JPH01264991A - Apparatus for producing single crystal - Google Patents
Apparatus for producing single crystalInfo
- Publication number
- JPH01264991A JPH01264991A JP9335888A JP9335888A JPH01264991A JP H01264991 A JPH01264991 A JP H01264991A JP 9335888 A JP9335888 A JP 9335888A JP 9335888 A JP9335888 A JP 9335888A JP H01264991 A JPH01264991 A JP H01264991A
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- raw material
- coracle
- material melt
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 46
- 239000002994 raw material Substances 0.000 claims abstract description 24
- 239000007788 liquid Substances 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 230000007423 decrease Effects 0.000 claims description 3
- 239000000565 sealant Substances 0.000 claims description 2
- 230000007547 defect Effects 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000003566 sealing material Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 239000000155 melt Substances 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、GaAs、 lnP等のm−v族化合物半導
体、CdTe等のn−vr族化合物半導体、Si、Ge
等の半導体、LNOlBSO等の酸化物の単結晶をチョ
クラルスキー法により、製造する装置に関する。Detailed Description of the Invention (Industrial Application Field) The present invention is applicable to m-v group compound semiconductors such as GaAs and lnP, n-vr group compound semiconductors such as CdTe, Si, Ge
This invention relates to an apparatus for producing single crystals of semiconductors such as LNO1BSO and oxides by the Czochralski method.
(従来の技術)
従来、原料融液にコラクルを挿入して、コラクル内の原
料融液量を調整し、育成結晶の直径を制御することが行
われてきた。(Prior Art) Conventionally, a coracle is inserted into the raw material melt to adjust the amount of the raw material melt in the coracle to control the diameter of the grown crystal.
第2図はコラクルを用いる従来の単結晶の製造装置の概
念図である。(特開昭62−2H193号参照)この装
置では底部に1つの小開口を有する逆円錐形のコラクル
7を用いている。るっぽlには原料融液2を収容し、支
持具を用いてコラクル7を融液中に浸漬する。(コラク
ルの支持具は図示していない。)次いで、種結晶を取り
付けた上軸4を下降させて、コラクル7内の原料融液2
に種結晶を浸漬した後、単結晶5を引き上げる。上記装
置では、コラクル7内の融液表面の直径を調整すること
により、引き上げ結晶の直径を制御することを意図した
ものである。FIG. 2 is a conceptual diagram of a conventional single crystal manufacturing apparatus using a coracle. (Refer to Japanese Patent Application Laid-Open No. 62-2H193.) This device uses an inverted conical coracle 7 having one small opening at the bottom. The raw material melt 2 is stored in the container, and the coracle 7 is immersed in the melt using a support. (The support for the coracle is not shown.) Next, the upper shaft 4 with the seed crystal attached is lowered, and the raw material melt 2 in the coracle 7 is lowered.
After immersing the seed crystal in the water, the single crystal 5 is pulled up. The above device is intended to control the diameter of the pulled crystal by adjusting the diameter of the surface of the melt in the coracle 7.
(発明が解決しようとする課題)
しかし、上記の装置では原料融液をコラクル内に導入す
る小開口が底部に1カ所であるために、原料融液は第2
図の矢印のように固液界面の中央から周辺に向かって流
れる。その結果、固液界面6の形状は上に凸となり、周
辺部に結晶核の発生を容易にし、多結晶化の原因となる
。(Problem to be Solved by the Invention) However, in the above device, since there is only one small opening at the bottom for introducing the raw material melt into the coracle, the raw material melt is transferred to the second
It flows from the center to the periphery of the solid-liquid interface as shown by the arrow in the figure. As a result, the shape of the solid-liquid interface 6 becomes upwardly convex, which facilitates the generation of crystal nuclei in the periphery, causing polycrystalization.
また、小開口部には融液の流入抵抗があるため、引き上
げ結晶の直径が大きくなると原料融液の流入が追い付か
ず、結晶の大型化の支障となっていた。In addition, since there is resistance to the inflow of the melt into the small opening, when the diameter of the pulled crystal increases, the inflow of the raw material melt cannot keep up, which poses an obstacle to increasing the size of the crystal.
本発明は、上記コラクルの欠点を解消し、原料融液のコ
ラクル内への流入を円滑にし、固液界面を平坦化若しく
は下に凸にするようなコラクルを用いることにより、結
晶欠陥の少ない高品質の単結晶の製造を可能とする単結
晶の製造装置を提供しようとするものである。The present invention eliminates the drawbacks of the coracle, smoothes the flow of the raw material melt into the coracle, and uses a coracle that flattens or convexes the solid-liquid interface. The present invention aims to provide a single-crystal manufacturing apparatus that enables the manufacture of high-quality single crystals.
(課題を解決するための手段)
本発明は、原料融液又は原料融液と液体封止剤を収容す
るルツボと、ルツボを回転昇降可能に支持する下軸と、
ルツボの周囲に配置した加熱ヒータと、種結晶を取り付
けた回転昇降可能な単結晶引上軸と、下方になるほど直
径を小さくする傾斜側壁部を有するコラクルと、該傾斜
側壁部を原料融液に浸漬するようにコラクルを支持する
支持具とを備えた単結晶の製造装置において、原料融液
に浸漬するコラクルの傾斜側壁部又は底部で、引上結晶
の直胴部の外周近くに1以上の小開口を設けたことを特
徴とする単結晶の製造装置である。(Means for Solving the Problems) The present invention provides a crucible that accommodates a raw material melt or a raw material melt and a liquid sealant, a lower shaft that supports the crucible so that it can rotate up and down,
A heater placed around the crucible, a single crystal pulling shaft equipped with a seed crystal that can be rotated up and down, a coracle having an inclined side wall whose diameter decreases toward the bottom, and a coracle that uses the inclined side wall to convert the raw material melt into In a single crystal production apparatus equipped with a support for supporting a coracle so as to be immersed, one or more crystals are provided near the outer periphery of the straight body of the pulled crystal on the inclined side wall or bottom of the coracle that is immersed in the raw material melt. This is a single crystal manufacturing device characterized by having a small opening.
なお、コラクルの開口の数は1つでもよいが、複数個を
対称位置に設けることがよく、開口の直径は2〜6mm
が望ましい。また、コラクルはカーボン、石英、BN、
pBN、 AIN、 pBNコートカーボン、5iN
s SiC,ZrO,、^1,03などにより製作する
ことができる。Note that the number of openings in the coracle may be one, but it is better to have multiple openings in symmetrical positions, and the diameter of the opening is 2 to 6 mm.
is desirable. In addition, coracles are carbon, quartz, BN,
pBN, AIN, pBN coated carbon, 5iN
s It can be manufactured from SiC, ZrO, ^1,03, etc.
(作用)
第1図は本発明の1具体例である単結晶の製造装置の概
念図である。この装置では、引き上げ結晶の直胴部の外
周に近い傾斜側壁に複数の小開口を設けたコラクル3を
用いている。るつぼ1内の原料融液2にはコラクル3を
浸漬し、小開口からコラクル3内に原料融液2を導入し
てそこから単結晶5を引き上げる。図中の矢印は原料融
液2がコラクル3内に流入する様子を示したものである
。コラクル内の原料融液の温度分布はコラクル外の高温
融液の流入する小開口部近傍がより高温となり中央が比
較的低温となる。その結果、固液界面6の形状は平坦か
、図のように下に凸となる。なお、小開口は上記のよう
に対称位置に複数設けることが好ましいが、引き上げ結
晶を回転させるので、融液温度もある程度平均化される
。その際、引き上げ結晶を回転させる代わりに、コラク
ルを回転させることもできる。(Function) FIG. 1 is a conceptual diagram of a single crystal manufacturing apparatus which is a specific example of the present invention. This device uses a coracle 3 in which a plurality of small openings are provided in the inclined side wall near the outer periphery of the straight body of the pulled crystal. A coracle 3 is immersed in the raw material melt 2 in the crucible 1, the raw material melt 2 is introduced into the coracle 3 through a small opening, and the single crystal 5 is pulled up from there. The arrows in the figure indicate how the raw material melt 2 flows into the coracle 3. The temperature distribution of the raw material melt inside the coracle is higher in the vicinity of the small opening outside the coracle into which the high-temperature melt flows, and relatively lower in the center. As a result, the shape of the solid-liquid interface 6 is either flat or downwardly convex as shown in the figure. Although it is preferable to provide a plurality of small openings at symmetrical positions as described above, since the pulled crystal is rotated, the melt temperature is also averaged to some extent. At this time, instead of rotating the pulled crystal, it is also possible to rotate the coracle.
第3図及び第4図は、本発明で使用可能である種々なコ
ラクルの断面図を示したものである。Figures 3 and 4 show cross-sectional views of various coracles that can be used with the present invention.
第3図は底部の広いコラクルの例であり、小開口を底部
に設けたものである。なお、コラクルに底部は必ずしも
必要でな(第4図のような断面形状を採用することもで
きる。FIG. 3 shows an example of a coracle with a wide bottom and a small opening provided at the bottom. Note that the coracle does not necessarily have a bottom (a cross-sectional shape as shown in FIG. 4 may also be adopted).
(実施例)
第1図の装置を用いて直胴部の直径3インチのGaAs
単結晶を製造した。コラクルは直径+00順の円筒部と
直径50Mの平面底部と高さ30 mmの傾斜側壁を有
し、内径75Mの傾斜側壁の位置に90’毎に4力所直
径4m1I+の小開口を設けたもので、材質はpBNで
ある。(Example) Using the apparatus shown in Fig. 1, GaAs with a diameter of 3 inches in the straight body part was
A single crystal was produced. The coracle has a cylindrical part with a diameter of +00, a flat bottom with a diameter of 50M, and a sloped side wall with a height of 30mm, and small openings with a diameter of 4m1I+ are provided at 4 force points every 90' on the sloped sidewall with an inner diameter of 75M. The material is pBN.
まず、るつぼ内に4kgのGaAsを収容し、これを溶
融した後、コラクルを小開口部より少し上まで浸漬する
ように保持する。−L軸の回転速度は5rpmで引き上
げ速度は10mm/hrとし、るつぼは逆方向に回転速
度20rpmで回転させた。First, 4 kg of GaAs is placed in a crucible, melted, and then held so that the coracle is submerged slightly above the small opening. - The rotation speed of the L axis was 5 rpm, the pulling speed was 10 mm/hr, and the crucible was rotated in the opposite direction at a rotation speed of 20 rpm.
その結果、直径3インチという大きな直径の結晶であっ
たが、安定して引き上げることができた。また、固液界
面の形状は極めて平坦であった。As a result, although the crystal had a large diameter of 3 inches, it was possible to pull it up stably. Moreover, the shape of the solid-liquid interface was extremely flat.
第2図のコラクルを用いて、上記と同様の条件で結晶成
長を行ったところ、直径2インチまでは安定して結晶を
引き上げることができたが、固液界面の形状は中央に向
かって凹化がみられた。また、直径3インチにしようと
すると、直径の急激な減少や切断が発生した。When crystal growth was performed using the coracle shown in Figure 2 under the same conditions as above, it was possible to stably pull the crystal up to a diameter of 2 inches, but the shape of the solid-liquid interface was concave toward the center. change was observed. Further, when trying to make the diameter 3 inches, a sudden decrease in diameter or cutting occurred.
(発明の効果)
本発明は、上記の構成を採用することにより、大きな直
径の結晶引き上げを可能とし、かつ、引き上げ結晶の固
液界面の形状を平坦若しくは下に凸にすることができ、
結晶の半径方向の均一性を大幅に改善し、結晶欠陥の少
ない高品質単結晶を制御性良く安定して育成することが
できるようになった。(Effects of the Invention) By adopting the above configuration, the present invention makes it possible to pull a crystal with a large diameter, and also makes it possible to make the shape of the solid-liquid interface of the pulled crystal flat or downwardly convex.
The radial uniformity of the crystal has been significantly improved, making it possible to stably grow high-quality single crystals with few crystal defects with good controllability.
第1図は本発明の1具体例である単結晶製造装置の概念
図、第2図は従来装置の概念図、第3図及び第4図は本
発明で使用するコラクルの断面図である。
第1図
第2図FIG. 1 is a conceptual diagram of a single crystal manufacturing apparatus which is a specific example of the present invention, FIG. 2 is a conceptual diagram of a conventional apparatus, and FIGS. 3 and 4 are cross-sectional views of a coracle used in the present invention. Figure 1 Figure 2
Claims (1)
と、ルツボを回転昇降可能に支持する下軸と、ルツボの
周囲に配置した加熱ヒータと、種結晶を取り付けた回転
昇降可能な単結晶引上軸と、下方になるほど直径を小さ
くする傾斜側壁部を有するコラクルと、該傾斜側壁部を
原料融液に浸漬するようにコラクルを支持する支持具と
を備えた単結晶の製造装置において、原料融液に浸漬す
るコラクルの傾斜側壁部又は底部で、引上結晶の直胴部
の外周近くに1以上の小開口を設けたことを特徴とする
単結晶の製造装置。A crucible that accommodates a raw material melt or a raw material melt and a liquid sealant, a lower shaft that supports the crucible so that it can be rotated up and down, a heater placed around the crucible, and a unit that can be rotated up and down that is equipped with a seed crystal. In a single crystal manufacturing apparatus, comprising a crystal pulling shaft, a coracle having an inclined side wall portion whose diameter decreases toward the bottom, and a support supporting the coracle such that the inclined side wall portion is immersed in a raw material melt. An apparatus for producing a single crystal, characterized in that one or more small openings are provided near the outer periphery of the straight body of the pulled crystal in the inclined side wall or bottom of the coracle that is immersed in the raw material melt.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9335888A JPH01264991A (en) | 1988-04-18 | 1988-04-18 | Apparatus for producing single crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9335888A JPH01264991A (en) | 1988-04-18 | 1988-04-18 | Apparatus for producing single crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01264991A true JPH01264991A (en) | 1989-10-23 |
Family
ID=14080056
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9335888A Pending JPH01264991A (en) | 1988-04-18 | 1988-04-18 | Apparatus for producing single crystal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01264991A (en) |
-
1988
- 1988-04-18 JP JP9335888A patent/JPH01264991A/en active Pending
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