JPH01264290A - Manufacture of printed wiring board - Google Patents

Manufacture of printed wiring board

Info

Publication number
JPH01264290A
JPH01264290A JP9133288A JP9133288A JPH01264290A JP H01264290 A JPH01264290 A JP H01264290A JP 9133288 A JP9133288 A JP 9133288A JP 9133288 A JP9133288 A JP 9133288A JP H01264290 A JPH01264290 A JP H01264290A
Authority
JP
Japan
Prior art keywords
copper foil
copper
etching resist
hole
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9133288A
Other languages
Japanese (ja)
Inventor
Akiyoshi Kadoya
角屋 明由
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9133288A priority Critical patent/JPH01264290A/en
Publication of JPH01264290A publication Critical patent/JPH01264290A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/425Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/428Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in substrates having a metal pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0094Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To form a fine coarse surface on a copper foil and improve adhesion to an etching resist, by oxidizing the surface of the copper foil before performing a process of supplying a catalyst and then, reducing the oxidized surface of the copper foil. CONSTITUTION:A pipe passage hole 3 for a through hole is made in a copper- placed laminate consisting of board 1 and a copper foil 2. Then, after oxidizing the surface of the copper foil 2 with an oxidation treatment agent, the treatment of reduction is carried out on the above surface of the copper foil with the treatment agent for reduction and the fine coarse surface 2a is formed on the copper foil 2. Then, a catalyst 4 is supplied to the wall face of the pipe passage hole 3. Subsequently, an etching resist 5 is formed according to a photolithography technique with a dry film and the copper foil 2 is etched by using an etchant. Then, a plating resisting resist 6 is formed at a place other than the through hole. A copper plating film 7 is formed in the through hole with a chemical copper plating technique. As the etching resist 5 is formed on the fine coarse surface 2a of the copper foil 2, a high sticking strength between the etching resist 5 and the copper foil 2 is obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はプリント配線板の製造方法にかかわり、特に、
微細パターンを有するプリント配線板におけるパターン
欠陥防止に好適なプリント配線板の製造方法に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method of manufacturing a printed wiring board, and in particular,
The present invention relates to a method of manufacturing a printed wiring board suitable for preventing pattern defects in a printed wiring board having a fine pattern.

〔従来の技術〕[Conventional technology]

従来、プリント配線板の製造に際しては、エツチングレ
ジスタと銅箔との密着力を向上させるための処理として
、エツチングレジスト付着の直前に、銅箔に対して砥粒
による機械的研磨を行っていプこ。
Conventionally, when manufacturing printed wiring boards, the copper foil is mechanically polished with abrasive grains immediately before the etching resist is attached as a treatment to improve the adhesion between the etching resist and the copper foil. .

また、本発明で採用している酸化処理を用いる方法は、
積層接着に用いた例はあるが、エツチングレジストと銅
箔との密着力向上圧用いた例はない。なお、これに関す
る公知例としては、特公昭58−2476号公報に記載
のものが挙げられる。
Furthermore, the method using oxidation treatment adopted in the present invention is as follows:
Although there are examples of it being used for lamination adhesion, there are no examples of using pressure to improve the adhesion between etching resist and copper foil. In addition, as a publicly known example regarding this, the one described in Japanese Patent Publication No. 58-2476 can be mentioned.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は、銅箔に微細な粗化面を形成することが
できないため、エツチングレジストとの十分な密着力を
得ることができなかった。このことは、パターン寸法の
微細化に伴うパターン欠陥増加の要因の一つとなりてお
り、銅箔に微細な粗化面を形成することが課題となって
いた。
In the above-mentioned conventional technology, it was not possible to form a finely roughened surface on the copper foil, and therefore it was not possible to obtain sufficient adhesion with the etching resist. This is one of the causes of an increase in pattern defects as pattern dimensions become finer, and forming a finely roughened surface on copper foil has become a problem.

本発明の目的は、銅箔に微細な粗化面を形成I−、エツ
チングレジストとの密着力を向上させる方法を提供する
ことにある。
An object of the present invention is to provide a method for forming a finely roughened surface on a copper foil to improve its adhesion to an etching resist.

〔課題を解決するための手段〕[Means to solve the problem]

上記目的は、触媒付与工程の前に、銅箔表面を酸化処理
し、さらにその表面を還元処理するとと罠より、達成さ
れる。
The above object can be achieved by oxidizing the surface of the copper foil and further reducing the surface before the catalyst application step.

〔作用〕[Effect]

上記構成において、酸化処理は銅箔表面に微細な粗化面
を形成する作用をもち、還元処理は、触媒付与工程で用
いる処理液によって形成された酸化粗化面が溶解するの
を防止する作用をもつ。また、エツチング工程の前工程
である触媒付与工程の前にこれらの処理を行うのは、酸
化処理により触媒が溶解脱落するのを防止するためであ
る。
In the above configuration, the oxidation treatment has the effect of forming a finely roughened surface on the surface of the copper foil, and the reduction treatment has the effect of preventing the oxidized and roughened surface formed by the treatment liquid used in the catalyst application step from dissolving. have. Furthermore, the reason why these treatments are performed before the catalyst application step, which is a pre-etching step, is to prevent the catalyst from dissolving and falling off due to the oxidation treatment.

以上のような作用によって、銅箔に微細な粗化面を形成
することができる。
Due to the above-described effects, a finely roughened surface can be formed on the copper foil.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1図(al〜(f)K従い
処理工程ごとに順次説明する。
Hereinafter, one embodiment of the present invention will be described in sequence for each processing step according to FIGS. 1A to 1FK.

(イ)基材1および銅箔2からなる銅張積層板にスルー
ホール用の貫通穴3を明ける(第1図(at)。
(a) A through hole 3 for a through hole is made in a copper clad laminate consisting of a base material 1 and a copper foil 2 (FIG. 1(at)).

(口] 銅箔2の表置に酸化処理剤(例えばシブレイ社
製プロボンド80)を使用して酸化処理を行った後、そ
の表面に還元処理剤(例えばジメチルアミンボラン)を
使用して還元処理を行い、銅箔2に微細な粗化面2aを
形成する(第1図(b))。
(Explanation) After performing oxidation treatment on the surface of the copper foil 2 using an oxidation treatment agent (for example, Probond 80 manufactured by Sibley), the surface thereof is subjected to reduction treatment using a reduction treatment agent (for example, dimethylamine borane). A finely roughened surface 2a is formed on the copper foil 2 (FIG. 1(b)).

(ハ)貫通穴3の壁面に触媒4(例えばシブレイ社展キ
ャタボジット44)を付与する(第1図(C))。
(c) A catalyst 4 (for example, Sibley Catabogit 44) is applied to the wall surface of the through hole 3 (FIG. 1(C)).

に) ドライフィルム(例えば日立化成製フォテック8
83)を用いて写真法によりエツチングレジスト5を形
成する(第1図(d))。
) Dry film (for example, Hitachi Chemical's Photec 8)
83) by a photographic method (FIG. 1(d)).

(ホ)エツチング剤(例えば塩化第二銅)を使用して銅
箔2のエツチングを行う(第1図(e))。
(e) Etching the copper foil 2 using an etching agent (for example, cupric chloride) (FIG. 1(e)).

(へ)スルーホールランド部以外に耐めっきレジスト6
(例えば日立製H8−08)を形成し、化学銅めつき法
により、スルーホールに銅めっき皮膜7を形成する(第
1図(f))。
(f) Plating resist 6 other than through-hole land area
(For example, Hitachi H8-08) is formed, and a copper plating film 7 is formed in the through hole by a chemical copper plating method (FIG. 1(f)).

本実施例においては、エツチングレジスト5は銅箔2の
微細な粗化面2&の上く形成されるので、エツチングレ
ジスト5と銅箔2との高い密着力を得ることができる。
In this embodiment, since the etching resist 5 is formed on the finely roughened surface 2& of the copper foil 2, high adhesion between the etching resist 5 and the copper foil 2 can be obtained.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、プリント配線板の製造において、銅箔
に対するエツチングレジストの密着力を著しく向上でき
るので、微細ノくターンのノくターン欠陥を著しく低減
することができ、歩留りを高めることができる。
According to the present invention, in the production of printed wiring boards, it is possible to significantly improve the adhesion of etching resist to copper foil, so it is possible to significantly reduce the number of fine turn defects, and to increase the yield. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例における工程ごとのワークの
断面図である。 符号の説明 1・・・基材、2・・・銅箔、2a・・・粗化面、3・
・・貫通穴、4・・・触媒、5・・・エツチングレジス
ト、6・・・耐めっきレジスト、7・・・銅めっき皮膜
。 第 1図
FIG. 1 is a sectional view of a workpiece at each step in an embodiment of the present invention. Explanation of symbols 1...Base material, 2...Copper foil, 2a...Roughened surface, 3.
... Through hole, 4... Catalyst, 5... Etching resist, 6... Plating resistant resist, 7... Copper plating film. Figure 1

Claims (1)

【特許請求の範囲】[Claims] 1.穴明け工程と、触媒付与工程と、エッチング工程と
、めっき工程とを順次実施するプリント配線板の製造方
法において、触媒付与工程の前に、銅箔表面を酸化処理
し、さらにその表面を還元処理する工程を設けたことを
特徴とするプリント配線板の製造方法。
1. In a printed wiring board manufacturing method that sequentially performs a drilling process, a catalyst application process, an etching process, and a plating process, the surface of the copper foil is oxidized before the catalyst application process, and the surface is further subjected to a reduction process. 1. A method for manufacturing a printed wiring board, comprising a step of:
JP9133288A 1988-04-15 1988-04-15 Manufacture of printed wiring board Pending JPH01264290A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9133288A JPH01264290A (en) 1988-04-15 1988-04-15 Manufacture of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9133288A JPH01264290A (en) 1988-04-15 1988-04-15 Manufacture of printed wiring board

Publications (1)

Publication Number Publication Date
JPH01264290A true JPH01264290A (en) 1989-10-20

Family

ID=14023489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9133288A Pending JPH01264290A (en) 1988-04-15 1988-04-15 Manufacture of printed wiring board

Country Status (1)

Country Link
JP (1) JPH01264290A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0472158A2 (en) * 1990-08-20 1992-02-26 Mitsubishi Rayon Company Ltd. Process for producing a printed wiring board
US5252195A (en) * 1990-08-20 1993-10-12 Mitsubishi Rayon Company Ltd. Process for producing a printed wiring board
WO1996015651A1 (en) * 1994-11-09 1996-05-23 Blaupunkt-Werke Gmbh Method of producing a feedthrough on a circuit board
US5539181A (en) * 1992-08-26 1996-07-23 International Business Machines Corporation Circuit board
EP0762814A1 (en) * 1995-08-22 1997-03-12 Macdermid Incorporated Method for the manufacture of printed circuit boards
CN106255320A (en) * 2016-08-10 2016-12-21 奥士康精密电路(惠州)有限公司 A kind of gong PTH half bore method

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0472158A2 (en) * 1990-08-20 1992-02-26 Mitsubishi Rayon Company Ltd. Process for producing a printed wiring board
EP0472158A3 (en) * 1990-08-20 1992-10-28 Mitsubishi Rayon Company Ltd. Process for producing a printed wiring board
US5252195A (en) * 1990-08-20 1993-10-12 Mitsubishi Rayon Company Ltd. Process for producing a printed wiring board
US5539181A (en) * 1992-08-26 1996-07-23 International Business Machines Corporation Circuit board
US5680701A (en) * 1992-08-26 1997-10-28 International Business Machines Corporation Fabrication process for circuit boards
WO1996015651A1 (en) * 1994-11-09 1996-05-23 Blaupunkt-Werke Gmbh Method of producing a feedthrough on a circuit board
US5799393A (en) * 1994-11-09 1998-09-01 Blaupunkt-Werke Gmbh Method for producing a plated-through hole on a printed-circuit board
EP0762814A1 (en) * 1995-08-22 1997-03-12 Macdermid Incorporated Method for the manufacture of printed circuit boards
JPH09102676A (en) * 1995-08-22 1997-04-15 Macdermid Inc Manufacture of printed circuit board
CN106255320A (en) * 2016-08-10 2016-12-21 奥士康精密电路(惠州)有限公司 A kind of gong PTH half bore method

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