JPH01253293A - Printed wiring substrate and manufacture thereof - Google Patents

Printed wiring substrate and manufacture thereof

Info

Publication number
JPH01253293A
JPH01253293A JP8110888A JP8110888A JPH01253293A JP H01253293 A JPH01253293 A JP H01253293A JP 8110888 A JP8110888 A JP 8110888A JP 8110888 A JP8110888 A JP 8110888A JP H01253293 A JPH01253293 A JP H01253293A
Authority
JP
Japan
Prior art keywords
plating
pattern
printed wiring
electrode
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8110888A
Other languages
Japanese (ja)
Inventor
Hiroshi Tsukagoshi
洋 塚越
Naohiro Morozumi
直洋 両角
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamaha Motor Co Ltd
Original Assignee
Yamaha Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamaha Motor Co Ltd filed Critical Yamaha Motor Co Ltd
Priority to JP8110888A priority Critical patent/JPH01253293A/en
Publication of JPH01253293A publication Critical patent/JPH01253293A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern

Abstract

PURPOSE:To realize the increase of a sectional area of a pattern, through which a large current is made to flow, without expanding the pattern in width so as to improve it in integration by a method wherein parts of the wiring pattern are formed of plating films different from each other in thickness respectively. CONSTITUTION:Wiring circuit sections 3 and 4 (region A) and a power circuit section 5 (region B) are formed on a rear 2a of a base board 2 through an electroplating. Through-holes 3a and 3b are provided to both the ends of the circuit sections 3 and 4. The plating thickness of the circuit section 5 provided inside the region B is nearly two times as large as those of the circuits 3 and 4 positioned inside the region A. Then, the sectional area of the pattern is made to increase without expanding it in width so much. By these processes, the pattern through which a large current is made to flow can be increased in a sectional area with expanding it in width, so that the pattern can be in creased in integration.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は絶縁性ベース基板上に金属配線をめっきにより
パターン形成したプリント配線基板及びその製造方法に
関し、特に電源回路部分等のように電流流量の比較的大
きい配線部分のパターン幅を狭小化でき、高集積度化を
図ることができるようにしためっき膜形状の改善に関す
る。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a printed wiring board in which metal wiring is patterned by plating on an insulating base substrate, and a method for manufacturing the same, and particularly relates to a printed wiring board in which a pattern of metal wiring is formed by plating on an insulating base substrate, and a method for manufacturing the same. The present invention relates to an improvement in the shape of a plating film that allows the pattern width of a relatively large wiring portion to be narrowed and a high degree of integration to be achieved.

〔従来の技術〕[Conventional technology]

プリント配線基板の製造において、ベース基板上に金属
配線をパターン形成する方法としてめっきによる方法が
ある。これは例えば、配線パターンの形状に応じためっ
きレジスト膜が装着されたベース基板を電極ととともに
めっき液中に浸漬し、ベース基板にv源の陰極を、電極
に陽極をそれぞれ接続し、両者間に所定電圧を印加する
ことによって、上記めっきレジスト膜から露出した部分
にめっき膜を形成する方法である。
In the manufacture of printed wiring boards, there is a plating method as a method of patterning metal wiring on a base substrate. For example, a base substrate on which a plating resist film is attached according to the shape of the wiring pattern is immersed together with an electrode in a plating solution, the cathode of the V source is connected to the base substrate, the anode is connected to the electrode, and the gap between the two is connected. In this method, a plating film is formed on the portion exposed from the plating resist film by applying a predetermined voltage to the plating resist film.

ところで、上記プリント配線基板における配線パターン
においては、例えば電源回路部分のように比較的大電流
を流す必要のある部分があり、このような部分はそれだ
けパターンの断面積を大きくする必要がある。この断面
積拡大方法としては、従来は該部分のパターン幅を広く
するのが一般的である。
By the way, in the wiring pattern of the printed wiring board, there is a part such as a power supply circuit part where a relatively large current needs to flow, and the cross-sectional area of the pattern needs to be increased accordingly in such a part. Conventionally, as a method for enlarging the cross-sectional area, it has been common to widen the pattern width of the portion.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら上述のようにパターン幅の拡大によって大
電流に対応するようにした場合、当然ながら必要なパタ
ーンの平面視面積が拡大し、これがパターンの高集積度
化の制約となり、結局基板が大型化してしまうという問
題がある。
However, as mentioned above, when expanding the pattern width to support large currents, the required area of the pattern in plan view naturally increases, which becomes a constraint on higher pattern integration, and ultimately leads to an increase in the size of the board. There is a problem with putting it away.

このようなパターン面積の拡大を抑制する方法として、
従来、めっき膜上にはんだを重ねて付着させる方法があ
ったが、この方法は、基板にソルダレジストを形成した
復液基板をはんだ浴面に浮かせる必要があり、それだけ
工程が増加し、生産性が低下する。またはんだ付着部は
大気に露出することとなるから雰囲気の湿度によりシロ
ートのおそれがあり、隣接パターンとあまり近接させる
ことができず、結局集積度をそれほど向上できない、さ
らにはんだは導電性がCuと比較すると1/3程度とあ
まりよくないので、この点からも集積度向上効果が低い
As a method to suppress such expansion of pattern area,
Conventionally, there was a method of depositing solder in layers on the plating film, but this method required floating the condensed liquid substrate with solder resist formed on the substrate on the solder bath surface, which increased the number of steps and reduced productivity. decreases. Since the solder-adhered area is exposed to the atmosphere, there is a risk of siltation due to the humidity of the atmosphere, and it is not possible to place the solder in close proximity with the adjacent pattern, resulting in the inability to improve the degree of integration.Furthermore, the conductivity of the solder is Cu. In comparison, it is about 1/3, which is not very good, and from this point of view as well, the effect of improving the degree of integration is low.

そこで本発明は、上記従来の問題点を解消するためにな
されたもので、製造工程をあまり増加させるとこなく、
かつパターン幅を拡大することなくパターン断面積を増
大でき、パターンの高集積度化、基板の小型化を実現で
きるプリント配線基板及びその製造方法を提供すること
を目的としている。
Therefore, the present invention was made in order to solve the above-mentioned conventional problems, and without increasing the manufacturing process too much,
Another object of the present invention is to provide a printed wiring board and a method for manufacturing the same, which can increase the cross-sectional area of the pattern without increasing the pattern width, achieve higher integration of the pattern, and reduce the size of the board.

〔問題点を解決するための手段〕[Means for solving problems]

本願の特定発明は、ベース基板上にめっき膜からなる配
線パターンを形成してなるプリント配線基板において、
上記配線パターンの一部領域のめっき膜を他領域のめっ
き膜より厚く形成したことを特徴としている。
The specific invention of the present application provides a printed wiring board in which a wiring pattern made of a plating film is formed on a base substrate,
It is characterized in that the plating film in some areas of the wiring pattern is formed thicker than the plating film in other areas.

また、本願の関連発明は、配線パターンの一部領域のめ
っき膜が他領域のめっき膜より厚いプリント配線基板の
製造方法であって、ベース基板及び電極をめっき液中に
浸漬し、電気めっきを複数段階に分けて行い、各段階ご
とに異なる形状のマスクをベース基板又は電極に装着し
て電気めっきを行うようにしたことを特徴としているに
の関連発明方法では、ベース基板にめっきレジスト膜と
してのマスクを装着する方法と、電極にマスクを装着す
る方法の両方が含まれるが、電極にマスクを装着する場
合は、電極とベース基板とを対向するように配置するの
が望ましい。
Further, a related invention of the present application is a method for manufacturing a printed wiring board in which the plating film in some areas of the wiring pattern is thicker than the plating film in other areas, the base board and the electrodes being immersed in a plating solution, and electroplating. The related invention method is characterized in that electroplating is carried out in multiple stages, and in each stage a mask of a different shape is attached to the base substrate or electrode to perform electroplating. This includes both a method of attaching a mask to an electrode and a method of attaching a mask to an electrode, but when attaching a mask to an electrode, it is preferable to arrange the electrode and the base substrate so as to face each other.

また、本願の他の関連発明は、上記電気めっきを2〒う
際に、を極にマスクを装着し、かつこのマスクとして、
めっき膜厚を厚くしようとする領域に対応する部分はど
開口率の大きいマスクを採用したことを特徴としている
In addition, another related invention of the present application is to attach a mask to the poles when performing the electroplating, and as this mask,
The feature is that a mask with a large aperture ratio is used in the area corresponding to the area where the plating film thickness is to be increased.

〔作用〕[Effect]

本願の特定発明では、プリント配線基板の配線パターン
の、例えば外部電源と基板内の搭載部品とを接続する電
源回路部分のめっき膜厚さを他の部分に比較して厚くし
たので、パターン幅をそれほど広くすることなくパター
ン断面積を増大でき、従ってパターン幅を拡大すること
なく大電流に対応でき、配線パターンの集積度を向上で
き、基板の小型化を達成できる。
In the specific invention of the present application, the plating film thickness of the wiring pattern of the printed wiring board, for example, the power supply circuit part that connects the external power supply and the components mounted in the board, is made thicker than other parts, so that the pattern width can be reduced. The cross-sectional area of the pattern can be increased without increasing the width, therefore, it is possible to handle a large current without increasing the width of the pattern, the degree of integration of the wiring pattern can be improved, and the size of the substrate can be reduced.

また、本願の関連発明では、例えば電気めっきを2段階
に分けて、各段階ごとに異なる形状のマスクをベース基
板又は電極に装着するようにしたので、第1段階のめっ
きにおいては、全領域のパターンにめっきが析出し、第
2段階においては、めっき膜厚を厚くしようとする領域
のパターンのみにめっきが析出し、これにより所望領域
のめっき膜厚を他の部分より厚くできる。この場合、基
板側にマスクを装着した場合は、膜厚を領域によって鮮
明に変化させることができる。また、電極側にマスクを
装着した場合は、第1のマスクを装着した状態で多数の
基板に第1段階のめっきを施し、第2のマスクを装着し
た状態で上記各基板を再びめっきすればよく、マスクを
一回取り替えるだけで多数の基板をめっきでき、作業能
率を向上できる。
In addition, in the related invention of the present application, for example, electroplating is divided into two stages, and a mask of a different shape is attached to the base substrate or electrode in each stage, so that in the first stage plating, the entire area is covered. The plating is deposited on the pattern, and in the second step, the plating is deposited only on the pattern in the region where the plating film thickness is to be increased, thereby making it possible to make the plating film thickness in the desired region thicker than in other parts. In this case, if a mask is attached to the substrate side, the film thickness can be clearly changed depending on the region. In addition, if a mask is attached to the electrode side, the first stage plating is performed on a number of substrates with the first mask attached, and each of the above substrates is plated again with the second mask attached. Often, a large number of substrates can be plated by changing the mask once, improving work efficiency.

また他の関連発明では、膜厚を厚くしようとする領域に
対応する部分はど開口率が大きいマスクを電極に装着し
たので、該領域部分の電流密度が他の部分より高くなり
、−度のめっき工程においてパターンの膜厚を部分的に
厚くすることができ、上述の関連発明方法よりさらに作
業能率が向上する。
In another related invention, a mask with a large aperture ratio is attached to the electrode in the region corresponding to the region where the film thickness is to be increased, so that the current density in the region is higher than in other regions, resulting in - In the plating process, the film thickness of the pattern can be partially increased, and the work efficiency is further improved compared to the related invention method described above.

〔実施例〕〔Example〕

以下、本発明の実施例を図について説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第1図ないし第4図は本発明の一実施例によるプリント
配線基板及びその製造方法を説明するための図である。
1 to 4 are diagrams for explaining a printed wiring board and a manufacturing method thereof according to an embodiment of the present invention.

本実施例によるプリント配線基板を模式的に示す第1図
において、1はプリント配線基板であり、これはベース
基板2の裏面2aに、配線回路部3゜4(fil域A)
及び電源回路部5 (領域B)を電気めっきによって形
成したものである。上記配線回路部3.4の両端には、
スルーホール3a、4aが形成されており、図示してい
ないが該スルーホール3a、4aには該基板2の表面2
b側に搭載された電子部品の端子が挿入され、はんだ付
は接続されている。また、電源回路部5のスルーホール
5a部分には、これも図示していないが、表面2bに搭
載された外部接続ソケットの端子が挿入され、はんだ付
は接読されている。
In FIG. 1 schematically showing a printed wiring board according to this embodiment, 1 is a printed wiring board, which has a wiring circuit section 3° 4 (fil area A) on the back surface 2a of a base board 2.
and the power supply circuit section 5 (area B) are formed by electroplating. At both ends of the wiring circuit section 3.4,
Through holes 3a and 4a are formed, and although not shown, the surface 2 of the substrate 2 is formed in the through holes 3a and 4a.
The terminals of the electronic components mounted on the b side are inserted and the soldering connections are made. Although not shown, the terminal of an external connection socket mounted on the surface 2b is inserted into the through hole 5a of the power supply circuit section 5, and soldering is performed directly.

そして上記領域B内に位置する電源回路部5のめっき膜
厚は、領域A内に位置する配線回路部3゜4の膜厚の約
2倍になっている。
The plating film thickness of the power supply circuit section 5 located within the region B is approximately twice that of the wiring circuit section 3.4 located within the region A.

第3図、第4図において、24は上記ベース基板2上に
上記配線回路部3.4及び電源回路部5をめっき形成す
るためのめっき装置を示し、該めっき装置24は、本体
部25と、これにめっき液タンク26内の硫酸銅等の酸
性鋼めっき液Pを供給する供給装置27とから構成され
ている。この供給装置27は、供給ポンプ28と、供給
側ヘッダ29.排出側ヘッダ30間を連結する第1.第
2供給通路31,32.第1.第2排出通路33゜34
と、該各通路に配設された第1.第2開閉弁35.36
、第1.第2流量計37.38、第1゜第2電磁弁39
.40とで構成されている。
In FIGS. 3 and 4, reference numeral 24 denotes a plating device for forming the wiring circuit portion 3.4 and the power supply circuit portion 5 on the base substrate 2 by plating, and the plating device 24 is connected to the main body portion 25. , and a supply device 27 that supplies an acidic steel plating solution P such as copper sulfate in a plating solution tank 26 to this. This supply device 27 includes a supply pump 28 and a supply side header 29 . The first one connects the discharge side headers 30. Second supply passages 31, 32. 1st. 2nd discharge passage 33°34
and a first one disposed in each passage. Second on-off valve 35.36
, 1st. 2nd flow meter 37.38, 1st degree second solenoid valve 39
.. It consists of 40.

また、上記本体部25は、めっき室を構成するケーシン
グ43内に電極44.44を対向配設し、該両電極間に
保持ブラケット45を形成して構成されている。上記電
極44は電源の陽極゛に、保持ブラケット45は陰極に
それぞれ接続されている。
Further, the main body section 25 is constructed by disposing electrodes 44, 44 facing each other in a casing 43 constituting a plating chamber, and forming a holding bracket 45 between the two electrodes. The electrode 44 is connected to the anode of the power source, and the holding bracket 45 is connected to the cathode.

なお、上記保持ブラケット45に被めっき部材としての
ベース基板を装着すると、該ケーシング43はこの基板
により第1.第2めっき室46,47に区分けされ、こ
の両めっき室46.47を介して上記第1供給、排出通
路31.33及び第2供給、排出通路32.34のそれ
ぞれが連通ずることとなる。
Note that when a base board as a member to be plated is attached to the holding bracket 45, the casing 43 is attached to the first base board by this board. It is divided into second plating chambers 46 and 47, and the first supply and discharge passages 31.33 and the second supply and discharge passages 32.34 communicate with each other via these two plating chambers 46 and 47.

次に上記第1図のプリント配線基板1を本願の関連発明
の一実施例方法により製造する場合について説明する。
Next, a case will be described in which the printed wiring board 1 shown in FIG. 1 is manufactured by a method according to an embodiment of the related invention of the present application.

■ 例えば、ガラス繊維入りエポキシ樹脂層を約10層
積層し、これをプレス成形してなるベース基板2を準備
し、所定位置にスルーホールを貫通形成するとともに、
無電解めっきにより、該ベース基板の両表面及びスルー
ホールの内周面に下地Cuめっき層を2〜5μmの厚さ
に形成して該ベース基板2に導電性を与える。
For example, a base substrate 2 is prepared by laminating about 10 glass fiber-containing epoxy resin layers and press-molding them, and through-holes are formed at predetermined positions.
A base Cu plating layer with a thickness of 2 to 5 μm is formed on both surfaces of the base substrate and the inner circumferential surface of the through hole by electroless plating to impart conductivity to the base substrate 2.

■ 上記下地Cuめっき層上に、感光性ドライフィルム
を熱圧着し、これの上面に上記各回路部3〜5に対応し
た形状のマスクを密着して露光。
(2) A photosensitive dry film is thermocompression bonded onto the base Cu plating layer, and a mask having a shape corresponding to each of the circuit parts 3 to 5 is closely attached to the upper surface of the film and exposed.

現像し、これによりめっきレジスト膜で覆われためっき
レジスト基板18 (第3図参照)を形成する。
This is developed, thereby forming a plating resist substrate 18 (see FIG. 3) covered with a plating resist film.

■ 次に上記めっき装置24により、上記めっきレジス
ト基板18にCuめっき層を形成する。
(2) Next, a Cu plating layer is formed on the plating resist substrate 18 using the plating apparatus 24.

この場合先ず、第1段階のめっきを行うために、表面に
マスクが装着されていない通常のチタン合金製電極44
a (第2図(a))をケーシング43内に装着する。
In this case, first, in order to perform the first stage plating, an ordinary titanium alloy electrode 44 without a mask attached to the surface is used.
a (FIG. 2(a)) is installed in the casing 43.

そして、めっきレジスト基板18をケーシング43内の
保持ブラケット45に装着し、循環ポンプ28を運転す
るとともに、めっき用電源をオンする。するとめっき液
Pが第1.第2供給通路31.32からケーシング43
内に供給され、めっきレジスト基板18の両表面に沿っ
て流動し、該基板18のめっきレジスト膜のパターン開
口から露出している部分にCuめっき層が形成される。
Then, the plating resist substrate 18 is mounted on the holding bracket 45 inside the casing 43, the circulation pump 28 is operated, and the plating power source is turned on. Then, plating solution P becomes the first plating solution. From the second supply passage 31.32 to the casing 43
The Cu plating layer is supplied to the plating resist substrate 18, flows along both surfaces of the plating resist substrate 18, and forms a Cu plating layer on the portion of the substrate 18 exposed from the pattern opening of the plating resist film.

またこのとき、第1開閉弁35の開度を第2開閉弁36
より大きく設定すれば、れにより、ケーシング43内の
第1めっき室46の流速F1が第2めっき室47の流速
F2より高くなり、かつ第1めっき室46例の圧力が高
くなる。そのためめっき液の一部は第1めっき室46か
らスルーホール13内を通って第2めっき室47内に流
動しく矢印F3)、その結果、スルーホールの下地めっ
き層上にもめっき層が確実に形成されることとなる。
Also, at this time, the opening degree of the first on-off valve 35 is changed to the second on-off valve 36.
If it is set larger, the flow velocity F1 in the first plating chamber 46 in the casing 43 becomes higher than the flow velocity F2 in the second plating chamber 47, and the pressure in the first plating chamber 46 becomes higher. Therefore, a part of the plating solution flows from the first plating chamber 46 through the through hole 13 into the second plating chamber 47 (arrow F3), and as a result, the plating layer is reliably formed on the base plating layer of the through hole. It will be formed.

■ 次に第2段階のめっきを行うために、絶縁性シート
からなるめっきレジストマスク45が貼着された電極4
4b(第2図(bl)を上記めっき装置24に装着する
。このマスク45には上記領域Bに対応する部分に開口
45aが形成されており、従って該領域已に位置する電
源回路部5のみにめっきが析出し、該回路部5のめっき
膜厚は上記配線回路部3,4のめっき膜厚の約2倍の厚
さになる。
■ Next, in order to perform the second stage plating, the electrode 4 is attached with a plating resist mask 45 made of an insulating sheet.
4b (FIG. 2(bl)) is attached to the plating apparatus 24. This mask 45 has an opening 45a formed in a portion corresponding to the region B, so that only the power supply circuit section 5 located across the region B is formed. The plating is deposited on the circuit portion 5, and the thickness of the plating film on the circuit portion 5 is approximately twice that of the wiring circuit portions 3 and 4.

■ 上記めっき膜が形成された基板をアルカリ液からな
る剥離液に漫清し、上記めっきレジスト膜を剥離除去し
、さらにエツチング液に浸漬し、上記各回路部3〜5の
接続用ランド部部分を除いてソルダレジスト膜を形成す
れば、これにより第1図に示すプリント配線基板1が製
造される。
■ The substrate on which the plating film is formed is thoroughly cleaned in a stripping solution consisting of an alkaline solution, the plating resist film is peeled off, and further immersed in an etching solution, and the connecting land portions of each of the circuit sections 3 to 5 are By forming a solder resist film except for the above, the printed wiring board 1 shown in FIG. 1 is manufactured.

このように本実施例方法によれば、電極44として、先
ずマスクのない電極44aを使用して第1段階めっきを
行い、次に厚膜配線部分(領域B)に対向する部分のみ
に開口45aを有するマスク45を装着した電極44b
を使用して第2段階めっきを施すようにしたので、電源
回路部5のめっき膜厚を配線回路部3.4の2倍に形成
することができ、従ってパターン幅を拡大することなく
パターン断面積を大きくでき、パターンの高集積変化を
達成でき、基板の小型化を図ることができる。
As described above, according to the method of this embodiment, the first stage plating is performed using the electrode 44a without a mask as the electrode 44, and then the opening 45a is formed only in the portion facing the thick film wiring portion (region B). Electrode 44b equipped with a mask 45 having
Since the second stage plating is performed using a plating layer, the plating film thickness of the power supply circuit section 5 can be made twice as thick as that of the wiring circuit section 3.4. Therefore, pattern cutting can be performed without expanding the pattern width. It is possible to increase the area, achieve highly integrated changes in patterns, and reduce the size of the substrate.

第2図fc)は本願の他の関連発明の一実施例方法を実
施するための電極を示す0本実施例の電極44Cに貼設
されたマスク45は、上記第tmのプリント配線基板1
の領域Bに対応する部分に、開口45aが形成されてお
り、領域Aに対応する部分には、多数の貫通穴45bが
形成されている。
FIG. 2 fc) shows an electrode for carrying out a method according to an embodiment of another related invention of the present application. The mask 45 attached to the electrode 44C of this embodiment is the same as that of the printed wiring board 1 of the above tm.
An opening 45a is formed in a portion corresponding to region B, and a large number of through holes 45b are formed in a portion corresponding to region A.

本実施例の電極44Cを上記めっき装置24に装着して
電気めっきを行うと、領域Bに対応する部分の電流密度
が領域Aに対応する部分の電流密度より高くなり、その
結果電源回路部5のめっき膜厚が配線回路部3.4のめ
っき膜厚より厚く形成される。また、本実施例では、電
極44cに装着するマスク45を取り替える必要がなく
、従って生産性を大幅に向上できる。
When the electrode 44C of this embodiment is attached to the plating apparatus 24 and electroplating is performed, the current density in the portion corresponding to the region B becomes higher than the current density in the portion corresponding to the region A, and as a result, the current density in the portion corresponding to the region A becomes higher. The plating film thickness is formed to be thicker than that of the wiring circuit portion 3.4. Furthermore, in this embodiment, there is no need to replace the mask 45 attached to the electrode 44c, so productivity can be greatly improved.

なお、上記実施例では、電極にマスクを装着したが、基
板側にマスクを装着することによっても部分的にめっき
膜厚を変化さセることができる。
In the above embodiment, a mask was attached to the electrode, but the thickness of the plating film can also be partially changed by attaching a mask to the substrate side.

この基板にマスクを装着する場合は、基板と電極とを必
ずしも対向させる必要はなく、従来−船釣に採用されて
いる静止めっき浴による場合にもめっき膜厚さを部分的
に変えることができる。
When attaching a mask to this substrate, the substrate and electrode do not necessarily have to face each other, and the thickness of the plating film can be partially changed even when using a static plating bath, which is conventionally used for boat fishing. .

また、上記実施例では、電極にマスクを装着することに
よって電流密度を部分的に変化させたが、この電流密度
の部分的な変化は、電極自体の形状を変えることによっ
ても実現できる。
Further, in the above embodiment, the current density was partially changed by attaching a mask to the electrode, but this partial change in current density can also be realized by changing the shape of the electrode itself.

〔発明の効果〕〔Effect of the invention〕

以上のように本願特定発明に係るプリント配線基板によ
れば、配線パターンを部分ごとに膜厚の異なるめっき膜
で形成したので、大電流を流すためのパターン断面積の
増大をパターン幅を拡大することなく実現でき、パター
ンの集積度を向上できる効果がある。また、本願の関連
発明によれば、めっき工程を複数段階に分け、各段階毎
に異なる形状のマスクを電極又は基板に装着し、又はめ
っき膜厚の厚い領域に対応する部分はど開口率の大きい
マスクを電極に装着してめっきを行うようにしたので、
配線パターンの領域ごとのめっき膜厚の変化を実現でき
る効果がある。
As described above, according to the printed wiring board according to the specified invention, the wiring pattern is formed with a plating film having a different thickness for each part, so that the pattern width can be increased to increase the pattern cross-sectional area for passing a large current. This can be realized without any problems, and has the effect of improving the degree of pattern integration. Further, according to the related invention of the present application, the plating process is divided into multiple stages, and a mask with a different shape is attached to the electrode or substrate for each stage, or the aperture ratio is reduced in the area corresponding to the thick plating film. Since plating was performed by attaching a large mask to the electrode,
This has the effect of realizing changes in the plating film thickness for each region of the wiring pattern.

【図面の簡単な説明】 第1図は本発明の一実施例によるプリント配線基板の斜
視図、第2図(a)、山)は本願の関連発明の一実施例
方法を実施するための電極の斜視図、第2図(C1は本
願の他の関連発明の一実施例方法を実施するための電極
の斜視図、第3図及び第4図は上記実施例方法を実施す
るためのめっき装置の断面図、全体構成図である。 図において、1はプリント配線基板、2はベース基板、
3.4は配線回路部(配線パターン)、44.44a 
〜44cは電極、45はマスク、Aは配線パターンの他
?■域、Bは配線パターンの一部領域である。 特許出顎人  ヤマハ発動機株式会社 代理人    弁理士 下 市  努
[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a perspective view of a printed wiring board according to an embodiment of the present invention, and FIG. 2 (C1 is a perspective view of an electrode for carrying out the method of an embodiment of another related invention of the present application, and FIGS. 3 and 4 are a plating apparatus for carrying out the method of the above embodiment) 1 is a cross-sectional view and an overall configuration diagram. In the figure, 1 is a printed wiring board, 2 is a base board,
3.4 is the wiring circuit section (wiring pattern), 44.44a
~44c is an electrode, 45 is a mask, and A is a wiring pattern? Area (3) and B are part of the wiring pattern. Patent jaw person Yamaha Motor Co., Ltd. agent Patent attorney Tsutomu Shimoichi

Claims (3)

【特許請求の範囲】[Claims] (1)ベース基板上にめっき膜からなる配線パターンを
形成したプリント配線基板において、上記配線パターン
の一部領域のめっき膜が、他領域のめっき膜より厚く形
成されていることを特徴とするプリント配線基板。
(1) A printed wiring board in which a wiring pattern made of a plating film is formed on a base substrate, wherein the plating film in some areas of the wiring pattern is formed thicker than in other areas. wiring board.
(2)ベース基板上に配線パターンをめっきにより形成
するに際し、その一部領域のめっき膜を、他領域のめっ
き膜より厚く形成するようにしたプリント配線基板の製
造方法であって、上記ベース基板及び電極をめっき液に
浸漬し、複数段階に分けて電気めっきを施すとともに、
各段階において異なる形状のマスクをベース基板又は電
極に装着するようにしたことを特徴とするプリント配線
基板の製造方法。
(2) A method for manufacturing a printed wiring board in which, when forming a wiring pattern on a base substrate by plating, a plating film in some areas is formed thicker than in other areas, the method comprising: and electrodes are immersed in a plating solution and electroplated in multiple stages,
A method for manufacturing a printed wiring board, characterized in that masks of different shapes are attached to a base substrate or electrodes at each stage.
(3)ベース基板上に配線パターンをめっきにより形成
するに際し、その一部領域のめっき膜を、他領域のめっ
き膜より厚く形成するようにしたプリント配線基板の製
造方法であって、上記ベース基板を電極と対向するよう
にめっき液に浸漬し、上記一部領域に対応する部分の開
口率を他領域の開口率より大きくしたマスクを電極に装
着して電気めっきを施すようにしたことを特徴とするプ
リント配線基板の製造方法。
(3) A method for manufacturing a printed wiring board, in which, when forming a wiring pattern on a base substrate by plating, a plating film in some areas is formed thicker than in other areas, the method comprising: is immersed in a plating solution so as to face the electrode, and electroplating is performed by attaching a mask to the electrode in which the aperture ratio of the portion corresponding to the above-mentioned partial area is larger than that of the other area. A method for manufacturing a printed wiring board.
JP8110888A 1988-03-31 1988-03-31 Printed wiring substrate and manufacture thereof Pending JPH01253293A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8110888A JPH01253293A (en) 1988-03-31 1988-03-31 Printed wiring substrate and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8110888A JPH01253293A (en) 1988-03-31 1988-03-31 Printed wiring substrate and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH01253293A true JPH01253293A (en) 1989-10-09

Family

ID=13737185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8110888A Pending JPH01253293A (en) 1988-03-31 1988-03-31 Printed wiring substrate and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH01253293A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01266786A (en) * 1988-04-18 1989-10-24 Sanyo Electric Co Ltd Construction of conductor of hybrid integrated circuit and its manufacture
JPH01266787A (en) * 1988-04-18 1989-10-24 Sanyo Electric Co Ltd Construction of conductor of hybrid integrated circuit and manufacture of the conductor
JP2008135570A (en) * 2006-11-28 2008-06-12 Shinko Electric Ind Co Ltd Method of manufacturing wiring board
JP2009026801A (en) * 2007-07-17 2009-02-05 Mitsubishi Electric Corp Semiconductor light-emitting device and its manufacturing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01266786A (en) * 1988-04-18 1989-10-24 Sanyo Electric Co Ltd Construction of conductor of hybrid integrated circuit and its manufacture
JPH01266787A (en) * 1988-04-18 1989-10-24 Sanyo Electric Co Ltd Construction of conductor of hybrid integrated circuit and manufacture of the conductor
JP2008135570A (en) * 2006-11-28 2008-06-12 Shinko Electric Ind Co Ltd Method of manufacturing wiring board
JP2009026801A (en) * 2007-07-17 2009-02-05 Mitsubishi Electric Corp Semiconductor light-emitting device and its manufacturing method

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