JPH01312724A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH01312724A JPH01312724A JP14371088A JP14371088A JPH01312724A JP H01312724 A JPH01312724 A JP H01312724A JP 14371088 A JP14371088 A JP 14371088A JP 14371088 A JP14371088 A JP 14371088A JP H01312724 A JPH01312724 A JP H01312724A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- coercive force
- flux density
- magnetic flux
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 229910000929 Ru alloy Inorganic materials 0.000 claims abstract description 12
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 7
- 229910000629 Rh alloy Inorganic materials 0.000 claims description 12
- 229910052703 rhodium Inorganic materials 0.000 claims description 10
- 230000004907 flux Effects 0.000 abstract description 28
- 239000010408 film Substances 0.000 abstract description 13
- 230000007423 decrease Effects 0.000 abstract description 7
- 229910045601 alloy Inorganic materials 0.000 description 19
- 239000000956 alloy Substances 0.000 description 19
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 229910000990 Ni alloy Inorganic materials 0.000 description 5
- 230000005415 magnetization Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910000691 Re alloy Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気ディスク装置等に用いる磁気記録媒体に係
り、特に高密度磁気記録に好適で、耐食性の優れた媒体
に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium used in magnetic disk drives and the like, and particularly to a medium suitable for high-density magnetic recording and excellent in corrosion resistance.
高密度磁気記録用の磁気記録媒体として金属磁性薄膜を
用いた媒体が提案されている。これらの中で、特開昭５
６−３８８１２に論じられているように、Ｃｏ−Ｎｉ合
金薄膜は保磁力が大きく、比較的耐食性にも優れている
。A medium using a metal magnetic thin film has been proposed as a magnetic recording medium for high-density magnetic recording. Among these, JP-A-5
As discussed in No. 6-38812, the Co--Ni alloy thin film has a large coercive force and relatively excellent corrosion resistance.
しかしＣｏ −Ｎ ｉ系合金薄膜は、磁気ディスクとし
て用いるには耐食性が不十分である。また、将来の高密
度磁気記録に用いるためには、より晶い飽和磁束密度を
有することが好ましく、１．５Ｔ程度のＣｏ−Ｎｉ系合
金薄膜はこの点で十分とはｄえない。However, Co-Ni alloy thin films have insufficient corrosion resistance to be used as magnetic disks. Further, for use in future high-density magnetic recording, it is preferable to have a crystalline saturation magnetic flux density, and a Co--Ni alloy thin film of about 1.5 T is not sufficient in this respect.
本発明者等はＦｅを主成分とする合金薄膜について鋭意
研究を重ねた結果、Ｆｅ−Ｒｕ、Ｆｃ−Ｒｈ 、 Ｆ”
ｅ −Ｒｕ −Ｒｈ系合金は高保磁力、高飽和磁束密
度および高耐食性を示すことを明らかにし、本発明を完
成するに至った。As a result of extensive research into alloy thin films containing Fe as the main component, the present inventors found that Fe-Ru, Fc-Rh, F''
It has been revealed that the e-Ru-Rh alloy exhibits high coercive force, high saturation magnetic flux density, and high corrosion resistance, and the present invention has been completed.
すなわち、非磁性基板上に磁性層を形成した磁気記録媒
体において、上記磁性層をＦｅ−Ｒｕ。That is, in a magnetic recording medium in which a magnetic layer is formed on a nonmagnetic substrate, the magnetic layer is made of Fe-Ru.
Ｆ’ ｅ −Ｒｈ 、 Ｆ ｅ −Ｒｕ −Ｒｈ系合金
の少なくとも一考からなる薄膜とすることにより、高密
度磁気記録に適した高い飽和磁束密度および高耐食性を
有する磁気記録媒体を得た。A magnetic recording medium having a high saturation magnetic flux density and high corrosion resistance suitable for high-density magnetic recording was obtained by forming a thin film made of at least one of F' e -Rh and Fe -Ru -Rh based alloys.
また、上記合金薄膜の組成をＦ ｅ −Ｒｕ系合金にお
いては、Ｒｕを３−ＬＱａｔ％、Ｆ ａ −Ｉ＜ｈ系合
金においては、Ｒｈを３〜７ａｔ％、Ｆｅ−Ｒｕ−Ｒｈ
系合金においてはＲｕを３〜１０ａｔ％、ＲｈをＱ−３
ａｔ％、ＲｕとＲｈの合計を３〜１０ｂｔ％と制限する
ことにより、飽和磁束密度を］、８Ｔ以」二、保磁力を
３０００ｅ以上とすることができる。また上記非磁性基
板と磁性層との間に中間層を設けることにより、＆ｉ性
薄膜の角形比を大きくすることができる。In addition, the composition of the alloy thin film is 3-LQat% Ru for Fe-Ru based alloys, 3-7 at% Rh for F a -I<h-based alloys, and 3-7 at% Rh for Fe-Ru-Rh based alloys.
In the series alloy, Ru is 3 to 10 at% and Rh is Q-3.
By limiting the sum of Ru and Rh at % to 3 to 10 bt%, the saturation magnetic flux density can be made 8T or more and the coercive force 3000e or more. Further, by providing an intermediate layer between the nonmagnetic substrate and the magnetic layer, the squareness ratio of the &i thin film can be increased.
以ｔに本発明の一実施例を挙げ、図表を参照しながらさ
らに具体的に説明する。Hereinafter, one embodiment of the present invention will be described in more detail with reference to figures and tables.
〔実施例１〕
磁性層の作製にはイオンビーム・スパッタリング装置を
用いた。スパッタリングは以下の条件で行った。[Example 1] An ion beam sputtering device was used to fabricate the magnetic layer. Sputtering was performed under the following conditions.
イオンガス ・・・Ａｒ装置内Ａｒ
ガス圧力 −２，５Ｘ Ｌ ０−２Ｐ ａ蒸
着用イオンガン加速電圧 ・・１２００Ｖ蒸着用イ
オンガンイオン電流 ・・・１．２０ｍＡ基板照射用
イオンガン加速電圧 ・・・２００Ｖ基板照射用イオン
ガンイオン電流・・・３５ｍＶターゲット電流
・・・７０ｍＡターゲット・基板間距離
・・・１２７ｎｎ本実施例では基板としてコーニンク
社製７０５９ガラス基板を用い、Ｆｅ−Ｒｕ系合金薄膜
を作製した。膜厚は５０００人一定とした。Ion gas...Ar in the Ar device
Gas pressure -2,5X L 0-2Pa Ion gun acceleration voltage for deposition...1200V Ion gun ion current for deposition...1.20mA Ion gun acceleration voltage for substrate irradiation...200V Ion gun ion current for substrate irradiation...35mV target current
...70mA target-to-board distance
...127nn In this example, a 7059 glass substrate manufactured by Konink Co., Ltd. was used as the substrate, and an Fe-Ru alloy thin film was produced. The film thickness was fixed at 5,000 people.
上記条件により作製したＦｅ−Ｒｕ系合金薄膜の保磁力
、角形比のＲｕｌｌＪｌｌ度依存性を第２図に示す。同
図の保磁力のＲｕ４度依存性は曲線２１に示すように、
Ｒｕ ａ度Ｏ％（純１？ｅ）よりもＲｕを添加したノＪ
゛が保磁力が高い。またＲ ｕ ′ａ度を３ａｔ％以上
とすると保磁力が４０００ ｅ以上となり。FIG. 2 shows the RullJll degree dependence of the coercive force and squareness ratio of the Fe--Ru alloy thin film produced under the above conditions. The Ru4 degree dependence of coercive force in the same figure is as shown by curve 21,
No.J with more Ru added than 0% (purity 1?e)
゛ has high coercive force. Furthermore, when the R u 'a degree is set to 3 at% or more, the coercive force becomes 4000 e or more.
より好ましい。反面、角度比の１ｚ ｕ ｅ度依存性は
曲線２２に示すように、Ｒｕ混人欧の増加に従がって角
形比が小さくなる。しかしこの点は後述のように非磁性
基板と磁性層との間に中間層を設けることにより解決で
きた。More preferred. On the other hand, as shown by curve 22, the dependence of the angular ratio on 1z u e degree decreases as the Ru mixed population increases. However, this problem could be solved by providing an intermediate layer between the nonmagnetic substrate and the magnetic layer as described later.
次に飽和磁束密度のＲｕ ４度依存性を第３図に示す。Next, FIG. 3 shows the Ru 4 degree dependence of the saturation magnetic flux density.
同図の飽和磁束密度のＲｕｆｉ度依存性は曲線３１に示
すように、Ｒｕ ′ａ度の増加に従い、飽和磁束密度が
低下する。しかしＲｕＪ濃度をＨ１ｎｔ％以−トとする
ことにより、１．８’「以上の飽和磁束密度が得られる
。この値は従来の実用材料であるＣ ｏ −２０８ｔ％
Ｎｉ合金の１．５Ｔより高い。The dependence of the saturation magnetic flux density on the Rufi degree in the figure is shown by a curve 31, in which the saturation magnetic flux density decreases as the Ru'a degree increases. However, by setting the RuJ concentration to H1nt% or higher, a saturation magnetic flux density of 1.8' or higher can be obtained.This value is higher than the conventional practical material Co-208t%.
Higher than 1.5T of Ni alloy.
以上述べたように、［’ ｔ３− Ｒｕ系合金は高飽和
磁束密度および高保磁力を有する。また保磁力を４００
０ ｅ以上、飽和磁束密度をＬ 、 ８１以上とするた
めには、Ｒｕ濃度を３〜１．０ａｔ％とすることが好ま
しい。As described above, the ['t3-Ru-based alloy has a high saturation magnetic flux density and a high coercive force. Also, the coercive force is 400
In order to make the saturation magnetic flux density L, 81 or more, the Ru concentration is preferably 3 to 1.0 at%.
〔実施例２〕
実施例１と同様の条件でＦ’ ｅ −Ｒｈ系合金薄膜を
形成した。保磁力および角形比のＲｋｌｐ度依浮性を第
４図に示す。同図の保磁力のＲｈ４度依存性は曲線４１
に示すように、純ＦｅよりもＲｈを添加した方が保磁力
が品い。またＲｈ８度を３〜７ａｔ％とすると保磁力を
３０００ ｅ以上とすることができる。反面、角形比の
１’＜ ｈ＾度依存性は曲線４２に示すように、Ｒｈ添
加とともに小さくなる。しかしこの点においても非磁性
基板と磁性層との間に中間層を設けることにより解決す
ることができる。[Example 2] A Fe-Rh based alloy thin film was formed under the same conditions as in Example 1. The Rklp degree dependence of coercive force and squareness ratio is shown in FIG. The Rh4 degree dependence of the coercive force in the same figure is curve 41.
As shown in the figure, the coercive force is better when Rh is added than when pure Fe is added. Further, when the Rh8 degree is set to 3 to 7 at%, the coercive force can be increased to 3000 e or more. On the other hand, as shown by curve 42, the dependence of the squareness ratio on degrees 1'<h^ decreases with the addition of Rh. However, this point can also be solved by providing an intermediate layer between the nonmagnetic substrate and the magnetic layer.
飽和磁束密度のＲｈ４度依存性を第５に示す。The Rh4 degree dependence of the saturation magnetic flux density is shown fifth.
同図の飽和磁束密度のＲｈ濃度依存性は曲線５１に示す
ように、Ｒｈを添加しても保磁力まほとんど変化しない
。As shown by a curve 51 in the Rh concentration dependence of the saturation magnetic flux density in the figure, even when Rh is added, the coercive force hardly changes.
以上述べたように、？’ｅ−Ｒｈ系合金は高飽和磁束密
度および高保磁力を有する。また保磁力を３０００ ｅ
以上とするためには、Ｒｈｆｉ度を３〜７ａｔ％とする
ことが好ましい。As mentioned above? 'e-Rh alloy has high saturation magnetic flux density and high coercive force. Also, the coercive force is 3000 e
In order to achieve the above, it is preferable that the Rhfi degree is 3 to 7 at%.
〔実施例３〕
第２図から第５図に示すように、Ｆｅ−Ｒｈ系合金と比
較してＦ ｅ −Ｒｕ系合金は保磁力が高い。[Example 3] As shown in FIGS. 2 to 5, the Fe-Ru alloy has a higher coercive force than the Fe-Rh alloy.
しかし飽和磁束密度は低い。このため、Ｆｅ−Ｒｅ系合
金のＲｅの一部をＲｈで置換した。実施例１と同様の条
件で作製したＦ” ｅ−Ｒｕ −Ｒｈ系合金薄膜の磁気
時性を第１表に示す。However, the saturation magnetic flux density is low. For this reason, a portion of Re in the Fe--Re alloy was replaced with Rh. Table 1 shows the magnetic time characteristics of the F'' e-Ru-Rh alloy thin film produced under the same conditions as in Example 1.
第 １ 表
第１表に示すように、Ｒｕの一部をＲｈで置換すると若
干保磁力は低下するが、飽和磁束密度は高くなる。しか
しＲｈを４ａｔ％以上とすると保磁力の低ドが著しくな
る。従ってＲｈによる置換は３ａｔ％以下が好ましい、
また、ＲｕとＲｈの合計の濃度を３ａｔ％未満あるいは
１０ａｔ％より大きくした場合も保磁力が減少した。こ
れは第２図および第４図に示すように、Ｆｅに対するこ
れからの元素の添加量が約５ａｔ％の時、保磁力が最大
となり、これより少くなでも多くても保磁力が減少する
ことからも容易に理解できる。Table 1 As shown in Table 1, when a portion of Ru is replaced with Rh, the coercive force slightly decreases, but the saturation magnetic flux density increases. However, when Rh is increased to 4 at% or more, the coercive force becomes significantly low. Therefore, the substitution with Rh is preferably 3 at% or less.
The coercive force also decreased when the total concentration of Ru and Rh was less than 3 at% or greater than 10 at%. This is because, as shown in Figures 2 and 4, when the amount of future elements added to Fe is about 5 at%, the coercive force is maximum, and if it is less or more than this, the coercive force decreases. can also be easily understood.
上述の様に、Ｆｅ−Ｒｕ系合金のＲｕの一部をＲｈで置
換することにより飽和磁束密度が高くなる。この場合、
高保磁力を得るためには、Ｒｕの濃度をｘ、Ｒｈの濃度
をｙとすると、Ｏ＜ ｙ≦３゜３≦ｘ ＋ ｙ≦１０な
る関係を満たす組成にすることが好ましい。As described above, by replacing a portion of Ru in the Fe-Ru alloy with Rh, the saturation magnetic flux density increases. in this case,
In order to obtain a high coercive force, it is preferable to use a composition that satisfies the following relationship: O<y≦3°3≦x+y≦10, where x is the concentration of Ru and y is the concentration of Rh.
〔実施例４〕
実施例１〜３で示した各種合金と従来の材料であるＣ
ｏ −２０ａｔ％Ｎｉ合金の耐食性を塩水噴霧試験によ
り比較した。試験方法を以下に述べる。[Example 4] Various alloys shown in Examples 1 to 3 and conventional material C
The corrosion resistance of o -20 at% Ni alloys was compared by a salt spray test. The test method is described below.
まず各種合金膜の飽和磁比Ｍｏ を測定し、その後。First, the saturation magnetic ratio Mo of various alloy films was measured, and then.
膜表面に０．５％ＮａＣＱ＊溶液を噴霧し、３０℃で２
４時間放置した。その後、飽和磁化Ｍ１を測定した。腐
食率は、腐食率（％） ＝（Ｍｏ Ｍｕ）Ｘ１００／
Ｍｏで定義した。実験結果を第２表に示す。Spray 0.5% NaCQ* solution onto the membrane surface and heat at 30℃ for 2 hours.
It was left for 4 hours. Thereafter, the saturation magnetization M1 was measured. Corrosion rate is Corrosion rate (%) = (Mo Mu) x 100/
Defined by Mo. The experimental results are shown in Table 2.
第 ２ 表
第２表に示すように、Ｃｏ−２０ａｔ％Ｎｉ合金はこの
試験により腐食し、飽和磁化が５％減少した。これに対
し、本発明のＦｅ−Ｒｕ、Ｆｅ−Ｒｈ 、 Ｆ ｅ −
Ｒｕ −Ｒｈ系合金は全（腐食せず、飽和磁化は変化し
なかった。Table 2 As shown in Table 2, the Co-20at%Ni alloy was corroded by this test and its saturation magnetization decreased by 5%. On the other hand, Fe-Ru, Fe-Rh, Fe-
The Ru-Rh alloy did not corrode and the saturation magnetization did not change.
〔実施例５〕
実施例１と同様のスパッタリング条件で、７０５９（コ
ーニング社製）ガラス基板上に膜厚５００人人のＣｒを
蒸着し、さらにその上に膜厚５００人のＦ ｅ −Ｒｕ
系合金を蒸着した。この合金薄膜の保磁力および角形比
のＲｕ濃度依存性を第６図に示す。第６図の保磁力のＲ
ｕ濃度依存性は曲線に示すように、Ｆｅ（Ｒｕ＝Ｏ）薄
膜よりも保磁力が高い。またＲｕｌｉｌ度を３ａｔ％以
上とすることにより、保磁力は３０００ ｅ以上となる
。また実施例１と同様、Ｒｕ濃度を１０ａｔ％以下とす
ることにより、飽和磁束密度を１．８Ｔ以上とすること
ができる。上述の様に、本実施例の膜構造においても、
Ｒｕ濃度を３〜１０ａｔ％とすることが好ましし亀。[Example 5] Under the same sputtering conditions as in Example 1, a 500-layer thick Cr film was deposited on a 7059 (Corning Inc.) glass substrate, and a 500-layer thick Fe-Ru film was further deposited thereon.
A series alloy was deposited. FIG. 6 shows the Ru concentration dependence of the coercive force and squareness ratio of this alloy thin film. Coercive force R in Figure 6
As shown in the curve, the u concentration dependence has a higher coercive force than the Fe (Ru=O) thin film. Further, by setting the Rulil degree to 3 at% or more, the coercive force becomes 3000 e or more. Further, as in Example 1, by setting the Ru concentration to 10 at % or less, the saturation magnetic flux density can be made to be 1.8 T or more. As mentioned above, in the membrane structure of this example,
It is preferable that the Ru concentration is 3 to 10 at%.
また、角形比のＲｕ濃度依存性は同図の曲線６２に示す
ように、０．７以上であった。このように本実施例では
実施例１の構造の場合よりも角形比が大きい、従って、
角形比を大きくする点から、非磁性基板と磁性層との間
に中間層を設けることが好ましい、また中間層としてＭ
ｏ、Ｗを用いた磁性薄膜を形成したところ、Ｃｒを用い
た場合とほぼ同様の角形比の向上が見られた。Further, the dependence of the squareness ratio on the Ru concentration was 0.7 or more, as shown by curve 62 in the figure. In this way, the squareness ratio of this example is larger than that of the structure of Example 1. Therefore,
In order to increase the squareness ratio, it is preferable to provide an intermediate layer between the non-magnetic substrate and the magnetic layer.
When a magnetic thin film was formed using O, W, the improvement in squareness ratio was found to be almost the same as when using Cr.
また、Ｆｅ−Ｒｕ系合金薄膜の代りに、ドｅ−Ｒｈ系合
金薄膜およびＦｅ−Ｒｕ−Ｒｈ系合金薄膜を形成したと
ころ、Ｆｅ−Ｒｕ系合金薄膜と同様、亮保磁力、高飽和
磁束密度を有する磁性簿膜が得られた。In addition, when we formed a de-e-Rh alloy thin film and a Fe-Ru-Rh alloy thin film instead of the Fe-Ru alloy thin film, we found that, like the Fe-Ru alloy thin film, they had a high coercive force and a high saturation magnetic flux density. A magnetic film having the following properties was obtained.
一方、磁気記録媒体は磁気ヘッドと接触する場合が多く
、耐摩耗性を向上させるという観点から、磁性薄膜上に
Ｃ，Ｂ、Ｓｉ、ＢＮ、ＳｉＣ，＾ＩＰ等の非磁性被覆膜
を設けることが望ましい。On the other hand, magnetic recording media often come into contact with magnetic heads, and from the viewpoint of improving wear resistance, a non-magnetic coating film such as C, B, Si, BN, SiC, IP, etc. is provided on the magnetic thin film. This is desirable.
〔実施例６〕
実施例１と同様のスパッタリング条件で、第１図の断面
図に示すような磁気記録媒体を作製した。[Example 6] A magnetic recording medium as shown in the cross-sectional view of FIG. 1 was manufactured under the same sputtering conditions as in Example 1.
１１は外径１３０ＩＩＩＩｌφ、内径４０ｍφ、厚さ１
．９−のＡｌ系合金からなる基板、１２は膜厚３０００
人のＣｒ薄膜からなる磁性制御層、１３は膜厚５００人
のＦｅ−４，７ａｔ％Ｒｕ 合金薄膜の磁性層である。11 has an outer diameter of 130IIIlφ, an inner diameter of 40mφ, and a thickness of 1
．． 9- is a substrate made of Al-based alloy, 12 is a film thickness of 3000
The magnetic control layer 13 is made of a thin Cr film, and 13 is a magnetic layer made of a Fe-4,7 at% Ru alloy thin film with a thickness of 500.
本発明の磁気記録媒体の記録密度をギャップ長０．４μ
ｍのＭ ｎ −Ｚ ｎフェライトヘッドにより測定した
。ヘットの浮上量は０．２８μｍとした。The recording density of the magnetic recording medium of the present invention is determined by a gap length of 0.4μ.
It was measured with a Mn-Zn ferrite head. The flying height of the head was 0.28 μm.
この結果、本発明の磁気記録媒体は２０ＫＰＣＩ以上の
高い記録密度を達成できることがわかった。As a result, it was found that the magnetic recording medium of the present invention can achieve a high recording density of 20 KPCI or more.
以上詳細に説明したごと（、Ｅｌ’ ６− Ｒｕ 、
Ｆ ｅ−Ｒｈ 、 Ｆ ｅ −Ｒｕ −Ｒｈ系合金薄膜
は高保磁力および高飽和磁束密度を有する。特に飽和磁
束密度は１．８Ｔ以上であり、磁気記録媒体の高出力化
に有利である。また上記合金薄膜と非磁性基板との間に
他の組成の中間層を介在せしめることにより、磁性薄膜
の角形比を大きくすることができる。また上記合金簿膜
を用いて高記録密度の磁気記録媒体を作製することがで
きる。As explained in detail above (, El' 6- Ru,
Fe-Rh, Fe-Ru-Rh based alloy thin films have high coercive force and high saturation magnetic flux density. In particular, the saturation magnetic flux density is 1.8 T or more, which is advantageous for increasing the output of magnetic recording media. Further, by interposing an intermediate layer having a different composition between the alloy thin film and the nonmagnetic substrate, the squareness ratio of the magnetic thin film can be increased. Furthermore, a magnetic recording medium with high recording density can be manufactured using the above-mentioned alloy film.
第１図は本発明の一実施例の磁気記録媒体の側面図、第
２図は本発明の実施例におけるＦｅ−Ｒｕ系合金薄膜の
保磁力および角形比のＲｕ濃度依存性を示すグラフ、第
３図は本発明の実施例におけるＦ ｅ −Ｒｕ系合金薄
膜の飽和磁束密度のＲｕ濃度依存性を示すグラフ、第４
図は本発明の実施例におけるＦｅ−Ｒｈ系合金Ｎ膜の保
磁力および角形比のＲｈ濃度依存性を示すグラフ、第５
図は本発明の実施例におけるＦ ｅ −Ｒｈ系合金簿膜
の飽和磁束密度のＲｈ濃度依存性を示すグラフ、第６図
は本発明の実施例におけるＣｒ中間層を有するＰａ−Ｒ
ｕ系合金薄膜の保磁力および角形比のＲｕ４度依存性を
示すグラフである。
１１・・・基板、１２・・・磁性制御層、１３・・・磁
性層。
２１．６１・・・保磁力のＲｕ ７９度依存性、２２゜
６２・・・角形比のＲｕ １１ｊｌＪ！ｉ依存性、３１
・・・飽和磁束密度のＲｕｌｌｊｌ度依存性、４１・・
・保磁力のＲｈｌｌｊｌｌ度依存性、４２・・・角形比
のＲｈ 濃度依存性、５１・・・ギ １ 目
にＵ−濃攬 （ユｆ潰
にに濃度（パＺ）
にに１展（ｉｔｔ ７：少FIG. 1 is a side view of a magnetic recording medium according to an embodiment of the present invention, and FIG. Figure 3 is a graph showing the Ru concentration dependence of the saturation magnetic flux density of the Fe-Ru alloy thin film in the example of the present invention.
The figure is a graph showing the Rh concentration dependence of the coercive force and squareness ratio of the Fe-Rh alloy N film in the example of the present invention.
The figure is a graph showing the Rh concentration dependence of the saturation magnetic flux density of the Fe-Rh alloy film in the example of the present invention.
It is a graph showing the Ru4 degree dependence of the coercive force and squareness ratio of a u-based alloy thin film. 11... Substrate, 12... Magnetic control layer, 13... Magnetic layer. 21.61...Ru 79 degree dependence of coercive force, 22°62...Ru 11jlJ of squareness ratio! i dependence, 31
...Rulljl degree dependence of saturation magnetic flux density, 41...
・Rhlljll degree dependence of coercive force, 42... Rh concentration dependence of squareness ratio, 51... Gi 7: small
Claims (1)
いて、上記磁性層がＦｅ−Ｒｕ系合金薄膜から成り、上
記非磁性基板と磁性層との間に中間層を設けたことを特
徴とする磁気記録媒体。 ２、上記Ｆｅ−Ｒｕ系合金薄膜のＲｕ濃度が３〜１０ａ
ｔ％であることを特徴とする特許請求の範囲第１項に記
載の磁気記録媒体。 ３、非磁性基板上に磁性層を形成した磁気記録媒体にお
いて、上記磁性層がＦｅ−Ｒｈ系合金薄膜から成り、上
記非磁性基板と磁性層との間に中間層を設けたことを特
徴とする磁気記録媒体。 ４、上記Ｆｅ−Ｒｈ系合金薄膜のＲｈ濃度が３〜７ａｔ
％であることを特徴とする特許請求の範囲第３に記載の
磁気記録媒体。 ５、非磁性基板上に磁性層を形成した磁気記録媒体にお
いて、上記磁性層がＦｅ−Ｒｕ−Ｒｈ系合金薄膜からな
り、ＲｕおよびＲｈの濃度（原子％）をそれぞれｘ、ｙ
とするとき、０＜ｙ≦３、３≦ｘ＋ｙ≦１０なる関係を
満たし、上記非磁性基板と磁性層との間に中間層を設け
たことを特徴とする磁気記録媒体。[Claims] 1. A magnetic recording medium in which a magnetic layer is formed on a non-magnetic substrate, wherein the magnetic layer is made of a Fe-Ru alloy thin film, and an intermediate layer is provided between the non-magnetic substrate and the magnetic layer. A magnetic recording medium characterized in that: 2. The Ru concentration of the Fe-Ru alloy thin film is 3 to 10a.
The magnetic recording medium according to claim 1, wherein the magnetic recording medium is t%. 3. A magnetic recording medium having a magnetic layer formed on a non-magnetic substrate, characterized in that the magnetic layer is made of a Fe-Rh alloy thin film, and an intermediate layer is provided between the non-magnetic substrate and the magnetic layer. magnetic recording media. 4. The Rh concentration of the Fe-Rh alloy thin film is 3 to 7 at.
% of the magnetic recording medium according to claim 3. 5. In a magnetic recording medium in which a magnetic layer is formed on a non-magnetic substrate, the magnetic layer is made of a Fe-Ru-Rh alloy thin film, and the concentrations (atomic %) of Ru and Rh are x and y, respectively.
A magnetic recording medium that satisfies the following relationships: 0<y≦3, 3≦x+y≦10, and further comprises an intermediate layer between the nonmagnetic substrate and the magnetic layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14371088A JPH01312724A (en) | 1988-06-13 | 1988-06-13 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14371088A JPH01312724A (en) | 1988-06-13 | 1988-06-13 | Magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01312724A true JPH01312724A (en) | 1989-12-18 |
Family
ID=15345175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14371088A Pending JPH01312724A (en) | 1988-06-13 | 1988-06-13 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01312724A (en) |
-
1988
- 1988-06-13 JP JP14371088A patent/JPH01312724A/en active Pending
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