JPH01239945A - Hybrid integrated circuit device - Google Patents

Hybrid integrated circuit device

Info

Publication number
JPH01239945A
JPH01239945A JP63068804A JP6880488A JPH01239945A JP H01239945 A JPH01239945 A JP H01239945A JP 63068804 A JP63068804 A JP 63068804A JP 6880488 A JP6880488 A JP 6880488A JP H01239945 A JPH01239945 A JP H01239945A
Authority
JP
Japan
Prior art keywords
semiconductor element
pad
plated
integrated circuit
hybrid integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63068804A
Other languages
Japanese (ja)
Inventor
Masahide Yamauchi
山内 眞英
Tetsuo Mori
哲郎 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP63068804A priority Critical patent/JPH01239945A/en
Publication of JPH01239945A publication Critical patent/JPH01239945A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/03Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
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    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • HELECTRICITY
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    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
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    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04042Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0555Shape
    • H01L2224/05552Shape in top view
    • H01L2224/05553Shape in top view being rectangular
    • HELECTRICITY
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    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
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    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
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    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1905Shape
    • H01L2924/19051Impedance matching structure [e.g. balun]
    • HELECTRICITY
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/18Printed circuits structurally associated with non-printed electric components
    • H05K1/182Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/328Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by welding

Abstract

PURPOSE:To reduce an irregularity in a plated thin wire and to reduce an input inductance by a method wherein a semiconductor element is inserted into a hole made in a substrate and a circuit pattern and a pad part are fixed on an identical plane and connected by using the plated thin wire. CONSTITUTION:Pad parts 9 formed on a semiconductor element 3 and circuit patterns formed on a dielectric substrate 1 are fixed in such a way that they are situated on an almost identical plane; they are connected to be conductive by using plated thin wires 10. By this constitution, an irregularity in the plated thin wires 10 can be reduced; an inductance of an input can be reduced. In addition, the area of the plated pads 9 can be made small; a parasitic capacitance can be reduced.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、例えば通信機器関連に使用される超高周波
用の混成集積回路装置の構造に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the structure of a hybrid integrated circuit device for ultra-high frequencies used, for example, in communication equipment.

〔従来の技術〕[Conventional technology]

第2図は従来の混成集積回路装置を示すl!r面斜視図
であり、図において、1はアルミナ等からなる誘電体基
板、2は上記誘電体基板l土に形成された回路パターン
、3は上記誘電体基板l上に妥着された半導体素子、4
は上記半導体素子3上に形成されたポンディングパッド
、5は上記ポンディングパッド4と上記回路パターン2
とを電気的に接続する金属細線、6は上記誘電体基板1
と上記半導体素子3とを接合Tる接着剤である0次に動
作について説明Tる。外部から送られてくる高周波信号
は、誘?iE体基板1に形成された一万の回路パターン
2より、金属細線5及びポンディングパッド4を経由し
て半導体素子3に印加される。ここで半導体素子3には
外部より直流電力が印加されており(図示せず)、入力
された高周波信号が増幅される。
FIG. 2 shows a conventional hybrid integrated circuit device. It is an R-plane perspective view, and in the figure, 1 is a dielectric substrate made of alumina or the like, 2 is a circuit pattern formed on the dielectric substrate l, and 3 is a semiconductor element fixed on the dielectric substrate l. , 4
5 is a bonding pad formed on the semiconductor element 3, and 5 is the bonding pad 4 and the circuit pattern 2.
A thin metal wire 6 electrically connects the dielectric substrate 1
The zero-order operation of the adhesive used to bond the semiconductor element 3 and the semiconductor element 3 will now be explained. Is the high frequency signal sent from the outside an inducer? A voltage is applied from the 10,000 circuit patterns 2 formed on the iE body substrate 1 to the semiconductor element 3 via the thin metal wires 5 and the bonding pads 4. Here, DC power is applied to the semiconductor element 3 from the outside (not shown), and the input high frequency signal is amplified.

この増幅された高周波信号は他方(出力+1ill )
のポンディングパッド4、金属細線5及び回路パターン
2を経由して出力信号として取り出される。
This amplified high frequency signal is the other (output + 1ill)
The output signal is taken out as an output signal via the bonding pad 4, the thin metal wire 5, and the circuit pattern 2.

(発明が解決しようとする課題〕 従来の混成集積回路装置は以上のように宥或ぎれている
ので、高周波信号は長くがっ寸法のバラツキの大きい忙
4細線5及びワイヤボンドするにめ面積が大に形成きれ
たポンディングパッド4ご経由しなければならす、人力
のインダクタンスか大さくなったり、ポンディングパッ
ドによる寄生6討の増大等が生じて、高周波特性か低F
Tる問題点があった。
(Problems to be Solved by the Invention) Conventional hybrid integrated circuit devices have the above-mentioned problems, so high-frequency signals are produced by long wires with large dimensional variations and small wire bonding areas. The inductance of the human power must be passed through the overly formed bonding pad 4, which may increase, and the parasitic effects due to the bonding pad may increase, resulting in poor high frequency characteristics or low F.
There were a number of problems.

この発明は上記のような問題点を解消丁6ためなされた
もので、入力インダクタンスの軽減、寄生容量の軽減ご
可能に下る高周波用の混成集積回路装置を得ることを目
的とする〇 〔課題を解決下6zめの手段〕 この発明に係る混成集積回路装置は、穴部を収けた基板
を有し1口の穴部に半導体素子を挿入し、かつ上記基板
面に形成された回路パターンと上記半導体素子面に形成
されたパッド部とがほぼ同一平面上に位置するように固
着Tるとともに、上g己回路パターンと上記パッド部と
をメッキ細線により電気的に接緬したものである。
This invention was made to solve the above-mentioned problems, and aims to provide a high-frequency hybrid integrated circuit device that can reduce input inductance and parasitic capacitance. Sixth Means for Solving] A hybrid integrated circuit device according to the present invention has a substrate having a hole, a semiconductor element is inserted into one hole, and the circuit pattern formed on the surface of the substrate and the above-described The pad portion formed on the surface of the semiconductor element is fixed so as to be located on substantially the same plane, and the upper circuit pattern and the pad portion are electrically connected by a thin plated wire.

〔作用〕 この発明に3ける混成集積回路装置は、基板面に形成さ
れた回路パターンと半導体素子面Gこ形成されたパッド
部とがはは1司−面上となり、メッキ細線により導通妥
耽し二ので、細線のバラツキが少なく入力のインダクタ
ンスを低減できる。またパッドの白檀を極端に減少する
ことができ寄生容量な低減できる。
[Function] In the hybrid integrated circuit device according to the third aspect of the present invention, the circuit pattern formed on the substrate surface and the pad portion formed on the semiconductor element surface are on one plane, and conduction is achieved by the plated thin wire. Therefore, there is less variation in thin wires and input inductance can be reduced. In addition, the sandalwood of the pad can be drastically reduced, and the parasitic capacitance can also be reduced.

〔実施例〕〔Example〕

第1図はこの発明の一実施例による混15!2+集槓回
路装置P示す断面斜視図であって、lはアルミナ等から
なる誘電体基板、2は土泥誘電体基板1上に形成された
回路パターン、3は上記誘電体基板1に設けられた穴部
7に接着剤8により固定された半導体素子、9は上記千
導雀素子3土に設けられたメッキパッド、10 GZメ
ッキで形成され7こメッキ細線であり、このメッキ細線
10は上記回路パターンzと上記メッキパッド9とを電
気的に導通させるものである。
FIG. 1 is a cross-sectional perspective view showing a mixed 15!2+concentrator circuit device P according to an embodiment of the present invention, where l is a dielectric substrate made of alumina or the like, and 2 is formed on a mud dielectric substrate 1. 3 is a semiconductor element fixed in a hole 7 provided in the dielectric substrate 1 with an adhesive 8; 9 is a plating pad provided on the Sendojaku element 3; 10 is formed by GZ plating. This plated thin wire 10 electrically connects the circuit pattern z and the plated pad 9.

また誘電体基板l上に形成されている回路パターン2と
、半導体素子3上に形成されているメッキパッド9とが
、はぼ同一面上に位置するように溝成されている。
Further, the grooves are formed so that the circuit pattern 2 formed on the dielectric substrate 1 and the plating pad 9 formed on the semiconductor element 3 are located on almost the same plane.

なお上記メッキ細線10は、細線形成用のレジスト層を
形成した後、メッキ法によりメッキ細線を形成し、レジ
スl−J#を除去する方法で作成下る。
The plated thin wire 10 is produced by forming a resist layer for forming the thin wire, forming the plated thin wire by a plating method, and removing the resist l-J#.

次に動作について説、明T^0外部力)ら送られてくる
高周波信号は誘電体基板lに形成された一万の(ロ)路
パターン2からメッキ細線lO及びメッキパッド9を経
由して半導体素子3に印加される。半導体素子3には外
部よつ直流電力か印U[lされており(図示せず)、入
力さねに高周波信号が増幅される。
Next, we will explain the operation.The high frequency signal sent from T^0 external force is transmitted from the 10,000 (b) path pattern 2 formed on the dielectric substrate l via the plated thin wire lO and the plated pad 9. A voltage is applied to the semiconductor element 3. The semiconductor element 3 is connected to an external DC power source (not shown), and a high frequency signal is amplified at the input.

この増lI4された高周波信号は、他方(出力側)のメ
ッキバッド9、メッキa線]0及び(ロ)路パターン2
を経由して出力信号として取り出される。ここで従来の
長くかつ寸法のバラツキの大きい金拠細線から敬μ幅の
メッキ細線lOに改良したためインダクタンスの低減が
図れ、バラツキも少なくて@る。またメッキバッド9は
従来のポンディングパッド4に比べその面積を小さくす
ることかでき寄生容量の低減が5JNごとなる。このた
め超高周波(80GHz〜)において良好な特性が得ら
れろ。
This amplified high frequency signal is transmitted to the other (output side) plating pad 9, plating a line]0 and (b) path pattern 2.
is extracted as an output signal via . Here, since the conventional long metal wire with large variations in dimensions has been improved to a plated thin wire with a width of 10 μm, the inductance can be reduced and the variation is also small. Furthermore, the area of the plating pad 9 can be made smaller than that of the conventional bonding pad 4, and the parasitic capacitance can be reduced by 5 JN. Therefore, good characteristics can be obtained at ultra-high frequencies (80 GHz and above).

〔発明の効果〕〔Effect of the invention〕

以上のようにこの発明によれば、半導体素子上に形成さ
れたパッド部と基板上に形成された(口)路パターンと
をほぼ同一面上に位置するようにして、メッキ細線によ
りパッド部と(ロ)路パターンを妥続したので、インダ
クタンスの低減及びバラツキの低減が達成できるととも
に、パッド部の面積が極端に小さくでき、寄生容量の軽
減が可能となる。
As described above, according to the present invention, the pad portion formed on the semiconductor element and the path pattern formed on the substrate are located on almost the same plane, and the pad portion is connected with the plated thin wire. (b) Since the circuit pattern is maintained, it is possible to reduce inductance and variation, and the area of the pad portion can be extremely reduced, making it possible to reduce parasitic capacitance.

このため特に超高周波(’:30GHz −)での良好
な特性をもつ混成集積回路装置が得られる効果がある。
Therefore, there is an effect that a hybrid integrated circuit device having good characteristics particularly at ultra-high frequencies (': 30 GHz -) can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例による混成集積回路装置を
示す断面斜視図、第2図は従来の混成集積回路装置を示
す断面斜視図である。 図中、1は誘電体基板、2は回路パターン、3は°半導
体素子、7は穴部、8は接着材、9はパッド部、10は
メッキ細線である。 尚、図中同一符号は同一またに相当部分ご示す。 代理人   大  岩  増  雄
FIG. 1 is a cross-sectional perspective view showing a hybrid integrated circuit device according to an embodiment of the present invention, and FIG. 2 is a cross-sectional perspective view showing a conventional hybrid integrated circuit device. In the figure, 1 is a dielectric substrate, 2 is a circuit pattern, 3 is a semiconductor element, 7 is a hole, 8 is an adhesive, 9 is a pad, and 10 is a thin plated wire. In addition, the same reference numerals in the figures indicate the same or corresponding parts. Agent Masuo Oiwa

Claims (1)

【特許請求の範囲】[Claims]  穴部が設けられた基板と、上記穴部に挿入される半導
体素子を有し、上記基板上に形成された回路パターンと
上記半導体素子上に形成されたパッド部とがほぼ同一面
上に位置するように上記半導体素子を上記基板の穴部に
固着するとともに、上記回路パターンと上記パッド部と
をメッキ細線により電気的に接続したことを特徴とする
混成集積回路装置。
A substrate provided with a hole and a semiconductor element inserted into the hole, wherein a circuit pattern formed on the substrate and a pad formed on the semiconductor element are located on substantially the same plane. A hybrid integrated circuit device, wherein the semiconductor element is fixed in the hole of the substrate, and the circuit pattern and the pad are electrically connected by a thin plated wire.
JP63068804A 1988-03-22 1988-03-22 Hybrid integrated circuit device Pending JPH01239945A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63068804A JPH01239945A (en) 1988-03-22 1988-03-22 Hybrid integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63068804A JPH01239945A (en) 1988-03-22 1988-03-22 Hybrid integrated circuit device

Publications (1)

Publication Number Publication Date
JPH01239945A true JPH01239945A (en) 1989-09-25

Family

ID=13384271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63068804A Pending JPH01239945A (en) 1988-03-22 1988-03-22 Hybrid integrated circuit device

Country Status (1)

Country Link
JP (1) JPH01239945A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT14667U1 (en) * 2014-03-26 2016-03-15 Tridonic Gmbh & Co Kg Printed circuit board with coil unit and a mounting method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT14667U1 (en) * 2014-03-26 2016-03-15 Tridonic Gmbh & Co Kg Printed circuit board with coil unit and a mounting method therefor

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