JPH01297120A - Regeneration of adsorption device for refining helium gas - Google Patents
Regeneration of adsorption device for refining helium gasInfo
- Publication number
- JPH01297120A JPH01297120A JP63125760A JP12576088A JPH01297120A JP H01297120 A JPH01297120 A JP H01297120A JP 63125760 A JP63125760 A JP 63125760A JP 12576088 A JP12576088 A JP 12576088A JP H01297120 A JPH01297120 A JP H01297120A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorber
- adsorption device
- regeneration
- helium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 title claims abstract description 148
- 239000001307 helium Substances 0.000 title claims abstract description 65
- 229910052734 helium Inorganic materials 0.000 title claims abstract description 65
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 title claims abstract description 64
- 238000011069 regeneration method Methods 0.000 title claims abstract description 59
- 230000008929 regeneration Effects 0.000 title claims abstract description 56
- 238000001179 sorption measurement Methods 0.000 title claims abstract description 55
- 238000007670 refining Methods 0.000 title abstract 2
- 230000001172 regenerating effect Effects 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims description 15
- 239000012535 impurity Substances 0.000 claims description 12
- 238000000746 purification Methods 0.000 claims description 12
- 238000003795 desorption Methods 0.000 claims description 9
- 238000005057 refrigeration Methods 0.000 claims description 9
- 238000011084 recovery Methods 0.000 claims description 6
- 239000003507 refrigerant Substances 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 28
- 239000003463 adsorbent Substances 0.000 abstract description 20
- 229910001873 dinitrogen Inorganic materials 0.000 abstract description 20
- 238000007599 discharging Methods 0.000 abstract description 2
- 239000002250 absorbent Substances 0.000 abstract 1
- 230000002745 absorbent Effects 0.000 abstract 1
- 238000001816 cooling Methods 0.000 description 11
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000006096 absorbing agent Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000112 cooling gas Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 150000002371 helium Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Separation By Low-Temperature Treatments (AREA)
- Separation Of Gases By Adsorption (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は吸着器の再生方法に係り、特にヘリウム冷凍装
置に用いられる吸着器の再生方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for regenerating an adsorption device, and particularly to a method for regenerating an adsorption device used in a helium refrigeration system.
従来、Ｈｅ冷凍機用の吸着器は初期の系内の不純物の除
去等を目的にしたものが多く、ヘリウム冷凍装置では連
続的に系内の００２． Ｈ２Ｏの除去をするものはなか
つた。しかし、吸着器自体は各分野で使用されており、
ヘリウム冷凍装置でも従来のＴＳＡ方式の吸着器を用い
てＨｅガスの精製を行なっていた。また、吸着器の再生
にあたっては加温したＮ２ガスを用いて脱着再生してい
た。Conventionally, most adsorbers for He refrigerators have been used for the purpose of removing impurities in the initial system, while helium refrigerators have continuously removed 002. There was nothing to remove H2O. However, the adsorber itself is used in various fields,
Helium refrigeration equipment also purifies He gas using a conventional TSA adsorption device. Furthermore, when regenerating the adsorber, heated N2 gas was used for desorption and regeneration.
なお、この種の再生に関するものとしては、例えば、特
開昭５５−１２７１２２号、特関昭６１−９０７２０号
等が挙げられる。Incidentally, examples of this type of regeneration include, for example, Japanese Patent Application Laid-open No. 127122/1982 and Japanese Patent Publication No. 90720/1983.
上記従来技術は、吸着器の再生用の加温ガスとして、加
温ガス中に不純物（例えば、００２．水分等）が無いガ
スを用いる必要があり、通常、空気分離装置等で採用さ
れる吸着塔は、深冷分離した排ガスを再生ガスとして使
用しており、比較的容易に再生できていた。In the above conventional technology, it is necessary to use a gas that does not contain impurities (for example, 002 water, etc.) in the heated gas as the heated gas for regenerating the adsorber, and the adsorption that is usually used in air separation equipment etc. The tower used cryogenically separated exhaust gas as regeneration gas, and could be regenerated relatively easily.
ところが、ヘリウム冷凍装置の場合、このような排ガス
が無いので、再生ガスとして比較的入手し易い液体窒素
を蒸発、加熱させて使用している。However, in the case of a helium refrigeration system, since there is no such exhaust gas, liquid nitrogen, which is relatively easy to obtain, is used as a regeneration gas by evaporating and heating it.
しかし、この再生ガスであるＮ２ガスが吸着剤に若干吸
着され、吸Ｓ器内のＮ２ガスを排出しただけでは吸着さ
れたＮ２ガスを完全に脱着することができないという問
題があった。However, there was a problem in that some of the N2 gas, which is the regeneration gas, was adsorbed by the adsorbent, and the adsorbed N2 gas could not be completely desorbed just by discharging the N2 gas in the S absorber.
本発明の第１の目的は、吸着器の再生を効率良く行なう
とともに、吸着器再生ガスを効率良く吸着剤から脱着す
ることのできるヘリウムガス精製用吸着器の再生方法を
提供することにある。A first object of the present invention is to provide a method for regenerating an adsorbent for helium gas purification, which can efficiently regenerate the adsorber and efficiently desorb adsorbent regeneration gas from the adsorbent.
また、本発明の第２の目的は、精製したヘリウムガス内
に加温ガスを含む不純ガスを残すことのないヘリウム冷
凍装置を提供することにある。A second object of the present invention is to provide a helium refrigeration system that does not leave behind any impurity gas containing heated gas in purified helium gas.
上記第１の目的は、吸着器内へ加温した再生ガスを供給
し吸着された不純ガスを脱着する工程と。The first purpose is to supply heated regeneration gas into the adsorber and desorb the adsorbed impurity gas.
不純ガスの脱着終了後に再生ガスを温度の高いまま真空
排気除去する工程とを有することにより、達成される。This is achieved by including a step of vacuum exhausting and removing the regeneration gas while keeping the temperature high after the desorption of the impurity gas is completed.
また、上記第２の目的は、ヘリウムガスを圧縮循環する
圧縮機と、圧縮機によって加圧された高圧ヘリウムガス
を断熱膨張させて極低温冷媒を生成する冷凍機と、高圧
ヘリウムガスのラインで圧縮機と冷凍機との間に並列に
設けられ文互に切り替え可能な吸着器と、吸着器に加温
した再生ガスを供給する手段と、吸着器内を真空排気す
る手段と、吸着器に他の吸着器で精製したヘリウムガス
を供給する供給ラインと、供給ラインによって吸着器に
送られたヘリウムガスを圧縮機の吸込側に回収する回収
ラインとから構成する二とにより、達成される。The second purpose is to provide a compressor that compresses and circulates helium gas, a refrigerator that adiabatically expands the high-pressure helium gas pressurized by the compressor to generate cryogenic refrigerant, and a high-pressure helium gas line. an adsorber that is installed in parallel between the compressor and the refrigerator and can be switched between each other; a means for supplying heated regeneration gas to the adsorber; a means for evacuating the inside of the adsorber; This is achieved by a supply line that supplies helium gas purified by another adsorber, and a recovery line that collects the helium gas sent to the adsorber by the supply line to the suction side of the compressor.
ヘリウム精製用吸着器の再生方法においては、吸着器に
よってヘリウムガス中から吸着除去した不純ガスは、加
温した再生ガスを吸着器内に供給することによって脱着
されて、再生ガスとともに排出される。次に、吸着剤か
らの不純ガスの脱着が終了すると、吸着器内に残ってい
る再生ガスを温度の高いまま真空排気する。これにより
、吸着剤の温度が高いまま再生ガスの排気が行われるの
で、吸着剤に再生ガスが吸着されることがない。In a method for regenerating an adsorber for helium purification, impurity gas adsorbed and removed from helium gas by the adsorber is desorbed by supplying heated regeneration gas into the adsorption device, and is discharged together with the regeneration gas. Next, when the desorption of impure gas from the adsorbent is completed, the regeneration gas remaining in the adsorber is evacuated while maintaining its temperature. As a result, the regeneration gas is exhausted while the temperature of the adsorbent remains high, so that the regeneration gas is not adsorbed by the adsorbent.
また、ヘリウム冷凍装置においては、吸着器の一方で圧
縮機から送られる高圧ヘリウムガス中の不純物な吸着除
去して冷凍機に供給し、他方の吸着器に加温した再生ガ
スを供給して吸着剤に吸着された不純力スを脱着、排出
する。再生力スによる不純ガスの脱着が終了すると、吸
着器内の再生ガスを温度の高いまま真空排気して排出す
る。その後、一方の吸着器で精製されたヘリウムガスの
一部を供給ラインを介して再生側の吸着器へ供給し、該
吸着器内を通ったヘリウムガスを回収ラインを介して圧
縮機の吸込側に戻す。これによ１）、再生側の吸着器を
冷却するとともに、吸着器内に残った再生ガスがあった
場合、圧ｋＪ機を介して一方の吸着器に通され再生ガス
は吸着除去される。In addition, in a helium refrigeration system, one adsorber adsorbs and removes impurities from the high-pressure helium gas sent from the compressor and supplies it to the refrigerator, and the other adsorber supplies heated regeneration gas to adsorb it. Desorbs and discharges impurities adsorbed by the agent. When the desorption of impure gas by the regeneration force is completed, the regeneration gas in the adsorber is evacuated and discharged while still at a high temperature. After that, a part of the helium gas purified by one adsorber is supplied to the regeneration-side adsorber via the supply line, and the helium gas that has passed through the adsorber is transferred to the suction side of the compressor via the recovery line. Return to As a result of this, 1) the adsorber on the regeneration side is cooled, and if there is regeneration gas remaining in the adsorber, the regeneration gas is passed through one adsorption device via the pressure kJ machine and removed by adsorption.
以下、本発明の一実施例を第１図および第２図により説
明する。An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.
第１図は吸着器を備えた冷凍装置を示し、この場合、吸
着器は連続精製可能なように２個の吸着器を切替使用で
きるようにしである。FIG. 1 shows a refrigeration system equipped with an adsorber, and in this case, the adsorber is designed so that two adsorbers can be used interchangeably to enable continuous purification.
圧縮ｆｉｔの吐出側は冷凍機３に冷媒ガス、この場合、
ヘリウムガスを供給する高圧ガス供給配管２につなげで
ある。圧縮機１の吸込側は冷凍機３からの戻り冷媒ガス
を回収する低圧ガス戻１１配管４につなげである。高圧
ガス供給配管２の途中には、第１吸着装置１０と第２吸
着装置印とが並列に設けである。第１吸着装置１０およ
び第２吸着装置美には、吸着器１１およびガが設けてあ
１１１吸着装置１０．２０の最上流側に弁口およびｎを
設け、吸着器ｆｉｌｏ、２０の最下流側に弁１７および
ｄを設けである。The discharge side of the compression fit supplies refrigerant gas to the refrigerator 3, in this case,
It is connected to a high-pressure gas supply pipe 2 that supplies helium gas. The suction side of the compressor 1 is connected to a low-pressure gas return 11 pipe 4 for recovering the return refrigerant gas from the refrigerator 3. In the middle of the high-pressure gas supply pipe 2, a first adsorption device 10 and a second adsorption device mark are provided in parallel. The first adsorption device 10 and the second adsorption device 111 are provided with an adsorption device 11 and a valve port is provided on the most upstream side of the adsorption device 10. The valves 17 and d are provided at.
第１吸着装置ｌＯおよび第２吸着装置９の吸着器１１．
２１よりも上流側には、弁１３および田を介してガス回
収管３１が引き出され低圧ガス戻り配管４に接続してあ
り、弁１４および冴を介して真空引管諺が引き出され真
空ポンプ羽に接続してあり、弁３５および５を介して大
気放出管Ｍが引き出しである。Adsorbers 11 of the first adsorption device IO and the second adsorption device 9.
On the upstream side of 21, a gas recovery pipe 31 is drawn out through a valve 13 and a pipe and connected to the low-pressure gas return pipe 4, and a vacuum pipe 31 is drawn out through a valve 14 and a pipe, and a vacuum pump impeller is drawn out. It is connected to the atmosphere discharge pipe M through valves 35 and 5.
また、第１吸着装置１０および第２吸着ＡＪ置（９）の
吸着５１１．２１よりも下流側には、弁１６および５を
介して加温ガス供給管あが接続してあ１１．加温ガス供
給管あには加温器あを介してガスタンク、この場合、液
体窒素タンク３７が接続しである。また、第１吸着装置
１０と第２吸着装置加との間で吸着器１１．２１よりも
下流側には、弁刃な介した微量ガス供給管あと、弁４１
を介した冷却用バイパス管４０とが接続しである。Further, a heated gas supply pipe 11. is connected via valves 16 and 5 to the downstream side of the adsorption unit 511.21 of the first adsorption device 10 and the second adsorption AJ position (9). A gas tank, in this case a liquid nitrogen tank 37, is connected to the heating gas supply pipe A via a heater A. Further, between the first adsorption device 10 and the second adsorption device, on the downstream side of the adsorption device 11.21, there is a trace gas supply pipe via a valve blade, and a valve 41.
It is connected to a cooling bypass pipe 40 via.
次に、上記のように構成された冷凍装置の作用について
説明する。Next, the operation of the refrigeration system configured as described above will be explained.
例えば、第１吸着装置１０側で圧縮機１から冷凍機３へ
送るヘリウムガスを精製し、第２吸着装五美側は吸着器
２１の再生を行なう場合、第１吸着装置ＩＯ側の弁ルお
よび弁１７を開いて圧縮機１からのヘリウムガスを吸着
器１１へ流し、第２吸着装置に側の弁ｎおよび弁ｎを閉
じてヘリウムガスが流れ込まないようにする。このとき
、第１吸着装童】０側の弁１３．１４． １５および】
６は閉じておく。For example, when the first adsorption device 10 side refines the helium gas sent from the compressor 1 to the refrigerator 3, and the second adsorption device Gomi side regenerates the adsorber 21, the valve on the first adsorption device IO side Then, the valve 17 is opened to allow helium gas from the compressor 1 to flow into the adsorber 11, and the valves n and n on the side of the second adsorption device are closed to prevent helium gas from flowing into the second adsorption device. At this time, the first suction device]0 side valve 13.14. 15 and】
6 is closed.
第２吸着装ｒａ２ｏ側で吸着器乙の再生を行なう場合、
最初の状態は、弁ｎないし４，３９および４１が閉じら
れており、吸着器ガ内には高圧ヘリウムガスが封じ込め
られた状態となっているので、まず。When regenerating adsorption device O on the second adsorption device RA2O side,
In the initial state, valves n through 4, 39, and 41 are closed, and high-pressure helium gas is sealed in the adsorber.
弁５を開いて吸着器ｎ内のヘリウムガスを大気放出管Ｕ
から出す。Open valve 5 to release helium gas in adsorber N to atmosphere discharge pipe U.
Take it out.
次に、弁漢を用いて再生ガスを吸着器２１内に送り込む
。この場合、再生ガスは液体窒素タンクｒからの液体窒
素を加温器謁によって蒸発、加温させて使用し、吸着器
ｎ内の吸着剤を加温する。このとき、加温窒素ガスは例
えば２５０℃まで加温して供給し、吸着器２１を通った
窒素ガスは大気放出管あから排出され、吸着器４内の吸
着剤は時間とともに加温される（これを第２図の＠ａ”
に示す）。Next, the regeneration gas is sent into the adsorber 21 using a benkan. In this case, liquid nitrogen from the liquid nitrogen tank r is evaporated and heated using a heater, and the regeneration gas is used to heat the adsorbent in the adsorber n. At this time, the heated nitrogen gas is heated to, for example, 250°C and supplied, and the nitrogen gas that has passed through the adsorber 21 is discharged from the atmosphere discharge pipe, and the adsorbent in the adsorber 4 is heated over time. (This is @a in Figure 2)
).
吸着器ガ内の温度が所定温度まで加温されたなら、その
状態で一定時間継続しくこれを第２図の１ｂ”に示す）
、吸着剤に吸着されていた不純ガスを放出させ、窒素ガ
スとともに排出する。Once the temperature inside the adsorber reaches a predetermined temperature, it remains in that state for a certain period of time (as shown in 1b'' in Figure 2).
, the impure gas adsorbed by the adsorbent is released and discharged together with nitrogen gas.
所定の時間が経過して不純ガスの脱着が終わると、弁濁
を閉じて加温窒素ガスの供給を停止するとともに弁２を
閉じ１次に、弁冴な開いて真空ポンプ羽によって吸１ｉ
器２１内に残った窒素力スを真空排気する（れな第２図
の１ｃ”に示す）。このとき、真空排気される窒素ガス
は加温されたままのものを排気するので、吸着剤は温度
が高い状態にあ１】、吸着剤が再生ガス、すなわち、窒
素ガスを吸着することなく、窒素ガスは真空排気される
ので、完全な再生が可能となる。When the desorption of the impure gas is completed after a predetermined period of time has passed, the valve is closed to stop the supply of heated nitrogen gas, and the valve 2 is closed.
The nitrogen gas remaining in the vessel 21 is evacuated (as shown in 1c" in Figure 2). At this time, the nitrogen gas that is evacuated remains heated, so the adsorbent When the temperature is high (1), the adsorbent does not adsorb the regeneration gas, that is, nitrogen gas, and the nitrogen gas is evacuated, making complete regeneration possible.
吸着器Ｚ内の窒素ガスの真空排気が終了したら弁スな閉
じ、次に、弁４１および弁乙な開いて、吸着器１１で精
製された常温のヘリウムガスの一部を吸着器２１へ流し
、吸着器４内を冷却する（これを。When the nitrogen gas in the adsorber Z has been evacuated, the valve 41 and the valve B are opened, and a part of the room temperature helium gas purified in the adsorber 11 is allowed to flow into the adsorber 21. , to cool the inside of the adsorber 4 (this.
第２図の１ｄ”に示す）。吸着器２１内を通ったヘリウ
ムガスはガス回収管３１を通って圧縮機１の吸込側に戻
される。これによって、吸着器２１内に再生ガスや不純
ガスが残っていたにしても、冷却用のヘリウムガスとと
もに圧縮ａｌに戻り、再生ガスや不純ガスは吸着器１１
で吸着除去されるので、冷凍機３側へ流れることはない
。1d" in FIG. 2). The helium gas that has passed through the adsorber 21 is returned to the suction side of the compressor 1 through the gas recovery pipe 31. As a result, the helium gas that has passed through the adsorber 21 is returned to the suction side of the compressor 1. Even if some gas remains, it returns to compressed al along with the cooling helium gas, and the regeneration gas and impure gas are transferred to the adsorber 11.
Since it is removed by adsorption, it does not flow to the refrigerator 3 side.
吸着器２１の冷却後は弁田を閉じて、吸着器４内の圧力
を予冷用バイパ３管和からのヘリウムガスで、吸着器１
１側の圧力と同じにしておき、弁４１を閉じて再生運転
を終了する。After cooling the adsorber 21, the valve field is closed and the pressure inside the adsorber 4 is reduced using helium gas from the pre-cooling bypass pipe 3.
The pressure on the first side is kept the same, and the valve 41 is closed to end the regeneration operation.
吸着装置加側で精製を行ない、吸着装置１０を再生する
場合は、上記した弁操作を交替して行なう二とにより行
なえる。When regenerating the adsorption device 10 by performing purification on the addition side of the adsorption device, this can be done by alternating the valve operations described above.
以上、本−実施例によれば、再生側の吸着器において、
再生ガスを温度が高いまま排気するので、吸着剤に再生
ガスが吸着されることなり、吸着器の再生が効率良４行
なわれるという効果がある。As described above, according to this embodiment, in the adsorption device on the regeneration side,
Since the regenerating gas is exhausted while still at a high temperature, the regenerating gas is adsorbed by the adsorbent, resulting in the effect that the adsorber can be regenerated with high efficiency.
また、再生側の吸着器を他の吸着器で精製したヘリウム
ガスにより冷却し、そのヘリウムガスを圧縮機の吸込側
に戻すことによ１１．再生側の吸着器に流したヘリウム
ガスに不純ガスまたは再生ガスが混ざっても、他の吸着
器で精製できるので、冷凍機側へ不純ガスを流すことが
ない。In addition, by cooling the adsorption device on the regeneration side with helium gas purified by another adsorption device, and returning the helium gas to the suction side of the compressor, 11. Even if impure gas or regeneration gas is mixed with the helium gas flowed into the adsorption device on the regeneration side, it can be purified in another adsorption device, so there is no need to flow impure gas to the refrigerator side.
次１こ、本発明の他の実施例を第３図により説明する。Next, another embodiment of the present invention will be explained with reference to FIG.
男３図は再生運転の過程を示すもので、冷凍装置は第１
図に示す！ｉＩ置を用いて説明する。Figure 3 shows the process of regeneration operation, and the refrigeration equipment is
Shown in the diagram! This will be explained using the iI position.
吸＃ ＱＲ２１に加温再生ガスを送りで一定時間高温の
まま保持する工程（第３図に示す″ １１ 、 ＠ ｂ
”）は、訂記−実施例と同様である。The process of feeding heated regeneration gas to suction # QR21 and maintaining it at a high temperature for a certain period of time (shown in Figure 3)
”) is the same as the correction example.
所定の時間が経過して不純ガスの脱着が終わると、加温
器あによる窒素ガスの加ｉｆ！温度を下げ、吸着器ｎ内
を所定の温度１例えば、２００℃まで冷却する（これを
第３図の＠ｅ＃に示す）。このときの所定の温度は、不
純ガス脱着後に吸着剤に吸着された再生ガ２の吸Ｓ蓋（
吸着剤に残った残留量）が所定の許容値以内に納まる温
度とする。After the predetermined time has passed and the desorption of the impure gas is complete, nitrogen gas is added by the heater. The temperature is lowered and the inside of the adsorber n is cooled to a predetermined temperature 1, for example, 200° C. (this is shown at @e# in FIG. 3). The predetermined temperature at this time is the suction lid (
The temperature is such that the residual amount (residual amount remaining in the adsorbent) is within the specified tolerance.
吸着器乙の冷却が所定温度まで行なわれたら。Once adsorption device B has been cooled to the specified temperature.
弁頒を閉じて窒素ガスの供給を停止するとともに弁５を
閉じ、次に、弁スを用いて真空ポンプ羽によって吸Ｉｊ
ｔ器ｍ内に残った窒素ガスを真空排気する（これを第３
図の＠ｆ＃に示す）。このとき、弁篤を開いて吸着器１
１で精製されたヘリウムガスを微量吸着器２１へ流す。Close the valve to stop the supply of nitrogen gas and close the valve 5, and then use the valve to suck air with the vacuum pump blade.
The nitrogen gas remaining in the vessel m is evacuated (this is
(shown at @f# in the figure). At this time, open the valve and
The helium gas purified in step 1 is passed to a trace adsorption device 21.
これにより、吸着器ム内の窒素ガスの分圧が下がり、吸
着剤からの窒素ガスの脱着が容易となる。なお、この場
合は、吸着器１１で精製したヘリウムガスを吸着Ｒ２１
内へ供給するようにしたが、別のヘリウムガスタンクか
ら供給するようにしても良い。This reduces the partial pressure of nitrogen gas in the adsorbent chamber, making it easier to desorb nitrogen gas from the adsorbent. In this case, the helium gas purified by the adsorber 11 is adsorbed by the adsorption R21.
In this example, the helium gas is supplied from a separate helium tank.
吸着器ガ内の窒素ガスの真空排気が終了したら。After the nitrogen gas inside the absorber has been evacuated.
弁冴および弁おを閉じ、弁４１および弁幻な開いて前記
一実施例と同様に吸着器ｎ内にヘリウムガスを流し、吸
着器りを冷却する（これを第３図の′″ｇ”に示す）。The valve 41 and the valve 41 are closed, and the valve 41 is opened to allow helium gas to flow into the adsorber n in the same manner as in the previous embodiment to cool the adsorber (this is referred to as ``g'' in Fig. 3). ).
その後も前記一実施例と同様に行なわれる。Thereafter, the process is carried out in the same manner as in the previous embodiment.
以上、本実施例によれば、前記一実施例と同様の効果が
あるとともに、所定温度まで再生ガスで冷却するので、
冷却ガスが多く流せ、冷却時間が短縮されて全体の再生
時間を短縮することができる。As described above, according to this embodiment, there are effects similar to those of the above-mentioned embodiment, and since the regeneration gas is used for cooling to a predetermined temperature,
More cooling gas can flow, reducing cooling time and reducing overall regeneration time.
また、再生ガスを真空排気する際にヘリウムガスを吸着
器内に導入することにより、再生ガスの分圧が下がるの
で、吸着剤からの再生ガスの脱着が容易になるという効
果がある。Furthermore, by introducing helium gas into the adsorber when evacuating the regeneration gas, the partial pressure of the regeneration gas is lowered, which has the effect of facilitating the desorption of the regeneration gas from the adsorbent.
なお１本実施例ではもう一方の吸着器にヘリウムガスを
供給するラインを、目的によ、ンて制御しやすいように
冷却用バイパス管類と微量ガス供給管おとに分けている
が、広範囲に制御できる弁を用いて一本のラインで共用
するようにしても良い。Note that in this embodiment, the line for supplying helium gas to the other adsorber is divided into cooling bypass pipes and trace gas supply pipes for easy control depending on the purpose. It is also possible to use a valve that can be controlled in a single line.
また、再生ガスの真空排気時にヘリウムガスを供給する
のは、ヘリウムガスを捨てることになるので微量にして
いるが、ヘリウムガスの供給量を多くすればさらに効果
が上がる。また、このヘリウムガスの供給は、前記一実
施例で行なっても良い。Further, when helium gas is supplied when the regeneration gas is evacuated, the amount of helium gas is discarded, so the amount is kept small, but the effect will be even greater if the amount of helium gas supplied is increased. Further, this helium gas supply may be performed in the above embodiment.
さらに、これら一実施例および他の実施例では、単に、
吸着器内に加温ガスや冷却ガスを流して再生するように
しているが、吸ａ器内に伝熱管を設けて、加温または冷
却等を併用して行なうようにしても良い。これによれば
、さらに再生時間を短縮することができる。また、この
場合、ヘリウムガスの精製について述べたが、他のガス
の精製についても同様に行なうことができる。Additionally, in this and other embodiments, simply:
Although regeneration is carried out by flowing heating gas or cooling gas into the absorber, a heat transfer tube may be provided in the absorber to perform heating or cooling in combination. According to this, the playback time can be further shortened. Further, although purification of helium gas has been described in this case, purification of other gases can be similarly performed.
本発明によれば、温度の高いまま再生ガスを排気するの
で、吸着器内に再生ガスや不純ガスを残すことなく効率
良く再生を行なうことができ、また、冷却に用いたヘリ
ウムガスを圧縮機側へ戻すので、精製したヘリウムガス
内に再生ガスや不純ガスを残すことがない。According to the present invention, since the regeneration gas is exhausted while the temperature remains high, regeneration can be performed efficiently without leaving regeneration gas or impurity gas in the adsorber, and the helium gas used for cooling can be transferred to the compressor. Since the helium gas is returned to the side, no regeneration gas or impure gas remains in the purified helium gas.
第１図は本発明のヘリウムガス精製用吸着器の再生方法
を実施するための装置の一例を示す構成図、第２図は本
発明の再生方法の一実施例を示す工程図、第３図は本発
明の再生方法の他の実施例を示す工程図である。
１１．２１・・・・・・吸着器、１２ないし１７，２２
ないし２７゜４１・・・・・・弁、３１・・・・・・ガ
ス回収管、３２・・・・・・真空引管。
あ・・・・・・大気放出管、３・・・・・・加温ガス供
給管、４０・・・冷却用バイパス管
＼−ノ′
Ｍ／ 図Fig. 1 is a configuration diagram showing an example of an apparatus for carrying out the regeneration method of an adsorption device for helium gas purification of the present invention, Fig. 2 is a process diagram showing an embodiment of the regeneration method of the present invention, and Fig. 3 FIG. 2 is a process diagram showing another embodiment of the regeneration method of the present invention. 11.21... Adsorption device, 12 to 17, 22
〜27゜41...Valve, 31...Gas recovery pipe, 32...Evacuation pipe. A...Atmospheric release pipe, 3...Heating gas supply pipe, 40...Cooling bypass pipe\-ノ'M/ Diagram
Claims (1)
再生方法において、前記吸着器内へ加温した再生ガスを
供給し吸着された不純ガスを脱着する工程と、前記不純
ガスの脱着終了後に前記再生ガスを温度の高いまま真空
排気除去する工程とを有することを特徴とするヘリウム
ガス精製用吸着器の再生方法。 ２、前記不純ガスはＣＯ＿２、ガスはＮ＿２である特許
請求の範囲第１項記載のヘリウムガス精製用吸着器の再
生方法。 ３、前記再生ガスの真空排気は前記再生ガス温度を、前
記不純ガスの脱着終了後の再生ガスの残留量が設定され
た許容値内に維持可能な温度域まで下げて行なう特許請
求の範囲第１項記載のヘリウムガス精製用吸着器の再生
方法。 ４、前記再生ガスの真空排気除去時にヘリウムガスを前
記吸着器内へ流す特許請求の範囲第１項記載のヘリウム
ガス精製用吸着器の再生方法。 ５、前記再生ガスの真空排気除去後に前記吸着器を、精
製されたヘリウムガスで冷却する特許請求の範囲第１項
記載のヘリウムガス精製用吸着器の再生方法。 ６、ヘリウムガスを圧縮循環する圧縮機と、該圧縮機に
よって加圧された高圧ヘリウムガスを断熱膨張させて極
低温冷媒を生成する冷凍機と、前記高圧ヘリウムガスの
ラインで前記圧縮機と前記冷凍機との間に並列に設けら
れ交互に切り替え可能な吸着器と、該吸着器に加温した
再生ガスを供給する手段と、前記吸着器内を真空排気す
る手段と、前記吸着器に他の吸着器で精製したヘリウム
ガスを供給する供給ラインと、該供給ラインによって前
記吸着器に送られたヘリウムガスを前記圧縮機の吸込側
に回収する回収ラインとを有することを特徴とするヘリ
ウム冷凍装置。[Scope of Claims] 1. A method for regenerating an adsorber for adsorbing and removing impurity gas in helium gas, comprising: supplying heated regeneration gas into the adsorber and desorbing the adsorbed impurity gas; 1. A method for regenerating an adsorber for helium gas purification, comprising the step of vacuum exhausting and removing the regeneration gas at a high temperature after completion of desorption of impure gas. 2. The method for regenerating an adsorption device for helium gas purification according to claim 1, wherein the impure gas is CO_2 and the gas is N_2. 3. The evacuation of the regeneration gas is carried out by lowering the temperature of the regeneration gas to a temperature range in which the residual amount of the regeneration gas after the completion of desorption of the impurity gas can be maintained within a set tolerance value. A method for regenerating an adsorption device for helium gas purification according to item 1. 4. The method for regenerating a helium gas purification adsorption device according to claim 1, wherein helium gas is allowed to flow into the adsorption device when the regeneration gas is vacuum-exhausted and removed. 5. The method for regenerating an adsorption device for helium gas purification according to claim 1, wherein the adsorption device is cooled with purified helium gas after the regeneration gas is vacuum-exhausted and removed. 6. A compressor that compresses and circulates helium gas; a refrigerator that adiabatically expands high-pressure helium gas pressurized by the compressor to generate a cryogenic refrigerant; and a line for the high-pressure helium gas that connects the compressor to the an adsorber that is provided in parallel with a refrigerator and can be switched alternately; a means for supplying heated regeneration gas to the adsorber; a means for evacuating the inside of the adsorber; A helium refrigeration system characterized by having a supply line for supplying helium gas purified by an adsorber, and a recovery line for recovering helium gas sent to the adsorber by the supply line to the suction side of the compressor. Device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63125760A JP2644823B2 (en) | 1988-05-25 | 1988-05-25 | Regeneration method of helium gas purification adsorber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63125760A JP2644823B2 (en) | 1988-05-25 | 1988-05-25 | Regeneration method of helium gas purification adsorber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01297120A true JPH01297120A (en) | 1989-11-30 |
| JP2644823B2 JP2644823B2 (en) | 1997-08-25 |
Family
ID=14918142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63125760A Expired - Lifetime JP2644823B2 (en) | 1988-05-25 | 1988-05-25 | Regeneration method of helium gas purification adsorber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2644823B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014121677A (en) * | 2012-12-21 | 2014-07-03 | Japan Organo Co Ltd | Regenerator of adsorbent, regeneration method of adsorbent, carbon dioxide purifier, and carbon dioxide purification method |
| CN113247872A (en) * | 2021-05-31 | 2021-08-13 | 安徽中科皖能科技有限公司 | Recovery and purification device of low-concentration helium |
| CN113731107A (en) * | 2021-10-11 | 2021-12-03 | 北京中科富海低温科技有限公司 | Online regeneration system |
| CN114111219A (en) * | 2021-11-02 | 2022-03-01 | 深圳供电局有限公司 | Gas purification device based on low-temperature refrigerator |
| CN115282747A (en) * | 2022-08-03 | 2022-11-04 | 中国石油化工股份有限公司 | Emergency treatment method for purifier in air separation device |
-
1988
- 1988-05-25 JP JP63125760A patent/JP2644823B2/en not_active Expired - Lifetime
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014121677A (en) * | 2012-12-21 | 2014-07-03 | Japan Organo Co Ltd | Regenerator of adsorbent, regeneration method of adsorbent, carbon dioxide purifier, and carbon dioxide purification method |
| CN113247872A (en) * | 2021-05-31 | 2021-08-13 | 安徽中科皖能科技有限公司 | Recovery and purification device of low-concentration helium |
| CN113731107A (en) * | 2021-10-11 | 2021-12-03 | 北京中科富海低温科技有限公司 | Online regeneration system |
| CN113731107B (en) * | 2021-10-11 | 2023-06-16 | 北京中科富海低温科技有限公司 | Online regeneration system |
| CN114111219A (en) * | 2021-11-02 | 2022-03-01 | 深圳供电局有限公司 | Gas purification device based on low-temperature refrigerator |
| CN115282747A (en) * | 2022-08-03 | 2022-11-04 | 中国石油化工股份有限公司 | Emergency treatment method for purifier in air separation device |
| CN115282747B (en) * | 2022-08-03 | 2024-02-13 | 中国石油化工股份有限公司 | Emergency treatment method for purifier in air separation device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2644823B2 (en) | 1997-08-25 |
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