JPH01251720A - Board cleaning device - Google Patents

Abstract

PURPOSE:To improve the productivity of a board by supplying ample fine bubbles over the surface of a cleaning liquid from a bubble generating section, causing rollers of a transfer section to rotate while making the bubbles adhere in the surface, and transferring the board through a bubble layer without directly touching the rollers, thereby requiring no manual intervention for the cleaning of the bottom surface of the board. CONSTITUTION:A cleaning liquid (a) is fed to a cleaning tank 2 with bubbles generated by a bubble generating section 5 which generates fine bubbles out of the cleaning liquid (a) composed of sulfuric acid while introducing the air from outside. When supplied to a transfer section 2, a board 7 is sequentially advanced by rollers 40 whose bottoms are immersed into the surface of the cleaning liquid (a). During this transfer process, the rollers 40 are rotated while causing the bubbles generated by the bubble generating section 5 and covering the surface of the cleaning liquid (a) to adhere to the surface. As a result, the bottom surface of the board 7 is transferred without directly touching the rollers 40 and is cleaned by touching the bubble layer 6.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a method for cleaning the surface of a substrate, such as a glass plate, with a light-shielding film, an organic color filter, an inorganic color filter, a spectroscopic film, a polarizing film, etc. The present invention relates to a substrate cleaning apparatus that cleans the back surface of a substrate provided with a component that is not completely resistant.

[Conventional technology]

Conventional methods for removing dirt from plate-shaped objects such as glass plates include soaking the plate in detergent and applying ultrasonic waves, brushing the surface on which the dirt has adhered, and applying detergent to the surface under high pressure. There was a method of spraying the surface, and a method of directly cutting the surface to which it was attached. As described above, there are various methods for cleaning, and the cleaning method is selected depending on the material of which the plate-like object is made. For example, there is a corrosion process in the process of creating a photomask, and this is because the base material (
At this time, the corrosive liquid and the remaining residue of the light-shielding film may also be adsorbed on the surface opposite to the desired light-shielding film surface, and this may become a stain. It is necessary to remove the dirt without damaging the surface of the light-shielding film, and in this case, since the dirt has an extremely strong adhesion to the base material, the dirt has been removed using a knife. This is particularly important in the case of optical elements, since dirt on the back surface can also cause defects.

[Problem to be solved by the invention]

However, as mentioned above, for example, a light shielding film, organic color filter, inorganic color filter, etc.
When creating spectroscopic films, polarizing films, etc. whose surfaces are equipped with components that are not completely resistant to cleaning, adhering dirt is removed by manual scraping, which may cause scratches on the product itself. Dirt was left behind, resulting in inconsistent quality (and poor productivity).So, we improved product productivity by making it possible to easily remove stains without damaging the product. This was considered an issue.

[Means to solve the problem]

The present invention has been made in consideration of the above-mentioned conventional problems, and includes a cleaning tank containing a cleaning liquid, a foam generating section that sends fine bubbles made of the cleaning liquid to the surface of the cleaning liquid, and at least a lower part of each of them. a transfer section including a plurality of rollers immersed in the cleaning liquid and rotating in the same direction arranged in the substrate transfer direction, and the substrate is transferred on the rollers with a foam layer made of bubbles attached to the roller surface interposed; The present invention provides a substrate cleaning apparatus characterized by having a configuration in which the conventional problems are solved.

[Effect]

In the present invention, a large amount of fine foam is sent from the foam generating section to the upper surface of the cleaning liquid, and the roller of the transfer section rotates while adhering the foam to the surface, so that the roller does not directly contact the substrate and forms a foam layer. The substrate is transferred through the foam layer, and the foam layer and the substrate come into contact to clean the contact surface.

〔Example〕

Next, the present invention will be explained in detail based on the embodiments shown in FIGS. 1 to 3.

In the figure, reference numeral 1 denotes a substrate cleaning device that is incorporated into a photomask manufacturing line.As shown in FIG. It consists of a circulation section 3 that sends the cleaning liquid a, and a transfer section 4 that transfers the glass plate substrate onto the cleaning tank.

The circulation section 3 is composed of a storage tank 30 connected to the cleaning tank 2 and a pump 31 connected to the storage tank 30 and feeding cleaning liquid into the cleaning tank 2.The storage tank 30 and the pump 3! A foam generating section 5 that takes in external air and generates fine bubbles made of the cleaning liquid is connected between the pump and the cleaning tank. Tank 2, storage tank 30, pump 31. It is provided so that the cleaning liquid circulates in order with the cleaning tank 2.

Further, the circulation section 3 is provided with an overflow 32 exposed on the surface of the cleaning liquid a and connected to the storage tank 30.

As shown in FIG. 3, the transfer unit 4 includes a plurality of rollers 40 that rotate in the same direction and are arranged in the substrate transfer direction, and the lower part of each of the rollers 40 is immersed in the surface of the cleaning liquid a. The roller 40 is configured to rotate while adhering to the surface the bubbles formed by the bubble generating section 5 and covering the surface of the cleaning liquid a. Each of the rollers 40 rotates while adhering foam, and the foam is sequentially supplied from the foam generating section, so that a foam layer 6 is formed on the surface of the cleaning liquid and the surface of the roller 400.
is formed, and the upper surface side has been processed in the previous process.
When the substrate 7 is sent to the transfer section 2, the substrate 7 is sequentially transferred by the roller 400 rotations, and during this transfer process, the back surface of the substrate 7 does not come into direct contact with the roller 40, but the substrate 7 is moved with the foam layer 6 interposed. However, it is provided so as to clean the back surface of the substrate 7 by contacting with the foam layer 6. Note that 8 in the figure indicates a protective sheet that protects the surface of the substrate 70.

〔Effect of the invention〕

As explained above, according to the present invention, there is provided a cleaning tank filled with a cleaning liquid, a foam generating section that sends fine bubbles made of the cleaning liquid to the surface of the cleaning liquid, and at least the lower portions of each of them are immersed in the cleaning liquid and directed in the same direction. The present invention is equipped with a transfer section in which a plurality of rotating rollers are arranged in the substrate transfer direction, and the substrate is transferred on the rollers with a foam layer made of bubbles attached to the roller surface interposed. The back side of the board can be cleaned manually, which improves the productivity of the board. Also, since there is no direct physical contact with the roller, there is no need to manually clean the back side of the board. 5
This eliminates the need to attach stains and stabilizes quality. Furthermore, it has excellent practical effects, such as being able to clean only one side, which was not possible when immersing it in a cleaning liquid.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram showing an embodiment of the substrate cleaning apparatus according to the present invention, FIG. 2 is an explanatory diagram showing the transfer section of the embodiment from above, and FIG. 3 is an explanatory diagram showing the transfer state of the substrate in the embodiment. FIG. ■...Substrate cleaning device 2...Cleaning tank 3...Circulation section 4...Transfer section 40...Roller 5... ...Bubble generating part 6...Bubble layer 7...Substrate Figure 1 Figure 2

Claims (1)

[Claims] A cleaning tank containing a cleaning solution, a foam generating unit that sends fine bubbles made of the cleaning solution to the surface of the cleaning solution, and a plurality of rollers each having at least a lower part immersed in the cleaning solution and rotating in the same direction in the direction of substrate transfer. 1. A substrate cleaning apparatus, comprising: a transfer section arranged in a plurality of rows, and a substrate is transferred over the roller with a foam layer formed of bubbles attached to the roller surface interposed therebetween.