JPH01298192A - Zinc-nickel alloy plating solution - Google Patents
Zinc-nickel alloy plating solutionInfo
- Publication number
- JPH01298192A JPH01298192A JP12823788A JP12823788A JPH01298192A JP H01298192 A JPH01298192 A JP H01298192A JP 12823788 A JP12823788 A JP 12823788A JP 12823788 A JP12823788 A JP 12823788A JP H01298192 A JPH01298192 A JP H01298192A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- zinc
- nickel
- alloy plating
- plating solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 67
- 229910000990 Ni alloy Inorganic materials 0.000 title claims description 18
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 title claims description 18
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims abstract description 10
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000001412 amines Chemical class 0.000 claims abstract description 8
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000002738 chelating agent Substances 0.000 claims abstract description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims abstract description 4
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 claims abstract description 4
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims abstract description 3
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 claims abstract description 3
- LSHROXHEILXKHM-UHFFFAOYSA-N n'-[2-[2-[2-(2-aminoethylamino)ethylamino]ethylamino]ethyl]ethane-1,2-diamine Chemical compound NCCNCCNCCNCCNCCN LSHROXHEILXKHM-UHFFFAOYSA-N 0.000 claims abstract description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims abstract description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 claims description 3
- 150000003934 aromatic aldehydes Chemical class 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- -1 pyridine compound Chemical class 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 30
- 238000005260 corrosion Methods 0.000 abstract description 11
- 230000007797 corrosion Effects 0.000 abstract description 11
- 229910045601 alloy Inorganic materials 0.000 abstract description 8
- 239000000956 alloy Substances 0.000 abstract description 8
- 229910007567 Zn-Ni Inorganic materials 0.000 abstract 3
- 229910007614 Zn—Ni Inorganic materials 0.000 abstract 3
- PUAQLLVFLMYYJJ-UHFFFAOYSA-N 2-aminopropiophenone Chemical compound CC(N)C(=O)C1=CC=CC=C1 PUAQLLVFLMYYJJ-UHFFFAOYSA-N 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 62
- 239000000203 mixture Substances 0.000 description 15
- 239000011701 zinc Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 10
- 229910052725 zinc Inorganic materials 0.000 description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 2
- PWHVEHULNLETOV-UHFFFAOYSA-N Nic-1 Natural products C12OC2C2(O)CC=CC(=O)C2(C)C(CCC2=C3)C1C2=CC=C3C(C)C1OC(O)C2(C)OC2(C)C1 PWHVEHULNLETOV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000002075 main ingredient Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- GTLDTDOJJJZVBW-UHFFFAOYSA-N zinc cyanide Chemical compound [Zn+2].N#[C-].N#[C-] GTLDTDOJJJZVBW-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 239000003109 Disodium ethylene diamine tetraacetate Substances 0.000 description 1
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N EtOH Substances CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- 235000019301 disodium ethylene diamine tetraacetate Nutrition 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、亜鉛−ニッケル合金電気めっき液に関するも
のであり、さらに詳しくは、均一な鏡面光沢外観を有し
耐食性にも優れた亜鉛−ニッケル合金めっきを形状複雑
な物品に施すことができる亜鉛−ニッケル合金めっき液
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a zinc-nickel alloy electroplating solution. The present invention relates to a zinc-nickel alloy plating solution that can apply alloy plating to articles with complex shapes.
亜鉛−ニッケル合金めっきは、亜鉛めっきに比べて優れ
た耐食性を有するため、鉄鋼製品への防食めっきとして
広く用いられている。特に、合金めっき被膜中のニッケ
ル含有率が10〜16%のものは、γ単相合金からなる
ものであって、耐食性が最も優れていることが知られて
いる。したがって、この範囲のニッケル含有率の亜鉛−
ニッケル合金めっきを安定して得るための提案が多数な
されている(特開昭55〜110791、同55〜15
2194.同57−164999゜同58−9997.
同58−55585.同58−197292、同59−
80789.同59−123782、同60−1069
92.同60−228693等)。しかしながら、これ
らはいずれも平らな鋼板の連続めっきのためのものであ
って、複雑な形状の機械部品等に使用できるものではな
い。Zinc-nickel alloy plating has superior corrosion resistance compared to zinc plating, and is therefore widely used as anticorrosive plating for steel products. In particular, it is known that an alloy plating film with a nickel content of 10 to 16% is made of a γ single-phase alloy and has the best corrosion resistance. Therefore, zinc with a nickel content in this range -
Many proposals have been made to stably obtain nickel alloy plating (Japanese Unexamined Patent Publications No. 55-110791, No. 55-15).
2194. 57-164999゜58-9997.
58-55585. 58-197292, 59-
80789. 59-123782, 60-1069
92. 60-228693, etc.). However, all of these methods are for continuous plating of flat steel plates, and cannot be used for complex-shaped mechanical parts.
複雑な形状を有する一般的な機械部品等に亜鉛−ニッケ
ル合金め・つきを施すためのめっき液としては、従来、
大別して硫酸浴、塩化浴、ピロリン酸浴、シアン浴、無
シアンアルカリ浴などがあり、それぞれ一長一短あるが
、日本では、無シアンアルカリ浴が、浴の管理が容易で
装置腐食も少ないという理由で、他の浴よりも好まれる
傾向がある。Conventionally, plating solutions for applying zinc-nickel alloy plating to general mechanical parts with complex shapes, etc.
Broadly divided, there are sulfuric acid baths, chloride baths, pyrophosphate baths, cyanide baths, and cyanide-free alkaline baths, each of which has its advantages and disadvantages, but in Japan, cyanide-free alkaline baths are preferred because they are easier to manage and cause less equipment corrosion. , tend to be preferred over other baths.
一般的な機械部品等に亜鉛−ニッケル合金めっきを施す
ための無シアンアルカリ浴は、特開昭58−34】89
、同62−238387、同62−240788等に幾
つか提案されている。これらの浴は、ニッケル共47r
率の均一性およびめっき外観の点ではかなり優れたもの
である。しかしながら、これら従来のめっき液は、得ら
れる合金めっき中のニッケル含有率の点で、満足できる
ものではなかった。すなわち、周知のよう1こ、亜鉛−
ニノケル合金めっきにおいてはニッケル含a率か10−
16%のγ相単相析出になるとすぐれた耐食性が達成さ
れることが分かっているが、上記従来の一般用無シアン
アルカリ性めっき液ではこのような高率のニッケルを含
有する耐食性亜鉛−ニッケル合金を析出させることはで
きない。したがって、現在−船釣な機械部品等を対象と
して工業的に実施されている亜鉛−ニッケル合金めっき
におけるニッケル共析率も、5〜10%程度である。A cyanide-free alkaline bath for applying zinc-nickel alloy plating to general mechanical parts, etc. is disclosed in Japanese Patent Application Laid-Open No. 58-34 [89]
, No. 62-238387, No. 62-240788, etc. These baths contain both nickel and 47r
It is quite excellent in terms of rate uniformity and plating appearance. However, these conventional plating solutions were not satisfactory in terms of the nickel content in the resulting alloy plating. In other words, as is well known, zinc-
In Ninokel alloy plating, the nickel content is 10-
It is known that excellent corrosion resistance is achieved when 16% of the γ phase is precipitated as a single phase, but the conventional cyanide-free alkaline plating solution for general use described above is not suitable for corrosion-resistant zinc-nickel alloys containing such a high percentage of nickel. cannot be precipitated. Therefore, the nickel eutectoid rate in zinc-nickel alloy plating, which is currently being carried out industrially for mechanical parts used in boats, is also about 5 to 10%.
本発明の目的は、従来の亜鉛−ニッケル合金めっき液が
上述のような問題点を有するものであったことに鑑み、
ニッケル共析率10〜16%の、高耐食性亜鉛−ニッケ
ル合金めっきを容易に与える無シアンアルカリ浴めっき
液を提供することにある。In view of the fact that the conventional zinc-nickel alloy plating solution had the above-mentioned problems, the purpose of the present invention is to
The object of the present invention is to provide a cyanide-free alkali bath plating solution that easily provides highly corrosion-resistant zinc-nickel alloy plating with a nickel eutectoid ratio of 10 to 16%.
本発明は、無シアンアルカリ性亜鉛−ニッケル合金めっ
き液の組成を下記のようにすることにより、上記目的を
達成したものである。The present invention achieves the above object by making the composition of a cyanide-free alkaline zinc-nickel alloy plating solution as follows.
Zn2+二5〜20y/l
Ni”:0.4〜4 、0 g/lま
ただしZ n i!+ / N I 2” (重量比)
を4〜12.5とする。Zn2+25~20y/l Ni": 0.4~4, 0 g/l but Zni!+/Ni2" (weight ratio)
is 4 to 12.5.
N−アミノエチルエタノールアミン、エチレンジアミン
、ジエチL〜>トリアミン、]・リエチレンアトラミン
、テトラエチレンペンタミンおよびペンタエチレンヘキ
サミンからなる群から選ばれた1種以上のアミン系キレ
−1−剤:合計量で0.04モル/l以上トリエタノー
ルアミン=15〜60 H/l光沢剤・その均−電着作
用に応じて、適量を用いる。One or more amine-based clearing agents selected from the group consisting of N-aminoethylethanolamine, ethylenediamine, diethyltriamine,]-lyethyleneatramine, tetraethylenepentamine, and pentaethylenehexamine: total amount 0.04 mol/l or more Triethanolamine = 15-60 H/l Brightener - Use an appropriate amount depending on its uniform electrodeposition effect.
この組成は、−F記目的を達成するためにはZn”十お
よびN12+の含有量もさることながら、強アルカリ性
のめっき液にニッケルイオンを安定に溶解させるための
添加剤の選択と配合率が極めて重要であることを本発明
者らか実験の結果見いだしたことに基づくものである。In order to achieve the objective listed in -F, this composition requires not only the content of Zn'' and N12+, but also the selection and blending ratio of additives to stably dissolve nickel ions in the strongly alkaline plating solution. This is based on the fact that the present inventors found through experiments that this is extremely important.
すなわち、本発明で用いるキレート剤もトリエタノール
アミンも、個々には従来の亜鉛−ニッケル合金めっき液
や亜鉛めっき液に使用された例もあるが、本発明の目的
達成のためには、これらを上述のように組み合わせて使
用することが必須である。また、光沢剤についても、特
定のものを使用することにより特に好ましい結果が得ら
れることが確認されている。That is, although both the chelating agent and triethanolamine used in the present invention have been individually used in conventional zinc-nickel alloy plating solutions and zinc plating solutions, in order to achieve the purpose of the present invention, they must not be used. It is essential to use them in combination as described above. It has also been confirmed that particularly favorable results can be obtained by using specific brighteners.
本発明のめっき液の組成について更に詳述すると、主剤
であるZo”の供給源としては、Zn0、Z n S
O+・7H20、Z nc I□、Ni2+の供給源と
してはN i(OH)2、N i COs、N15O,
・61−(20、N iC1,・6H20などの塩類を
用いることがでさる。Zo2+が5 g/l未満では実
用に適し!−陰極電流効率が得られず、また2 0 g
/lを超えると、均一な光沢めっき外観が得られない。To explain in more detail the composition of the plating solution of the present invention, the main ingredient Zo'' is supplied from Zn0, ZnS
O+・7H20, Z nc I□, Ni2+ supply sources include N i(OH)2, N i COs, N15O,
・61-(20, NiC1, ・6H20 and other salts can be used. If Zo2+ is less than 5 g/l, it is not suitable for practical use!-Cathode current efficiency cannot be obtained, and 20 g
If it exceeds /l, a uniform glossy plating appearance cannot be obtained.
Zo”/Ni2+比は、4未満では、均一で光沢良好な
めっき外観は得られるもののニッケル共析率が16%を
超えるようになり、かえって耐食性が悪くなるだけでな
く、経済的にも不利である。また、この比率が約12.
5を超えると、低電流部が無光沢のめっきとなり、しか
もニッケル共析率はio%以下になって耐食性が悪化す
る。When the Zo''/Ni2+ ratio is less than 4, although a uniform and glossy plating appearance can be obtained, the nickel eutectoid ratio exceeds 16%, which not only deteriorates the corrosion resistance but also is economically disadvantageous. Also, this ratio is about 12.
If it exceeds 5, the low current area becomes matte plating, and the nickel eutectoid rate becomes less than io%, resulting in poor corrosion resistance.
アミン系キレート剤は、めっき液中における濃度が0.
04モル/l以下ではNI2+を十分可溶化することが
できない。また、この濃度は、高くても約0.5モル/
lが適当で、これを超えても効果は変わらない。The concentration of the amine chelating agent in the plating solution is 0.
If the amount is less than 0.04 mol/l, NI2+ cannot be sufficiently solubilized. Also, this concentration is at most about 0.5 mol/
l is appropriate, and even if it exceeds it, the effect will not change.
トリエタノールアミンは、15 g/l未満の濃度では
、高電流部においては良好な光沢めっき外観が得られる
ものの、低電流部においては無光沢となってしまう。When the concentration of triethanolamine is less than 15 g/l, a good bright plating appearance is obtained in the high current area, but the plate becomes matte in the low current area.
また、601/lを超えると、広い電流密度範囲にわた
って均一で優れた光沢めっき外観が得られるものの、陰
極電流効率が悪化し、実用に適さないものとなる。On the other hand, if it exceeds 601/l, although a uniform and excellent shiny plating appearance can be obtained over a wide current density range, the cathode current efficiency deteriorates, making it unsuitable for practical use.
本発明のめっき液に使用する光沢剤としては、ジンヶ−
1・亜鉛めっきやシアン化亜鉛めっきに従来使われてい
る光沢剤を適宜使用することかでき、制限はないが、中
でも、アミンとエピクロルヒドリンとの反応生成物、芳
香族アルデヒド、第四級化されたピリジン化合物などは
、特に優れた光沢めっきを与える点で、本発明のめっき
液に使用するのに特に適したものである。The brightener used in the plating solution of the present invention is
1. Brighteners conventionally used for zinc plating and cyanide zinc plating can be used as appropriate, and there are no restrictions, but among them, the reaction products of amines and epichlorohydrin, aromatic aldehydes, quaternized Pyridine compounds and the like are particularly suitable for use in the plating solution of the present invention in that they provide particularly excellent bright plating.
pllは特に限定されないが、約13以上とすることが
望ましい。pll is not particularly limited, but is preferably about 13 or more.
本発明の亜鉛−ニノケル合金めっき液の標準的な使用法
を示すと次のとおりである。The standard usage of the zinc-Ninokel alloy plating solution of the present invention is as follows.
陰極電流密度:0.5〜8Δ/dra”陽極電流密度・
1〜8A/dm2
浴温:15〜35°C
陽極:可溶性陽極として亜鉛、また不溶性陽極としては
カーボン、ステンレススチール、ニッケル等を用いるこ
とができる。Cathode current density: 0.5~8Δ/dra” Anode current density
1 to 8 A/dm2 Bath temperature: 15 to 35°C Anode: Zinc can be used as a soluble anode, and carbon, stainless steel, nickel, etc. can be used as an insoluble anode.
金属の補給:亜鉛は陽極からの溶解、またはZQOの添
加で行い、ニッケルは、N i S O+・6H20、
NiC1□・6 HxO、、N +(OH)2、N i
C03なとの添加で行う。Metal replenishment: Zinc is melted from the anode or added with ZQO, nickel is NiSO+6H20,
NiC1□・6 HxO,, N + (OH)2, Ni
This is done by adding C03.
以下、実施例および比較例を示して本発明を説明する。 The present invention will be described below with reference to Examples and Comparative Examples.
なお、以下の例におけるめっさはすべて267m1のハ
ルセルを用いて行ったもので、めっき条件は次のとおり
である。All plating in the following examples was performed using a 267 m1 Hull cell, and the plating conditions were as follows.
電流=2A
めっき時間:5分
浴温:25℃(比較例2のみ35℃)
陽極:亜鉛
陰極ニブライト鋼板
実施例】
浴組成: NaOH1,30g/II、 ZnO12,
5g/1t(Zoとして10 g/l) 、N Is
Ot・6 HzO6,7g/l(Niとして1.5g/
il、Zn/N1=6.67)、エチレンジアミン I
J#(0,166モル/l、)リエタノールアミン 3
0g15.、光沢剤・スパー80(荏原ニーシライト株
式会社製シアン化亜鉛めっき用光沢剤:第四級化ピリジ
ン化合物を主剤とするもの) 4ml/lハルセル試
験の結果、試験片全面にわたり均一な鏡面光沢外観が得
られた。試験片中央におけるニッケル共析率は14.2
%であった。Current = 2A Plating time: 5 minutes Bath temperature: 25°C (35°C only in Comparative Example 2) Anode: Zinc cathode Nibrite steel plate Example] Bath composition: NaOH1.30g/II, ZnO12,
5g/1t (10g/l as Zo), N Is
Ot・6 HzO6,7g/l (1.5g/l as Ni
il, Zn/N1=6.67), ethylenediamine I
J# (0,166 mol/l,) reethanolamine 3
0g15. , Brightener/Spar 80 (brightener for cyanide zinc plating manufactured by Ebara Nishilight Co., Ltd.: containing a quaternized pyridine compound as the main ingredient) As a result of the 4 ml/l Hull Cell test, a uniform specular gloss appearance was observed over the entire surface of the test piece. Obtained. The nickel eutectoid rate at the center of the specimen is 14.2
%Met.
また、このめっき液を用いて鋼板に5μmめっきし、さ
らに有色クロメート処理(荏原ニーシライト株式会社装
クロ、メート処理剤・7N−IIYM[I 50m1/
I+使用)を施した。別に、後記比較例2のめっき液を
用いて同様のめっきとタロメート処理を行なった。旭理
済み鋼板Iこついてそれぞれ塩水噴霧試験を行なったと
ころ、比較例2によるものは480時間で白さびが発生
したのに対し、本実施例によるものは2000時間経過
後も白さびの発生が認めれなかった。In addition, this plating solution was used to plate a steel plate with a thickness of 5 μm, and then a colored chromate treatment (Ebara Nishilight Co., Ltd. Soucro, mate treatment agent 7N-IIYM [I 50m1/
I+) was applied. Separately, similar plating and talomate treatment were performed using the plating solution of Comparative Example 2 described later. When a salt water spray test was conducted on each of the treated steel sheets I, it was found that white rust developed in the comparative example 2 after 480 hours, while white rust did not develop in the material according to this example even after 2000 hours. I couldn't admit it.
実施例2
浴組成:実施例Iのエチレンジアミンをジエチレントリ
アミン lOに/1l(0,097モル/II )に変
更した。Example 2 Bath composition: Ethylenediamine in Example I was changed to diethylenetriamine lO/1l (0,097 mol/II).
ハルセル試験の結果、試験片全面にわたり均一な鏡面光
沢外観が得られた。試験片中央におけるニッケル共析率
は13.4%であった。As a result of the Hull cell test, a uniform specular gloss appearance was obtained over the entire surface of the specimen. The nickel eutectoid rate at the center of the test piece was 13.4%.
実施例3
浴組成:実施例1のエチレンジアミンをトリエチレンテ
トラミン 25に/α(0,171モル/l)に変更し
lこ。Example 3 Bath composition: The ethylenediamine in Example 1 was changed to triethylenetetramine 25/α (0,171 mol/l).
ハルセル試験の結果、試験片全面にわたり均一な鏡面光
沢外観が得られた。試験片中央におけるニッケル共析率
は13.5%であった。As a result of the Hull cell test, a uniform specular gloss appearance was obtained over the entire surface of the specimen. The nickel eutectoid rate at the center of the test piece was 13.5%.
実施例4
浴組成:実施例1のエチレンジアミンをテトラエチレン
ペンタミン l Og#l(0,053モル/It )
に変更し lこ 。Example 4 Bath composition: The ethylenediamine of Example 1 was replaced with tetraethylenepentamine l Og#l (0,053 mol/It )
Change it to .
ハルセル試験の結果、試験片全面にわたり均一な鏡面光
沢外観が得られた。試験片中央におけるニッケル共析率
は15.8%であった。As a result of the Hull cell test, a uniform specular gloss appearance was obtained over the entire surface of the specimen. The nickel eutectoid rate at the center of the test piece was 15.8%.
実施例5
浴組成:実施例1のエチレンジアミンをペンタエチレン
テトラミン 10g/α(0,043モル/l )に変
更し lこ。Example 5 Bath composition: Ethylenediamine in Example 1 was changed to pentaethylenetetramine 10 g/α (0,043 mol/l).
ハルセル試験の結果、試験片全面にわたり均一な鏡面光
沢外観が得られた。試験片中央におけるニッケル共析率
は11.0%であった。As a result of the Hull cell test, a uniform specular gloss appearance was obtained over the entire surface of the specimen. The nickel eutectoid rate at the center of the test piece was 11.0%.
実施例6
浴組成:実施例1のエチレンジアミンをN−アミノエチ
ルエタノールアミン 10c/l (0,096モル/
II)に変更した。Example 6 Bath composition: Ethylenediamine of Example 1 was mixed with N-aminoethylethanolamine 10 c/l (0,096 mol/l)
II).
ハルセル試験の結果、試験片全面にわたり均一な鏡面光
沢外観が得られた。また、ハルセル板の低電流側からの
距離の相違(すなわち、陰極電流密度の相違)によるニ
ッケル共析率の変化は、第1図に示したとおり、はとん
ど認められなかった。ハルセル板上各部にけるめっき厚
は第2図に示したとおりであった。As a result of the Hull cell test, a uniform specular gloss appearance was obtained over the entire surface of the specimen. Moreover, as shown in FIG. 1, almost no change in the nickel eutectoid rate due to a difference in distance from the low current side of the Hull cell plate (ie, a difference in cathode current density) was observed. The plating thickness at each part on the Hull Cell board was as shown in Figure 2.
実施例7
浴組成:NaOH40c/l、ZnO6,25c/l(
Znとして5 H#) 、 N iC12・6 H20
1、62g/4 (N iとして0.41/l、Z口/
Ni−12,5)、N−アミノエチルエタノールアミン
5に/II(0,048モル/l)、トリエタノール
アミン 30 g/l、光沢剤・LX−5OR(荏原ニ
ーシライト株式会社製ジンケート亜鉛めっき用光沢剤;
アミンとエピクロルヒドリンとの反応生成物および芳香
族アルデヒドを含有) F++l/I)ハルセル試験
の結果、陰極電流効率はあまり良くないものの、試験片
全面にわたり鏡面光沢外観が得られた。試験片中央にお
けるニッケル共析率は12,0%であった。Example 7 Bath composition: NaOH40c/l, ZnO6,25c/l (
5 H#) as Zn, N iC12・6 H20
1, 62g/4 (0.41/l as Ni, Z port/
Ni-12,5), N-aminoethylethanolamine 5/II (0,048 mol/l), triethanolamine 30 g/l, brightener LX-5OR (manufactured by Ebara Nishilite Co., Ltd. for zincate galvanizing) Brightener;
Contains a reaction product of amine and epichlorohydrin and an aromatic aldehyde)F++l/I) As a result of the Hull cell test, a specular glossy appearance was obtained over the entire surface of the test piece, although the cathode current efficiency was not very good. The nickel eutectoid rate at the center of the test piece was 12.0%.
実施例8
浴組成: NaOH130t/l、 ZnO20g/I
t (Znとしてlex/1> 、 Nrc+□・6
Hzo 10 g/ρ(Niとして2.5c/l、Z
n/N1=6.4)、N−アミノエチルエタノールアミ
ン 20gInc0.19モル/])、トリ工9 /
−ルア ミ7 40 g/11.光沢剤・LX−5OR
5ml#ハルセル試験の結果、試験片全面にわたり鏡面
光沢外観が得られた。試験片中央におけるニッケル共析
率は14.3%であった。Example 8 Bath composition: NaOH 130t/l, ZnO 20g/I
t (lex/1 as Zn>, Nrc+□・6
Hzo 10 g/ρ (2.5 c/l as Ni, Z
n/N1=6.4), N-aminoethylethanolamine 20gInc0.19 mol/]), Tri-Ethanol 9/
-Luami 7 40 g/11. Brightener LX-5OR
As a result of the 5ml #Hull Cell test, a specular glossy appearance was obtained over the entire surface of the test piece. The nickel eutectoid rate at the center of the test piece was 14.3%.
実施例9
浴組成 : N!OH130t/l1. Zn0 1
2.5c/l(Znとして10 !/11) 、 N
iClz・6 Hzo 10 g#t(Niとして2
.5t/l、Zn/N1=4.0)、N−アミノエチル
エタノールアミン 21/l(0,19モル/g)。Example 9 Bath composition: N! OH130t/l1. Zn0 1
2.5c/l (10!/11 as Zn), N
iClz・6 Hz 10 g#t (2 as Ni
.. 5t/l, Zn/N1=4.0), N-aminoethylethanolamine 21/l (0.19 mol/g).
トリエタノールアミン15g/M、光沢剤・LX−5O
R5ml/fi
ハルセル試験の結果、試験片全面にわたり鏡面光沢外観
が得られた。試験片各部におけるニッケル共析率は第1
図に示すとおりである。Triethanolamine 15g/M, brightener/LX-5O
As a result of the R5ml/fi Hull cell test, a specular glossy appearance was obtained over the entire surface of the test piece. The nickel eutectoid rate in each part of the test piece was the first
As shown in the figure.
比較例1
実施例9の浴組成においてトリエタノールアミンを配合
しないほかは同様の組成にした。Comparative Example 1 The same bath composition as in Example 9 was used except that triethanolamine was not blended.
ハルセル試験の結果、中・高電流部においては鏡面光沢
が得られたものの、低電流側から2cmの範囲において
は無光沢のめっきとなった。試験片各部におけるニッケ
ル共析率は第1図に示すとおりである。As a result of the Hull cell test, although specular gloss was obtained in the medium and high current areas, the plating was matte in a range of 2 cm from the low current side. The nickel eutectoid ratio in each part of the test piece is as shown in FIG.
比較例2(酸性浴)
浴組成 : ZnCIz 1 oot/a、 NiC
l2・61120140c/l、 NH,CI 200
c/l、光沢剤・2N−5OMU(荏原ニーシライト株
式会社製) 50ml/l、光沢剤・2+1−60 (
荏原ニーシライト株式会社製) 2 at/e。Comparative example 2 (acidic bath) Bath composition: ZnCIz 1 oot/a, NiC
l2・61120140c/l, NH,CI 200
c/l, brightener 2N-5OMU (manufactured by Ebara Nishilight Co., Ltd.) 50ml/l, brightener 2+1-60 (
(manufactured by Ebara Nishilight Co., Ltd.) 2 at/e.
pH5,6
ハルセル試験の結果、試験片全面にわたり鏡面光沢外観
が得られたが、試験片各部におけるニッケル共析率は、
第1図に示したとおり低電流密度側で変化が大きかった
。まためっき厚も、第2図に示したとおり、電流密度の
変化に伴う変化が大きかった。As a result of the pH 5, 6 Hull cell test, a specular gloss appearance was obtained over the entire surface of the test piece, but the nickel eutectoid rate in each part of the test piece was
As shown in Figure 1, the change was large on the low current density side. Furthermore, as shown in FIG. 2, the plating thickness also changed significantly with changes in current density.
比較例3
実施例1においてエチレンジアミン 10g#をエチレ
ンジアミン四酢酸二ナトリウム 30g#(0,088
モル/りに変更した。Comparative Example 3 In Example 1, 10 g of ethylenediamine was mixed with 30 g of disodium ethylenediaminetetraacetate (0,088
It was changed to mol/litre.
ハルセル試験の結果、試験片全面にわたり鏡面光沢外観
が得られたものの、試験片中央におけるニッケル共析率
は2.6%であった。As a result of the Hull cell test, although a specular gloss appearance was obtained over the entire surface of the test piece, the nickel eutectoid rate at the center of the test piece was 2.6%.
比較例4
実施例1において光沢剤スパー80を添加しないほかは
同様の組成とした。Comparative Example 4 The composition was the same as in Example 1 except that the brightener Spar 80 was not added.
ハルセル試験の結果、試験片中央におけるニッケル共析
率は13.9%であったが、外観は、暗灰色のマット状
のものであった。As a result of the Hull cell test, the nickel eutectoid rate at the center of the specimen was 13.9%, but the appearance was dark gray and matte.
実施例および比較例の結果から明らかなように、本発明
の亜鉛−ニッケル合金めっき液は従来のめっき液ではき
わめて困難であったニッケル共析率lO〜16%の亜鉛
−ニッケル共析めっきを可能にしたものであり、しかも
、低電流部から高電流部まで、広い範囲にわたって−様
なニッケル共析を生じるものである。これにより、本発
明のめっき液を用いて得られる亜鉛−ニッケル合金めっ
きは、従来の低ニッケル共析率亜鉛−ニッケル合金めっ
きよりもはるかに優れた耐食性を示す。本発明のめっき
液は、ニッケル共析率の点で優れているだけでなく、広
い電流密度範囲にわたり厚さが均一で、美しい鏡面光沢
を有するめっき皮膜を与えるという特長がある。As is clear from the results of Examples and Comparative Examples, the zinc-nickel alloy plating solution of the present invention enables zinc-nickel eutectoid plating with a nickel eutectoid ratio of lO to 16%, which was extremely difficult with conventional plating solutions. Moreover, --like nickel eutectoid occurs over a wide range from the low current part to the high current part. As a result, the zinc-nickel alloy plating obtained using the plating solution of the present invention exhibits much better corrosion resistance than the conventional low nickel eutectoid ratio zinc-nickel alloy plating. The plating solution of the present invention not only has an excellent nickel eutectoid rate, but also has the advantage of providing a plating film that is uniform in thickness over a wide current density range and has a beautiful specular gloss.
上述のように、本発明によれば従来のめっき液では到底
不可能であった高品質亜鉛−ニッケル合金めっきが可能
であり、工業用材料、機械部品等の品質向上に大きな貢
献をなし得るものである。As mentioned above, according to the present invention, high-quality zinc-nickel alloy plating, which was impossible with conventional plating solutions, is possible, and it can greatly contribute to improving the quality of industrial materials, machine parts, etc. It is.
第1図および第2図は実施例および比較例の試験結果を
示すグラフである。
第1図
ハルセル板低電流部からの距離(c+*)陰極電流密度
(A/dmすFIGS. 1 and 2 are graphs showing the test results of Examples and Comparative Examples. Fig. 1 Distance from low current part of Hull cell plate (c++) Cathode current density (A/dm)
Claims (3)
0.4〜4.0g/l、但しZn^2^+/Ni^2^
+(重量比)が4〜12.5になるように含有し、更に
、N−アミノエチルエタノールアミン、エチレンジアミ
ン、ジエチレントリアミン、トリエチレンテトラミン、
テトラエチレンペンタミン、ペンタエチレンヘキサミン
からなる群から選ばれたアミン系キレート剤1種以上を
0.04モル/l以上、トリエタノールアミンを15〜
60g/l、および有効量の光沢剤を含有することを特
徴とするアルカリ性無シアン亜鉛−ニッケル合金めっき
液。(1) Zn^2^+ 5 to 20 g/l, Ni^2^+ 0.4 to 4.0 g/l, however, Zn^2^+/Ni^2^
+ (weight ratio) is 4 to 12.5, and further contains N-aminoethylethanolamine, ethylenediamine, diethylenetriamine, triethylenetetramine,
0.04 mol/l or more of one or more amine-based chelating agents selected from the group consisting of tetraethylenepentamine and pentaethylenehexamine, and 15 to 15% of triethanolamine.
An alkaline cyanide-free zinc-nickel alloy plating solution containing 60 g/l and an effective amount of a brightener.
成物および芳香族アルデヒドからなるものである請求項
1記載のめっき液。(2) The plating solution according to claim 1, wherein the brightener comprises a reaction product of an amine and epichlorohydrin and an aromatic aldehyde.
ものである請求項1記載のめっき液。(3) The plating solution according to claim 1, wherein the brightener comprises a quaternized pyridine compound.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12823788A JPH01298192A (en) | 1988-05-27 | 1988-05-27 | Zinc-nickel alloy plating solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12823788A JPH01298192A (en) | 1988-05-27 | 1988-05-27 | Zinc-nickel alloy plating solution |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01298192A true JPH01298192A (en) | 1989-12-01 |
Family
ID=14979884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12823788A Pending JPH01298192A (en) | 1988-05-27 | 1988-05-27 | Zinc-nickel alloy plating solution |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01298192A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5417840A (en) * | 1993-10-21 | 1995-05-23 | Mcgean-Rohco, Inc. | Alkaline zinc-nickel alloy plating baths |
EP1099780A2 (en) | 1999-11-10 | 2001-05-16 | Nihon Hyomen Kagaku Kabushiki Kaisha | Surface treating agent |
JP2007002274A (en) * | 2005-06-21 | 2007-01-11 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating method |
JP2008297621A (en) * | 2007-06-04 | 2008-12-11 | Shimadzu Corp | Zinc-nickel alloy plating solution and zinc-nickel alloy plating method |
JP2012246554A (en) * | 2011-05-30 | 2012-12-13 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating liquid and plating method |
JP2013014833A (en) * | 2010-07-22 | 2013-01-24 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating liquid and plating method |
CN104805480A (en) * | 2015-05-21 | 2015-07-29 | 广东达志环保科技股份有限公司 | Alkaline zinc-nickel electroplating liquid, preparation method and electroplating method |
US9587320B2 (en) | 2014-09-25 | 2017-03-07 | Yuken Industry Co., Ltd. | Additive for acid zinc alloy plating bath, acid zinc alloy plating bath, and method for producing zinc alloy plated article |
CN109252194A (en) * | 2018-11-21 | 2019-01-22 | 上海聆轩化工商行 | A kind of Zinc-nickel alloy electroplating liquid and its preparation process |
JP6582353B1 (en) * | 2019-02-15 | 2019-10-02 | ディップソール株式会社 | Zinc or zinc alloy electroplating method and system |
CN110760907A (en) * | 2019-12-05 | 2020-02-07 | 佛山市南海高益美环保实业有限公司 | Alkaline cyanide-free electroplating zinc-nickel alloy additive and electroplating solution |
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-
1988
- 1988-05-27 JP JP12823788A patent/JPH01298192A/en active Pending
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5417840A (en) * | 1993-10-21 | 1995-05-23 | Mcgean-Rohco, Inc. | Alkaline zinc-nickel alloy plating baths |
EP1099780A2 (en) | 1999-11-10 | 2001-05-16 | Nihon Hyomen Kagaku Kabushiki Kaisha | Surface treating agent |
US6500886B1 (en) | 1999-11-10 | 2002-12-31 | Nihon Hyomen Kagaku Kabushiki Kaisha | Surface treating agent |
US7030183B2 (en) | 1999-11-10 | 2006-04-18 | Nihon Hyomen Kagaku Kabushiki Kaisha | Surface treating method and surface treating agent |
JP2007002274A (en) * | 2005-06-21 | 2007-01-11 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating method |
JP2008297621A (en) * | 2007-06-04 | 2008-12-11 | Shimadzu Corp | Zinc-nickel alloy plating solution and zinc-nickel alloy plating method |
JP2013014833A (en) * | 2010-07-22 | 2013-01-24 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating liquid and plating method |
JP2012246554A (en) * | 2011-05-30 | 2012-12-13 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating liquid and plating method |
US9587320B2 (en) | 2014-09-25 | 2017-03-07 | Yuken Industry Co., Ltd. | Additive for acid zinc alloy plating bath, acid zinc alloy plating bath, and method for producing zinc alloy plated article |
CN104805480A (en) * | 2015-05-21 | 2015-07-29 | 广东达志环保科技股份有限公司 | Alkaline zinc-nickel electroplating liquid, preparation method and electroplating method |
CN109252194A (en) * | 2018-11-21 | 2019-01-22 | 上海聆轩化工商行 | A kind of Zinc-nickel alloy electroplating liquid and its preparation process |
WO2020130603A2 (en) | 2018-12-19 | 2020-06-25 | 주식회사 포스코 | Electroplated steel sheet having excellent surface appearance, and manufacturing method therefor |
JP6582353B1 (en) * | 2019-02-15 | 2019-10-02 | ディップソール株式会社 | Zinc or zinc alloy electroplating method and system |
CN110462107A (en) * | 2019-02-15 | 2019-11-15 | 迪普索股份公司 | Zinc or Zinc alloy electroplating method and system |
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