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4046984A Granted JPS60186498A (ja) | 1984-03-05 | 1984-03-05 | 半導体単結晶の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60186498A (en, 2012) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5408952A (en) * | 1991-04-26 | 1995-04-25 | Mitsubishi Materials Corporation | Single crystal growth method |
CN104278320A (zh) * | 2013-07-04 | 2015-01-14 | 有研新材料股份有限公司 | 一种用于测量直拉硅单晶炉中硅熔体液面位置的装置 |
-
1984
- 1984-03-05 JP JP4046984A patent/JPS60186498A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60186498A (ja) | 1985-09-21 |
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