JPH01239826A - Manufacture of reduced reoxidized semiconductor ceramic capacitor - Google Patents
Manufacture of reduced reoxidized semiconductor ceramic capacitorInfo
- Publication number
- JPH01239826A JPH01239826A JP6663288A JP6663288A JPH01239826A JP H01239826 A JPH01239826 A JP H01239826A JP 6663288 A JP6663288 A JP 6663288A JP 6663288 A JP6663288 A JP 6663288A JP H01239826 A JPH01239826 A JP H01239826A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- sheet
- reduction
- reduced
- reoxidized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000003985 ceramic capacitor Substances 0.000 title claims description 10
- 239000000203 mixture Substances 0.000 claims abstract description 39
- 239000000919 ceramic Substances 0.000 claims abstract description 9
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 7
- 239000000654 additive Substances 0.000 claims abstract description 6
- 230000000996 additive effect Effects 0.000 claims abstract description 6
- 238000010030 laminating Methods 0.000 claims abstract description 5
- 238000005245 sintering Methods 0.000 claims abstract description 4
- 238000010405 reoxidation reaction Methods 0.000 claims description 15
- 238000011282 treatment Methods 0.000 claims description 6
- 239000003990 capacitor Substances 0.000 abstract description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 3
- 229910002971 CaTiO3 Inorganic materials 0.000 abstract description 2
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium oxide Inorganic materials [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 abstract description 2
- 229910002113 barium titanate Inorganic materials 0.000 abstract 3
- 239000002075 main ingredient Substances 0.000 abstract 2
- 239000010410 layer Substances 0.000 description 19
- 230000015556 catabolic process Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052573 porcelain Inorganic materials 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
- H01G4/1272—Semiconductive ceramic capacitors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Ceramic Capacitors (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は各種電子機器に利用される還元再酸化型半導体
磁器コンデンサの製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method of manufacturing a reduction and reoxidation type semiconductor ceramic capacitor used in various electronic devices.
従来の技術
還元再酸化型半導体磁器コンデンサは小型で大容量が得
られるコンデンサとして実用化されている。BaTiO
3を主成分として、希土類元素酸化物等を添加した組成
が一般に知られており、粒径が1〜2μmの緻密なセラ
ミックが得られている。Conventional reduction-reoxidation type semiconductor ceramic capacitors have been put into practical use as small capacitors that can provide large capacitance. BaTiO
A composition in which the main component is 3 and rare earth element oxides, etc. is generally known, and a dense ceramic with a particle size of 1 to 2 μm is obtained.
従来の還元再酸化型半導体コンデンサの断面は第4図に
示すようになシ、1は表面誘電体層、2は半導体層、3
は対向電極である。製造方法は次の通りである。コンデ
ンサの特性に応じた組成の混合原料に、有機系バインダ
を加えて、造粒、整粒、成形する。まず成形体を空気中
で焼成することによって誘電体磁器とする。次に還元雰
囲気中で熱処理することにより全体を半導体化し、さら
に空気中で熱処理することによシ表面に薄い誘電体層を
形成する。最後に両面に電極を付与してコンデンサとす
る。コンデンサの容量は誘電体層の厚みが薄い程大きく
なる。従って、薄い表面誘電体層をもつ還元再酸化型半
導体コンデンサは、一般のセラミックコンデンサに比べ
て大きな容量が得られることとなる。The cross section of a conventional reduction and reoxidation type semiconductor capacitor is as shown in Fig. 4, where 1 is a surface dielectric layer, 2 is a semiconductor layer, and 3 is a surface dielectric layer.
is the counter electrode. The manufacturing method is as follows. An organic binder is added to a mixed raw material whose composition matches the characteristics of the capacitor, and the mixture is granulated, sized, and shaped. First, the molded body is fired in air to produce dielectric porcelain. Next, the entire structure is made into a semiconductor by heat treatment in a reducing atmosphere, and a thin dielectric layer is formed on the surface by further heat treatment in air. Finally, electrodes are applied to both sides to form a capacitor. The capacitance of a capacitor increases as the thickness of the dielectric layer decreases. Therefore, a reduction and reoxidation type semiconductor capacitor having a thin surface dielectric layer has a larger capacitance than a general ceramic capacitor.
発明が解決しようとする裸面
しかし、このような製造方法では、三回の熱処理が必要
であり、コンデンサの特性はそれらすべての影響を受け
る。特に、表面誘電体層1を形成する際の熱処理の条件
バラツキは、その厚みに大きな影響を及ぼし、静電容量
のバラツキ、破壊電圧の低下につながる゛ものである。However, this manufacturing method requires three heat treatments, and the characteristics of the capacitor are affected by all of them. In particular, variations in heat treatment conditions when forming the surface dielectric layer 1 have a large effect on its thickness, leading to variations in capacitance and a decrease in breakdown voltage.
本発明は、このような点を改善するものであシ、量産に
適した方法で、還元再酸化型半導体コンデンサを歩留シ
良く製造する方法を提供することを目的とするものであ
る。SUMMARY OF THE INVENTION The present invention aims to improve the above-mentioned problems and to provide a method for manufacturing a reduction-reoxidation type semiconductor capacitor with a high yield by a method suitable for mass production.
課題を解決するための手段
この課題を解決するために本発明は、BaTiOsを主
成分とし、希土類元素酸化物を含む組成の成形体シート
の表面に、耐還元性添加物をこの成形体組成に添加した
組成の成形体シートを積層した後、焼結して得られた誘
電体磁器を還元再酸化処理又は、還元処理のみを施すこ
とによって、表面誘電体層を形成する方法としたもので
ある。Means for Solving the Problem In order to solve this problem, the present invention provides a surface of a molded sheet having a composition mainly composed of BaTiOs and containing a rare earth element oxide, and adding a reduction-resistant additive to this molded sheet composition. This method forms a surface dielectric layer by laminating molded sheets having the added composition and then sintering the resulting dielectric porcelain by subjecting it to reduction and reoxidation treatment or only reduction treatment. .
作用
このように、セラミックの内部と表面層の組成を変えた
誘電体磁器を還元処理すると、組成によって還元状態が
異なシ、その際に表面層に耐還元性物質を添加すれば、
その部分は完全に半導体化されず、あるいは条件によっ
ては誘電体のまま表面層として残ることになる。また表
面層の厚みを成形体シートの厚みとして予め設定してお
くことができるので、表面誘電体層の厚みの制御が容易
になり、そのため、静電容量のバラツキが抑えられ、破
壊電圧の低下も防ぐことができる。Effect: When dielectric ceramics with different compositions of the inside and surface layer of the ceramic are reduced, the reduction state will differ depending on the composition.If a reduction-resistant substance is added to the surface layer at that time,
That portion may not be completely converted into a semiconductor, or depending on the conditions, may remain as a dielectric surface layer. In addition, since the thickness of the surface layer can be set in advance as the thickness of the molded sheet, the thickness of the surface dielectric layer can be easily controlled, which suppresses variations in capacitance and reduces breakdown voltage. can also be prevented.
実施例 以下実施例に基づき本発明の詳細な説明する。Example The present invention will be described in detail below based on Examples.
BaTiO388モルチ、Nd2O33モA/ % 、
TiO29モルチの組成を組成1とし、BaTiO3s
sモルチ、Nd 2053 モ/l/ %、Ti02
9−Eル%、CaTiO31wt%の組成を組成2とす
る。組成1の配合組成のように各原料を秤量し、ボール
ミルで湿式混合した後乾燥した。この原料に、有機バイ
ンダーとしてポリビニルブチラール7wt%、可塑剤と
してジオクチルフタレー)3wt%、溶剤として酢酸n
ブチル50wt%を加え湿式混練し、濾過、脱泡後、8
層μmの厚みのシートを成形した。次に組成2について
も同様にして、厚み20μmのシートを成形した。BaTiO388molti, Nd2O33moA/%,
The composition of TiO29 mortar is composition 1, and BaTiO3s
smolti, Nd 2053 mo/l/%, Ti02
A composition of 9-El% and 1wt% of CaTiO3 is defined as composition 2. Each raw material was weighed as in the composition of Composition 1, wet mixed in a ball mill, and then dried. This raw material contains 7 wt% polyvinyl butyral as an organic binder, 3 wt% dioctyl phthalate as a plasticizer, and acetic acid n as a solvent.
After adding 50 wt% of butyl and wet kneading, filtering and defoaming,
A sheet with a thickness of .mu.m was molded. Next, a sheet having a thickness of 20 μm was molded for Composition 2 in the same manner.
それぞれのシートを70mmX 130mmの形状に裁
断し、組成2のシート1層の上に組成1のシートを6層
積層し、さらにその上に組成2のシートを1層積層した
。次にこれらの積層体を圧着し、7mmX7mmの形状
に切断した。次にこれらをバインダーを除去した後、空
気中1300’Cの温度で2時間焼成して誘電体磁器を
得た。次にこれらの誘電体磁器を還元雰囲気(N2:u
2=95:5)中で1000℃で4時間還元処理し、さ
らに空気中で、1ooo℃で4時間再酸化処理して表面
誘電体層を形成した。次に両面の所定の位置に銀ペース
トをスクリーン印刷し、850’Cで焼付けて電極を形
成した。得られた還元再酸化型半導体コンデンサの断面
を第2図に、また、成形体シートの圧着体を第1図に示
す。第1図の組成2の成形体シート4の部分が第2図の
表面誘電体層6となり、組成1の成形体シート6の部分
が半導体層7となる。8は対向電極である。ここで、コ
ンデンサとしての特性は、表面誘電体層6を形成する組
成2によって決まる。Each sheet was cut into a shape of 70 mm x 130 mm, six sheets of composition 1 were laminated on one layer of sheet of composition 2, and one layer of sheet of composition 2 was further laminated thereon. Next, these laminates were crimped and cut into a shape of 7 mm x 7 mm. Next, after removing the binder, these were fired in air at a temperature of 1300'C for 2 hours to obtain dielectric porcelain. Next, these dielectric ceramics were placed in a reducing atmosphere (N2:u
2=95:5) at 1000° C. for 4 hours, and then re-oxidized in air at 100° C. for 4 hours to form a surface dielectric layer. Next, silver paste was screen printed at predetermined positions on both sides and baked at 850'C to form electrodes. FIG. 2 shows a cross section of the obtained reduced and reoxidized semiconductor capacitor, and FIG. 1 shows a pressed body of the molded sheet. The portion of the molded sheet 4 of Composition 2 in FIG. 1 becomes the surface dielectric layer 6 of FIG. 2, and the portion of the molded sheet 6 of Composition 1 becomes the semiconductor layer 7. 8 is a counter electrode. Here, the characteristics as a capacitor are determined by the composition 2 forming the surface dielectric layer 6.
比較用として、組成1をもつ従来の還元再酸化型半導体
コンデンサを作り、特性を比較した。単位面積当りの静
電容量、誘電損失(tanδ)、破壊電圧(BDV)、
及び静電容量のバラツキを測定した結果を第1表に示す
。静電容量及びtanδは0.1 ’I 、 I KH
2(7)条件で測定し、BD”/は昇圧破壊方式を用い
て、コンデンサの両極間に1mA以上の電流が流れる直
前の電圧を測定した。For comparison, a conventional reduction-reoxidation semiconductor capacitor having composition 1 was made and its characteristics were compared. Capacitance per unit area, dielectric loss (tanδ), breakdown voltage (BDV),
Table 1 shows the results of measuring the variation in capacitance. Capacitance and tan δ are 0.1'I, IKH
Measurements were made under conditions 2(7), and BD''/ was measured using a step-up breakdown method to measure the voltage immediately before a current of 1 mA or more flows between the two poles of the capacitor.
く第 1 表〉
第1表から明らかなように、本発明の製造方法によれば
静電容量等の特性を従来方法と同等に保ちながら、その
バラツキを低減し、BD’/の低下も防ぐことができた
。Table 1 As is clear from Table 1, the manufacturing method of the present invention reduces variations in capacitance and other properties while keeping them the same as in the conventional method, and also prevents a decrease in BD'/. I was able to do that.
なお、本実施例では希土類元素酸化物としてNd2O3
を用いたが、他の希土類元素(例えば、La。Note that in this example, Nd2O3 was used as the rare earth element oxide.
was used, but other rare earth elements (e.g. La.
Ca、Pr、Sm、Eu、Gd、Dyなど)でも良く、
耐還元性添加物としてはζMgTiO3、人β203な
どを用いても良い。Ca, Pr, Sm, Eu, Gd, Dy, etc.) may be used,
As the reduction-resistant additive, ζMgTiO3, human β203, etc. may be used.
また、組成2の成形体シート4を片面にのみ積層するこ
とによって、第3図に示すような還元再酸化型半導体磁
器コンデンサも容易に製造できる。Furthermore, by laminating the molded sheet 4 of composition 2 on only one side, a reduction and reoxidation type semiconductor ceramic capacitor as shown in FIG. 3 can be easily manufactured.
発明の効果
以上のように、本発明によれば、BaTi05を主成分
として、希土類元素酸化物を含む組成の成形体シートの
表面に、耐還元性添加物を該成形体組成に添加した組成
の成形体シートを積層した後、焼結して得られた誘電体
磁器を還元・再酸化処理又は、還元処理のみを施して表
面誘電体層を形成することによって、表面誘電体層の厚
みをあらかじめ設定でき、静電容量のバラツキを低減し
、破壊電圧の低下を防ぐことができる。Effects of the Invention As described above, according to the present invention, a reduction resistant additive is added to the surface of a molded sheet having BaTi05 as a main component and a rare earth element oxide. After laminating the molded sheets, the dielectric ceramic obtained by sintering is subjected to reduction/reoxidation treatment or only reduction treatment to form a surface dielectric layer, so that the thickness of the surface dielectric layer can be adjusted in advance. can be set, reducing variations in capacitance and preventing a drop in breakdown voltage.
第1図は本発明の還元再酸化型半導体磁器コンデンサの
製造方法による圧着体の断面図、第2図は本発明の実施
例による還元再酸化型半導体磁器コンデンサの断面図、
第3図は本発明の実施例による還元再酸化型半導体磁器
コンデンサの他の例の断面図、第4図は従来の還元再酸
化型半導体磁器コンデンサの断面図である。
4・・・・・・組成2の成形体シート、5・・・・・・
組成1の成形体シート、6・・・・・・表面誘電体層、
7・・・・・・半導体層、8・・・・・・対向電極。FIG. 1 is a sectional view of a crimped body according to the method for manufacturing a reduction and reoxidation type semiconductor ceramic capacitor of the present invention, and FIG. 2 is a sectional view of a reduction and reoxidation type semiconductor ceramic capacitor according to an embodiment of the present invention.
FIG. 3 is a sectional view of another example of the reduction and reoxidation type semiconductor ceramic capacitor according to the embodiment of the present invention, and FIG. 4 is a sectional view of a conventional reduction and reoxidation type semiconductor ceramic capacitor. 4... Molded sheet of composition 2, 5...
Molded sheet of composition 1, 6...surface dielectric layer,
7... Semiconductor layer, 8... Counter electrode.
Claims (1)
組成の成形体シートの表面に、耐還元性添加物を前記組
成に添加した組成の成形体シートを積層した後、焼結し
て得られた誘電体磁器を還元再酸化処理又は、還元処理
のみを施すことによって、表面誘電体層を形成すること
を特徴とした還元再酸化型半導体磁器コンデンサの製造
方法。A dielectric obtained by laminating a molded sheet having a composition in which a reduction-resistant additive is added to the above composition on the surface of a molded sheet having a composition mainly composed of BaTiO_3 and containing a rare earth element oxide, and then sintering the molded sheet. A method for manufacturing a reduction and reoxidation type semiconductor ceramic capacitor, characterized in that a surface dielectric layer is formed by subjecting body ceramic to reduction and reoxidation treatment or only reduction treatment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6663288A JPH01239826A (en) | 1988-03-18 | 1988-03-18 | Manufacture of reduced reoxidized semiconductor ceramic capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6663288A JPH01239826A (en) | 1988-03-18 | 1988-03-18 | Manufacture of reduced reoxidized semiconductor ceramic capacitor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01239826A true JPH01239826A (en) | 1989-09-25 |
Family
ID=13321461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6663288A Pending JPH01239826A (en) | 1988-03-18 | 1988-03-18 | Manufacture of reduced reoxidized semiconductor ceramic capacitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01239826A (en) |
-
1988
- 1988-03-18 JP JP6663288A patent/JPH01239826A/en active Pending
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