JPH01232614A - 接点材料およびその製造方法 - Google Patents
接点材料およびその製造方法Info
- Publication number
- JPH01232614A JPH01232614A JP1019935A JP1993589A JPH01232614A JP H01232614 A JPH01232614 A JP H01232614A JP 1019935 A JP1019935 A JP 1019935A JP 1993589 A JP1993589 A JP 1993589A JP H01232614 A JPH01232614 A JP H01232614A
- Authority
- JP
- Japan
- Prior art keywords
- ions
- layer
- chalcogenide
- contact material
- implanted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 150000002500 ions Chemical class 0.000 claims abstract description 25
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 13
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 13
- 239000010937 tungsten Substances 0.000 claims abstract description 13
- 150000003624 transition metals Chemical class 0.000 claims abstract description 12
- -1 nitrogen ions Chemical class 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 11
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 8
- 239000011733 molybdenum Substances 0.000 claims abstract description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 6
- 239000011651 chromium Substances 0.000 claims abstract description 6
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 6
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 6
- 239000010955 niobium Substances 0.000 claims abstract description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 6
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000010936 titanium Substances 0.000 claims abstract description 6
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 6
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 6
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 6
- 230000000737 periodic effect Effects 0.000 claims abstract description 5
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000011261 inert gas Substances 0.000 claims abstract description 4
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 4
- 239000011593 sulfur Substances 0.000 claims abstract description 4
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 4
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract 3
- 229910052798 chalcogen Inorganic materials 0.000 claims abstract 3
- 150000001787 chalcogens Chemical class 0.000 claims abstract 3
- 229910052711 selenium Inorganic materials 0.000 claims abstract 3
- 239000011669 selenium Substances 0.000 claims abstract 3
- 239000010410 layer Substances 0.000 claims description 59
- 150000004770 chalcogenides Chemical class 0.000 claims description 37
- 238000000034 method Methods 0.000 claims description 22
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 238000002513 implantation Methods 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 229910052786 argon Inorganic materials 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000007943 implant Substances 0.000 claims description 5
- 238000005229 chemical vapour deposition Methods 0.000 claims description 3
- 238000005240 physical vapour deposition Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 239000002356 single layer Substances 0.000 claims 3
- 238000002347 injection Methods 0.000 abstract description 2
- 239000007924 injection Substances 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 230000006978 adaptation Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 239000010970 precious metal Substances 0.000 description 4
- 229910052756 noble gas Inorganic materials 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/021—Composite material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Contacts (AREA)
- Manufacture Of Switches (AREA)
- Physical Vapour Deposition (AREA)
- Conductive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3802869.7 | 1988-02-01 | ||
| DE3802869A DE3802869A1 (de) | 1988-02-01 | 1988-02-01 | Kontaktwerkstoff auf basis von uebergangsmetallen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01232614A true JPH01232614A (ja) | 1989-09-18 |
Family
ID=6346371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1019935A Pending JPH01232614A (ja) | 1988-02-01 | 1989-01-31 | 接点材料およびその製造方法 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0327157B1 (OSRAM) |
| JP (1) | JPH01232614A (OSRAM) |
| AT (1) | ATE108282T1 (OSRAM) |
| DE (2) | DE3802869A1 (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2459303C1 (ru) * | 2011-02-03 | 2012-08-20 | Открытое акционерное общество "Рязанский завод металлокерамических приборов" (ОАО "РЗМКП") | Способ изготовления магнитоуправляемого герметизированного контакта |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3482202A (en) * | 1967-03-15 | 1969-12-02 | Westinghouse Electric Corp | Electrical apparatus and self-lubricating contact |
| NL7905720A (nl) * | 1979-07-24 | 1981-01-27 | Hazemeijer Bv | Werkwijze voor het verbeteren van schakelkontakten, in het bijzonder voor vakuumschakelaars. |
| WO1983000945A1 (en) * | 1981-09-11 | 1983-03-17 | Western Electric Co | Apparatus including electrical contacts |
-
1988
- 1988-02-01 DE DE3802869A patent/DE3802869A1/de active Granted
-
1989
- 1989-01-25 AT AT89200156T patent/ATE108282T1/de active
- 1989-01-25 DE DE58907989T patent/DE58907989D1/de not_active Expired - Fee Related
- 1989-01-25 EP EP89200156A patent/EP0327157B1/de not_active Expired - Lifetime
- 1989-01-31 JP JP1019935A patent/JPH01232614A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP0327157A2 (de) | 1989-08-09 |
| DE58907989D1 (de) | 1994-08-11 |
| EP0327157A3 (en) | 1990-12-05 |
| EP0327157B1 (de) | 1994-07-06 |
| DE3802869A1 (de) | 1989-08-10 |
| ATE108282T1 (de) | 1994-07-15 |
| DE3802869C2 (OSRAM) | 1991-02-14 |
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