JPH01296429A - Recording medium and its production - Google Patents
Recording medium and its productionInfo
- Publication number
- JPH01296429A JPH01296429A JP63126404A JP12640488A JPH01296429A JP H01296429 A JPH01296429 A JP H01296429A JP 63126404 A JP63126404 A JP 63126404A JP 12640488 A JP12640488 A JP 12640488A JP H01296429 A JPH01296429 A JP H01296429A
- Authority
- JP
- Japan
- Prior art keywords
- recording medium
- magnetic recording
- monomolecular
- recording layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000000034 method Methods 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 239000004094 surface-active agent Substances 0.000 claims abstract description 14
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910000077 silane Inorganic materials 0.000 claims abstract description 13
- 230000001681 protective effect Effects 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 5
- 238000009832 plasma treatment Methods 0.000 claims abstract description 4
- 239000012298 atmosphere Substances 0.000 claims abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 150000004668 long chain fatty acids Chemical class 0.000 claims description 3
- 239000012780 transparent material Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 8
- 239000002356 single layer Substances 0.000 claims 4
- 239000012190 activator Substances 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 2
- 239000001301 oxygen Substances 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 235000014113 dietary fatty acids Nutrition 0.000 claims 1
- 229930195729 fatty acid Natural products 0.000 claims 1
- 239000000194 fatty acid Substances 0.000 claims 1
- 150000004665 fatty acids Chemical class 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000001179 sorption measurement Methods 0.000 abstract description 7
- 238000007740 vapor deposition Methods 0.000 abstract description 6
- 239000003795 chemical substances by application Substances 0.000 abstract description 2
- 238000004544 sputter deposition Methods 0.000 abstract description 2
- 230000003213 activating effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 30
- 230000001186 cumulative effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000006247 magnetic powder Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910017709 Ni Co Inorganic materials 0.000 description 1
- 229910003267 Ni-Co Inorganic materials 0.000 description 1
- 229910003262 Ni‐Co Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- LLCSWKVOHICRDD-UHFFFAOYSA-N buta-1,3-diyne Chemical group C#CC#C LLCSWKVOHICRDD-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- -1 methyl isobutyl Chemical group 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、考魂記録媒体及びその製造方法に関するもの
である。さらに詳しくは、磁気テープ、磁気ディスク、
磁気カード、光磁気ディスク等の磁気記録媒体の記録層
の保護膜形成方法及びその方法を用いて製造される磁気
記録媒体に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a soul-contemplative recording medium and a method for manufacturing the same. For more information, please refer to magnetic tape, magnetic disk,
The present invention relates to a method for forming a protective film on a recording layer of a magnetic recording medium such as a magnetic card or a magneto-optical disk, and a magnetic recording medium manufactured using the method.
従来の技術
従来より、磁気記録媒体には、大きく分けて塗布型と蒸
着型がある。2. Description of the Related Art Conventionally, magnetic recording media can be roughly divided into coating type and vapor deposition type.
塗布型の磁気記録媒体では、一般にFe2O3やCOを
添加したγ−F e203等の磁性粉末をポリビニール
・ブチラール、 トルエン、メチルイソブチル等のに混
合物に混合分散して塗料化し、媒体基体表面に4〜5μ
mの厚みで塗布する方法である。In coating-type magnetic recording media, magnetic powder such as γ-Fe203 containing Fe2O3 or CO is generally mixed and dispersed in a mixture of polyvinyl butyral, toluene, methyl isobutyl, etc. to form a paint, and 4 is applied to the surface of the media substrate. ~5μ
This is a method of coating with a thickness of m.
発明が解決しようとした課題
この方法では製造が容易である反面、磁性粉末を小さく
することに限界があり、高密度記録用としては性能が不
十分であった。Problems to be Solved by the Invention Although this method is easy to manufacture, there is a limit to the size of the magnetic powder, and the performance is insufficient for high-density recording.
一方、蒸着型の記録媒体では、記録密度は塗布型に比べ
良くなるが、磁性金属層が表面に出ているため耐久性に
問題がある。そこで、1000〜2000の金属を電子
ビームやスッパタ法で蒸着した上へ、オーバーコートを
行い、さらに磁気記録媒体表面に潤滑性を与えるために
滑剤を塗布しているが、まだ十分な耐久性が得られてい
ない現状である。さらに、オーバーコートや滑剤の塗布
を薄く均一に行えないため、記録用磁気ヘッドと記録層
のギャップが大きくなり、蒸着型本来の高密度記録が十
分発揮できない状況である。On the other hand, vapor deposition type recording media have better recording density than coating type recording media, but have problems with durability because the magnetic metal layer is exposed on the surface. Therefore, metals of 1,000 to 2,000% are deposited by electron beam or sputtering, overcoated, and a lubricant is applied to provide lubricity to the surface of the magnetic recording medium, but the durability is still insufficient. The current situation is that this has not been achieved. Furthermore, since the overcoat or lubricant cannot be applied thinly and uniformly, the gap between the recording magnetic head and the recording layer becomes large, making it impossible to fully utilize the high-density recording inherent to the vapor deposition type.
以上述べてきた従来法の欠点に鑑み、本発明の目的は、
オーバーコートや滑剤をより薄く均一に且つピンホール
無く行う方法を提供し、蒸着型磁気記録媒体の信頼性を
向上させると共に高密度記録を実現することにある。In view of the drawbacks of the conventional methods described above, the purpose of the present invention is to:
The object of the present invention is to provide a method for applying an overcoat and a lubricant thinner, more uniformly, and without pinholes, thereby improving the reliability of vapor-deposited magnetic recording media and realizing high-density recording.
課題を解決するための手段
本発明は、媒体基体上に蒸着形成された磁気記録層の表
面に直接または間接にシラン界面活性剤よりなる単分子
を形成するもので、その方法はシラン界面活性剤を単分
子状に化学吸着させる工程と、膜形成後さらに所定のガ
スを含む雰囲気中でエネルギー線(光、電子ビーム、X
線、γ線、イオンビーム等)を照射、あるいはプラズマ
処理を行うこと等によりシラン界面活性剤の感応基を変
性させる工程とを含み、これらの工程を複数回交互に行
う等の方法により複数層の単分子膜が保護膜として形成
されていることを特徴とした高密度記録媒体を提供する
ものである。Means for Solving the Problems The present invention forms a single molecule of a silane surfactant directly or indirectly on the surface of a magnetic recording layer formed by vapor deposition on a media substrate. After the film is formed, energy rays (light, electron beam,
rays, gamma rays, ion beams, etc.) or plasma treatment to modify the sensitive groups of the silane surfactant. The present invention provides a high-density recording medium characterized in that a monomolecular film of is formed as a protective film.
作用
本発明によれば、磁気記録媒体の表面に複数層の単分子
保護膜が互いに層間で化学結合した状態の高密度の有機
薄膜を、ピンホールなくかつ均一な厚みで非常に薄く形
成でき、高性能な表面保護膜を形成することが可能とな
る。According to the present invention, it is possible to form a very thin, high-density organic thin film with a uniform thickness and no pinholes on the surface of a magnetic recording medium, in which a plurality of monomolecular protective films are chemically bonded between the layers. It becomes possible to form a high-performance surface protection film.
実施例 以下、実施例を第1〜7図を用いて説明する。Example Examples will be described below using FIGS. 1 to 7.
例えば、第1図に示すように、磁気記録用ディスク基板
(媒体基体)1上にスッパタ法等により磁気記録層2(
Fe−Ni1 Ni−Co・旧・・等の磁性金属や磁性
金属酸化膜)を形成した後、シラン界面活性剤としてC
H2”CH−(CH2)n−8i Cla (。:整数
。10〜20程度が最も扱いやすい)を用い、2 X
10−3〜5 X 10−2Mol/1程度の濃度で溶
かした80%n−へキサン、12%四塩化炭素、8%ク
ロロホルム溶液を調整し、前記磁気記録層の形成された
媒体基体を浸漬すると、磁気記録層として蒸着された金
属表面はナチュラルオキサイドが形成されているので表
面で
シラン界面活性剤による単分子吸着膜3が一層(20〜
30 の厚み)形成される。For example, as shown in FIG. 1, a magnetic recording layer 2 (
After forming a magnetic metal (such as Fe-Ni1 Ni-Co, old... or magnetic metal oxide film), C is added as a silane surfactant.
Using H2"CH-(CH2)n-8i Cla (.: an integer. About 10 to 20 is easiest to handle), 2
A solution of 80% n-hexane, 12% carbon tetrachloride, and 8% chloroform dissolved at a concentration of about 10-3 to 5 x 10-2 Mol/1 is prepared, and the medium substrate on which the magnetic recording layer is formed is immersed. Then, since natural oxide is formed on the metal surface deposited as the magnetic recording layer, a monomolecular adsorption film 3 made of silane surfactant is formed on the surface (20~
30 mm thick) is formed.
次に、酸素あるいはN2を含んだ雰囲気中で(空気中で
もよい)ビニル基4 (CHp=CH−)をエネルギー
線(電子線、X線、γ線、紫外線、イオン線)で照射し
、ビニル基4に水酸(−OH)基5(第3図)あるいは
アミン(−N H2)基6(第4図)を付加させる。な
お、これらの感応基がビニル基に付加することはFTI
R分析により確認された。また、このとき表面に並んだ
ビニル基は、02やN2を含んだプラズマ中で処理する
方法でも−OH基や−NH2基の付加を行うことができ
る。以下、同じ反応液を用い化学吸着工程およびOH基
あるいはNN2基イτ1加工程を繰り返すことにより、
磁気記録媒体等の表面に複数層の単分子膜が互いに層間
で化学結合した状態の高密度の単分子累積膜7(保護膜
8(第1図))を得ることができる。(第5図及び第6
図)更に、最終層にFを含んだ単分子膜を形成しようと
した場合には、最終の吸着工程で試薬としてCF3−C
F2− (CH2) l1l−8i C13等Fを含ん
だンリコン界面活性剤を用いて化学吸着を行ったり、或
は成膜を終えた後、さらに最表面の単分子膜をフッ素を
含むカス中でプラズマ処理することにより表面にFを含
む単分子累積膜を形成できる。Next, the vinyl group 4 (CHp=CH-) is irradiated with an energy beam (electron beam, A hydroxyl (-OH) group 5 (Figure 3) or an amine (-NH2) group 6 (Figure 4) is added to 4. Note that the addition of these sensitive groups to vinyl groups is called FTI.
Confirmed by R analysis. In addition, -OH groups and -NH2 groups can be added to the vinyl groups arranged on the surface at this time by processing in plasma containing O2 and N2. By repeating the chemisorption step and the τ1 processing step for OH groups or NN2 groups using the same reaction solution,
A high-density monomolecular cumulative film 7 (protective film 8 (FIG. 1)) in which a plurality of monomolecular films are chemically bonded to each other can be obtained on the surface of a magnetic recording medium or the like. (Figures 5 and 6
Figure) Furthermore, when attempting to form a monomolecular film containing F in the final layer, it is necessary to use CF3-C as a reagent in the final adsorption step.
F2- (CH2) l1l-8i Chemical adsorption is performed using a surfactant containing F such as C13, or after film formation, the outermost monomolecular film is further deposited in a fluorine-containing residue. By plasma treatment, a monomolecular cumulative film containing F can be formed on the surface.
一方、シラン界面活性剤を一層化学吸着法で形成した基
板を長鎖脂肪酸(例えば、CH2−(CH2)。−CO
OHl 。は10〜25)あるいは、長鎖アルコール
(例えば、CH3−(CH2)。−0H1。は10〜2
5)を溶かした水溶液中に浸せきすることにより、長鎖
脂肪酸あるいは長鎖アルコールの単分子膜をさらに一層
前記シラン界面活性剤よりなる単分子膜表面に吸着形成
できる。On the other hand, a substrate on which a silane surfactant was formed by a chemical adsorption method was coated with a long-chain fatty acid (e.g., CH2-(CH2).-CO
OHl. is 10-25) or a long-chain alcohol (e.g. CH3-(CH2).-0H1. is 10-2
By immersing it in an aqueous solution containing 5), a monomolecular film of long-chain fatty acids or long-chain alcohols can be further adsorbed and formed on the surface of the monomolecular film made of the silane surfactant.
例えば、CN3−(CN2)IT−OHを10−5mo
l/l溶かした水溶液中に10°Cで30分浸せきする
と長鎖アルコールの単分子膜がOH基を表にして一層長
鎖アルコールの単分子膜9を吸着形成できる。For example, 10-5 mo of CN3-(CN2)IT-OH
By immersing it in an aqueous solution containing l/l at 10° C. for 30 minutes, a monomolecular film 9 of long-chain alcohol can be formed by adsorption with the OH groups facing up.
(第7図)
なお、上記実施例では、直接磁気記録媒体表面に単分子
累積膜を形成した例を示したが、磁気記録媒体上にCや
Wl Mo等の物質を蒸着しこれらの膜を介して単分子
累積膜を形成しても同じ効果が得られることは言うまで
もない。また、磁気ディスクを例にして説明したが、磁
気テープ、磁気カード、さらに媒体基体にPMMA等の
透明体を用いれば光磁気記録媒体へ応用できることも言
うまでもない。(Figure 7) In the above example, an example was shown in which a monomolecular cumulative film was formed directly on the surface of a magnetic recording medium, but it is also possible to deposit a substance such as C or WlMo on the magnetic recording medium to form these films. It goes without saying that the same effect can be obtained even if a monomolecular cumulative film is formed through the oxide film. Furthermore, although the description has been made using a magnetic disk as an example, it goes without saying that the present invention can also be applied to magnetic tape, magnetic cards, and magneto-optical recording media if a transparent material such as PMMA is used as the medium base.
また、本方法は、磁気記録媒体の保護膜形成以外にも、
光記録媒体や半導体素子の保護膜としても応用可能であ
る。In addition to forming a protective film on magnetic recording media, this method can also be used to
It can also be applied as a protective film for optical recording media and semiconductor devices.
発明の効果
以上述べてきた本発明により、磁気記録媒体等の表面に
複数層の単分子保護膜が互いに層間で化学結合した状態
の高密度の有機薄膜をピンホール無く、かつ均一な厚み
て、非常に薄(形成できる。Effects of the Invention According to the present invention described above, a high-density organic thin film in which a plurality of monomolecular protective films are chemically bonded to each other on the surface of a magnetic recording medium etc. can be formed without pinholes and with a uniform thickness. Very thin (can be formed.
従って、基体が磁気記録媒体等の場合、記録再生ヘッド
の効率が向上し、ノイズも減少でき、効果大なるもので
ある。すなわち、本発明の方法により基体表面に複数層
の単分子膜よりなる超薄膜を化学吸着することにより、
ピンホールフリーで均一な膜厚の有機保護膜が得られる
。さらに有機薄膜表面にFを含ませることにより、保護
膜に滑性を持たせることができ、ヘッドの滑り性が向上
される。従って、耐摩耗性向上効果大なるものである。Therefore, when the substrate is a magnetic recording medium or the like, the efficiency of the recording/reproducing head can be improved and noise can be reduced, which is a great effect. That is, by chemically adsorbing an ultra-thin film consisting of multiple monomolecular films onto the surface of a substrate using the method of the present invention,
A pinhole-free organic protective film with a uniform thickness can be obtained. Furthermore, by including F in the surface of the organic thin film, the protective film can be given slipperiness, and the slipperiness of the head can be improved. Therefore, the effect of improving wear resistance is significant.
以」二、述べてきた実施例は、基体として磁気記録媒体
を用いて説明してきたが、光ディスク、レフード等耐摩
耗性を向上したり、表面保護を目的とした全てのものに
使用できることは明かである。2. The embodiments described above have been explained using a magnetic recording medium as the substrate, but it is clear that the present invention can be used for optical disks, re-hoods, and any other device that aims to improve wear resistance or protect the surface. It is.
なお、化学吸着用の材料として、ジアセチレン系の誘導
体〔例えば、CH2=CH−(CH2)。−CC−CC
−(CH2)II−3i Cla (nl、:整数)等
]を用いた場合には、紫外線照射により架橋を生成させ
面方向の導電性を持たすことができ、基体表面の帯電を
防止することも可能である。Note that diacetylene derivatives [for example, CH2=CH-(CH2)] can be used as materials for chemisorption. -CC-CC
-(CH2)II-3i Cla (nl, : integer), etc.), crosslinking can be generated by ultraviolet irradiation to provide in-plane conductivity, and it is also possible to prevent charging of the substrate surface. It is possible.
第1図〜第7図は本発明の詳細な説明するための磁気記
録媒体断面図を示し、第1図は概念図、第2図〜第7図
は第1図中O印A部を分子レベルまで拡大した工程断面
図である。
1・・・・・・媒体基体、2・・・・・・磁気記録層、
3・・・・・・単分子吸着膜、4・・・・・・ビニル基
、5・・・・・・水酸基、6・・・・・・アミノ基、7
・・・・・・単分子累積膜、8・・・・・・長鎖アルコ
ールの単分子膜。
代理人の氏名 弁理士 中尾敏男 ほか1名出語
城 憾
0ト
惺 城
懺 惺
し)1 to 7 show cross-sectional views of a magnetic recording medium for explaining the present invention in detail, FIG. 1 is a conceptual diagram, and FIGS. 2 to 7 show a portion A in FIG. It is a process sectional view enlarged to the level. 1... Media base, 2... Magnetic recording layer,
3... Monomolecular adsorption membrane, 4... Vinyl group, 5... Hydroxyl group, 6... Amino group, 7
... Monomolecular cumulative film, 8... Monomolecular film of long chain alcohol. Name of agent: Patent attorney Toshio Nakao and one other person
Claims (8)
ン界面活性剤よりなる単分子膜が複数層直接または間接
に形成されていることを特徴とした記録媒体。(1) A recording medium characterized in that a plurality of monomolecular films made of a silane surfactant are directly or indirectly formed on the surface of a recording layer formed on an arbitrary medium substrate.
ていることを特徴とした特許請求の範囲第1項記載の記
録媒体。(2) The recording medium according to claim 1, wherein the plurality of monomolecular protective films are chemically bonded to each other between the layers.
した特許請求の範囲第1項または第2項記載の記録媒体
。(3) The recording medium according to claim 1 or 2, wherein the uppermost monomolecular film contains F.
特徴とした特許請求の範囲第1項記載の記録媒体。(4) The recording medium according to claim 1, wherein the uppermost monomolecular film contains an -OH group.
界面活性剤を化学吸着させ、前記記録層上に直接または
間接に前記活性剤のシリコンと記録層上の酸素を化学結
合させて、単分子膜を一層形成する工程と、一層単分子
膜を形成した後、N_2又はO_2を含むガス雰囲気中
で高エネルギービームを照射するか又はプラズマ処理し
た後シラン界面活性剤を化学吸着させる工程を、複数回
繰り返すことを特徴とした記録媒体の製造方法。(5) forming a recording layer on the surface of the medium substrate, chemically adsorbing a silane surfactant, and chemically bonding silicon of the activator and oxygen on the recording layer directly or indirectly onto the recording layer; A step of forming a single layer of a monomolecular film, and a step of chemically adsorbing a silane surfactant after forming a single layer of a monomolecular film, irradiating it with a high energy beam in a gas atmosphere containing N_2 or O_2 or performing plasma treatment. , a method for manufacturing a recording medium characterized by repeating the process multiple times.
H_2)_n−SiCl_3(n:整数)で表される化
学物質を用いることを特徴とした特許請求の範囲第5項
記載の記録媒体の製造方法。(6) As a silane surfactant, CH_2=CH-(C
The method for manufacturing a recording medium according to claim 5, characterized in that a chemical substance represented by H_2)_n-SiCl_3 (n: an integer) is used.
を特徴とした特許請求の範囲第6項記載の記録媒体の製
造方法。(7) The method for manufacturing a recording medium according to claim 6, characterized in that an optically transparent material is used as the medium substrate.
界面活性剤と化学吸着させ前記活性剤のシリコンと記録
層上の酸素を化学結合させて単分子膜を一層形成する工
程と、長鎖脂肪酸又は長鎖アルコールを溶解した水溶液
に浸せきし、さらにもう一層の長鎖脂肪酸又はアルコー
ル単分子膜を吸着累積する工程を含むことを特徴とした
記録媒体の製造方法。(8) a step of forming a recording layer on the surface of the medium substrate; a step of chemically adsorbing a silane surfactant and chemically bonding silicon of the activator with oxygen on the recording layer to form a monolayer layer; A method for producing a recording medium, comprising the steps of immersing it in an aqueous solution in which a chain fatty acid or long chain alcohol is dissolved, and further adsorbing and accumulating another long chain fatty acid or alcohol monolayer.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63126404A JP2532577B2 (en) | 1988-05-24 | 1988-05-24 | Recording medium manufacturing method |
US07/354,240 US4992300A (en) | 1988-05-24 | 1989-05-19 | Manufacturing method for a recording medium or a recording head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63126404A JP2532577B2 (en) | 1988-05-24 | 1988-05-24 | Recording medium manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01296429A true JPH01296429A (en) | 1989-11-29 |
JP2532577B2 JP2532577B2 (en) | 1996-09-11 |
Family
ID=14934316
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63126404A Expired - Fee Related JP2532577B2 (en) | 1988-05-24 | 1988-05-24 | Recording medium manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2532577B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001001403A1 (en) * | 1999-06-24 | 2001-01-04 | Fujitsu Limited | Production method of magnetic recording medium and magnetic recording medium produced by this method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61122925A (en) * | 1984-11-19 | 1986-06-10 | Matsushita Electric Ind Co Ltd | Magnetic recording medium and its production |
-
1988
- 1988-05-24 JP JP63126404A patent/JP2532577B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61122925A (en) * | 1984-11-19 | 1986-06-10 | Matsushita Electric Ind Co Ltd | Magnetic recording medium and its production |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001001403A1 (en) * | 1999-06-24 | 2001-01-04 | Fujitsu Limited | Production method of magnetic recording medium and magnetic recording medium produced by this method |
US6878398B2 (en) | 1999-06-24 | 2005-04-12 | Fujitsu Limited | Method of manufacturing magnetic recording medium and the magnetic recording medium |
US6890585B2 (en) | 1999-06-24 | 2005-05-10 | Fujitsu Limited | Method of manufacturing magnetic recording medium and the magnetic recording medium |
Also Published As
Publication number | Publication date |
---|---|
JP2532577B2 (en) | 1996-09-11 |
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