JPH01251720A - Board cleaning device - Google Patents
Board cleaning deviceInfo
- Publication number
- JPH01251720A JPH01251720A JP7957488A JP7957488A JPH01251720A JP H01251720 A JPH01251720 A JP H01251720A JP 7957488 A JP7957488 A JP 7957488A JP 7957488 A JP7957488 A JP 7957488A JP H01251720 A JPH01251720 A JP H01251720A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- rollers
- cleaning
- board
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 49
- 239000000758 substrate Substances 0.000 claims description 27
- 239000006260 foam Substances 0.000 claims description 19
- 239000007788 liquid Substances 0.000 abstract description 24
- 238000000034 method Methods 0.000 abstract description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract 2
- 238000003860 storage Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000003599 detergent Substances 0.000 description 2
- 230000001680 brushing effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、基板、例えばガラス板の表面に遮光膜、育機
カラーフィルタ、無機カラーフィルタ、分光膜、偏光膜
などの表面に洗浄への耐性が完全でない構成物が設けら
れたものの裏面を洗浄する基板洗浄装置に関するもので
ある。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a method for cleaning the surface of a substrate, such as a glass plate, with a light-shielding film, an organic color filter, an inorganic color filter, a spectroscopic film, a polarizing film, etc. The present invention relates to a substrate cleaning apparatus that cleans the back surface of a substrate provided with a component that is not completely resistant.
従来、ガラス板などの板状物に付着した汚れを取り除く
方法としては、洗剤中に板状物を浸して超音波を当てる
方法や、汚れ付着面をブラッシングする方法、また洗剤
を高圧状態で付着面を吹き当てる方法、そして直接付着
面を断層する方法があった。このように洗浄には各種の
方法があるが、板状物を構成する素材などに対応してそ
の洗浄方法が選択されている。例えばフォトマスクを作
成する工程で腐食工程があり、これは腐食洛中に基材(
ガラス板)を浸すものであるが、このときに所望する遮
光膜面と反対側の面にも腐食液および遮光膜の残りかす
が吸着する場合があり、これが汚れとなって〜また。そ
して遮光膜面を傷つけることなく汚れを除去する必要が
あり、特にこの場合基材に対する汚れの付着力が極めて
強いことから、刃物で汚れを取り除いていた。特に光学
素子の場合は、裏面の汚れも欠陥になるので、このこと
は重要である。Conventional methods for removing dirt from plate-shaped objects such as glass plates include soaking the plate in detergent and applying ultrasonic waves, brushing the surface on which the dirt has adhered, and applying detergent to the surface under high pressure. There was a method of spraying the surface, and a method of directly cutting the surface to which it was attached. As described above, there are various methods for cleaning, and the cleaning method is selected depending on the material of which the plate-like object is made. For example, there is a corrosion process in the process of creating a photomask, and this is because the base material (
At this time, the corrosive liquid and the remaining residue of the light-shielding film may also be adsorbed on the surface opposite to the desired light-shielding film surface, and this may become a stain. It is necessary to remove the dirt without damaging the surface of the light-shielding film, and in this case, since the dirt has an extremely strong adhesion to the base material, the dirt has been removed using a knife. This is particularly important in the case of optical elements, since dirt on the back surface can also cause defects.
しかしながら、上述したように、例えばガラス板の表面
に遮光膜、存機カラーフィルタ、無機カラーフィルタ、
分光膜、偏光膜などの表面に洗浄への耐性が完全でない
構成物が設けられたものを作成するに当たり、付着した
汚れを人手による削り取り作業で取り除いていることか
ら、製品自体に傷を付けたり汚れの取り残しが生じたり
して品質の安定性がな(生産性も悪いものであった。そ
こで製品に傷を付けることなく、また汚れが容易に除去
できるようにして製品の生産性を向上させることが課題
とされていた。However, as mentioned above, for example, a light shielding film, organic color filter, inorganic color filter, etc.
When creating spectroscopic films, polarizing films, etc. whose surfaces are equipped with components that are not completely resistant to cleaning, adhering dirt is removed by manual scraping, which may cause scratches on the product itself. Dirt was left behind, resulting in inconsistent quality (and poor productivity).So, we improved product productivity by making it possible to easily remove stains without damaging the product. This was considered an issue.
本発明は、上記した従来の課題を考慮してなされたもの
で、洗浄液が入れられた洗浄槽と、前記洗浄液からなる
微細な泡を洗浄液の表面に送る泡発生部と、少なくとも
それぞれの下部が前記洗浄液に浸り同一方向に回転する
複数本のローラーを基板の移送方向に配列してなる移送
部とを備え、前記ローラー表面に付着した泡からなる泡
層を介在させてローラー上を基板が移送する構成とした
ことを特徴とする基板洗浄装置を提供して、従来の課題
を解消するものである。The present invention has been made in consideration of the above-mentioned conventional problems, and includes a cleaning tank containing a cleaning liquid, a foam generating section that sends fine bubbles made of the cleaning liquid to the surface of the cleaning liquid, and at least a lower part of each of them. a transfer section including a plurality of rollers immersed in the cleaning liquid and rotating in the same direction arranged in the substrate transfer direction, and the substrate is transferred on the rollers with a foam layer made of bubbles attached to the roller surface interposed; The present invention provides a substrate cleaning apparatus characterized by having a configuration in which the conventional problems are solved.
本発明においては、泡発生部から洗浄液上面に微細にし
てかつ多量の泡を送り込み、移送部のローラーが前記泡
を表面に付着させながら回転し、前記ローラーが直接基
板に接触することなく泡層を介して基板を移送し、また
泡層と基板とが接触してその接触面を洗浄するようにな
る。In the present invention, a large amount of fine foam is sent from the foam generating section to the upper surface of the cleaning liquid, and the roller of the transfer section rotates while adhering the foam to the surface, so that the roller does not directly contact the substrate and forms a foam layer. The substrate is transferred through the foam layer, and the foam layer and the substrate come into contact to clean the contact surface.
つぎに、本発明を第1図から第3図に示す実施例に基づ
いて詳細に説明する。Next, the present invention will be explained in detail based on the embodiments shown in FIGS. 1 to 3.
図中1はフォトマスクの製造ラインに組み込まれる基板
洗浄装置で、第1図に示すように、該基板洗浄装@lは
、硫酸からなる洗浄液aが送り込まれる洗浄槽2とこの
洗浄槽2に前記洗浄液aを送り込む循環部3と前記洗浄
槽上にてガラス板の基板を移送する移送部4とからなる
ものである。In the figure, reference numeral 1 denotes a substrate cleaning device that is incorporated into a photomask manufacturing line.As shown in FIG. It consists of a circulation section 3 that sends the cleaning liquid a, and a transfer section 4 that transfers the glass plate substrate onto the cleaning tank.
前記循環部3は洗浄槽2に接続された貯留タンク30と
この貯留タンク30に接続され前記洗浄槽2に洗浄液を
送り込むポンプ31とから構成されていて、前記貯留タ
ンク30とポンプ3!との間に、外部空気を取り込んで
洗浄液からなる微細な泡を発生させる泡発生部5が連結
されていて、泡を含んだ状態で前記ポンプによって洗浄
液が洗浄槽に送り込まれ、洗i′fI槽2、貯留タンク
30、ポンプ31.洗浄槽2と順に洗浄液が循環するよ
うに設けられている。The circulation section 3 is composed of a storage tank 30 connected to the cleaning tank 2 and a pump 31 connected to the storage tank 30 and feeding cleaning liquid into the cleaning tank 2.The storage tank 30 and the pump 3! A foam generating section 5 that takes in external air and generates fine bubbles made of the cleaning liquid is connected between the pump and the cleaning tank. Tank 2, storage tank 30, pump 31. It is provided so that the cleaning liquid circulates in order with the cleaning tank 2.
また循環部3には洗浄液aの表面に表出し前記貯留タン
ク30に連結したオーバーフロー32を備えている。Further, the circulation section 3 is provided with an overflow 32 exposed on the surface of the cleaning liquid a and connected to the storage tank 30.
移送部4は、第3図に示すように、同一方向に回転する
複数本のローラー40を基板の移送方向に配列したもの
で、前記ローラー40それぞれの下部が洗浄液aの表面
に浸っており、ローラー40は、泡発生部5で形成され
洗浄液aの表面を覆っている泡を表面に付着させて回転
するようになっている。ローラー40それぞれが泡を付
着させながら回転し、そして泡が泡発生部から順次供給
されるので、洗浄液表面とローラー400表面に泡層6
が形成され、前工程から上面側が加工処理された基板7
が移送部2に送り込まれると、ローラー400回転によ
り基板7が順次移送され、この移送過程において、基板
7の裏面はローラー40に直接接することなく、前記泡
層6を介在させて基板7が移動し、泡層6との接触によ
って基板7の裏面を洗浄するように設けられている。な
お図中8は基板70表面を保護する保護シートを示すも
のである。As shown in FIG. 3, the transfer unit 4 includes a plurality of rollers 40 that rotate in the same direction and are arranged in the substrate transfer direction, and the lower part of each of the rollers 40 is immersed in the surface of the cleaning liquid a. The roller 40 is configured to rotate while adhering to the surface the bubbles formed by the bubble generating section 5 and covering the surface of the cleaning liquid a. Each of the rollers 40 rotates while adhering foam, and the foam is sequentially supplied from the foam generating section, so that a foam layer 6 is formed on the surface of the cleaning liquid and the surface of the roller 400.
is formed, and the upper surface side has been processed in the previous process.
When the substrate 7 is sent to the transfer section 2, the substrate 7 is sequentially transferred by the roller 400 rotations, and during this transfer process, the back surface of the substrate 7 does not come into direct contact with the roller 40, but the substrate 7 is moved with the foam layer 6 interposed. However, it is provided so as to clean the back surface of the substrate 7 by contacting with the foam layer 6. Note that 8 in the figure indicates a protective sheet that protects the surface of the substrate 70.
以上説明したように、本発明によれば、洗浄液が入れら
れた洗浄槽と、前記洗浄液からなる微細な泡を洗浄液の
表面に送る泡発生部と、少なくともそれぞれの下部が前
記洗浄液に浸り同一方向に回転する複数本のローラーを
基板の移送方向に配列してなる移送部とを備え、前記ロ
ーラー表面に付着した泡からなる泡層を介在させてロー
ラー上を基板が移送する構成としたので、基板の裏面の
洗浄を人手によることな(行うことができ、基板の生産
性が向上するようになる。またローラーとは物理的に直
接接触することがないので、製品(基板)に対して(5
を付けることがなくなり品質を安定させることができる
ようになる。さらに洗浄液中に浸す場合には出来なかっ
た片面のみの洗浄が行えるようになるなど、実用性にす
ぐれた効果を奏するものである。As explained above, according to the present invention, there is provided a cleaning tank filled with a cleaning liquid, a foam generating section that sends fine bubbles made of the cleaning liquid to the surface of the cleaning liquid, and at least the lower portions of each of them are immersed in the cleaning liquid and directed in the same direction. The present invention is equipped with a transfer section in which a plurality of rotating rollers are arranged in the substrate transfer direction, and the substrate is transferred on the rollers with a foam layer made of bubbles attached to the roller surface interposed. The back side of the board can be cleaned manually, which improves the productivity of the board. Also, since there is no direct physical contact with the roller, there is no need to manually clean the back side of the board. 5
This eliminates the need to attach stains and stabilizes quality. Furthermore, it has excellent practical effects, such as being able to clean only one side, which was not possible when immersing it in a cleaning liquid.
第1図は本発明にかかる基板洗浄装置の一実施例を示す
説明図、第2図は一実施例の移送部を上方から示す説明
図、第3図は一実施例における基板の移送状態を示す説
明図である。
■・・・・・・基板洗浄装置
2・・・・・・洗浄槽
3・・・・・・循環部
4・・・・・・移送部 40・・・・・・ローラ
ー5・・・・・・泡発生部
6・・・・・・泡層
7・・・・・・基板
第1図
第2図
ムFIG. 1 is an explanatory diagram showing an embodiment of the substrate cleaning apparatus according to the present invention, FIG. 2 is an explanatory diagram showing the transfer section of the embodiment from above, and FIG. 3 is an explanatory diagram showing the transfer state of the substrate in the embodiment. FIG. ■...Substrate cleaning device 2...Cleaning tank 3...Circulation section 4...Transfer section 40...Roller 5... ...Bubble generating part 6...Bubble layer 7...Substrate Figure 1 Figure 2
Claims (1)
細な泡を洗浄液の表面に送る泡発生部と、少なくともそ
れぞれの下部が前記洗浄液に浸り同一方向に回転する複
数本のローラーを基板の移送方向に配列してなる移送部
とを備え、前記ローラー表面に付着した泡からなる泡層
を介在させてローラー上を基板が移送する構成としたこ
とを特徴とする基板洗浄装置。A cleaning tank containing a cleaning solution, a foam generating unit that sends fine bubbles made of the cleaning solution to the surface of the cleaning solution, and a plurality of rollers each having at least a lower part immersed in the cleaning solution and rotating in the same direction in the direction of substrate transfer. 1. A substrate cleaning apparatus, comprising: a transfer section arranged in a plurality of rows, and a substrate is transferred over the roller with a foam layer formed of bubbles attached to the roller surface interposed therebetween.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7957488A JPH01251720A (en) | 1988-03-31 | 1988-03-31 | Board cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7957488A JPH01251720A (en) | 1988-03-31 | 1988-03-31 | Board cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01251720A true JPH01251720A (en) | 1989-10-06 |
Family
ID=13693767
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7957488A Pending JPH01251720A (en) | 1988-03-31 | 1988-03-31 | Board cleaning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01251720A (en) |
-
1988
- 1988-03-31 JP JP7957488A patent/JPH01251720A/en active Pending
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