JPH01307223A - Hot plate for resist hardening - Google Patents

Hot plate for resist hardening

Info

Publication number
JPH01307223A
JPH01307223A JP13880188A JP13880188A JPH01307223A JP H01307223 A JPH01307223 A JP H01307223A JP 13880188 A JP13880188 A JP 13880188A JP 13880188 A JP13880188 A JP 13880188A JP H01307223 A JPH01307223 A JP H01307223A
Authority
JP
Japan
Prior art keywords
resist
hot plate
trench
exists
surface tension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13880188A
Other languages
Japanese (ja)
Inventor
Takashi Inami
敬 井波
Shinichi Aso
阿曽 伸一
Hirozo Takegawa
武川 博三
Ryutaro Akutagawa
竜太郎 芥川
Tokihiko Shimizu
清水 時彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP13880188A priority Critical patent/JPH01307223A/en
Publication of JPH01307223A publication Critical patent/JPH01307223A/en
Pending legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable forming a thin part of resist film by forming a trench on a hot plate, and providing a part to which an object to be heated does not make contact. CONSTITUTION:A trench 6 is formed on the surface of a hot plate 3. When a glass substrate 2 is put on the hot plate 3 for resist hardening, and the hardening of resist 1 is begun, little solvent evaporates, because the thermal input is almost zero to the resist 1 corresponding with the part of the hot plate 3 where the trench 6 exists, as compared with the other part. Since the surface tension of the resin is generally higher than that of the solvent, the surface tension of the resist 1 where the solvent evaporates becomes higher as compared with the trench 6 part. As a result, the gradient of the surface tension generates between the part of the hot plate 3 where the trench 6 exists and the other part, and so the resist flows from the side where the trench exists to the part where the trench does not exist. Thereby, after the resist is hardened, the film thickness of the resist corresponding with the part of the hot plate 3 where the trench 6 exists can be thinly formed.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は半導体用レジスト、あるいは液晶テレビ、固体
撮像素子等に用いる着色レジストの硬化装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an apparatus for curing colored resists used for semiconductor resists, liquid crystal televisions, solid-state image sensors, etc.

従来の技術 従来この種のレジスト硬化用ホットプレートは、第3図
aに示すように、スピンナ、ロールコータ−等によりガ
ラス基板1上へ均一にレジスト2を塗布した後、レジス
ト硬化用ホットプレート3上に置いて(第3図b)、レ
ジスト中にふくまれる流動性を与え塗布性能を向上させ
る目的で添加されていた溶剤を蒸発させ、残りの樹脂成
分を加熱重合し硬化させ、硬化後の膜厚は第3図Cに示
すように膜厚の平均値は減少するものの塗布時の膜厚分
布状態を変化させることなく均一に硬化させることが主
たる作用であった。
2. Description of the Related Art Conventionally, this type of hot plate for curing resist is used, as shown in FIG. (Fig. 3b), the solvent contained in the resist that was added to give fluidity and improve coating performance is evaporated, and the remaining resin component is heated and polymerized to harden. Although the average value of the film thickness decreased as shown in FIG. 3C, the main effect was to uniformly cure the film without changing the film thickness distribution during coating.

発明が解決しようとする課題 このような従来のレジスト硬化用ホットプレートでは単
にレジスト塗布時の基板上の膜厚分布を維持しながら硬
化を行うのみで、新たな機能を果たすための膜厚分布形
状の変化を与えることができなかった。
Problems to be Solved by the Invention Conventional hot plates for curing resist simply perform curing while maintaining the film thickness distribution on the substrate when resist is applied; could not give any change.

課題を解決するための手段 本発明は、ホットプレートにおけるレジストの硬化に有
効な平面内において、所定形状に溝を形成し、被加熱物
が接触しない部分を設けるものである。
Means for Solving the Problems In the present invention, a groove is formed in a predetermined shape in a plane effective for curing the resist on a hot plate, and a portion is provided with which the object to be heated does not come into contact.

作用 本発明は上記した構成によりレジストの塗布後の硬化工
程において所定形状に膜厚の薄い部分を形成するもので
ある。
Function The present invention forms a thin portion in a predetermined shape in the curing process after applying the resist using the above-described configuration.

実施例 以下、本発明の一実施例を添付図面に基すいて説明する
。第1図は本発明のレジスト硬化用ホットプレートの構
造を示した断面図とその温度分布の一例であり、第2図
はこのレジスト硬化用ホットプレートを用いたレジスト
硬化工程を示す工程図である。なお、第1図〜第3図に
おいて共通するようそには同一番号を付している。
EXAMPLE Hereinafter, an example of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing the structure of the resist curing hot plate of the present invention and an example of its temperature distribution, and FIG. 2 is a process diagram showing the resist curing process using this resist curing hot plate. . Note that the same numbers are given to common inlets in FIGS. 1 to 3.

第1図において、3はアルミニウム、銅、鉄等の熱の良
導体よりなるレジスト硬化用ホットプレートであり、4
はその中に埋め込まれたニクロム、タンタル等の発熱抵
抗コイルである。5は発熱抵抗コイル4に電圧を供給す
る電源である。ホットプレート3の表面には2個所溝6
を形成しており、この部分では被加熱物とホットプレー
トとの間に熱伝導の悪い空気層が介在するため殆ど被加
熱物に対して熱入力は無い。
In FIG. 1, 3 is a resist hardening hot plate made of a good thermal conductor such as aluminum, copper, iron, etc.;
is a heating resistance coil made of nichrome, tantalum, etc. embedded within it. Reference numeral 5 denotes a power source that supplies voltage to the heating resistance coil 4. There are two grooves 6 on the surface of the hot plate 3.
In this part, there is an air layer with poor thermal conductivity between the object to be heated and the hot plate, so there is almost no heat input to the object to be heated.

次に第2図によってレジスト硬化工程の説明を行う。第
2図aはスピンナ、ロールコータ等によりレジス、ト1
が均一に塗布された直後のガラス基板2である。このと
きレジスト1は未硬化で溶剤成分を多く含んでいる。次
にこのガラス基板2をレジスト硬化用ホットプレート3
上に置いてレジストの硬化を始める(第2図b)。この
とき、ホットプレート3の溝6のある部分に対応したレ
ジストは他の部分に比べて熱の入力が殆ど無いため溶剤
の蒸発は少ない。一般に樹脂の表面張力は溶剤の表面張
力よりも高いので、溶剤の蒸発のある部分のレジストは
溝の部分に比べて表面張力が高くなる。つまりホットプ
レート3の溝6のある部分と他の部分との間に表面張力
勾配が生じ、その結果溝のある側から溝の無い側へむけ
てのレジストの流動がおこる。その結果レジスト硬化後
、第2図Cに示すようにホットプレート3の溝のある部
分に対応したレジストの膜厚が薄くなる。また溝のある
部分の両側の膜厚は少し厚くなるが拡散しやすいため顕
著ではない。膜厚の薄くなった部分と他との膜厚差は未
硬化時の膜厚、ホットプレートの温度勾配等に比例し、
レジストの粘度に反比例する。
Next, the resist curing process will be explained with reference to FIG. Fig. 2 a shows the resist and toner coating using a spinner, roll coater, etc.
This is the glass substrate 2 immediately after it has been uniformly coated. At this time, the resist 1 is uncured and contains a large amount of solvent component. Next, this glass substrate 2 is placed on a hot plate 3 for curing the resist.
Place the resist on top and begin to harden the resist (Figure 2b). At this time, since the resist corresponding to the groove 6 of the hot plate 3 receives almost no heat input compared to other parts, the solvent evaporates less. Generally, the surface tension of the resin is higher than the surface tension of the solvent, so the surface tension of the resist in areas where the solvent evaporates is higher than that in the groove areas. In other words, a surface tension gradient is generated between a portion of the hot plate 3 where the grooves 6 are located and another portion, and as a result, the resist flows from the side where the grooves are present to the side where there are no grooves. As a result, after the resist hardens, the resist film thickness corresponding to the grooved portions of the hot plate 3 becomes thinner, as shown in FIG. 2C. Also, the film thickness on both sides of the grooved portion becomes slightly thicker, but it is not noticeable because it is easily diffused. The difference in film thickness between the thinner part and the other parts is proportional to the uncured film thickness, the temperature gradient of the hot plate, etc.
Inversely proportional to resist viscosity.

本発明になるレジスト膜の利用例について述べる。液晶
カラーテレビ用カラt−フィルターを黒、赤、緑、青の
着色レジストを用いて形成する場合を考える。ブラック
マトリクスを黒のレジストで形成した後R1G、  H
の各画素を同一のマスクで一画素分ずつずらして露光す
る場合、ブラックマトリクスの外枠部分にもレジストが
残り、この部分の膜厚が突出し、液晶駆動用電極等の形
成されたアレー側ガラス基板との対抗電極間シ日−トの
原因となっていた。しかしブラックマトリクスの黒枠部
分に相当する部分に溝を形成したホットプレートを用い
て、RlG、  Bの各レジスト硬化することによって
黒枠部分上のレジストは膜厚が薄くなり、前述のような
問題点は解消する。
An example of the use of the resist film according to the present invention will be described. Consider the case where a color T-filter for a liquid crystal color television is formed using black, red, green, and blue colored resists. After forming the black matrix with black resist, R1G, H
When each pixel is exposed using the same mask and shifted by one pixel, resist remains on the outer frame part of the black matrix, and the film thickness in this part protrudes, causing the array side glass on which liquid crystal driving electrodes etc. are formed to be exposed. This caused a crack between the opposing electrode and the substrate. However, by hardening the RlG and B resists using a hot plate with grooves formed in the portions corresponding to the black frame portions of the black matrix, the resists on the black frame portions become thinner, and the above-mentioned problem is solved. Eliminate.

発明の効果 本発明はガラス基板等の上に均一にレジストを塗布した
後、ホットプレート上に置いて硬化するとき、ホットプ
レートに溝を形成し被加熱物が接触しない部分を設ける
ことにより、レジスト膜厚の薄い部分を形成することが
出来る。
Effects of the Invention The present invention enables the resist to be coated uniformly on a glass substrate, etc., and then placed on a hot plate to harden. A thin portion can be formed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例のレジ、スト硬化用ホットプ
レートの構造の断面図、第2図は本発明になるレジスト
硬化用ホットプレートを用いたレジスト硬化工程図、第
3図は従来例の硬化工程図である。 1・・・・レジスト、2・・・・ガラス基板、3・・・
・レジスト硬化用ホットプレート、4・・・・発熱抵抗
線、6・・・・溝。 代理人の氏名 弁理士 中尾敏男ほか1名3−−−ネッ
トフ0シート 乙−−−溝 4−−一発案ド低貌コイシ 第1図 第2図
Fig. 1 is a sectional view of the structure of a resist curing hot plate according to an embodiment of the present invention, Fig. 2 is a resist curing process diagram using the resist curing hot plate of the present invention, and Fig. 3 is a conventional resist curing process. It is a hardening process diagram of an example. 1...Resist, 2...Glass substrate, 3...
・Hot plate for curing resist, 4... heat generating resistance wire, 6... groove. Name of agent: Patent attorney Toshio Nakao and 1 other person 3 --- Netf 0 sheet O --- Mizo 4 -- One idea, short-looking Koishi Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims]  レジストの硬化に有効な平面内において、所定形状に
溝を形成し、被加熱物が接触しない部分を設けたことを
特徴とするレジスト硬化用ホットプレート。
1. A hot plate for curing a resist, characterized in that a groove is formed in a predetermined shape in a plane effective for curing a resist, and a portion that does not come into contact with an object to be heated is provided.
JP13880188A 1988-06-06 1988-06-06 Hot plate for resist hardening Pending JPH01307223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13880188A JPH01307223A (en) 1988-06-06 1988-06-06 Hot plate for resist hardening

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13880188A JPH01307223A (en) 1988-06-06 1988-06-06 Hot plate for resist hardening

Publications (1)

Publication Number Publication Date
JPH01307223A true JPH01307223A (en) 1989-12-12

Family

ID=15230551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13880188A Pending JPH01307223A (en) 1988-06-06 1988-06-06 Hot plate for resist hardening

Country Status (1)

Country Link
JP (1) JPH01307223A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345020A (en) * 1991-05-22 1992-12-01 Hitachi Chem Co Ltd Hotplate for heat treatment use

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821332A (en) * 1981-05-15 1983-02-08 ジ−・シ−・エ−・コ−ポレ−シヨン Device for baking resist on semiconductor wafer
JPS5961027A (en) * 1982-09-29 1984-04-07 Toshiba Corp Semiconductor substrate heating apparatus
JPS60161619A (en) * 1984-02-01 1985-08-23 Hitachi Electronics Eng Co Ltd Heating apparatus
JPS6231220A (en) * 1985-08-02 1987-02-10 Oki Electric Ind Co Ltd Ecl circuit

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821332A (en) * 1981-05-15 1983-02-08 ジ−・シ−・エ−・コ−ポレ−シヨン Device for baking resist on semiconductor wafer
JPS5961027A (en) * 1982-09-29 1984-04-07 Toshiba Corp Semiconductor substrate heating apparatus
JPS60161619A (en) * 1984-02-01 1985-08-23 Hitachi Electronics Eng Co Ltd Heating apparatus
JPS6231220A (en) * 1985-08-02 1987-02-10 Oki Electric Ind Co Ltd Ecl circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345020A (en) * 1991-05-22 1992-12-01 Hitachi Chem Co Ltd Hotplate for heat treatment use

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