JPS6398823A - Magnetic recording medium and its production - Google Patents
Magnetic recording medium and its productionInfo
- Publication number
- JPS6398823A JPS6398823A JP24292186A JP24292186A JPS6398823A JP S6398823 A JPS6398823 A JP S6398823A JP 24292186 A JP24292186 A JP 24292186A JP 24292186 A JP24292186 A JP 24292186A JP S6398823 A JPS6398823 A JP S6398823A
- Authority
- JP
- Japan
- Prior art keywords
- film
- recording
- examples
- magnetic
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000005468 ion implantation Methods 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 7
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 6
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 5
- 230000007797 corrosion Effects 0.000 abstract description 19
- 238000005260 corrosion Methods 0.000 abstract description 19
- 229910052707 ruthenium Inorganic materials 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 77
- 238000002474 experimental method Methods 0.000 description 16
- 230000005415 magnetization Effects 0.000 description 12
- 239000000463 material Substances 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 238000012360 testing method Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000001755 magnetron sputter deposition Methods 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 3
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- 229910017060 Fe Cr Inorganic materials 0.000 description 2
- 229910002544 Fe-Cr Inorganic materials 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical class [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- 229910000629 Rh alloy Inorganic materials 0.000 description 1
- 229920000535 Tan II Polymers 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気記録に用いる記録媒体、とくに、高密度記
録に好適な記録媒体およびその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a recording medium used for magnetic recording, and particularly to a recording medium suitable for high-density recording and a method for manufacturing the same.
磁気記録に用いる記録媒体として、従来、磁性粉を基板
上に塗布したものが用いられてきたが。Conventionally, as a recording medium used for magnetic recording, one in which magnetic powder is coated on a substrate has been used.
最近、高密度記録が可能な記録媒体として、Ｃ０−Ｎｉ
スパッタ膜や、Ｃｏ−Ｐメッキ膜等のいわゆる連続磁性
金属膜を用いた記録媒体が実用化されつつある。Recently, C0-Ni has been used as a recording medium capable of high-density recording.
Recording media using so-called continuous magnetic metal films such as sputtered films and Co--P plated films are being put into practical use.
しかしながら、これら連続磁性金属膜は腐食されやすい
という欠点を有している。However, these continuous magnetic metal films have the disadvantage of being easily corroded.
従来、この腐食の問題を解決するためには、昭和６０年
度電子通信学会総合全国大会講演論文集ｌ−１９９に述
べられているように、Ｃｒ等の高耐食性金属を含有した
磁性膜を用いる方法が提案されている。Conventionally, in order to solve this corrosion problem, a method using a magnetic film containing a highly corrosion-resistant metal such as Cr was used, as described in Proceedings of the 1985 National Conference of the Institute of Electronics and Communication Engineers, Vol. 1-199. is proposed.
し７かしながら高耐食性金属を含有した磁性膜はｉａ、
ｆ１］磁束密度が小さくなるため、再生出力が小さくな
るという欠点がある。However, magnetic films containing highly corrosion-resistant metals are ia,
f1] Since the magnetic flux density becomes smaller, there is a drawback that the reproduction output becomes smaller.
本−尾明の目的は上記した従来技術の人点金なくし、再
生出力が犬きく、シかも耐ユ”耐性だ秀れた連続磁性金
属膜ならびにその製造方法を提供するものである。The object of the present invention is to provide a continuous magnetic metal film which eliminates the disadvantages of the prior art described above, has high reproduction output, and is excellent in resistance to damage and decay, as well as a method for manufacturing the same.
〔間４点を解決するための手段〕
太き、を再生出力を得るためては、飽和磁化の大きな記
録媒体を用いる必要がある。単元素で最も大きな飽和磁
化を有する材料ｎＦｅである。本発明者等はｔ Ｐ ｅ
に種々の材料を添加することＫより耐食性を同上させ、
しかも記録媒体にふされＬい磁気特性を有するようにす
ることができることを見出した。[Means for solving the four points in between] In order to obtain a thick reproduction output, it is necessary to use a recording medium with a large saturation magnetization. The material nFe has the largest saturation magnetization of any single element. The inventors t P e
By adding various materials to K, the corrosion resistance is improved.
Moreover, it has been found that it is possible to make the recording medium have excellent magnetic properties.
本発明者等はＦｅにＲｈ、ｐｄ、１％ｕ、 Ｃｒ。The present inventors added Rh, pd, 1% u, and Cr to Fe.
ｉＮ ’ Ｉ Ｃｏを添加した磁性膜は従来磁気記録媒
体用連続磁性薄膜として用いられてきたＣｏ−Ｎｉ膜知
くらべて耐食性および記録再生特性に秀れていることを
見出した。It has been found that a magnetic film doped with iN'ICo has superior corrosion resistance and recording and reproducing properties compared to the Co--Ni film conventionally used as a continuous magnetic thin film for magnetic recording media.
さらに、Ｆｅに上記の元素を添加する際の添加法として
、イオン注入法を用いること−こより、単なるスパッタ
法よりも記録密度特性が秀れた磁気記録媒体を得ること
ができることを見出した。Furthermore, it has been found that by using ion implantation as a method of adding the above-mentioned elements to Fe, it is possible to obtain a magnetic recording medium with better recording density characteristics than a simple sputtering method.
本発明はＦｅを主成分とし、Ｒｈ、Ｐｄ、Ｒｕ。 The main component of the present invention is Fe, Rh, Pd, and Ru.
Ｃｒ、 Ｎｉ、Ｃｏのうち一種類あるいはそれ以上を含
有せしめた磁性膜を記録膜として用いるものである。こ
のうち、ｌ’ｅは大きな飽和磁化、すなわち、大きな再
生出力を得るためのものであり、Ｒｈ、ｐｄ、Ｒｕ＋
Ｃｒ＋ Ｎｉｌ Ｃｏは耐食性を向上させる元素であ
る。また、ｌｌｈ、ｐｄ、几Ｕ。A magnetic film containing one or more of Cr, Ni, and Co is used as a recording film. Among these, l'e is for obtaining large saturation magnetization, that is, large reproduction output, and Rh, pd, Ru+
Cr+NilCo is an element that improves corrosion resistance. Also, llh, pd, 几U.
Ｃｒ、 Ｎｉ、Ｃｏを添加する際にイオン注入法を用
いると、単なるスパッタ法を用いる場合てくらべて記録
密度特性の秀れた磁気記録媒体を得ることができる。When ion implantation is used to add Cr, Ni, and Co, a magnetic recording medium with superior recording density characteristics can be obtained compared to when a simple sputtering method is used.
実施例１〜４
外径１３０Ｉａ１φ、内径４０ａｍφ、厚さ１，９−の
Ａｔ円板上に膜厚１５μｍのｌｑ ｉ Ｐ膜を設けたも
のを基板として用い、その上に、膜厚０・０５μｍのｐ
６膜をマグネトロンスパッタ法により作製した。つき゛
に、このＦｅ膜（てイオン注入法によシドース量１０１
４１固／譚２のＢｈを注入した。イオン注入時の基板温
度を３００Ｃ，電圧を３５０ＫｅＶとし、イオン注入時
間？：５，１０．２０．３０分と変化させることにより
４種類のＦｅ−′ＦＬｈ膜を作製した。さらにこの上に
は膜厚０．０２μｍのカーボン膜を設けた。後に行った
誘導結合準プラズマ分光法（ＩＣＰＳ法）の分析結果よ
り、本実験で得られたｌ；’ｅ−ｆ％ｈ膜中の几り組成
は、それぞれ１０． ２０． ４０．６０ ａ ｔ ％
であることがわかつ九。Examples 1 to 4 An At disc having an outer diameter of 130Ia1φ, an inner diameter of 40amφ, and a thickness of 1.9 mm, on which a lq i P film with a film thickness of 15 μm was provided, was used as a substrate, and a film with a film thickness of 0.05 μm was placed on it. p of
Six films were fabricated by magnetron sputtering. At the same time, this Fe film (with a dose amount of 101
Bh of 41 solid/tan 2 was injected. The substrate temperature during ion implantation was 300C, the voltage was 350KeV, and the ion implantation time was ? : 5, 10, 20, and 30 minutes, four types of Fe-'FLh films were prepared. Furthermore, a carbon film with a film thickness of 0.02 μm was provided on this. From the analysis results of inductively coupled quasi-plasma spectroscopy (ICPS method) conducted later, it was found that the concentration composition in the l;'e-f%h film obtained in this experiment was 10. 20. 40.60 at%
It turns out that 9.
上記のようにして作製した記録媒体とギャップ長０．２
μｍ、）ラック１ｌｌｉｉ＆１００μｍ１巻数１２ター
ンのＭｒｔＺｔｎフェライトヘッドを用い、ヘッド浮上
量０．２０μｍ、ヘッド−媒体量相対速度２０ｍ／（８
）で記録再生実験を行った。Recording medium produced as above and gap length 0.2
Using a MrtZtn ferrite head with rack 1llii & 100 μm and 12 turns, the head flying height is 0.20 μm, and the head-medium relative speed is 20 m/(8
), we conducted recording and playback experiments.
記録周波数０．１ＭＨ２における再生出力ならびに、
０．１ ＭＨｚ ＶＣ！？ける再生出力の１／２の再生
出力を与える記録密匿Ｄ ｓ ｏを第１図に示す。尚。Reproduction output at recording frequency 0.1MH2 and
0.1 MHz VC! ? FIG. 1 shows a recording security D s o that provides a reproduction output that is 1/2 of the reproduction output that is obtained. still.
同図に示した比較例は、後述するように、Ｃ０−Ｎｉス
パッタ膜を用いた場合の特性である。The comparative example shown in the figure shows the characteristics when a C0-Ni sputtered film is used, as will be described later.
つぎに１本実験に用いた４種類の磁気ディスクよりｈ
１０ｍＸ １０調の切片を切り出し、飽和磁化を測定し
た後、５％ＮａＣ１水溶液を噴霧し、いったん乾燥させ
、さらに温度６０Ｃ１相対湿度９０チの雰囲気中に１０
００ｈ ｒ放置した。これらの試料の飽和磁化の測定を
行ったところ、４枚の試料とも最初の測定値と全く同じ
値を得た。Next, h from the four types of magnetic disks used in the experiment.
After cutting out sections of 10 m x 10 tones and measuring their saturation magnetization, they were sprayed with a 5% NaCl aqueous solution, dried once, and then placed in an atmosphere of 60 C and relative humidity of 90 C.
I left it for 00 hours. When the saturation magnetization of these samples was measured, the values obtained were exactly the same as the first measurement values for all four samples.
第１図に示した不実施例と比較例との記録再生特性およ
び上述の耐食試験の結果よシ、Ｈ，ｈを１３〜５０ａｔ
チ含有したＦｅ−Ｒｈ合金膜は従来用いられてき１ｃｏ
−Ｎｉ膜にくらべて秀れた記録再生特性を示し、しかも
耐食性に秀れていることがわかる。According to the recording and reproducing characteristics of the non-example and comparative example shown in FIG. 1 and the results of the above-mentioned corrosion resistance test,
A Fe-Rh alloy film containing 1co has been conventionally used.
It can be seen that this film exhibits superior recording and reproducing properties compared to the -Ni film, and also has excellent corrosion resistance.
実施例５
実施例１に用いたものと同一形状、同一材質の基板上に
、膜厚０．０６μｍのＦｅ７５Ｒｊ１２５膜ｔスバッタ
法により作製した。ターゲットは２００ ｆｆＬ’ｉφ
の合金ターゲットを用いた。スパッタ１晦のルＦＭ力ｄ
２ ｋ Ｗ ｔ Ａ ｒ圧は５ ｍ Ｔｏｒｒ 、基
板温度は１００Ｃとした。つぎに、膜厚０．０２μｍの
カーボン膜全同じくスパッタ法により作製した。Example 5 On a substrate having the same shape and the same material as those used in Example 1, a Fe75Rj125 film having a thickness of 0.06 μm was fabricated by the spatter method. Target is 200 ffL'iφ
An alloy target was used. Spatter 1 night Le FM force d
The 2 kW t Ar pressure was 5 m Torr, and the substrate temperature was 100C. Next, a carbon film having a thickness of 0.02 μm was entirely produced by the same sputtering method.
このよう圧して作：ツした記録媒体と、実施例１〜４で
用いた磁気ヘッドを用い、実捲例１〜４と同一条件で記
録再生実験を行った。Recording and reproducing experiments were conducted under the same conditions as in actual winding examples 1 to 4 using the recording medium produced by pressing as described above and the magnetic head used in Examples 1 to 4.
この結果、記録周波ａｏ、ＩＭＨｚＫおける再生出力は
２．４８ｍＶＩ）ｌ）であ！Ｊ、Ｄｓｏは２３ｋｆｃｉ
であった。As a result, the playback output at the recording frequency ao and IMHzK is 2.48 mVI)l)! J, Dso is 23kfci
Met.
つき゛に実施例１〜４と同じ方法を用いｒ耐食試験を行
ったところ、飽和磁化の変化は全く見られなかった。When a corrosion resistance test was conducted using the same method as in Examples 1 to 4, no change in saturation magnetization was observed.
以上述べてきたように、本実施例の実験結果と実施例１
〜４の結果ならびに比較例の績↓処との化成を行うと、
スパッタ法により作製した媒体の記録再生特性は、イオ
ン注入法を用いて作製した媒体の特性にくらべて若干劣
るものの従来用いられてきたＣｏ−Ｎｉ磁性膜媒体にく
らべると優れており、さらに耐食性も秀れていることが
わかる。As mentioned above, the experimental results of this example and Example 1
When performing chemical synthesis with the results of ~4 and the results of comparative examples ↓,
Although the recording and reproducing characteristics of media fabricated by sputtering are slightly inferior to those of media fabricated by ion implantation, they are superior to conventionally used Co-Ni magnetic film media, and they also have good corrosion resistance. I can see that you are excellent.
実、幅側６〜９
実施例１〜４と同一形状、同一材２日の基板上にｇ厚０
．０５μｒｎのＦｅ膜をマグネトロンスパッタ法によシ
作夷した。つぎに、この１２ｅ膜にイオン注入法により
、ドース量１０１４ｉ！Ｉ！＋１／ｍ”のＰｄを注入し
た。実施例１〜４と同じイオン圧入条件を用いることに
より、Ｐｄ組成１０． ２０． ４０゜６０ａｔチのｆ
；’ｅ−ｐｄ膜を作、視し北。つぎに、このｐｅ−１）
ｄ膜上に膜厚０，０２μｍのカーボン膜を設けた。In fact, the width side 6 to 9 is the same shape as Examples 1 to 4, and the g thickness is 0 on the same material.
．． A Fe film having a thickness of 0.05 μrn was formed by magnetron sputtering. Next, this 12e film is implanted with a dose of 1014i! I! +1/m'' Pd was implanted. By using the same ion implantation conditions as in Examples 1 to 4, Pd compositions of 10.20.40° and 60at.
'Create an e-pd film and look north. Next, this pe-1)
A carbon film with a thickness of 0.02 μm was provided on the d film.
上記のようにして作製した記録媒体と実施例１〜４で用
いたｌａ気ヘッドを用い、ヘッド浮上量０．２０μｍ、
ヘッド−媒体量相対速度２０ｍ／（８）で記録再生実験
を行った。この実験結果全第２図に示す。Using the recording medium produced as described above and the LA head used in Examples 1 to 4, the head flying height was 0.20 μm,
Recording and reproducing experiments were conducted at a head-medium relative speed of 20 m/(8). The results of this experiment are shown in Figure 2.
第２図に示すように％ｐｄ量１２〜４７ａｔ％のｐｅ−
ｐｄ膜は従来用いられてきたＣｏ−Ｎｉ膜にくらべて艮
好な記録再生特性を示す。As shown in Figure 2, pe-
The PD film exhibits better recording and reproducing characteristics than the conventionally used Co--Ni film.
なお、べ実施例の試料に対し実施例１〜４の方法を用い
て耐食試験を行ったところ、飽和磁化の劣化は全く見ら
れなかった。In addition, when a corrosion resistance test was conducted on the sample of Example 1 using the method of Examples 1 to 4, no deterioration of saturation magnetization was observed.
実施例１０〜１２
実施例１〜４と同一形状、同−材質の基板上に［厚０．
０５μｍ０Ｆｅ膜ｔマグネトロンスパッタ法により作製
した。つき゛に、このＰｅ１１ｇにイオン注入法により
、ドース量１０目個／ｃｍ ”のＲｕｆ注入した。実施
例１〜４と同じイオン注入条件を用いることにより、ル
Ｕ景１０，２０．３０ａｔチのＦｅ−Ｌ％ｕ膜を作製し
た。つざＶこ、このＦｅ−１（、ｕ膜上に膜厚０．０２
μｍのカーボン膜を設：すた。Examples 10 to 12 A substrate having the same shape and the same material as Examples 1 to 4 [thickness 0.
A 0.05 μm0 Fe film was fabricated by magnetron sputtering. Therefore, RuF was implanted into this Pe 11g using an ion implantation method at a dose of 10 atoms/cm. -L%u film was prepared.
A µm carbon film was installed.
上記のようにして作製した記録媒体と実施例１〜４で用
いた磁気ヘッドを用い、ヘッド浮上量０．２０μｍ、ヘ
ッド−媒体量相対速度２０ｍ／（８）で記録再生実験を
行った。この実験結果を第３図に示す。Using the recording medium produced as described above and the magnetic head used in Examples 1 to 4, a recording/reproducing experiment was conducted at a head flying height of 0.20 μm and a head-medium relative speed of 20 m/(8). The results of this experiment are shown in FIG.
同図に示すように、１１．ｕ量１５〜２４ａｔ％のｐｅ
−１’（、ｕ膜は従来用いられてきたＣｏ−Ｎｉ膜にく
らべて艮好な記録再生特性を示す。As shown in the figure, 11. pe with u amount of 15 to 24 at%
-1'(, U film exhibits excellent recording and reproducing characteristics compared to the conventionally used Co--Ni film.
本実施例の試料に対し実施例１〜４の方法を用いて耐食
試験を行ったところ、飽和磁化の劣化は全く見られなか
った。When the samples of this example were subjected to a corrosion resistance test using the methods of Examples 1 to 4, no deterioration of saturation magnetization was observed.
実施例１３〜１７
実施例１〜４と同一形状、同一材質の基板上に膜厚０．
０５μｍのＦｅ膜をマグネトロンスパッタ法によ）作製
した。つぎに、このＦｅ膜にイオン注入法により、ドー
スｔｌＯ”個／（７）２のＣｒ量圧注入た。実施例１〜
４と同じイオン圧入条件を用いることにより、Ｃｒ量１
０，２０，３０゜４０ａｔ％のＦｅ−］％ｕ膜を作製し
た。つぎに、このＦ ｅ−Ｃｒ膜上に膜厚０．０２μｍ
のカーボン膜を設けた。Examples 13 to 17 A film with a thickness of 0.5 mm was formed on a substrate of the same shape and material as in Examples 1 to 4.
A Fe film of 0.05 μm was fabricated by magnetron sputtering. Next, Cr was implanted into this Fe film at a dose of tlO''/(7)2 by ion implantation. Examples 1 to 1
By using the same ion injection conditions as in 4, the amount of Cr is 1
0, 20, 30°40at% Fe-]%u films were prepared. Next, a film with a thickness of 0.02 μm was applied on this Fe-Cr film.
A carbon film was provided.
上記のようにして作製した記録媒体と実施例１〜４で用
いた磁気ヘッドを用い、ヘッド浮上量０．２０μｍ、ヘ
ッド−媒体量相対速度２０ｍ／（８）で記録再生実験を
行った。この実験結果を第４図に示す。Using the recording medium produced as described above and the magnetic head used in Examples 1 to 4, a recording/reproducing experiment was conducted at a head flying height of 0.20 μm and a head-medium relative speed of 20 m/(8). The results of this experiment are shown in FIG.
同図に示すように、Ｃｒ量１４〜３５ａｔチの’ｆ；’
ｅ−Ｃｒ膜は従来用いられてきたＣｏ−Ｎｉ膜だくらべ
て良好な記録再生特性を示す。As shown in the figure, 'f;' with a Cr content of 14 to 35at
The e-Cr film exhibits better recording and reproducing characteristics than the conventionally used Co-Ni film.
本実施例の試料に対し実施例１〜４の方法を用いて２食
試験を行ったところ、飽和磁化の劣化は全く見られなか
った。When a two-meal test was conducted on the sample of this example using the method of Examples 1 to 4, no deterioration of saturation magnetization was observed.
実施例１８〜２１
実施例１〜４と同一形状、同−材質の基板上に膜厚０５
０５μｍのＦｅ膜をマグネトロンスパッタ法により作製
した。つぎに、このＦｃ膜にイオン注入法により、ドー
ス量１０１４個／ ｃｍ ２のＮｉ量圧入した。実施列
１〜４と同じイオン注入条件を用いること（でより、Ｎ
ｉ量０，１０，２０．３０ａｔ％のＦｅ−Ｎｉ膜を作製
し念。つぎに、このＦｅ−Ｎｉ膜上に膜厚０．０２μｍ
のカーボン膜を設けた。Examples 18 to 21 A film thickness of 0.5 mm was deposited on a substrate of the same shape and material as Examples 1 to 4.
A Fe film with a thickness of 0.05 μm was fabricated by magnetron sputtering. Next, Ni was injected into the Fc film at a dose of 1014 pieces/cm 2 by ion implantation. Using the same ion implantation conditions as implementation rows 1 to 4 (by N
We prepared Fe-Ni films with an i content of 0, 10, and 20.30 at%. Next, a film with a thickness of 0.02 μm was applied on this Fe-Ni film.
A carbon film was provided.
上記のよう圧して作製した記録媒体と実踊例１〜４で用
いた磁気ヘッドを用い、ヘッド浮上歌０．２０μｍ、ヘ
ッド−媒体量相対速度２０ｍ／（８）で記録再生実験を
行った。この実験結果を第５図に示す。Using the recording medium produced by pressing as described above and the magnetic head used in Actual Dance Examples 1 to 4, a recording and reproducing experiment was conducted at a head floating height of 0.20 μm and a head-medium relative speed of 20 m/(8). The results of this experiment are shown in FIG.
同図に示すように、Ｎｉ量１４〜２７ａｔ％のＦｅ−Ｎ
ｉ膜は従来用いられてきたＣ０−１マ１模にくらべて良
好な記録再生実験を示す。As shown in the figure, Fe-N with Ni content of 14 to 27 at%
The i-film shows better recording and reproducing results than the conventionally used C0-1 film.
本実施例の試料【対し実施例１〜４の方法を用いて耐食
試験を行ったところ、飽和磁化の劣化は全く見られなか
った。When the samples of this example were subjected to a corrosion resistance test using the method of Examples 1 to 4, no deterioration of saturation magnetization was observed.
実施例２２〜２７
実施例１〜４と同一形状、同一材質の基板上に膜厚０．
０５μｍのＦｅ膜をマグネトロンスパッタ法によシ作製
した。つき°に、このＦｅ膜にイオン注入法により、ド
ース量１０１４個／ｃｍ ２のＣｏｆＪ注入した。実施
例１〜４と同じイオン注入条件を用いることによりｂｃ
ｏ量０，１０，４０，６０゜９Ｑａｔ％のＦｅ−Ｃｏ膜
を作製した。つぎに、このＦｅ−Ｃｏ膜上に膜厚０．０
２μｍのカーボン膜を設けた。Examples 22 to 27 A film with a thickness of 0.5 mm was formed on a substrate having the same shape and the same material as Examples 1 to 4.
A Fe film with a thickness of 0.05 μm was fabricated by magnetron sputtering. At the same time, CofJ was implanted into this Fe film at a dose of 1014 particles/cm 2 by ion implantation. bc by using the same ion implantation conditions as Examples 1 to 4.
Fe--Co films with an o content of 0, 10, 40, and 60°9Qat% were prepared. Next, on this Fe-Co film, a film thickness of 0.0
A 2 μm carbon film was provided.
上記のようにして作製した記録媒体と実施例１〜４で用
いた磁気ヘッドを用い、ヘッド浮上量０．２０μｍ、ヘ
ッド−媒体量相対速度２０ｍ／％で記録再生実験を行つ
之。この実験結果を第６図に示す。Using the recording medium produced as described above and the magnetic head used in Examples 1 to 4, a recording and reproducing experiment was conducted at a head flying height of 0.20 μm and a head-medium relative speed of 20 m/%. The results of this experiment are shown in FIG.
同図に示すように、Ｃｏ量１０〜９０ａｔ％のＦ ｅ
−Ｃｏ膜は従来用いられてきたＧｏ−Ｎｉ膜、こくらべ
て良好な記録再生特性を示す。As shown in the figure, Fe with a Co content of 10 to 90 at%
The -Co film exhibits better recording and reproducing characteristics than the conventionally used Go-Ni film.
′４．拠施例の試料に対し、実施例１〜４の方法を用い
て耐食試験を行ったところ、飽和磁化の劣化は、Ｃｏ１
１０，４０，６０ａ ｔ％に対してＨ全く見られずｃｏ
′１９０ａｔ％の試料に対しては約１５係の低下が与ら
れた。'4. When a corrosion resistance test was conducted on the sample of the based example using the method of Examples 1 to 4, it was found that the deterioration of saturation magnetization was
No H was observed for 10, 40, 60a t%.
A reduction of about 15 factors was given to the 190 at% sample.
比収例
実施例１〜４に用い７とものと同一形状、同一材質の基
板上に、膜厚０．０６μｍのＣｏ７６Ｎｉ３ｏ膜を作製
した後、膜厚０．０２μｍのカーボン膜を作製した。Ｃ
ｏ−Ｎｉ膜、Ｃ膜ともにスパッタ法によシ作製した。タ
ーゲット径はともに２００鴎φ１几Ｆ屹力は２ｋＷ、Ａ
ｒ圧５ｍＴｏｒｒ 、 ４板制御温度１００Ｃとじｔｏ
この円板と実施例１の磁気ヘッドを用い、実施例１の条
件で記録再生実験を行ったところ、０．１ｒ’Ａ ｆ（
Ｚでの再生出力はｉ、４８ｍＶｐｐであり＆Ｄ５６は１
４ｋｆｃｉであった。Ratio Yield Example A Co76Ni3o film with a thickness of 0.06 μm was formed on a substrate having the same shape and the same material as those used in Examples 1 to 4 and 7, and then a carbon film with a thickness of 0.02 μm was formed. C
Both the o-Ni film and the C film were produced by sputtering. Both target diameters are 200 mm φ1 liter, F force is 2 kW, A
When a recording and reproducing experiment was conducted under the conditions of Example 1 using this disk and the magnetic head of Example 1, an r pressure of 5 mTorr and a 4-plate control temperature of 100 C was obtained.
The playback output at Z is i, 48mVpp and &D56 is 1
It was 4kfci.
つぎに、この円板を実施例１の条件下で腐食実験を行っ
たところ、飽和磁化は、１５％低下してい友。Next, when this disk was subjected to a corrosion experiment under the conditions of Example 1, the saturation magnetization decreased by 15%.
以上述べてきたように、Ｒｈで１３〜５０ａｔ％、Ｐｄ
で１２〜４７ ａ ｔ ％ ｈ Ｒｕで１５〜２４ａｔ
％、Ｃｒで１４〜３５ａｔ％ｉＮｔで１４〜２７ａｔ％
、Ｃｏで１０〜９０ ａ ｔ ％Ｏイずれか少なくとも
一考を含有せしめたＦｅ膜は、従来用いられてきたＣｏ
−１”Ｊｉ膜にくらべて、記録再生特性に秀れ、耐食性
も同等以上である。As mentioned above, Rh has 13 to 50 at%, Pd
12-47 at % h Ru 15-24 at
%, 14-35 at% for Cr, 14-27 at% for iNt
, Co containing at least one of 10 to 90 at % O
-1'' Compared to the Ji film, it has excellent recording and reproducing characteristics, and has the same or higher corrosion resistance.
なお、ｐｅ−Ｃｏ膜に、 Ｒｈ、 Ｐｄ、 、［（、
ｕ。In addition, Rh, Pd, , [(,
u.
Ｃｒ ｅ Ｎ ｓのうち一種類あるいはそれ以上を添加
した試料も前記各実施例に示したものと同様に記録再生
特性及び耐食性に秀れている。Samples to which one or more types of CreNs were added were also excellent in recording and reproducing characteristics and corrosion resistance, similar to those shown in the examples described above.
【図面の簡単な説明】
第１図はｌ；’ｅ−ＦＬｈ膜におけるＲｈ添加量と再生
出力及びＤ５ｏの関係を示す図、第２図はＦｅ−Ｐｄ膜
におけるＰｄ添加量と再生出力及びＤ３（１の関係を示
す図、第３図はｐｅ−ルＵ膜における几Ｕ添加量と再生
出力及びＤｓｏの関係を示す図、第４図ばＦｅ−Ｃｒ模
におけるＣｒ添加量と再生出力及びＤ５ｏの関係を示す
図、第５図はＦｅ−８１膜におけるＮｉ添刀ｏｉと再生
出力及びＤ５ｏの１１係を示す図、第６図はＦ ｅ−Ｃ
ｏ膜におけるＣｏ添加量と再生出力及び１）ｓｏの関係
を示す図である。[Brief explanation of the drawings] Figure 1 is a diagram showing the relationship between the Rh addition amount, reproduction output, and D5o in the l;'e-FLh film, and Figure 2 is a diagram showing the relationship between the Pd addition amount, reproduction output, and D3 in the Fe-Pd film. (Fig. 3 is a diagram showing the relationship between the amount of Cr added, the regeneration output, and Dso in the Peel U film, and Figure 4 is the diagram showing the relationship between the amount of Cr added, the regeneration output, and D5o in the Fe-Cr model. Figure 5 is a diagram showing the relationship between Ni splicing oi in Fe-81 film, reproduction output, and D5o, Figure 6 is Fe-C
FIG. 3 is a diagram showing the relationship between the amount of Co added in the o film, the reproduction output, and 1) so.
Claims (1)
、Ｃｏのうち一種類あるいはそれ以上の元素を含有せし
めた磁性膜を、非磁性基板上に設けたことを特徴とする
磁気記録媒体。 ２、上記特許請求の範囲１において、Ｒｈを含有せしめ
る場合には、１３〜５０ａｔ％、Ｐｄの場合には１２〜
４７ａｔ％、Ｒｕの場合には１５〜２４ａｔ％、Ｃｒの
場合には１４〜３５ａｔ％、Ｎｉの場合には１４〜２７
ａｔ％、Ｃｏの場合には１０〜９０ａｔ％を含有せしめ
たＦｅを主成分とする磁性膜を用いることを特徴とする
磁気記録媒体。 ３、非磁性基板上に設けたＦｅ膜中に、Ｒｈ、Ｒｕ、Ｐ
ｄ、Ｃｒ、Ｎｉ、Ｃｏの群から選ばれる少なくとも一種
の元素をイオン注入法にて含有せしめる工程を含むこと
を特徴とする磁気記録媒体の製造方法。[Claims] 1. Main component is Fe, Rh, Pd, Ru, Cr, Ni
1. A magnetic recording medium comprising a magnetic film containing one or more of Co, Co, and Co on a nonmagnetic substrate. 2. In the above claim 1, when Rh is contained, it is 13 to 50 at%, and when Pd is contained, it is 12 to 50 at%.
47 at%, 15 to 24 at% for Ru, 14 to 35 at% for Cr, 14 to 27 at% for Ni.
1. A magnetic recording medium characterized by using a magnetic film containing Fe as a main component, containing 10 to 90 at% of Co in the case of Co. 3. Rh, Ru, P in the Fe film provided on the non-magnetic substrate
1. A method for manufacturing a magnetic recording medium, comprising the step of incorporating at least one element selected from the group consisting of d, Cr, Ni, and Co by ion implantation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24292186A JPS6398823A (en) | 1986-10-15 | 1986-10-15 | Magnetic recording medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24292186A JPS6398823A (en) | 1986-10-15 | 1986-10-15 | Magnetic recording medium and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6398823A true JPS6398823A (en) | 1988-04-30 |
Family
ID=17096188
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24292186A Pending JPS6398823A (en) | 1986-10-15 | 1986-10-15 | Magnetic recording medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6398823A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002241069A (en) * | 2001-02-13 | 2002-08-28 | Mitsubishi Electric Corp | Ceiling cover opening and closing device |
-
1986
- 1986-10-15 JP JP24292186A patent/JPS6398823A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002241069A (en) * | 2001-02-13 | 2002-08-28 | Mitsubishi Electric Corp | Ceiling cover opening and closing device |
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