JPH01287275A - Continuous vacuum vapor deposition apparatus - Google Patents
Continuous vacuum vapor deposition apparatusInfo
- Publication number
- JPH01287275A JPH01287275A JP63113469A JP11346988A JPH01287275A JP H01287275 A JPH01287275 A JP H01287275A JP 63113469 A JP63113469 A JP 63113469A JP 11346988 A JP11346988 A JP 11346988A JP H01287275 A JPH01287275 A JP H01287275A
- Authority
- JP
- Japan
- Prior art keywords
- rolls
- roll
- sealing
- substrate
- vacuum chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title description 4
- 238000007789 sealing Methods 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 238000007738 vacuum evaporation Methods 0.000 claims description 6
- 238000001771 vacuum deposition Methods 0.000 claims description 5
- 230000032258 transport Effects 0.000 claims 1
- 238000004804 winding Methods 0.000 abstract description 7
- 230000037303 wrinkles Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 14
- 239000007789 gas Substances 0.000 description 11
- 238000011144 upstream manufacturing Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、グラスチックフィルム、紙寺の用撓件のある
走行基板に連続的に真空蒸着する装置に関し、符に好ま
しいシール装置金偏えた上記装置に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a device for continuous vacuum deposition on a flexible traveling substrate such as a glass film or a paper film. The present invention relates to the above device.
従来は、グラスチックフィルム、紙寺に対する真空蒸着
はバッチ方式で行なわれていたため、連続真空シール装
置は知られていない。ここでは参考として鋼板を対象と
した連続真空シール装置を第６図に示す。Conventionally, vacuum deposition on glass films and paper films has been carried out in a batch manner, so continuous vacuum sealing equipment has not been known. For reference, a continuous vacuum sealing device for steel plates is shown in FIG. 6.
第６図において、１は走行基板、２ａ、２ｂ。In FIG. 6, 1 is a running board, 2a, 2b.
２ ｃ 、−は入１μｍ１シールロール、３ａ 、 ３
ｂ 、 ３ｃ 。2 c, - 1 μm 1 seal roll, 3a, 3
b, 3c.
・・・ｉｄ 出ｌ１１１１シールロール、４ａ、４ｂ、
４ｃ、・・・ハ兵空ボング、５は蒸着装置、６ａ、６ｂ
、６ｃ、・・・は圧力室、７は蒸着室、８はデフレクタ
−ロール、９は巻付ロールである。...id Out 1111 seal roll, 4a, 4b,
4c, . . . Hairobong bong, 5 is vapor deposition equipment, 6a, 6b
, 6c, . . . are pressure chambers, 7 is a vapor deposition chamber, 8 is a deflector roll, and 9 is a winding roll.
走行基板１は、一対のピンチロールで構成されたシール
ロール２ａ、２ｂ、２ｃ、・・・で仕切られた圧力室６
ａ 、 ６ｂ、 ６ｃ 、・・・を経て、ノブ「定の真
空度に保たれた蒸着室７に達し、該蒸着室７内で蒸着装
置５によって蒸着めっきされた後、出側シールロール３
２Ｌ、３ｂ、３ｃ、゛・全経て、大気中へ搬出される。The running board 1 has a pressure chamber 6 partitioned by seal rolls 2a, 2b, 2c, . . . each consisting of a pair of pinch rolls.
a, 6b, 6c, .
2L, 3b, 3c, ゛・All are carried out into the atmosphere.
各シールロールの詳ａを第７図ｔＡＩと、第７回内のｍ
−ｍ線断面矢視図である第７図（Ｂｌに示す。The details of each seal roll are shown in Figure 7 tAI and m in the 7th issue.
FIG. 7 (shown in Bl) is a cross-sectional view taken along the -m line.
第７図ＦＡｌ ｌ ＣＢ＋において、１１．１２は一対
のピンチロール、１４はシールパー、１６はケーシング
、１７は上流側圧力室、１８は下流側圧力室、＋９ａ、
１９ｂ、１９ｃ はリーク隙間、すなわち１９ａはピ
ンチロール１１とシールパー１４との隙間、１９ｂはピ
ンチロール１１の軸端とケーシング１６との隙間、１９
Ｃはピンチロール１１及び１２の間で走行基板１が存在
していない部分の隙間である。In FIG. 7 FAl l CB+, 11.12 is a pair of pinch rolls, 14 is a sealer, 16 is a casing, 17 is an upstream pressure chamber, 18 is a downstream pressure chamber, +9a,
19b and 19c are leak gaps, 19a is a gap between the pinch roll 11 and the sealer 14, 19b is a gap between the shaft end of the pinch roll 11 and the casing 16, 19
C is a gap between the pinch rolls 11 and 12 where the running substrate 1 is not present.
上流側圧力室１７と下ｉｔ １ｔｌｌ圧力室１８とはピ
ンチロール１１．１２及びシールパー１４とで仕切られ
、上記の僅かなリーク隙間＋ ９ａ 、 ｊ９ｂ。The upstream pressure chamber 17 and the lower pressure chamber 18 are separated by pinch rolls 11, 12 and sealers 14, with the above-mentioned slight leak gaps +9a and j9b.
１９Ｃ’ｅ）Ｍｉって上流側から下流側へガスが１ｆｉ
Ｑれる。19C'e)Mi is 1fi of gas from the upstream side to the downstream side
Q can be done.
第６図及び第７図にン罫したような従来の構成の真空シ
ール装置ではリーク隙間＋９ａ〜１９Ｃ１ＩｌＩＩ核を
小さくして、下流側から下流側−・流れるガス流賞盆小
さくすることか、Ａ窒ボング４ａ。In a vacuum sealing device with a conventional configuration as shown in Figs. 6 and 7, it is necessary to reduce the leak gap +9a to 19C1IlII nucleus and make the gas flow flowing from the downstream side to the downstream side smaller.A Nitrogen bong 4a.
４ｂ 、 ４ｃ・・・の容量を小さく抑えるために必妙
である。This is necessary in order to keep the capacity of 4b, 4c, etc. small.
しかしながら、回転するピンチロール１１゜１２と固定
されたシールパー１４あるいはり一一シング１６との曲
の隙間は接触防止のため成る一定値以上小さくすること
かできず、リーク隙間曲損を小さくするには限界があっ
た。However, the curved gap between the rotating pinch rolls 11 and 12 and the fixed sealer 14 or gripper 16 cannot be made smaller than a certain value to prevent contact, and it is difficult to reduce the leakage gap bending damage. had its limits.
１だ、リーク隙間をガスが流れるときりこ走行基板１の
ばたつきが発生し、走行基板１のしわの発生、走行基板
１の切断につながる虞れが強かった。No. 1, when the gas flows through the leak gap, the sliding board 1 flutters, and there is a strong possibility that the running board 1 will wrinkle or be cut.
本発明は、リーク隙間面ｆｆｔ’ｒ極力小さくし、この
隙間へガスが流れるのを極力抑えて、上記した走行基板
のばたつき寺が発生しないシール装置を備えた連続真空
蒸着装隨全提案することを目的とする。The present invention proposes a continuous vacuum evaporation system equipped with a sealing device that minimizes the leakage gap surface fft'r, suppresses the flow of gas into this gap as much as possible, and prevents the above-mentioned flapping of the running board from occurring. With the goal.
本発明は、上記問題点を、走行基板全連続的に大気中か
ら真空室に導き、該真空室にて該走行基板に−Ａ空蒸庸
を施した後、大気中に搬出する連続真空蒸着装置におい
て、
（１）大気からＭｌｌ記章空室１全シールロールによっ
て複数の圧力室に区切り、各シールロールは３本１組の
ピンチロールによって構成さぺかつ前記走行基板が該シ
ールロールに対して巻付角１０度以上で奉伺くようにし
てなるか、あるいは（２）大気から前記真空室までをシ
ール装置によって複数の圧力室に区分し、各シール装置
は、１本のシールロールおよび該シールロールの両側に
設置されたシールパーから構成され、かつ該シールロー
ルの両側に前記走行基板がそれぞれ巻付角１０度以上で
巻付くようにしてなることを％徴とする連続真空蒸着装
置によｐ解決するものである。The present invention solves the above-mentioned problem by continuous vacuum evaporation, in which the entire running substrate is continuously guided from the atmosphere into a vacuum chamber, the running substrate is subjected to -A air evaporation in the vacuum chamber, and then carried out into the atmosphere. In the apparatus, (1) Mll insignia vacancy 1 is separated from the atmosphere into a plurality of pressure chambers by all sealing rolls, each sealing roll is composed of a set of three pinch rolls, and the running substrate is connected to the sealing roll. (2) The space from the atmosphere to the vacuum chamber is divided into a plurality of pressure chambers by a sealing device, and each sealing device consists of one seal roll and the pressure chamber. A continuous vacuum evaporation apparatus is used, which is composed of sealers installed on both sides of a seal roll, and characterized in that the traveling substrate is wrapped around each side of the seal roll at a wrapping angle of 10 degrees or more. p.
本発明は、上流側シールロールと下流側シールロール全
一体化し、シールロールの本ａ全減らしたことによって
、合計のシール隙間の箇所が減るので、構造的にシール
隙間面積が減少する。従って、シール性能が向上し、真
空ポンプ容量が低減する。In the present invention, the upstream seal roll and the downstream seal roll are all integrated, and the number of seal rolls is completely reduced, thereby reducing the total number of seal gaps, and structurally reducing the seal gap area. Therefore, sealing performance is improved and vacuum pump capacity is reduced.
また本発明は、シールロールに走行基板を巻付けるため
、リークガス流れの影響の大きいシールロール付近での
走行基板のばたつきが発生しない。Further, in the present invention, since the running substrate is wound around the seal roll, the running substrate does not fluctuate in the vicinity of the seal roll where the influence of leak gas flow is large.
第１図及び第２図（Ａｌ ｌ ＣＢ＋は本発明装置の一
例をン廖す図である。FIGS. 1 and 2 (Al CB+ are diagrams showing an example of the apparatus of the present invention.
第１図は全体説明図、第２回置は第１図の一部詳細図、
第２図ｔＢｌは第２回置の１−１線断面矢視図である。Figure 1 is an overall explanatory diagram, and the second illustration is a detailed diagram of a part of Figure 1.
FIG. 2 tBl is a sectional view taken along the line 1-1 of the second rotation.
第１図において、第６，７図と同一符号は第６，７図と
同一部全７ハし、２’ａ、 ２’ｂ、 ２’ｃ −は
３本−組のピンチロールで構成されるシールロールであ
り、入側シールロール及び出側シールロール全兼ねてい
る。In Fig. 1, the same numbers as in Figs. 6 and 7 are the same as in Figs. 6 and 7. It is a seal roll that serves as both an inlet seal roll and an outlet seal roll.
これらのシールロールは、第２図囚、（Ｂ）に示すよう
に、６本−組のピンチロール１１’、＋２’。These seal rolls are a set of six pinch rolls 11' and +2', as shown in FIG. 2 (B).
１３′で構成され、ピンチロール１１′と１６′が図示
しない駆動装置で回転駆動される。このように６本−組
のビチロールからなるシールロールＶＣよれば、合計の
リーク隙間＋９ａ〜ｊ９ｃの′爾ル「が従来の構造に比
べて減少するため、構造的にリーク隙間面積の合計（１
［１を低減することができ、シール性能が向上する。13', and pinch rolls 11' and 16' are rotationally driven by a drive device (not shown). In this way, according to the seal roll VC consisting of a set of 6 bity rolls, the total leak gap +9a to j9c is reduced compared to the conventional structure, so the total leak gap area (1
[1 can be reduced, and the sealing performance is improved.
また、第１図に示すように、各シールロール間（すなわ
ち各圧力室６ａ、６ｂ、６ｃ・・・内）に設けられたガ
イドロール２０ａ、２［］ｂ、２０ｃ・・・に工り走行
基板１のシールロールへの巻付角が一定以上を確保して
おり、万一リークガスが発生してもリークガスＶこよる
走行基板１のばたつきは極く少い。In addition, as shown in FIG. The wrapping angle of the substrate 1 around the seal roll is ensured to be above a certain level, and even if leak gas occurs, the movement of the running substrate 1 due to the leak gas V is extremely small.
本発明者らの実験によれば、この巻付角は、第６図（Ａ
ｌに示すようＶこ、１０度以上が過当であり、１０度以
上で巻付けば走行基板のばたつきは問題なくなる。According to the experiments conducted by the inventors, this wrapping angle is as shown in Fig. 6 (A
As shown in Figure 1, a V of 10 degrees or more is excessive, and if the winding is 10 degrees or more, there will be no problem with the traveling board flapping.
なお、第３図（Ａｌは、第５図（Ｂｌに７］＼す喪顯で
実験した結果、得られたものである。すなわち、ｍ３図
（Ｂｌにおいて、直径８０１１１１のシールロール１０
１と直径９０１Ｍｎのシールロール１０２０間に幅４０
０駄で厚さが１２μｍと２０ ｌＩｍの２枚のフィルム
（走行基板）１を各々走行きせる。In addition, Fig. 3 (Al is obtained as a result of an experiment in Fig. 5 (7 in Bl)\Mourning. In other words, in Fig. m3 (Bl, seal roll 10 with a diameter of 801111
1 and a seal roll 1020 with a diameter of 901 Mn, the width is 40 mm.
Two films (traveling substrates) 1 with thicknesses of 12 μm and 20 μm are respectively run.
そして、真空室１０５内のカイトロール＋０３と大気中
のガイドロール１０４とを矢印α間ケ４１ 動すセてフ
ィルム１のシールロール＋０＋への巻付角ｋＷ史し、点
線βの部分のフィルム１のばたつき状態（振幅）を目視
評価した。このとき、シールロール１０１，１０２前後
の出力が、該シールロール１０１，１０２曲を通過する
ガス流量が最大で、フィルムのはたっきに対し最も厳し
い条件である大気圧と３６０１−−ルとなるように、真
空室１０５内を矢印γ方向へルーツ型真空ポンプで排気
し、該真空室１０５の圧力を６６０トールに調整した。Then, the winding angle kW of the film 1 on the seal roll +0+ is determined between the arrow α between the kite roll +03 in the vacuum chamber 105 and the guide roll 104 in the atmosphere, and the film 1 in the part indicated by the dotted line β The fluttering state (amplitude) was visually evaluated. At this time, the output before and after the sealing rolls 101 and 102 is equal to atmospheric pressure and 3601-rel, which is the maximum gas flow rate passing through the sealing rolls 101 and 102 and the most severe condition for film flickering. The inside of the vacuum chamber 105 was evacuated in the direction of the arrow γ using a Roots-type vacuum pump, and the pressure of the vacuum chamber 105 was adjusted to 660 Torr.
第４図及び第５図（Ａｌ 、 （Ｂｌは、本発明装置の
他の例を示す図である。FIGS. 4 and 5 (Al, (Bl) are diagrams showing other examples of the device of the present invention.
第４図は全体説明図、第５図（Ａｌは第４図の一部詳細
図、第５図（Ｂｌは第５図（Ａ）のｍ−ｎ線断面矢視図
である。FIG. 4 is an overall explanatory diagram, FIG. 5 (Al is a partially detailed view of FIG. 4, and FIG. 5 (Bl is a cross-sectional view taken along line m-n in FIG. 5(A).
第４図において、第６，７図と同一符号は第６．７図と
同一部を示し、２“ａ、２“ｂ、２“Ｃ・・・は１本の
シールロールで構成すれるシールロールでｈ ｖ 、入
鞠シールロール及び出側シールロールを兼ネている。こ
れらのシールロール２ａ〜２ｃは、図示しない駆動装置
で各々回転駆動されている。In Fig. 4, the same reference numerals as in Figs. 6 and 7 indicate the same parts as in Fig. 6.7, and 2"a, 2"b, 2"C... are seals composed of one seal roll. The roll hv also serves as an entry seal roll and an exit seal roll.These seal rolls 2a to 2c are each rotationally driven by a drive device (not shown).
これらのシールロールは、第５図（Ａｌ 、 （Ｂｌに
示すように、１本のシールロール２“の両側に配置され
たシールパー１４．１４と共にシール装Ｗを構成する。These sealing rolls constitute a sealing device W together with sealers 14, 14 arranged on both sides of one sealing roll 2'', as shown in FIG. 5 (Al, (Bl).
このシール装置によれば、合計のリーク隙間１９ａ。According to this sealing device, the total leakage gap 19a.
１９ｂの箇所が従来の構造に比べて減少するため、構造
的にリーク隙間面積の合計値を低減することかでき、シ
ール性能が向上する。Since the number of locations 19b is reduced compared to the conventional structure, the total leak gap area can be reduced structurally, and the sealing performance is improved.
丑た、′ＰＪ４図にツバずよりに、各シールロール間（
すなわち各圧力室６ａ、６ｂ 、６ｃ・・・内）に設け
られたガイドロール２０ａ、２０ｂ’、２０ｃ・・・に
よジ走行基＆１のシールロールへの巻付角が一定以上ヶ
解保しており、カーリークガスが発生してもリークガス
による走行基板のばたつきは毬く少い。従って、走行基
板１が、シールパ＝１４．１４に接触して切断される虞
れはない。As shown in Figure PJ4, between each seal roll (
That is, when the winding angle of the guide rolls 20a, 20b', 20c, etc. provided in each pressure chamber 6a, 6b, 6c, etc. to the seal roll exceeds a certain level, the guide rolls 20a, 20b', 20c... Therefore, even if car leak gas is generated, there is little flapping of the running board due to the leak gas. Therefore, there is no risk that the running board 1 will come into contact with the sealer 14, 14 and be cut.
本発明者らの実験によれば、この巻付角は、前記の第３
図ＦＢＩに示す辿り、１０度以上か適当であり、１０度
以上で奉伺けば走行基板のばたつきの問題はなくなる。According to the inventors' experiments, this wrapping angle is the third
As shown in Figure FBI, it is appropriate to set the angle at 10 degrees or more, and if the angle is set at 10 degrees or more, the problem of the running board flapping will disappear.
本発明装置によれば、シールロール都でのリーク隙間が
小さくなるため、シール性能が向上する。According to the device of the present invention, the sealing performance is improved because the leak gap at the seal roll is reduced.
また、本発明装置によれは、走行基板が１０度以上の巻
付角度でシールロールへ巻イ」いているため、少々のリ
ークガスがあっても走行基板のばたつきがなくなシ、走
行基板のしわの発生、切断の虞れがない。In addition, according to the device of the present invention, since the running board is wound around the seal roll at a winding angle of 10 degrees or more, the running board does not flutter even if there is a small amount of leak gas, and the running board does not wrinkle. There is no risk of breakage or breakage.
第１図及び第２図（Ａｌ ｌ ＦＢ＋は本発明−装置の
一例を示す図で、第１図は全体説明図、第２図（Ａｌは
第１図の一部詳細図、第２図（Ｂｌは第２図ＦＡ、ｌの
１−１線断面矢視図、第３区内は本発明の効果を示すグ
ラフ、第３図（Ｂｌは第３図ｆＡｌを導くための条件金
かす図、第４図及び第５図囚１１ ＦＢ＋は本発明装置
の他の例を示す図で、第４図は全体説明図、第５区内は
第４図の一部詳細図、第５図ｔＢｌは第５区内のｕ−ｎ
線断面矢視図、第６図及び第７図（Ａｌ ｌ （Ｂｌは
従来の装置の構成図′ｌ′ある。
１・・・走行基板
２ａ、２ｂ、２ｃ、２ａ、２ｂ、２ｃ、２ ＝−シー
／Ｌ１０−／ｌ／２ａ、２ｂ、２ｃ ・・・入側シール
ロール３２Ｌ、 ３ｂ、 ３ｃ −出側シールロール
４ａ、４ｂ、４ｃ ・・・真空ポンプ
５・・・蒸着装置
６ｈ、６ｂ、６Ｃ・・・圧力室
７・・・蒸着室
８・・・デフレクタロール
９・・・巻付ロール
＋１’、１２’、 ＋３７．１１ 、１２・・・ピンチ
ロール１ ４ ・・・ シ − ルノ（−
１６・・・ケーシング
１７・・・上流側圧力室
１８・・・下流側圧力室
ｊ９ａ、１９ｂ、＋９ｃｍリーク隙間Figures 1 and 2 (Al FB+ are diagrams showing an example of the device of the present invention, Figure 1 is an overall explanatory diagram, Figure 2 (Al is a partially detailed diagram of Figure 1, Figure 2 is a diagram showing an example of the device of the present invention, Bl is a cross-sectional view taken along the line 1-1 of Fig. 2FA, l; the third section is a graph showing the effects of the present invention; Figure 4 and Figure 5 Prisoner 11 FB+ are diagrams showing another example of the device of the present invention, Figure 4 is an overall explanatory diagram, section 5 is a detailed diagram of a part of Figure 4, and Figure 5 tBl is a diagram showing another example of the device of the present invention. un in the 5th ward
Line cross-sectional view, FIGS. 6 and 7 (Al l (Bl is the configuration diagram 'l' of the conventional device. 1... Traveling board 2a, 2b, 2c, 2a, 2b, 2c, 2 = - Sea/L10-/l/2a, 2b, 2c... Inlet seal roll 32L, 3b, 3c - Outlet seal roll 4a, 4b, 4c... Vacuum pump 5... Evaporation device 6h, 6b, 6C... Pressure chamber 7... Vapor deposition chamber 8... Deflector roll 9... Winding roll +1', 12', +37.11, 12... Pinch roll 1 4... Sealing roll ( - 16...Casing 17...Upstream pressure chamber 18...Downstream pressure chamber j9a, 19b, +9cm leak gap
Claims (2)
真空室にて該走行基板に真空蒸着を施した後、大気中へ
搬出する連続真空蒸着装置において、大気から前記真空
室までをシールロールによつて複数の圧力室に区切り、
各シールロールは３本１組のピンチロールによつて構成
され、かつ前記走行基板が該シールロールに対して巻付
角１０度以上で巻付くようにしてなることを特徴とする
連続真空蒸着装置。(1) In a continuous vacuum evaporation device that continuously leads a running substrate from the atmosphere to a vacuum chamber, performs vacuum deposition on the running substrate in the vacuum chamber, and then carries it out to the atmosphere, from the atmosphere to the vacuum chamber. is divided into multiple pressure chambers by seal rolls,
A continuous vacuum deposition apparatus characterized in that each seal roll is constituted by a set of three pinch rolls, and the traveling substrate is wound around the seal roll at a wrapping angle of 10 degrees or more. .
真空室にて該走行基板に真空蒸着を施した後、大気中へ
搬出する連続真空蒸着装置において、大気から前記真空
室までをシール装置によつて複数の圧力室に区分し、各
シール装置は１本のシールロールおよび該シールロール
の両側に設置されたシールバーから構成され、かつ該シ
ールロールの両側に前記走行基板がそれぞれ巻付角１０
度以上で巻付くようにしてなることを特徴とする連続真
空蒸着装置。(2) In a continuous vacuum evaporation device that continuously leads a running substrate from the atmosphere to a vacuum chamber, performs vacuum deposition on the running substrate in the vacuum chamber, and then transports it to the atmosphere, from the atmosphere to the vacuum chamber. is divided into a plurality of pressure chambers by a sealing device, each sealing device is composed of one sealing roll and sealing bars installed on both sides of the sealing roll, and the traveling substrate is placed on both sides of the sealing roll. Wrap angle 10 each
A continuous vacuum evaporation device that is characterized by being coiled at a temperature of more than 100%.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63113469A JPH0768621B2 (en) | 1988-05-12 | 1988-05-12 | Continuous vacuum deposition equipment |
| KR1019890004722A KR920003591B1 (en) | 1988-04-11 | 1989-04-10 | Continuous vacuum vapor deposition device |
| EP89106353A EP0337369B1 (en) | 1988-04-11 | 1989-04-11 | Continuous vacuum vapor deposition apparatus |
| US07/336,349 US5000114A (en) | 1988-04-11 | 1989-04-11 | Continuous vacuum vapor deposition system having reduced pressure sub-chambers separated by seal devices |
| DE89106353T DE68909988T2 (en) | 1988-04-11 | 1989-04-11 | Device for continuous vacuum coating. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63113469A JPH0768621B2 (en) | 1988-05-12 | 1988-05-12 | Continuous vacuum deposition equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01287275A true JPH01287275A (en) | 1989-11-17 |
| JPH0768621B2 JPH0768621B2 (en) | 1995-07-26 |
Family
ID=14613041
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63113469A Expired - Fee Related JPH0768621B2 (en) | 1988-04-11 | 1988-05-12 | Continuous vacuum deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0768621B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6696096B2 (en) | 2000-06-22 | 2004-02-24 | Matsushita Electric Works, Ltd. | Apparatus for and method of vacuum vapor deposition and organic electroluminescent device |
| WO2011111626A1 (en) * | 2010-03-08 | 2011-09-15 | 積水化学工業株式会社 | Surface treatment device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6270575A (en) * | 1985-09-21 | 1987-04-01 | Kawasaki Steel Corp | Differential pressure sealing device for continuous dry plating |
-
1988
- 1988-05-12 JP JP63113469A patent/JPH0768621B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6270575A (en) * | 1985-09-21 | 1987-04-01 | Kawasaki Steel Corp | Differential pressure sealing device for continuous dry plating |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6696096B2 (en) | 2000-06-22 | 2004-02-24 | Matsushita Electric Works, Ltd. | Apparatus for and method of vacuum vapor deposition and organic electroluminescent device |
| WO2011111626A1 (en) * | 2010-03-08 | 2011-09-15 | 積水化学工業株式会社 | Surface treatment device |
| JP5130413B2 (en) * | 2010-03-08 | 2013-01-30 | 積水化学工業株式会社 | Surface treatment equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0768621B2 (en) | 1995-07-26 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |