JPH01220460A - Bump forming solder for semiconductor device - Google Patents

Bump forming solder for semiconductor device

Info

Publication number
JPH01220460A
JPH01220460A JP4443088A JP4443088A JPH01220460A JP H01220460 A JPH01220460 A JP H01220460A JP 4443088 A JP4443088 A JP 4443088A JP 4443088 A JP4443088 A JP 4443088A JP H01220460 A JPH01220460 A JP H01220460A
Authority
JP
Japan
Prior art keywords
solder
bump forming
semiconductor device
main components
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4443088A
Other languages
Japanese (ja)
Inventor
Takeshi Oka
毅 岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omron Tateisi Electronics Co filed Critical Omron Tateisi Electronics Co
Priority to JP4443088A priority Critical patent/JPH01220460A/en
Publication of JPH01220460A publication Critical patent/JPH01220460A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve heat resistance and adhesion, to simplify a bump forming step and to decrease a cost, by forming a bump forming solder for a semiconductor device so that aluminum and zinc are main components thereof. CONSTITUTION:As a bump forming solder for a semiconductor device, aluminum and zinc are used as main components, and the ratio of the main components Zn/Al is made to be about 9/1. The solder whose main components are Al and Zn has a high melting point, can withstand heating of an IC chip and has excellent adhesion with an Al electrode. The phenomenon of errosion with the solder is not produced when bonding is performed with soldering. A bump forming step can be simplified. At the same time low-cost materials are used. Therefore, the cost of the solder can be decreased.

Description

【発明の詳細な説明】 発明の要約 ICチップのバンプ材料をZ n / A j!系とし
たため、従来のS n / P b系よりも、耐熱性向
上。
[Detailed Description of the Invention] Summary of the Invention The bump material of an IC chip is made of Z n /A j! Because it is a Sn/Pb system, it has improved heat resistance than the conventional Sn/Pb system.

電気伝導度向上、バンプ形成工程の簡略化等が可能とな
る。
It becomes possible to improve electrical conductivity and simplify the bump forming process.

発明の背景 この発明は、半導体装置、とくにICチップを、半導体
基板、プリント配線基板等に実装するときに用いられる
バンプ形成材料、すなわちバンプ形成用ハンダに関する
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bump-forming material, ie, bump-forming solder, used when mounting a semiconductor device, particularly an IC chip, on a semiconductor substrate, a printed wiring board, or the like.

従来のバンプ材料としては、金、またはスズ鉛系がよく
用いられ、kk近では特に、フリップチップ・ボンディ
ング法においてスズ鉛系が多く用いられるようになって
きた。しかしこのような従来のスズ鉛系のハンダでは融
点が低く、高集積化された近年のICチップは発熱量も
多く高温になるので熱に対する信頼性に問題がある。一
方、金を用いた場合には上記した耐熱性の問題は無いが
高価であり、またハンダ付で接着する場合ハンダ食われ
と呼ばれる現象が発生し、つけ直しができないという問
題がある。
Gold or tin-lead materials are often used as conventional bump materials, and tin-lead materials are increasingly being used in the flip-chip bonding method, especially near KK. However, such conventional tin-lead solder has a low melting point, and recent highly integrated IC chips generate a lot of heat and reach high temperatures, so there is a problem with thermal reliability. On the other hand, when gold is used, although it does not have the above-mentioned heat resistance problem, it is expensive, and when it is soldered and bonded, a phenomenon called solder erosion occurs, making it impossible to reattach.

発明の概要 この発明は耐熱性があり、しかも比較的安価なバンプ形
成用ハンダを提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a heat-resistant and relatively inexpensive solder for forming bumps.

この発明による半導体装置のバンプ形成用ハンダは、ア
ルミニウム(A()および亜鉛(Zn)を主成分とする
ことを特徴とする。
The solder for forming bumps in a semiconductor device according to the present invention is characterized by containing aluminum (A()) and zinc (Zn) as main components.

この発明によればその構成をアルミニウムと亜鉛を主成
分とするバンプ形成材料としたので。
According to the present invention, the bump forming material is composed of aluminum and zinc as main components.

■ 融点を380℃程度まで上げることができ。■ The melting point can be raised to around 380℃.

ICチップの発熱に対しても問題がない。There is no problem with heat generation from the IC chip.

■ ICチップ等の半導体装置のアルミニウム電極に対
しても密着が強い。
■ Strong adhesion to aluminum electrodes of semiconductor devices such as IC chips.

■ アルミニウム電極に特別な表面処理を必要としない
■ No special surface treatment is required for the aluminum electrode.

■ 材料が安価である。■ Materials are inexpensive.

■ ハンダ付をしてもハンダ食われが無い。■ No solder corrosion even after soldering.

笠の効果が得られる。You can get the effect of a hat.

実施例の説明 バンプ形成用ハンダの成分比2口/Aj!を約9/1と
した。固#[1線は379℃、液相線は390℃1作業
温度は380℃である。
Description of Examples Component ratio of bump forming solder: 2/Aj! was approximately 9/1. The solid line is 379°C, the liquidus line is 390°C, and the working temperature is 380°C.

このハンダを溶融した超音波式ハンダ槽(超音波周波数
21H1z、設定温度380〜400℃)を用いて、最
小ICパッドピッチ 180μ−のIC(80パツド)
を、1〜3 secデイツプ後引きあげ、基板」二にボ
ンディングした。雰囲気は非酸化雰囲気(N2を流した
)で行った。その結果80ピン(A、i7製)全てにつ
いて、ハンダの「ブリッジ現象」なくハンダをつけるこ
とができた。
Using an ultrasonic solder bath (ultrasonic frequency 21Hz, set temperature 380-400℃) in which this solder was melted, an IC (80 pads) with a minimum IC pad pitch of 180μ- is produced.
After dipping for 1 to 3 seconds, it was pulled up and bonded to the substrate. The atmosphere was a non-oxidizing atmosphere (N2 was flowed). As a result, I was able to solder all 80 pins (A, made by i7) without the solder "bridging phenomenon."

以  上that's all

Claims (1)

【特許請求の範囲】[Claims]  アルミニウムおよび亜鉛を主成分とする半導体装置の
バンプ形成用ハンダ。
A solder for forming bumps on semiconductor devices whose main components are aluminum and zinc.
JP4443088A 1988-02-29 1988-02-29 Bump forming solder for semiconductor device Pending JPH01220460A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4443088A JPH01220460A (en) 1988-02-29 1988-02-29 Bump forming solder for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4443088A JPH01220460A (en) 1988-02-29 1988-02-29 Bump forming solder for semiconductor device

Publications (1)

Publication Number Publication Date
JPH01220460A true JPH01220460A (en) 1989-09-04

Family

ID=12691275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4443088A Pending JPH01220460A (en) 1988-02-29 1988-02-29 Bump forming solder for semiconductor device

Country Status (1)

Country Link
JP (1) JPH01220460A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5143865A (en) * 1988-09-02 1992-09-01 Kabushiki Kaisha Toshiba Metal bump type semiconductor device and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5143865A (en) * 1988-09-02 1992-09-01 Kabushiki Kaisha Toshiba Metal bump type semiconductor device and method for manufacturing the same

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