JPH01259176A - Production of thin metal film type composite material - Google Patents
Production of thin metal film type composite materialInfo
- Publication number
- JPH01259176A JPH01259176A JP63086743A JP8674388A JPH01259176A JP H01259176 A JPH01259176 A JP H01259176A JP 63086743 A JP63086743 A JP 63086743A JP 8674388 A JP8674388 A JP 8674388A JP H01259176 A JPH01259176 A JP H01259176A
- Authority
- JP
- Japan
- Prior art keywords
- ink
- metal
- organic
- thin metal
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 49
- 239000002184 metal Substances 0.000 title claims abstract description 49
- 239000002131 composite material Substances 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000010953 base metal Substances 0.000 claims abstract description 17
- 238000001035 drying Methods 0.000 claims abstract description 7
- 239000010409 thin film Substances 0.000 claims description 22
- 238000010304 firing Methods 0.000 claims description 10
- 239000011230 binding agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 3
- 239000002904 solvent Substances 0.000 abstract description 3
- 238000001354 calcination Methods 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000000976 ink Substances 0.000 description 40
- 238000000034 method Methods 0.000 description 13
- 239000010931 gold Substances 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 11
- 229910052737 gold Inorganic materials 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 239000004332 silver Substances 0.000 description 11
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 150000002739 metals Chemical class 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 239000010408 film Substances 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000010949 copper Substances 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 125000002524 organometallic group Chemical group 0.000 description 6
- 229910052741 iridium Inorganic materials 0.000 description 5
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- RSWGJHLUYNHPMX-UHFFFAOYSA-N 1,4a-dimethyl-7-propan-2-yl-2,3,4,4b,5,6,10,10a-octahydrophenanthrene-1-carboxylic acid Chemical compound C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 4
- 229910001316 Ag alloy Inorganic materials 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000004663 powder metallurgy Methods 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- RBHIUNHSNSQJNG-UHFFFAOYSA-N 6-methyl-3-(2-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2(C)OC2CC1C1(C)CO1 RBHIUNHSNSQJNG-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 239000010426 asphalt Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- -1 butylcarboxytol Substances 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N carbon tetrachloride Substances ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- MJEMIOXXNCZZFK-UHFFFAOYSA-N ethylone Chemical compound CCNC(C)C(=O)C1=CC=C2OCOC2=C1 MJEMIOXXNCZZFK-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- MSNOMDLPLDYDME-UHFFFAOYSA-N gold nickel Chemical class [Ni].[Au] MSNOMDLPLDYDME-UHFFFAOYSA-N 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- UODXCYZDMHPIJE-UHFFFAOYSA-N menthanol Chemical compound CC1CCC(C(C)(C)O)CC1 UODXCYZDMHPIJE-UHFFFAOYSA-N 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 239000000341 volatile oil Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は金属薄膜複合材料の製造方法に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing a metal thin film composite material.
(従来技術とその問題点)
従来の複合材料としての製造方法は、線状、テープ状に
加工された金属材料を異種の母材金属に圧着、熱着又は
中間に接着用各種ろう材を用いてろう付けする方法があ
り、また電気めっき法、無電解めっき法及び金属ペース
トを塗布して焼付ける方法が一般的に用いられている。(Prior art and its problems) Conventional manufacturing methods for composite materials involve pressure bonding, thermal bonding, or using various brazing fillers for bonding between metal materials processed into wire or tape shapes to different base metals. There is a method of brazing, and commonly used methods include electroplating, electroless plating, and applying a metal paste and baking.
これらの方法の問題点としてめっき法は密着強度の不足
や金属母材の種類や合金めっき等における適しためっき
浴がない等の問題があり、機械加工による張材は、張厚
5μm以下の複合材料を製造することが金属の展延特性
や合金特性等により困難であり、金属ペーストを塗布し
て焼付けする方法では金属粉末を用いるため膜厚のバラ
ツキが大きく、また密着性も悪いという欠点があった。Problems with these methods include the lack of adhesion strength and lack of plating baths suitable for the type of metal base material and alloy plating, etc.; Manufacturing the material is difficult due to the spreadability and alloy properties of metals, and the method of applying metal paste and baking it uses metal powder, which has the drawbacks of large variations in film thickness and poor adhesion. there were.
最近では蒸着法等も用いられているが、蒸着設備として
特殊な設備を必要とする等の問題があり、特殊な材料が
用いられている程度である。Recently, vapor deposition methods have been used, but there are problems such as the need for special equipment as vapor deposition equipment, and only special materials are used.
(発明の目的)
本発明は、上記従来法の問題点を解決するためになされ
たもので、特に膜厚1μm以下の薄膜層を単体金属また
は2種以上の合金として、しかも数層にも形成すること
ができ、さらに密着性の強い、ち密で均一な薄膜複合材
料を製造する方法を提供することを目的とするものであ
る。(Purpose of the Invention) The present invention has been made to solve the problems of the conventional method described above, and in particular, a thin film layer with a thickness of 1 μm or less is made of a single metal or an alloy of two or more types, and moreover, it is formed into several layers. It is an object of the present invention to provide a method for manufacturing a dense and uniform thin film composite material that can be bonded to a thin film and has strong adhesion.
(問題点を解決するための手段)
本発明は、有機金属インクを用いて母材金属上に塗布し
、乾燥した後、焼成することにより1又は2層以上の金
属の薄膜を形成させることを特徴とする金属薄膜複合材
料の製造方法である。(Means for Solving the Problems) The present invention involves forming one or more metal thin films by applying an organic metal ink onto a base metal, drying it, and then firing it. This is a method for producing a characteristic metal thin film composite material.
以下本発明をより詳細に説明する。The present invention will be explained in more detail below.
有機金属インクは有機金属化合物(狭義には、金属原子
と1つ以上あ炭素原子との間に直接結合 □をもつ化
合物)とバインダとしての各種の樹脂と、□該有竺金属
化合物および該樹脂に共通の有機溶剤からなる均一な溶
液状のものである。Organometallic ink consists of an organometallic compound (in a narrow sense, a compound with a direct bond □ between a metal atom and one or more carbon atoms), various resins as a binder, □ the metal compound and the resin. It is a homogeneous solution consisting of an organic solvent common to
有機金属化合物は樹脂酸の金属塩が好ましく、バインダ
として加える樹脂としては、アルキッド樹脂、尿素樹脂
、メラミン樹脂、ロジン誘導体樹脂、アスファルト、セ
ルロース樹脂、エポキシ樹脂、アクリル樹脂およびテル
ペン樹脂から選択される。また、溶剤として、メンタノ
ール、テルピネオール、プチルカルヒ゛トール、メチル
エチルケトン、プロピレングリコール、エチレングリコ
ール、シクロヘキサノン、酢酸エチル、酢酸ベンジル、
アミルアセラード、セルソルブ、ブチルセルソルブ、ブ
タノール、ニトロベンゼン、トルエン、キシレン、石油
エーテル、クロロホルム、四塩化5 炭素、ピネン、ジ
ペンテン、ジペンテンオキサイド、精油のいずれか1種
または2種以上の混合溶剤を珀いて合成されたものであ
る。The organometallic compound is preferably a metal salt of a resin acid, and the resin added as a binder is selected from alkyd resins, urea resins, melamine resins, rosin derivative resins, asphalt, cellulose resins, epoxy resins, acrylic resins, and terpene resins. In addition, as a solvent, menthanol, terpineol, butylcarboxytol, methyl ethyl ketone, propylene glycol, ethylene glycol, cyclohexanone, ethyl acetate, benzyl acetate,
One or more mixed solvents of amyl acerade, cellosolve, butyl cellosolve, butanol, nitrobenzene, toluene, xylene, petroleum ether, chloroform, 5-carbon tetrachloride, pinene, dipentene, dipentene oxide, and essential oil. It was synthesized by
有機金属インクを金属母材に塗布し乾燥した後、焼成す
る工程では、まず、室温〜200℃前後で溶剤が蒸発分
離する。つぎに樹脂と樹脂酸の金属塩が300〜1.0
00℃で分解して金属もしくは金属酸化物になる。この
際、金属または金属酸化物の薄膜は金属母材へ拡散し密
着する。拡散の深さは焼成温度時間、金属母材の融点お
よび金属母材と焼成して形成される金属または金属酸化
物の合金特性により異なるため用途によりその条件を選
択する。In the process of coating the metal base material with the organic metal ink, drying it, and then firing it, the solvent first evaporates and separates at a temperature of room temperature to about 200°C. Next, the resin and the metal salt of the resin acid are 300 to 1.0
It decomposes into metals or metal oxides at 00°C. At this time, the thin film of metal or metal oxide diffuses and adheres to the metal base material. The depth of diffusion varies depending on the firing temperature and time, the melting point of the metal base material, and the alloy properties of the metal or metal oxide formed by firing with the metal base material, so the conditions are selected depending on the application.
各種形状の母材金属上に各種有機金属インクをスクリー
ン印刷、ハケ塗り、ローリングスプレ、スタンプ、ディ
ッピング等の方法で塗布し、室温で10〜30分間乾燥
した後J180〜220℃で10〜15分間加熱乾燥す
る。次に300〜1000℃で5〜1o分間焼成するこ
とにより各種金属の0.05〜0.1μmの薄膜を形成
させることができる。任意の膜厚を得るにはこの操作を
繰返すことで可能であるが、膜厚は2μm以下が好まし
い。Various organic metal inks are applied onto base metals of various shapes by methods such as screen printing, brush painting, rolling spray, stamping, dipping, etc., dried at room temperature for 10 to 30 minutes, and then heated to 180 to 220°C for 10 to 15 minutes. Heat and dry. Next, by firing at 300 to 1000°C for 5 to 10 minutes, a thin film of various metals with a thickness of 0.05 to 0.1 μm can be formed. Although it is possible to obtain an arbitrary film thickness by repeating this operation, the film thickness is preferably 2 μm or less.
また各種有機金属インクの金属濃度や塗布する方法によ
り各種金属の膜厚に差が生じることは当然であり、0.
05〜0.1μmの膜厚はスクリーン印刷による平均的
な結果である。Furthermore, it is natural that the film thickness of various metals varies depending on the metal concentration of various organic metal inks and the coating method.
The film thickness of 0.05 to 0.1 μm is an average result obtained by screen printing.
焼成温度は各種有機金属インク、特に金属又は2種以上
の金属を混ぜ合わせた場合で変化するが、母材金属の変
形等も考慮した焼成温度を選ぶ必要がある。しかし30
0℃以下では有機金属インクが完全に分解しないことと
1000℃以上で加熱すると母材金属が変形したり、母
材金属との合金化をする等、他の作用が生ずるため好ま
しくない。The firing temperature varies depending on the type of organic metal ink, especially when a metal or two or more metals are mixed together, but it is necessary to select the firing temperature taking into consideration deformation of the base metal. But 30
It is not preferable to heat the organic metal ink below 0°C because it will not completely decompose, and if it is heated above 1000°C, other effects such as deformation of the base metal or alloying with the base metal will occur.
さらに焼成時の雰囲気を酸化雰囲気や還元雰囲気で行っ
て目的とする各種金属の薄膜を酸化させたり、母材金属
等の酸化防止をすることもできる。Furthermore, the firing can be performed in an oxidizing atmosphere or a reducing atmosphere to oxidize the target thin film of various metals or to prevent the oxidation of the base metal.
また2種以上金属を層状とする場合は、まず母材金属に
上記方法により任意の膜厚とした第1層を施した後、次
の第2層目の薄膜を同様に施すことで可能であり、同様
の操作を繰返し行えば異種金属又は合金の数層の薄膜を
形成させることもできる。In addition, when layering two or more metals, it is possible to first apply a first layer with an arbitrary thickness to the base metal using the above method, and then apply a second thin layer in the same manner. By repeating similar operations, it is also possible to form several layers of thin films of different metals or alloys.
有機金属インクは2種以上を混合しても溶液状であり、
焼成した後の金属の分散は均一度の高いものが得られる
。Organometallic inks remain in a solution state even when two or more types are mixed.
After firing, the metal can be highly uniformly dispersed.
以下、本発明に係わる金属薄膜複合材料の製造方法の実
施例を記載するが、該実施例は本発明を限定するもので
はない。Examples of the method for manufacturing a metal thin film composite material according to the present invention will be described below, but the examples are not intended to limit the present invention.
(実施例1)
母材金属としてニッケル板(幅5.mm、長さ200m
m、厚さ0.8mm)に有機金インクをローリングによ
り塗布し、室温にて10分間乾燥した後、200℃で1
0分間加熱乾燥し、次に400℃で5分間焼成した。こ
の操作を3回繰返し行った後膜厚を測定したところ、ち
密で空車孔のないニッケル板に密着した0゜3μmの金
薄膜を形成することができた。(Example 1) Nickel plate (width 5.mm, length 200m
Organic gold ink was applied by rolling onto a sheet (0.8 mm thick), dried at room temperature for 10 minutes, and then heated at 200°C for 10 minutes.
It was dried by heating for 0 minutes, and then baked at 400° C. for 5 minutes. After repeating this operation three times, the film thickness was measured, and it was found that a thin gold film of 0.3 μm in thickness was formed which was dense and closely adhered to the nickel plate without voids.
この金−ニッケル板の両端より約20++++nの部分
を直角に折り曲げ、またほぼ中間の部分を90°ねじり
試験したがひび割れ、はがれは生じなかった。A portion of this gold-nickel plate approximately 20++n from both ends was bent at right angles, and a portion approximately in the middle was twisted by 90°, but no cracking or peeling occurred.
ここで用いた有機金インクは下記のものを混合したもの
である。The organic gold ink used here was a mixture of the following:
樹脂酸金 20.0重量%
卑金属樹脂酸塩 05重量%
樹脂 230重量%
有機溶剤 565重量%
(実施例2)
母材金属として銅−ニソケル合金(Ni65%含有のも
の)板(幅5mm、長さ200mm、厚さ0.8mm)
に有機金インクと有機銀インクを混合した有機金属イン
クをディッピングにより塗布し、室温で10分間乾燥し
た後、100℃で10分間加熱乾燥し、次に300℃で
5分間焼成した。この模作を5回繰返して行った後、膜
厚を測定したところ、05μmの金、銀合金
(金75重量%、銀25重量%)薄膜を形成することが
できた。Gold resin acid 20.0% by weight Base metal resinate 05% by weight Resin 230% by weight Organic solvent 565% by weight (Example 2) Copper-Nisokel alloy (containing 65% Ni) plate (width 5 mm, length (length 200mm, thickness 0.8mm)
An organometallic ink containing an organic gold ink and an organic silver ink was applied by dipping to the surface, dried at room temperature for 10 minutes, heated and dried at 100°C for 10 minutes, and then baked at 300°C for 5 minutes. After repeating this pattern five times, the film thickness was measured, and it was found that a thin film of gold and silver alloy (75% by weight of gold, 25% by weight of silver) of 0.5 μm could be formed.
この金、銀合金−銅、ニッケル合金板の折り曲げ、ねじ
り試験を実施例1と同様に行ったがひび割れ、はがれは
生じなかった。This gold, silver alloy-copper, nickel alloy plate was subjected to bending and twisting tests in the same manner as in Example 1, but no cracking or peeling occurred.
ここで用いた有機金属インクは下記のものを混合したも
のである。The organometallic ink used here was a mixture of the following:
樹脂酸金 15.0重量%
樹脂酸銀 5.0重量%
卑金属樹脂酸塩 05重量%
樹脂 23.0重量%
有機溶剤 56.5重量%
(実施例3)
母材金属銅板(幅5mm、長さ200mm、厚さ0.8
mm)に有機白金インクと有機イリジウムインクを混合
した有機合金インクをハケ塗りにより塗布し、室温で1
0分間乾燥し、200℃で10分間加熱乾燥した後、次
に500℃で5分間焼成して、さらに加熱温度を700
℃に上昇させて5分間焼成した。白金、イリジウムの膜
厚は01μmで、白金とイリジウムの割合は90°10
重量比であった。Gold resinate 15.0% by weight Silver resinate 5.0% by weight Base metal resinate 05% by weight Resin 23.0% by weight Organic solvent 56.5% by weight (Example 3) Base metal copper plate (width 5 mm, length length 200mm, thickness 0.8
An organic alloy ink consisting of a mixture of organic platinum ink and organic iridium ink was applied to the surface (mm) by brushing, and
After drying for 0 minutes, heating and drying at 200°C for 10 minutes, baking at 500°C for 5 minutes, and further increasing the heating temperature to 700°C.
℃ and baked for 5 minutes. The film thickness of platinum and iridium is 01μm, and the ratio of platinum and iridium is 90°10
It was a weight ratio.
ここで用いて有機金属インクは下記のものと混合したも
のである。The organometallic ink used here is a mixture of the following:
樹脂酸白金 7.0重量%
樹脂酸イリジウム 1.2重量%
卑金属樹脂酸塩 05重量%
樹脂 44.5重量%
有機溶剤 46.8重量%
(実施例4)
母材金属銅パイプ(外径8mm、長さ100mm、厚さ
1mm)に有機銀インクと有機銅インクを混合した有機
合金インクをパイプの外側にハケ塗りにより塗布し、室
温で30分間乾燥した後還元ガス雰囲気で500℃、2
0分間焼成した。この模作を3回繰返したところ、0.
3μmの銀、銅合金薄膜を形成したパイプが得られた。Platinum resinate 7.0% by weight Iridium resinate 1.2% by weight Base metal resinate 05% by weight Resin 44.5% by weight Organic solvent 46.8% by weight (Example 4) Base metal copper pipe (outer diameter 8 mm) , length 100 mm, thickness 1 mm), an organic alloy ink containing an organic silver ink and an organic copper ink was applied to the outside of the pipe by brushing, dried at room temperature for 30 minutes, and then heated at 500°C in a reducing gas atmosphere for 20 minutes.
Baked for 0 minutes. When this imitation was repeated three times, 0.
A pipe on which a 3 μm thick silver and copper alloy thin film was formed was obtained.
また銀と銅の割合は70゜30重中比であった。The ratio of silver to copper was 70°30 weight/medium ratio.
ここで用いた有機金属インクは下記のものを混合したも
のである。The organometallic ink used here was a mixture of the following:
樹脂酸銀 140重量%
樹脂酸銅 585重量%
その他卑金属樹脂酸塩 0.5重量%
樹脂 42.0重量%有機溶剤
38.0重量%(実施例5)
実施例4で作製した銀、銅合金薄膜を形成したパイプを
半分に切断したものに実施例1で用いた有機金インクを
ハケ塗りで塗布し、室温で10分間乾燥した後、200
℃で10分間加熱焼成し次に還元ガス雰囲気で400℃
、5分間焼成した。この模作を3回繰返して行ったとこ
ろ、金薄膜層、銀、銅合金薄膜層、銅の母材の3層のパ
イプ材が得られた。Silver resinate 140% by weight Copper resinate 585% by weight Other base metal resinates 0.5% by weight Resin 42.0% by weight Organic solvent
38.0% by weight (Example 5) The organic gold ink used in Example 1 was applied by brush to the pipe on which the silver and copper alloy thin film prepared in Example 4 was cut in half, and the pipe was heated at room temperature. After drying for 10 minutes, 200
℃ for 10 minutes and then heated to 400℃ in a reducing gas atmosphere.
, and baked for 5 minutes. This imitation was repeated three times to obtain a pipe material with three layers: a gold thin film layer, a silver and copper alloy thin film layer, and a copper base material.
(発明の効果)
本発明は、膜厚1μm以下の薄膜層を単体金属又は2種
以上の金属として、しかも数層にも形成することができ
、さらに密着強度の強い、ち密で均一な薄膜複合材料を
製造することができ、従来の各種金属や粉末冶金法等を
用いて製造されている接点材料やブラシ材料においてそ
れぞれの持つ特性から欠点、例えば偏析しやすい合金や
粉末冶金が作られた合金のもろさ等を解決することがで
き、用途に適した特性のある複合材料を製造することが
可能であり、その利用価値は非常に高いものといえる。(Effects of the Invention) The present invention can form a thin film layer with a thickness of 1 μm or less as a single metal or two or more metals, and can also be formed into several layers, and further has a dense and uniform thin film composite with strong adhesion strength. Contact materials and brush materials manufactured using various conventional metals and powder metallurgy methods have drawbacks due to their respective characteristics, such as alloys that tend to segregate or alloys made using powder metallurgy. It is possible to solve problems such as brittleness and produce composite materials with characteristics suitable for various uses, and their utility value can be said to be extremely high.
なお、本発明は、特許請求の範囲に記載した特徴を有す
るものであるが、その実施態様を例示すると次のとおり
である。The present invention has the features described in the claims, and examples of its embodiments are as follows.
(2)有機金属インクとして、有機金インク、有機白金
インク、有機銀インク、有機パラジウムインク、有機イ
リジウムインク、有機ロジウムインク、有機ルデニウム
インク、有機ニッケルインク、有機銅インク、有機亜鉛
インク、有機タンクステンインク、有機カドミウムイン
ク、有機インジウムインク、有機モリブデンインク、有
機マクネシウムインクから成る群より選択される1種又
は2種以上の有機金属インクからなる請求項1記載の金
属薄膜合成材料の製造方法。(2) As organic metal inks, organic gold ink, organic platinum ink, organic silver ink, organic palladium ink, organic iridium ink, organic rhodium ink, organic rhodium ink, organic nickel ink, organic copper ink, organic zinc ink, organic The production of the metal thin film synthetic material according to claim 1, which comprises one or more organic metal inks selected from the group consisting of tanksten ink, organic cadmium ink, organic indium ink, organic molybdenum ink, and organic magnesium ink. Method.
出卵人 田中貴金属工業株式会社
手続補正書(自発)
1、事件の表示
昭和fi 3年特3′F願第8 [i 7 II 3号
2、発明の名称
金属薄膜複合飼料の製造方法
3゜補正をする者
事件との関係 特許出願人
明細書の発明の詳細な説明の欄
5 補正の内容
(1)明細書第3頁第4〜6行の1(狭義には、・・を
もつ化合物)」を削除する。Procedural amendment by Tanaka Kikinzoku Kogyo Co., Ltd. (voluntary) 1. Indication of the case Showa fi 3 Patent Application No. 3'F No. 8 [i 7 II No. 3 2. Name of the invention Method for producing metal thin film composite feed 3゜Relationship with the case of the person making the amendment Detailed explanation of the invention in the patent applicant's specification Column 5 Contents of the amendment (1) Page 3 of the specification, lines 4-6, 1 (in a narrow sense, a compound having... )” is deleted.
Claims (1)
した後、焼成することにより1又は2層以上金属の薄膜
を形成させることを特徴とする金属薄膜複合材料の製造
方法。1. A method for producing a metal thin film composite material, which comprises forming one or more metal thin films by applying an organic metal ink onto a base metal, drying it, and then firing it.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63086743A JPH01259176A (en) | 1988-04-08 | 1988-04-08 | Production of thin metal film type composite material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63086743A JPH01259176A (en) | 1988-04-08 | 1988-04-08 | Production of thin metal film type composite material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01259176A true JPH01259176A (en) | 1989-10-16 |
Family
ID=13895275
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63086743A Pending JPH01259176A (en) | 1988-04-08 | 1988-04-08 | Production of thin metal film type composite material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01259176A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58733A (en) * | 1981-06-25 | 1983-01-05 | Kawasaki Heavy Ind Ltd | Leak detecting method in case of breakdown of bellows |
JPS6192389A (en) * | 1984-10-11 | 1986-05-10 | 株式会社東芝 | Bellows joint device |
-
1988
- 1988-04-08 JP JP63086743A patent/JPH01259176A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58733A (en) * | 1981-06-25 | 1983-01-05 | Kawasaki Heavy Ind Ltd | Leak detecting method in case of breakdown of bellows |
JPS6192389A (en) * | 1984-10-11 | 1986-05-10 | 株式会社東芝 | Bellows joint device |
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