JPH06330327A - Production of metallic thin film combined material - Google Patents

Production of metallic thin film combined material

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Publication number
JPH06330327A
JPH06330327A JP13692593A JP13692593A JPH06330327A JP H06330327 A JPH06330327 A JP H06330327A JP 13692593 A JP13692593 A JP 13692593A JP 13692593 A JP13692593 A JP 13692593A JP H06330327 A JPH06330327 A JP H06330327A
Authority
JP
Japan
Prior art keywords
thin film
metal
metalloorganic
composite material
tin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13692593A
Other languages
Japanese (ja)
Inventor
Chihiro Nakanishi
千博 中西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP13692593A priority Critical patent/JPH06330327A/en
Publication of JPH06330327A publication Critical patent/JPH06330327A/en
Pending legal-status Critical Current

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  • Chemically Coating (AREA)

Abstract

PURPOSE:To form a thin film of a simple metal or an alloy of two or more kinds of metals and to produce a uniform metallic thin film combined material excellent, in adhesion. CONSTITUTION:The top of a substrate metal is coated with an organometallic compd. alone or a metallo-org. material consisting of the organometallic compd., a resin and an org. solvent and the resulting coating film is dried and baked. The organometallic compd. contains one or more kinds of metals selected from among Al, Ga, Ge, Ir, Sn, Sb, Pb and Bi.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、金属薄膜複合材料の製
造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a metal thin film composite material.

【0002】[0002]

【従来の技術】従来の金属複合材料としての製造方法
は、線状、テープ状に加工した金属材料を異種の母材金
属材に圧着、熱着または中間に接着用各種ろう材を用い
てろう付けする方法があり、また他の方法として、電気
メッキ法、無電解メッキ法および金属ペーストを塗布し
て焼付ける方法が一般的に用いられる。
2. Description of the Related Art In the conventional manufacturing method as a metal composite material, a metal material processed into a linear or tape shape is crimped to a different base metal material, heat-bonded, or various brazing materials for adhesion are used in the middle. There is also a method of applying, and as other methods, an electroplating method, an electroless plating method and a method of applying a metal paste and baking it are generally used.

【0003】これらの方法の欠点として、メッキ法は密
着強度の不足や合金メッキ等における適したメッキ浴が
ないこと、機械加工で線状、テープ状に加工することで
は張厚5μm以下の複合材料を製造することが金属の展
延特性や合金特性等から極めて困難であり、金属ペース
トを塗布して焼付けする方法では金属粉末を用いるため
膜厚のバラツキが大きく、密着力も不十分であるという
欠点があった。
Disadvantages of these methods are that the plating method lacks adhesion strength, that there is no suitable plating bath for alloy plating, etc., and that it is a composite material with a thickness of 5 μm or less when machined into a linear or tape shape. It is extremely difficult to manufacture due to the spreading characteristics and alloy characteristics of the metal, and the method of coating and baking a metal paste uses metal powder, resulting in large variations in film thickness and insufficient adhesion. was there.

【0004】その他、蒸着法等も用いられるが、蒸着設
備として特殊な設備を必要とする等経済性ならびに操作
が複雑化する等の欠点があるため極めて特殊な材料にの
み利用される程度である。
In addition to the above, the vapor deposition method and the like are also used, but since they have drawbacks such as economic need such as special equipment as vapor deposition equipment and complicated operation, they are used only for extremely special materials. .

【0005】[0005]

【発明が解決しようとする課題】本発明は、上記従来法
の欠点を解決するために成されたもので、特に膜厚 1.5
μm以下の薄膜層を単体金属または2種以上の合金とし
て、しかも数層にも形成することができ、さらに密着性
に優れ、緻密で均一な金属薄膜複合材料の製造方法を提
供することを目的とする。
The present invention has been made to solve the above-mentioned drawbacks of the conventional method.
An object of the present invention is to provide a method for producing a dense and uniform metal thin film composite material, which can form a thin film layer having a thickness of μm or less as a single metal or an alloy of two or more kinds, and even several layers, and has excellent adhesion. And

【0006】[0006]

【課題を解決するための手段】本発明は、母材金属上に
有機金属化合物単独又は有機金属化合物、樹脂及び有機
溶剤から成るメタロオーガニックを塗布し、乾燥後焼付
けることにより、1層または2層以上の金属の薄膜を形
成させることを特徴とする金属薄膜複合材料の製造方法
であり、前記メタロオーガニック中に含まれる有機金属
化合物が、アルミニウム、ガリウム、ゲルマニウム、イ
ンジウム、スズ、アンチモン、鉛及びビスマスから選ば
れる1種または2種以上の有機酸金属塩である金属薄膜
複合材料の製造方法である。
According to the present invention, a metalloorganic compound consisting of an organometallic compound alone or an organometallic compound, a resin and an organic solvent is applied onto a base metal, dried and baked to form one layer or two layers. A method for producing a metal thin film composite material, comprising forming a metal thin film having a layer or more, wherein the organometallic compound contained in the metalloorganic material is aluminum, gallium, germanium, indium, tin, antimony, lead and A method for producing a metal thin film composite material, which is one or more kinds of organic acid metal salts selected from bismuth.

【0007】前記メタロオーガニックは樹脂酸の金属塩
等の有機金属化合物単独又は有機金属化合物とバインダ
としての各種樹脂と、これらを溶解する有機溶剤から成
る均一な液状のものである。
The metallo-organic is a uniform liquid which is composed of an organic metal compound such as a metal salt of a resin acid or an organic metal compound and various resins as a binder, and an organic solvent which dissolves them.

【0008】バインダとして添加する各種樹脂は、アル
キッド樹脂、尿素樹脂等から選び、有機溶剤としてはタ
ーピネオール、ブチルカルビトール等いずれも従来の印
刷インキや厚膜金属ペーストに使用されているもので、
有機金属化合物を溶解して均一な液状にすることのでき
るものであれば良く、特に限定されない。
Various resins to be added as a binder are selected from alkyd resins, urea resins and the like, and as organic solvents, terpineol, butyl carbitol and the like are all used in conventional printing inks and thick film metal pastes.
It is not particularly limited as long as it can dissolve the organometallic compound into a uniform liquid state.

【0009】有機金属化合物の金属としてアルミニウ
ム、ガリウム、ゲルマニウム、インジウム、スズ、アン
チモン、鉛及びビスマスから選ばれる1種または2種以
上の金属とするのは、これらの金属および合金は、軟ら
かく、展延性に富むため、柔軟性を要求されるテープ状
金属薄膜複合材料を製造するのに適しているからであ
る。また、同時に、これらの金属は低融点の合金を作り
やすいことから母材金属上に2層以上の薄膜を形成する
際に、第1層を形成する薄膜とし、第2層以降の薄膜の
密着強度を高めることができるものである。
The metal of the organometallic compound is one or more metals selected from aluminum, gallium, germanium, indium, tin, antimony, lead and bismuth, because these metals and alloys are soft and spread. Because it is rich in ductility, it is suitable for producing a tape-shaped metal thin film composite material that requires flexibility. At the same time, since these metals easily form low melting point alloys, when forming two or more thin films on the base metal, the first layer is formed as a thin film, and the second and subsequent thin films are adhered to each other. The strength can be increased.

【0010】また、本発明によるメタロオーガニックを
母材金属上に薄膜形成させるには、スクリーン印刷、ハ
ケ塗り、ディッピング等によって塗布し、乾燥後、 300
〜1000℃の不活性ガス雰囲気中で焼付け、金属薄膜を得
ることができる。焼付け温度は母材金属の耐熱性および
メタロオーガニック中の金属の融点等を考慮して決定す
るが、 300℃以下ではメタロオーガニック中の樹脂成分
が残留することがあり好ましくない。
In order to form a thin film of the metalloorganic material of the present invention on the base metal, it is applied by screen printing, brush coating, dipping, etc., and after drying, 300
A metal thin film can be obtained by baking in an inert gas atmosphere of up to 1000 ° C. The baking temperature is determined in consideration of the heat resistance of the base metal and the melting point of the metal in the metalloorganic, but it is not preferable at 300 ° C or lower because the resin component in the metalloorganic remains.

【0011】なお、前記金属薄膜の厚み調製する方法と
して、メタロオーガニック中の有機金属化合物の割合を
調節するか、塗布、乾燥、焼付けの操作を繰り返し行う
か選択することができるが、該メタロオーガニックの使
用中から、有機金属化合物は1〜 100wt%、バインダと
しての樹脂は0〜70wt%、残部有機溶剤から成る成分割
合とすることが好ましく、このような成分割合で調製し
たメタロオーガニックを用いて、塗布、乾燥、焼付けた
際の金属薄膜の厚みは0.05〜1.0 μmが得られるもので
ある。
As a method for adjusting the thickness of the metal thin film, it is possible to adjust the ratio of the organometallic compound in the metalloorganic or to repeat the operations of coating, drying and baking. It is preferable that the content ratio of the organometallic compound is 1 to 100 wt%, the resin as the binder is 0 to 70 wt%, and the balance is the organic solvent, and the metalloorganic prepared in such a proportion is used. The thickness of the metal thin film after coating, drying and baking is 0.05 to 1.0 μm.

【0012】以下、本発明に係わる実施例を記載する
が、該実施例は本発明を限定するものではない。
Hereinafter, examples according to the present invention will be described, but the examples do not limit the present invention.

【0013】[0013]

【実施例1】 樹脂酸スズ 20wt% 樹脂酸アンチモン 20wt% 樹脂バインダ(ロジン樹脂) 30wt% 有機溶剤(α−ターピネオール) 30wt% 上記組成のスズ−アンチモンメタロオーガニックを調製
し、厚さ 0.2mm幅30mmの洋白テープ状母材金属上にスク
リーン印刷にて塗布した後、 125℃で10分間乾燥し、窒
素雰囲気中 400℃で10分間焼付けて厚さ 0.4μmのスズ
−アンチモン合金薄膜を得た。
Example 1 Tin resinate 20 wt% Antimony resinate 20 wt% Resin binder (rosin resin) 30 wt% Organic solvent (α-terpineol) 30 wt% A tin-antimony metalloorganic of the above composition was prepared, thickness 0.2 mm width 30 mm Was coated on the nickel-white tape-shaped base metal by screen printing, dried at 125 ° C. for 10 minutes, and baked at 400 ° C. for 10 minutes in a nitrogen atmosphere to obtain a tin-antimony alloy thin film having a thickness of 0.4 μm.

【0014】このテープを直角に折り曲げて、スズ−ア
ンチモン合金薄膜の密着強度を試験したことがヒビ割
れ、剥がれは生じなかった。また、該薄膜の表面を拡大
して観察したところ緻密なものであった。
When this tape was bent at a right angle and the adhesion strength of the tin-antimony alloy thin film was tested, neither cracking nor peeling occurred. In addition, when the surface of the thin film was enlarged and observed, it was dense.

【0015】[0015]

【実施例2】実施例1で得たスズ−アンチモン合金薄膜
を形成させた洋白テープ材のスズ−アンチモン合金薄膜
上側に金メタロオーガニック(組成:樹脂酸Au30%、
ロジン樹脂20%、樹脂酸ロジウム 0.2%、樹脂酸ビスマ
ス2%、α−ターピネオール47.8%)をスクリーン印刷
で塗布し、 125℃で乾燥したのち、 400℃で焼付けて金
の厚さ 0.2μmの薄膜を形成した。
Example 2 Gold metalloorganic (composition: 30% of resin acid Au, on the upper side of the tin-antimony alloy thin film of the nickel silver tape material on which the tin-antimony alloy thin film obtained in Example 1 was formed.
20% rosin resin, 0.2% rhodium resinate, 2% bismuth resinate, 47.8% α-terpineol) were applied by screen printing, dried at 125 ° C, and then baked at 400 ° C to form a gold thin film with a thickness of 0.2 μm. Was formed.

【0016】該金の薄膜の密着強度試験として、断面積
4mm2 のピンをハンダ付けによって、金の薄膜上に接合
し、引っ張り試験を行ったところ、2Kg/mm2であった。
また、このとき得られた洋白上スズ−アンチモン−金材
(厚さ 0.2mm、巾30mm) を圧延機にて 0.1mm厚まで圧延
したが、ヒビ割れ、剥がれは生じなかった。
As an adhesion strength test of the gold thin film, a pin having a cross-sectional area of 4 mm 2 was joined to the gold thin film by soldering, and a tensile test was conducted to find that it was 2 kg / mm 2 .
The nickel-silver tin-antimony-gold material (thickness 0.2 mm, width 30 mm) obtained at this time was rolled by a rolling mill to a thickness of 0.1 mm, but no cracking or peeling occurred.

【0017】なお、洋白テープ材にスズ−アンチモン合
金薄膜を形成させず、直接金メタロオーガニックを同様
に塗布、乾燥、焼付けたものの金の薄膜の密着強度試験
を同様に行ったところ、 1.2Kg/mm2であった。
When a tin-antimony alloy thin film was not formed on the nickel-silver tape material, a gold metalloorganic was directly applied, dried, and baked, and the adhesion strength test of the gold thin film was similarly performed. It was / mm 2 .

【0018】[0018]

【発明の効果】以上説明したように、本発明の製造方法
によれば、従来法では困難であった1.5μm以下の金属
薄膜を形成させることができ、しかも、展延性に富み、
緻密で密着力に優れた金属薄膜複合材料を製造すること
ができるものである。
As described above, according to the manufacturing method of the present invention, it is possible to form a metal thin film having a thickness of 1.5 μm or less, which is difficult by the conventional method, and moreover, it is excellent in ductility.
It is possible to manufacture a metal thin film composite material that is dense and has excellent adhesion.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 母材金属上に有機金属化合物単独又は有
機金属化合物、樹脂及び有機溶剤から成るメタロオーガ
ニックを塗布し、乾燥後焼付けることにより、1層また
は2層以上の金属の薄膜を形成させることを特徴とする
金属薄膜複合材料の製造方法。
1. A metal thin film of one layer or two or more layers is formed by applying a metalloorganic composed of an organometallic compound alone or an organometallic compound, a resin and an organic solvent onto a base metal, drying and baking. A method for producing a metal thin film composite material, comprising:
【請求項2】 前記メタロオーガニック中に含まれる有
機金属化合物が、アルミニウム、ガリウム、ゲルマニウ
ム、インジウム、スズ、アンチモン、鉛及びビスマスか
ら選ばれる1種または2種以上の有機酸金属塩である請
求項1に記載の金属薄膜複合材料の製造方法。
2. The organic metal compound contained in the metalloorganic is one or more organic acid metal salts selected from aluminum, gallium, germanium, indium, tin, antimony, lead and bismuth. 1. The method for producing a metal thin film composite material according to 1.
JP13692593A 1993-05-14 1993-05-14 Production of metallic thin film combined material Pending JPH06330327A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13692593A JPH06330327A (en) 1993-05-14 1993-05-14 Production of metallic thin film combined material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13692593A JPH06330327A (en) 1993-05-14 1993-05-14 Production of metallic thin film combined material

Publications (1)

Publication Number Publication Date
JPH06330327A true JPH06330327A (en) 1994-11-29

Family

ID=15186781

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13692593A Pending JPH06330327A (en) 1993-05-14 1993-05-14 Production of metallic thin film combined material

Country Status (1)

Country Link
JP (1) JPH06330327A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016108656A (en) * 2014-10-13 2016-06-20 ヘレウス ドイチェラント ゲーエムベーハー ウント カンパニー カーゲー Copper color coating material, its preparation process and its application

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016108656A (en) * 2014-10-13 2016-06-20 ヘレウス ドイチェラント ゲーエムベーハー ウント カンパニー カーゲー Copper color coating material, its preparation process and its application

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