JPS62162223A - Thin film magnetic recording medium - Google Patents

Thin film magnetic recording medium

Info

Publication number
JPS62162223A
JPS62162223A JP241586A JP241586A JPS62162223A JP S62162223 A JPS62162223 A JP S62162223A JP 241586 A JP241586 A JP 241586A JP 241586 A JP241586 A JP 241586A JP S62162223 A JPS62162223 A JP S62162223A
Authority
JP
Japan
Prior art keywords
film
coercive force
thickness
thin film
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP241586A
Other languages
Japanese (ja)
Inventor
Kyoji Noda
恭司 野田
Yasuhiro Notohara
康裕 能登原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP241586A priority Critical patent/JPS62162223A/en
Publication of JPS62162223A publication Critical patent/JPS62162223A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To increase the coercive force Hc without decreasing the residual magnetic flux density Br, to increase the thickness of a magnetic layer, to decrease the thickness of the substrate Cr film, and to reduce the cost by adding Pt to the in-plane magnetized film of Co-Ni on a nonmagnetic substrate through the Cr film. CONSTITUTION:Glass is used as the nonmagnetic substrate 1, and a Cr thin film 2 and a Co magnetic film 3 are coated on the substrate. The relation of the thickness of the Cr film and the coercive force Hc of the magnetic film of 85Co-10Ni-5Pt obtained by adding Pt to the in-plane magnetized film of Co-Ni and having 0.08mum thickness is shown in Figure 5, and simultaneously compared with the cases where 80Co-20Ni and 70Co-30Ni are used. The coercive force Hc of 85Co-10Ni-5Pt is greater than those of 80Co-20Ni and 70Co-30Ni even when the thickness of the Cr layer is decreased. Besides, the residual magnetic flux density Br is plotted against the Ni-content is Figure 6, and the residual magnetic flux density Br of 85Co-10Ni-5Pt is greater than those of other compositions.

Description

【発明の詳細な説明】 産業上の利用分野 本発明はハードディスク磁気記録装置等に用いられる薄
膜磁気記録用の媒体に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a thin film magnetic recording medium used in hard disk magnetic recording devices and the like.

従来の技術 優れた高密度磁気記録特性を得るためには、媒体の薄膜
化、高保磁力化、高残留磁束密度化が必要である。この
条件を満たす磁性体として、C。
BACKGROUND OF THE INVENTION In order to obtain excellent high-density magnetic recording characteristics, it is necessary to make the medium thinner, have a higher coercive force, and have a higher residual magnetic flux density. C is a magnetic material that satisfies this condition.

系合金磁性薄膜が特に注目されている。媒体の製造方法
としては、電気メツキ法や無電解メッキ法によるものと
、蒸着、スパッタ、イオンブレーティング等の真空系内
で強磁性薄膜を作製するものがある。この中で、特にス
パッタ法は蒸着法等に比べて堆積速度が遅いが、合金膜
作製が比較的容易に行える利点があり、各種CO合金が
ディスク媒体用に研究開発されている。また、最近では
インライン式連続スパッタ装置を使用することにより、
第1図に示すような比磁性基板1上にCr膜2を介して
CoやCo−Niの磁性膜3を被着し、更に固体潤滑膜
であるカーボン保護III 4を同時に被着できるよう
になった。このインライン式連続スパッタ装置を用いる
ことにより、スパッタ磁気ディスクの量産製造が可能と
なり、実用化されるようになってきた。
Magnetic thin films based on alloys are attracting particular attention. Methods for producing the medium include those using electroplating or electroless plating, and methods for producing a ferromagnetic thin film in a vacuum system such as vapor deposition, sputtering, and ion blating. Among these methods, the sputtering method in particular has a slower deposition rate than the vapor deposition method, but has the advantage that alloy films can be produced relatively easily, and various CO alloys are being researched and developed for use in disk media. In addition, recently, by using in-line continuous sputtering equipment,
A magnetic film 3 of Co or Co-Ni is deposited on a specific magnetic substrate 1 as shown in FIG. became. By using this in-line continuous sputtering apparatus, mass production of sputtered magnetic disks has become possible and has come into practical use.

発明が解決しようとする問題点 非磁性基板1上にCr膜2を介してCo−Ni面内磁化
膜3が形成された金属薄膜媒体は、高密度磁気記録特性
を得るための条件である薄膜化。
Problems to be Solved by the Invention A metal thin film medium in which a Co--Ni in-plane magnetized film 3 is formed on a nonmagnetic substrate 1 via a Cr film 2 has a thin film that is a condition for obtaining high-density magnetic recording characteristics. ification.

高保磁力化、高残留磁束密度化が可能であることがよく
知られている。ところで、一般に媒体の磁気特性を評価
する方法として、次の(1)式に示す反磁界パラメータ
が使用され、この値が大きい方が電気磁気変換特性で高
出力再生となる。
It is well known that high coercive force and high residual magnetic flux density are possible. Incidentally, as a general method for evaluating the magnetic properties of a medium, the demagnetizing field parameter shown in the following equation (1) is used, and the larger the value, the higher the output reproduction due to the electromagnetic conversion characteristics.

反磁界パラメーターBr・δ/ Hc・・・・(1)こ
こで、Brは残留磁束密度Eガウス二〇]、δは膜厚[
μm]、Hcは保磁力[○e]である。
Demagnetizing field parameter Br・δ/Hc... (1) Here, Br is the residual magnetic flux density E Gauss 20], and δ is the film thickness [
μm], Hc is coercive force [○e].

金属薄膜媒体の保磁力Hcは磁気ヘッドの記録電流の負
担を少な(させるなどの考慮をして700〜800 0
eが好ましいとされている。ところが、第2図に示す保
磁力Heと下地Cr膜厚との関係から明らかなように磁
性層の膜厚が0.08μmにおいて保磁力H’cを70
0〜80o Oeとするためには、Cr 8%の膜厚を
Co−2ONiの場合で0.5μm以上、Co−3ON
iの場合で0.17μm以上となり、Co−2ONiで
はCr材料の消費料が多(、コスト高となる問題がある
。第3図はCo−2ONiの膜厚をパラメータとして、
保磁力Heと下地Cr膜厚との関係を示している。この
第3図から明らかなように、磁性膜3の膜厚δを大きく
すると保磁力Hcが小さくなるので膜厚δを上げること
も困難である。また、第2図で明らかなようにNiの組
成比を203t%から30at%にすると保磁力Heが
高(なるが、第4図に示すように残留磁束密度Brが低
下するので、電気磁気変換特性での再生出力は高(なら
ないことがわかっている。
The coercive force Hc of the metal thin film medium is set to 700 to 8000, taking into consideration things such as reducing the burden of the recording current on the magnetic head.
It is said that e is preferable. However, as is clear from the relationship between the coercive force He and the underlying Cr film thickness shown in FIG. 2, when the magnetic layer thickness is 0.08 μm, the coercive force H'c is
In order to achieve 0 to 80o Oe, the film thickness of 8% Cr must be 0.5 μm or more in the case of Co-2ONi, and 0.5 μm or more in the case of Co-3ONi.
In the case of Co-2ONi, it is 0.17 μm or more, and Co-2ONi has the problem of high consumption of Cr material (and high cost. Figure 3 shows the thickness of Co-2ONi as a parameter.
The relationship between the coercive force He and the underlying Cr film thickness is shown. As is clear from FIG. 3, if the thickness δ of the magnetic film 3 is increased, the coercive force Hc becomes smaller, so it is also difficult to increase the thickness δ. Furthermore, as is clear from Fig. 2, when the Ni composition ratio is increased from 203 t% to 30 at%, the coercive force He becomes high (but as shown in Fig. 4, the residual magnetic flux density Br decreases, so the electromagnetic conversion It is known that the playback output with the characteristics is not high.

以上のことから、保磁力Heが700〜8000eで、
且つBr・δが大きくなるように磁性材料を考慮しなけ
れば低コストで高再生出力を得ることは困難であり、優
れた高密度記録特性を得るにはまだ十分とは言えない。
From the above, when the coercive force He is 700 to 8000e,
In addition, unless consideration is given to the magnetic material so as to increase Br.delta., it is difficult to obtain high reproduction output at low cost, and it is still not sufficient to obtain excellent high-density recording characteristics.

問題点を解決するための手段 前記の問題点を解決するために、本発明では非磁性基板
上にCr膜を介したCo−Ni面内磁化膜を形成し、C
o−Ni面内磁化膜にptを添加したものである。
Means for Solving the Problems In order to solve the above problems, in the present invention, a Co--Ni in-plane magnetization film is formed on a non-magnetic substrate with a Cr film interposed therebetween.
This is an o-Ni in-plane magnetized film to which pt is added.

作  用 上記の手段により、残留磁束密度Brを低下させること
なく保磁力Heを高くさせることが可能となり、更に磁
性層の厚さを上げることも可能となる。また、下地Cr
膜の膜厚を減少してもよくなるため、Cr材料の消費料
が少なくなり低コストにすることが可能となる。
Effect: By the above means, it is possible to increase the coercive force He without reducing the residual magnetic flux density Br, and it is also possible to increase the thickness of the magnetic layer. In addition, the base Cr
Since the thickness of the film can be reduced, consumption of Cr material is reduced and costs can be reduced.

また、更にTiを添加することによってCo−3ONi
と同程度の耐食性を持つ磁性材料とすることが可能とな
る。
In addition, by further adding Ti, Co-3ONi
It is possible to create a magnetic material with corrosion resistance comparable to that of

実施例 本発明の詳細な説明する。非磁性基板1としてガラスを
用いて、Cr薄膜2及び磁性膜3を被着した。第5図は
本発明のPtをCo−Ni面内磁化膜に添加した磁性膜
として85Co−1ONi−5Ptの場合を膜厚0.0
8μmにて実施した時の保磁力HeとCr膜の膜厚の関
係を示し、同時に80Co−2ON i及び70Co−
3ONiの場合と比較した図である。第5図から明らか
なように、本発明のptをCo−Ni面内磁化膜に添加
した85Co−1ONi−5Ptは図に示した80Co
−2ONiや70Co−3ON iよりもCr層の厚さ
が少なくても保磁力Heが700〜8000eとなる。
EXAMPLE The present invention will be described in detail. Glass was used as the nonmagnetic substrate 1, and a Cr thin film 2 and a magnetic film 3 were deposited thereon. Figure 5 shows the case of 85Co-1ONi-5Pt with a film thickness of 0.0 as a magnetic film in which Pt of the present invention is added to a Co-Ni in-plane magnetization film.
The relationship between the coercive force He and the film thickness of the Cr film when conducted at 8 μm is shown, and at the same time, 80Co-2ON i and 70Co-
It is a figure compared with the case of 3ONi. As is clear from FIG. 5, the 85Co-1ONi-5Pt in which pt of the present invention is added to the Co-Ni in-plane magnetization film is the 80Co shown in the figure.
Even if the thickness of the Cr layer is smaller than that of -2ONi and 70Co-3ONi, the coercive force He is 700 to 8000e.

また、第6図はN i ML成比に対する残留磁束密度
Brを示す図である。
Moreover, FIG. 6 is a diagram showing the residual magnetic flux density Br versus the N i ML composition ratio.

第6図より明らかなように、本発明による85Co−1
ONi−5Ptの方が80Co−2ONiや70Co 
 3ONiより大きな残留磁束密度Brを示している。
As is clear from FIG. 6, 85Co-1 according to the present invention
ONi-5Pt is better than 80Co-2ONi and 70Co
It shows a larger residual magnetic flux density Br than 3ONi.

従って、本発明による85C。Therefore, 85C according to the invention.

−1ONi−5Ptは、磁気的には80Co−2ONi
よりも良く、下地Cr層の消費料に関しても70Co−
3ON iよりも少なくすることが可能となった。
-1ONi-5Pt is magnetically 80Co-2ONi
It is better than 70Co- in terms of consumption of the underlying Cr layer
It is now possible to use less than 3ON i.

本発明のptを添加したCo−Ni面内磁化膜において
、Pt組成比を変化させた時の保磁力HCを第7図に示
す。第7図はCr膜を0.25μmとして考えた。保磁
力Hcが700 0e以上とするためには、Ptが2a
t%以上必要であることがわかる。また、Ptの組成比
を変化させた時の角形比B r / B sを第8図に
示す。第8図から明らかなように、Ptが7at%以上
添加されると角形比B r / B sが低下してしま
うことがわかった。従って、Ptの組成比は2at%以
上、7at%以下であることが望ましいと考えられる。
FIG. 7 shows the coercive force HC when the Pt composition ratio is changed in the Co--Ni in-plane magnetized film added with pt of the present invention. In FIG. 7, the Cr film is assumed to have a thickness of 0.25 μm. In order to have a coercive force Hc of 7000e or more, Pt must be 2a
It can be seen that t% or more is required. Further, FIG. 8 shows the squareness ratio B r /B s when the composition ratio of Pt is changed. As is clear from FIG. 8, it was found that when 7 at% or more of Pt was added, the squareness ratio B r /B s decreased. Therefore, it is considered desirable that the composition ratio of Pt is 2 at% or more and 7 at% or less.

ところで、本発明のptをCo−Ni面内磁化膜では、
残留磁束密度Brを高めるためにNiの組成比を約10
at%としである。そのため、第9図の耐食性試験に示
すように70Co−3ONiに比較すると良くないこと
が明らかとなった。そこで、本発明では耐食性効果の強
いTiを添加してみた。第9図に示すようにTiをla
t%添加することにより、70 Co  30 N i
とほぼ同程度の耐食性を持った磁性膜を得ることができ
た。第10図は、Tiの組成比を変化させた時の保磁力
を示す図であるが、Tiの組成比を3at%以上添加す
ると保磁力が低下してしまうのでTiの添加量は、3a
t%以下であることが望ましいことが明らかとなった。
By the way, when the PT of the present invention is a Co-Ni in-plane magnetized film,
In order to increase the residual magnetic flux density Br, the Ni composition ratio is approximately 10
At%. Therefore, as shown in the corrosion resistance test in FIG. 9, it became clear that it was not as good as 70Co-3ONi. Therefore, in the present invention, we tried adding Ti, which has a strong corrosion resistance effect. As shown in Figure 9, Ti is la
By adding t%, 70 Co 30 N i
We were able to obtain a magnetic film with almost the same corrosion resistance. FIG. 10 is a diagram showing the coercive force when the Ti composition ratio is changed. If the Ti composition ratio is added to 3 at % or more, the coercive force decreases, so the amount of Ti added is 3 at % or more.
It has become clear that it is desirable that the content is t% or less.

発明の効果 実施例で示したように、本発明はPtをCo−Ni面内
磁化膜媒体に添加したものであるため、従来のCo−N
i面内磁化膜媒体である80C。
Effects of the Invention As shown in the examples, since the present invention adds Pt to a Co-Ni in-plane magnetization film medium, it is different from the conventional Co-N
80C, which is an i-plane magnetic film medium.

−2ON i及び70Co−3ONiに比べて、Brや
Heが大きくなる二七が明らかとなり、更にTiを添加
することにより、70Co−3ONiと同程度の耐食性
を持った媒体となり、従来のスパッタ磁気ディスクより
も優れた磁気ディスクを供給することが可能となった。
-2ON i and 70Co-3ONi, it is clear that Br and He are larger in 27, and by adding Ti, it becomes a medium with corrosion resistance comparable to that of 70Co-3ONi, and it can be used as a medium for conventional sputtering magnetic disks. It has now become possible to supply magnetic disks that are superior to those of previous manufacturers.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明及び従来例のスパッタ磁気ディスクの構
造を示す断面図、第2図は従来のCo系磁性薄膜である
Co、80Co−2ONi、70Co−3ONiの保磁
力Heと下地Cr膜の膜厚の関係を示す図、第3図は下
地Cr膜の膜厚を0.5amとした時の80Co−2O
Niの保磁力Hcと80Co−2ON iの膜厚との関
係を示す図、第4図は80Co−2ONiと70Co−
3ONiの残留時速密度Brを示す図、第5図は本発明
のPtをCo−Ni面内磁力化膜に添加した媒体の保磁
力Hcと下地Cr膜の膜厚の関係を示す図、第6図は残
留磁束密度BrのNi組成比依存性を示す図、第7図は
本発明のCo−Ni−PtにおいてPtの組成比と、保
磁力Hcとの関係を示す図、第8図は本発明のCo−N
i−Pt及びCo−Ni−Pt−Tiのptの組成比と
角形比Br/Bs(Br:残留磁束密度、Bs:飽和磁
束密度)を示す図、第9図は本発明の85Co−1ON
i−5Pt及び84Co−1ONi −5Pt−Tiと
従来の70Co−3ONi、C。 の耐食性を示す図、第10図は本発明のCo−Ni−P
tTiにおいてTiの組成比と保磁力との関係を示す図
である。 1・・・・非磁性基板   2・・・・Cr薄膜層3・
・・・Co系磁性合金薄膜層   4・・・・保護膜第
1図 第2図 下Su Cr gL 171可f 4 a’(pen 
7第3図 第4図 第5図 桃Cr慢榎、l♂(lJrQ 〕 第6図 第7図 Pt  (cLt  :4) 第8図 h tαf−/、] 第9図 10m6(痔閏〕
FIG. 1 is a cross-sectional view showing the structure of sputtered magnetic disks according to the present invention and conventional examples, and FIG. 2 shows the coercive force He of conventional Co-based magnetic thin films Co, 80Co-2ONi, and 70Co-3ONi and the relationship between the coercive force He and the underlying Cr film. A diagram showing the relationship between film thickness, Figure 3 shows 80Co-2O when the film thickness of the underlying Cr film is 0.5 am.
Figure 4 shows the relationship between the coercive force Hc of Ni and the film thickness of 80Co-2ONi.
FIG. 5 is a diagram showing the residual hourly density Br of 3ONi. The figure shows the dependence of the residual magnetic flux density Br on the Ni composition ratio, Figure 7 shows the relationship between the Pt composition ratio and the coercive force Hc in the Co-Ni-Pt of the present invention, and Figure 8 shows the dependence of the residual magnetic flux density Br on the Ni composition ratio. Invention Co-N
A diagram showing the pt composition ratio and squareness ratio Br/Bs (Br: residual magnetic flux density, Bs: saturation magnetic flux density) of i-Pt and Co-Ni-Pt-Ti, FIG. 9 is 85Co-1ON of the present invention.
i-5Pt and 84Co-1ONi-5Pt-Ti and conventional 70Co-3ONi,C. Figure 10 shows the corrosion resistance of Co-Ni-P of the present invention.
FIG. 3 is a diagram showing the relationship between Ti composition ratio and coercive force at tTi. 1...Nonmagnetic substrate 2...Cr thin film layer 3.
... Co-based magnetic alloy thin film layer 4 ... Protective film Figure 1 Figure 2 Lower Su Cr gL 171 possible f 4 a' (pen
7 Fig. 3 Fig. 4 Fig. 5 Peach Cr, l♂ (lJrQ) Fig. 6 Fig. 7 Pt (cLt :4) Fig. 8 h tαf-/, ] Fig. 9 10m6 (hemorrhoid)

Claims (4)

【特許請求の範囲】[Claims] (1)非磁性基板上にCr膜を介してCo−Ni面内磁
化膜を形成し、前記Co−Ni面内磁化膜中にPtを添
加したことを特徴とする薄膜磁気記録媒体。
(1) A thin film magnetic recording medium characterized in that a Co--Ni in-plane magnetized film is formed on a non-magnetic substrate via a Cr film, and Pt is added to the Co--Ni in-plane magnetized film.
(2)Ptの組成比を2at%以上、7at%以下とす
ることを特徴とする特許請求の範囲第1項記載の薄膜磁
気記録媒体。
(2) The thin film magnetic recording medium according to claim 1, characterized in that the composition ratio of Pt is 2 at% or more and 7 at% or less.
(3)Co−Ni面内磁化膜中に更にTiが添加された
ことを特徴とする特許請求の範囲第1項記載の薄膜磁気
記録媒体。
(3) The thin film magnetic recording medium according to claim 1, wherein Ti is further added to the Co--Ni in-plane magnetization film.
(4)Ptの組成比を2at%以上、7at%以下とし
、Tiの組成比を3.0at%以下としたことを特徴と
する特許請求の範囲第3項記載の薄膜磁気記録媒体。
(4) The thin film magnetic recording medium according to claim 3, characterized in that the composition ratio of Pt is 2 at% or more and 7 at% or less, and the composition ratio of Ti is 3.0 at% or less.
JP241586A 1986-01-09 1986-01-09 Thin film magnetic recording medium Pending JPS62162223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP241586A JPS62162223A (en) 1986-01-09 1986-01-09 Thin film magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP241586A JPS62162223A (en) 1986-01-09 1986-01-09 Thin film magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS62162223A true JPS62162223A (en) 1987-07-18

Family

ID=11528615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP241586A Pending JPS62162223A (en) 1986-01-09 1986-01-09 Thin film magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS62162223A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0573880A (en) * 1991-09-06 1993-03-26 Internatl Business Mach Corp <Ibm> Magnetic recording medium and manufacture thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0573880A (en) * 1991-09-06 1993-03-26 Internatl Business Mach Corp <Ibm> Magnetic recording medium and manufacture thereof
US5516547A (en) * 1991-09-06 1996-05-14 International Business Machines Corporation Method for fabricating magnetic recording medium

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