JPH01223429A - Production of active matrix type liquid crystal display device - Google Patents
Production of active matrix type liquid crystal display deviceInfo
- Publication number
- JPH01223429A JPH01223429A JP63050455A JP5045588A JPH01223429A JP H01223429 A JPH01223429 A JP H01223429A JP 63050455 A JP63050455 A JP 63050455A JP 5045588 A JP5045588 A JP 5045588A JP H01223429 A JPH01223429 A JP H01223429A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- crystal display
- display device
- resist pattern
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 19
- 239000011159 matrix material Substances 0.000 title claims description 13
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000007650 screen-printing Methods 0.000 claims abstract description 6
- 230000010287 polarization Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 10
- 239000010409 thin film Substances 0.000 abstract description 7
- 239000010408 film Substances 0.000 abstract description 6
- 238000000206 photolithography Methods 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000002253 acid Substances 0.000 abstract description 2
- 238000005530 etching Methods 0.000 abstract description 2
- 150000007513 acids Chemical class 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明はアクティブマトリクス型液晶表示装置の製造方
法に関するものである。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method of manufacturing an active matrix liquid crystal display device.
〈従来技術〉
従来より液晶を用いた表示装置として種々の方式が提案
、開発されている。その中で、能動素子を用いる方式は
、マドvクス配置された複数の画素を駆動させる液晶表
示装置においてよく使用されており、多くの走査ライン
数での高コントラスト表示を実現するとで不可欠なもの
となっている。<Prior Art> Various systems have been proposed and developed as display devices using liquid crystals. Among these, methods using active elements are often used in liquid crystal display devices that drive multiple pixels arranged in a Mad Vx arrangement, and are essential for achieving high contrast display with a large number of scanning lines. It becomes.
vJ2図は上記アクティブ々トリクス方式を用いた液晶
表示装置の要部断面図である。同図の如く、能動素子基
板2の一生面上には画素電極3.バスライン5.及び能
動素子4が配置され、配向膜6゜液晶層7.及び配向膜
6を介して前記能動素子基板2主面と向い合う対向基板
ll主面上にはカラーフィルタ8.ブラックマトリクス
9.及び対向電極10が配置されてなる。また能動素子
基板2の裏面及び対向基板11の裏面には夫々偏光板1
゜12が設けられ、透過光の変調を行なう。FIG. vJ2 is a cross-sectional view of a main part of a liquid crystal display device using the above-mentioned active matrix method. As shown in the figure, pixel electrodes 3. Bus line 5. and an active element 4 are arranged, an alignment film 6°, a liquid crystal layer 7. A color filter 8 is disposed on the main surface of the counter substrate 11, which faces the main surface of the active element substrate 2 with the alignment film 6 interposed therebetween. Black matrix9. and a counter electrode 10 are arranged. Further, polarizing plates 1 are provided on the back surface of the active element substrate 2 and the back surface of the counter substrate 11, respectively.
12 is provided to modulate the transmitted light.
尚、上述の配置や対向関係には任意性があり、これまで
にも種々の組合せで実現した液晶表示装置が多数報告さ
れている。Note that the above-mentioned arrangement and facing relationship are arbitrary, and many liquid crystal display devices realized in various combinations have been reported.
このような液晶表示装置では、その製造工程のうち、能
動素子基板2主面上に能動素子4.バスライン5.及び
画素電極3を作製する工程において、ホトリングラフィ
技術によって所望レジストパターンを構成する方法が採
られている。具体的には為例えば第3図(a)K、示す
ように、先ず基板20上全面にパターニングしたい薄膜
21.及びホトレジスト22を順次形成した後、第3図
(b)の如く、前記ホトレジスト22上部に所望パター
ンを有するホトマスク23を配置し、該ホトマスク23
上からホトレジスト22に光を照射してホトレジスト2
2を選択的に露光する。続いて露光されたホトレジスト
22を現像すると、第3図(C)の如く、レジストパタ
ーン22aが完成される。In such a liquid crystal display device, during the manufacturing process, active elements 4. Bus line 5. In the step of manufacturing the pixel electrode 3, a method is adopted in which a desired resist pattern is formed using photolithography technology. Specifically, for example, as shown in FIG. 3(a)K, first, a thin film 21. which is to be patterned all over the substrate 20 is formed. After sequentially forming the photoresist 22, a photomask 23 having a desired pattern is placed on top of the photoresist 22, as shown in FIG.
Light is irradiated onto the photoresist 22 from above to remove the photoresist 2.
2 is selectively exposed. Subsequently, the exposed photoresist 22 is developed to complete a resist pattern 22a as shown in FIG. 3(C).
〈発明が解決しようとする課題〉
上記従来技術ではレジストパターンの形成のみに関して
、ホトレジスト塗布、露光、現像と三工程が費されてお
り、アクティブマトリクス型液晶表示装置の製造コスト
の減少を妨げるという問題がある。<Problems to be Solved by the Invention> In the above-mentioned conventional technology, only the formation of a resist pattern requires three steps: photoresist coating, exposure, and development, which hinders the reduction in manufacturing costs of active matrix liquid crystal display devices. There is.
〈課題を解決するための手段〉
本発明は上述する課題を解決するためになされたもので
、電圧の印加、非印加に応答して偏光面の回転、非回転
を制御する液晶表示装置であって、バスラインを通して
伝達された外部信号が能動素子を介して複数個の画素を
マトリクス駆動させるアクティブマトリクス型液晶表示
装置において、上記能動素子とバスライン形成用レジス
トパターンはその全て又は一部分がスクリーン印刷にて
形成されてなるアクティブマトリクス型液晶表示装置の
製造方法を提供するものである。<Means for Solving the Problems> The present invention has been made to solve the above-mentioned problems, and is a liquid crystal display device that controls rotation or non-rotation of a plane of polarization in response to application or non-application of voltage. In an active matrix liquid crystal display device in which an external signal transmitted through a bus line drives a plurality of pixels in a matrix through active elements, all or part of the active elements and the resist pattern for forming the bus line are screen printed. The present invention provides a method for manufacturing an active matrix liquid crystal display device.
く作 用〉
上述の如く、能動素子及びバスライン形成用レジストパ
ターンをスクリーン印刷にて形成することにより、従来
のホトリソグラフィ技術を用いてレジストパターンを形
成する際に比べて工程数が大幅に減少する。As mentioned above, by forming the resist pattern for forming active elements and bus lines by screen printing, the number of steps is significantly reduced compared to when forming the resist pattern using conventional photolithography technology. do.
〈実施例〉
以下、図面を用いて本発明の実施例を詳述するが、本発
明はこれに限定されるものではない。<Examples> Examples of the present invention will be described in detail below with reference to the drawings, but the present invention is not limited thereto.
第1図(a)〜(C)は本発明の一実施例を説明するた
めの要部断面図である。先ず、第1図(a)の如く基板
13上全面に薄膜14を形成した後、第1図(b)の如
く前記薄膜14上にスクリーンメツシュ15を配置し、
該スクリーンメツシュ15上の耐強酸性エツチングレジ
ストインク等のレジスト17をスキージ16により薄膜
14土に押し出すと、第1図(C)の如くスクリーンメ
ツシュ15により選択的にレジスト17が押し出されて
薄膜14上にレジストパターン18が形成される。FIGS. 1(a) to 1(C) are sectional views of essential parts for explaining one embodiment of the present invention. First, a thin film 14 is formed on the entire surface of the substrate 13 as shown in FIG. 1(a), and then a screen mesh 15 is placed on the thin film 14 as shown in FIG. 1(b).
When the resist 17 such as strong acid-resistant etching resist ink on the screen mesh 15 is pushed out onto the thin film 14 with the squeegee 16, the resist 17 is selectively pushed out by the screen mesh 15 as shown in FIG. 1(C). A resist pattern 18 is formed on the thin film 14.
上述の如く、レジストパターンをスクリーン印刷で形成
することにより、従来のホトリソグラフィ技術で形成す
る際要した塗布、露光、現像の三工程を一工程に減少さ
せることが可能となる。また、このレジストパターン形
成工程以外の工程はホトリソグラフィ技術使用時と全く
同じであり、新しく別の工程を導入したり、工程の変更
を伴うものではない。As described above, by forming a resist pattern by screen printing, it is possible to reduce the three steps of coating, exposure, and development required when forming a resist pattern by conventional photolithography technology to one step. Further, the steps other than this resist pattern forming step are exactly the same as those when using photolithography technology, and no new or different steps are introduced or changes are made to the steps.
尚、本発明のスクリーン印刷法において、ステンレス5
00メツシユ、或いは一体成型平型メッシュ等のスクリ
ーンメツシュを用いることにより、解像度が50μm9
重ね合せ精度が±10μm程度となり、約30011m
以上の画素ピッチをもつアクティブマトリクス型液晶表
示装置には充分適用可能である。In addition, in the screen printing method of the present invention, stainless steel 5
By using a screen mesh such as 00 mesh or integrally molded flat mesh, the resolution can be reduced to 50 μm9.
Overlay accuracy is approximately ±10μm, approximately 30011m
It is fully applicable to active matrix liquid crystal display devices having a pixel pitch of the above.
〈発明の効果〉
本発明によりアクティブマトリクス型液晶表示装置の製
造工程を短縮できるため、前記液晶表示装置のコストを
大巾に削減することが可能となる。<Effects of the Invention> According to the present invention, the manufacturing process of an active matrix type liquid crystal display device can be shortened, so that the cost of the liquid crystal display device can be significantly reduced.
第1図(a)〜(C)は本発明の一実施例を説明するた
めの断面図、第2図はアクティブマトリクス型液晶表示
装置の要部断面図、第3図(a)〜(C)は従来例を説
明するための断面図である。
1.12偏光板 2能動素子基板 8画素電極4能動素
子 5バスライン 6配向膜 7液晶層8カラーフィル
タ 9ブラツクマトリクス 10対向電極 11対向基
板 18基板 14薄膜15スクリーンメ゛ツシユ 1
6ス’t−シ17L/シスト 18レジストパターンFIGS. 1(a) to (C) are cross-sectional views for explaining one embodiment of the present invention, FIG. 2 is a cross-sectional view of essential parts of an active matrix liquid crystal display device, and FIGS. 3(a) to (C) ) is a sectional view for explaining a conventional example. 1.12 Polarizing plate 2 Active element substrate 8 Pixel electrode 4 Active element 5 Bus line 6 Alignment film 7 Liquid crystal layer 8 Color filter 9 Black matrix 10 Counter electrode 11 Counter substrate 18 Substrate 14 Thin film 15 Screen mesh 1
6 S'T-S 17L/Sist 18 Resist Pattern
Claims (1)
転を制御する液晶表示装置であって、バスラインを通し
て伝達された外部信号が能動素子を介して複数個の画素
をマトリクス駆動させるアクティブマトリクス型液晶表
示装置において、上記能動素子とバスライン形成用レジ
ストパターンはその全て又は一部分がスクリーン印刷に
て形成されてなることを特徴とするアクティブマトリク
ス型液晶表示装置の製造方法。1. A liquid crystal display device that controls the rotation or non-rotation of the plane of polarization in response to the application or non-application of voltage, in which an external signal transmitted through a bus line drives multiple pixels in a matrix through active elements. 1. A method of manufacturing an active matrix liquid crystal display device, wherein all or a part of the active elements and the resist pattern for forming bus lines are formed by screen printing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63050455A JPH01223429A (en) | 1988-03-02 | 1988-03-02 | Production of active matrix type liquid crystal display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63050455A JPH01223429A (en) | 1988-03-02 | 1988-03-02 | Production of active matrix type liquid crystal display device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01223429A true JPH01223429A (en) | 1989-09-06 |
Family
ID=12859340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63050455A Pending JPH01223429A (en) | 1988-03-02 | 1988-03-02 | Production of active matrix type liquid crystal display device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01223429A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03167335A (en) * | 1989-11-22 | 1991-07-19 | Kanebo Ltd | Rayon fasciated spun yarn and rayon/wool fasciated spun yarn by air false twisting method |
DE19649761C2 (en) * | 1996-11-30 | 2003-04-03 | Univ Stuttgart | Process for the production of liquid crystal displays on plastic foils using bistable liquid crystals |
US6686229B2 (en) | 2001-03-02 | 2004-02-03 | Koninklijke Philips Electronics N.V. | Thin film transistors and method of manufacture |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54103694A (en) * | 1978-02-01 | 1979-08-15 | Seiko Epson Corp | Production of transparent conductive film patterns of liquid crystal panel |
-
1988
- 1988-03-02 JP JP63050455A patent/JPH01223429A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54103694A (en) * | 1978-02-01 | 1979-08-15 | Seiko Epson Corp | Production of transparent conductive film patterns of liquid crystal panel |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03167335A (en) * | 1989-11-22 | 1991-07-19 | Kanebo Ltd | Rayon fasciated spun yarn and rayon/wool fasciated spun yarn by air false twisting method |
DE19649761C2 (en) * | 1996-11-30 | 2003-04-03 | Univ Stuttgart | Process for the production of liquid crystal displays on plastic foils using bistable liquid crystals |
US6686229B2 (en) | 2001-03-02 | 2004-02-03 | Koninklijke Philips Electronics N.V. | Thin film transistors and method of manufacture |
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