JPH01214182A - Metal steam laser device - Google Patents

Metal steam laser device

Info

Publication number
JPH01214182A
JPH01214182A JP4045388A JP4045388A JPH01214182A JP H01214182 A JPH01214182 A JP H01214182A JP 4045388 A JP4045388 A JP 4045388A JP 4045388 A JP4045388 A JP 4045388A JP H01214182 A JPH01214182 A JP H01214182A
Authority
JP
Japan
Prior art keywords
electrode
plasma tube
insulating material
heat
metal vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4045388A
Other languages
Japanese (ja)
Inventor
Nobutada Aoki
延忠 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP4045388A priority Critical patent/JPH01214182A/en
Publication of JPH01214182A publication Critical patent/JPH01214182A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/031Metal vapour lasers, e.g. metal vapour generation

Abstract

PURPOSE:To increase laser oscillation capacity by inserting a cylindrical second electrode between a plasma tube and a first electrode for preventing powder and impurities within a heat-insulating material from being mixed into plasma tube by improving flow of buffer gas into the heat-insulating material. CONSTITUTION:If a second electrode 15 is inserted between a plasma tube 9 and a first electrode 12a, internal electric field of the electric field 15 becomes smaller and the electric field in axial direction is centered at a plasma tube 9 with improved steam density at the further depth, thus enabling excitation to be performed actively. As a result, oscillation efficiency can be improved. Also, since a proper gap 8 is provided between electrodes 12a and 15, flow of buffer gas supplied from one part of a supporting flange to the other into a heat-insulating material 10 can be made smoothly. Furthermore, discharge of powder within the heat-insulating material 10 and impurity gas to the outside of the main unit 1 can be performed fully. Thus, by keeping the concentration of impurities within the plasma tube 9 to be low, discharge can be stably maintained.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、金属蒸気をレーザ媒質とした金属蒸気レーザ
装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a metal vapor laser device using metal vapor as a laser medium.

(従来の技術) 近年、可視域(波長5106A、5783A)の発振波
長を持ち、高効率、高ゲイン、高繰り返し、高出力のレ
ーザ光を得る銅蒸気レーザが利用されるようになってい
る。
(Prior Art) In recent years, copper vapor lasers have come into use that have an oscillation wavelength in the visible range (wavelengths of 5106A and 5783A) and that produce high-efficiency, high-gain, high-repetition, and high-output laser light.

第2図は、この種の金属蒸気レーザを得るレーザ装置の
概略構成を示すものである。すなわち、第2図における
金属蒸気レーザ装置はレーザ発振管本体1と、この本体
1に設けられるウィンドウ13の両側に配置されたレー
ザ共振器ミラー2.3と、本体1内のプラズマチューブ
9にバッファガスを供給するバッファガス供給装置4と
、本体1に内の電極12に電圧を印加し放電させるため
の電力を供給するための供給電源5と、プラズマチュー
ブ9内にパルス放電を起させるための放電回路6と、プ
ラズマチューブ9内を排気する排気装置7と、本体1お
よび支持フランジ16などを冷却する冷却装置8により
構成されている。
FIG. 2 shows a schematic configuration of a laser device for producing this type of metal vapor laser. That is, the metal vapor laser device shown in FIG. A buffer gas supply device 4 for supplying gas, a supply power supply 5 for supplying power to apply voltage to the electrode 12 in the main body 1 to cause discharge, and a supply power supply 5 for supplying power to cause a pulse discharge in the plasma tube 9. It is comprised of a discharge circuit 6, an exhaust device 7 that exhausts the inside of the plasma tube 9, and a cooling device 8 that cools the main body 1, support flange 16, and the like.

本体1は中心部に耐熱性セラミック製プラズマチューブ
9と、このチューブ9のまわりに巻かれたファイバー系
の断熱材10とこの断熱材10の外周に設けられた石英
又はガラス保護管11を内部構造物としている。また本
体1のヘッド部はモリブデン等の耐熱性金属製円筒状第
1電極12を設置した部分と、レーザ光を取り出す為の
ウィンドウ13を設置するアセンブリとから構成される
The main body 1 has an internal structure including a plasma tube 9 made of heat-resistant ceramic in the center, a fiber-based heat insulating material 10 wrapped around the tube 9, and a quartz or glass protection tube 11 provided around the outer periphery of the heat insulating material 10. It's a thing. The head portion of the main body 1 is composed of a portion in which a cylindrical first electrode 12 made of heat-resistant metal such as molybdenum is installed, and an assembly in which a window 13 for extracting laser light is installed.

ウィンドウ13は支持フランジ16に取着され、ブリュ
スター管を構成する。
Window 13 is attached to support flange 16 and forms a Brewster tube.

なお、符号14は金属蒸気源で、たとえば銅蒸気レーザ
では銅が使用される。この金属蒸気レーザ装置の発振原
理は、前記供給電源5、放電回路6によりバッファガス
が供給されたガラス保護管11内の両筒1電極12間に
放電を起こし、断熱材10が外周面に巻かれたプラズマ
チューブ9が加熱され、プラズマチューブ9内に配置さ
れた金属蒸気源14がレーザ媒質である金属蒸気をプラ
ズマチューブ内9に充たし放電プラズマにより励起させ
た際、放出される励起光を前記レーザ共振器ミラー2.
3間で共振増幅させてレーザ出力を得るものである。
Note that reference numeral 14 is a metal vapor source; for example, copper is used in a copper vapor laser. The oscillation principle of this metal vapor laser device is that a discharge is generated between the electrodes 12 of both cylinders in the glass protection tube 11 to which buffer gas is supplied by the supply power source 5 and the discharge circuit 6, and a heat insulating material 10 is wrapped around the outer circumferential surface. When the plasma tube 9 is heated and the metal vapor source 14 disposed inside the plasma tube 9 fills the plasma tube 9 with metal vapor as a laser medium and excites it with discharge plasma, the emitted excitation light is emitted as described above. Laser resonator mirror 2.
The laser output is obtained by amplifying the resonance between the three.

このようなプラズマチューブ9を高温に維持し、金属蒸
気をプラズマチューブ9内に長期間光たすことが必要な
金属蒸気レーザでは、プラズマチューブ9の健全性と、
安定な放電を得るよう工夫された構造に形成することが
重要なポイントとなる。
In a metal vapor laser that requires maintaining the plasma tube 9 at a high temperature and emitting metal vapor within the plasma tube 9 for a long period of time, the health of the plasma tube 9 and
The important point is to form a structure that is designed to obtain stable discharge.

(発明が解決しようとする課題) 従来の金属蒸気レーザ装置では第2図で示す様に一対の
第1電極12の先端部とプラズマチューブ9の先端との
間は、プラズマチューブ9の熱膨張を吸収するために隙
間Aをあけている。また、第1電極12の終端部は支持
フランジ16に固定されている。しかしながら、この従
来のレーザ装置では第1電極12とプラズマチューブ9
との間に設けられた隙間Aから断熱材10の粉末とか不
純物が吹き出しプラズマチューブ9内に混入して放電を
不安定にする問題点があった。また、プラズマチューブ
9内は放電を安定に維持するため不純物の混入を極力防
ぐ必要がある。そこで、断熱材10中の不純物ガスを本
体1外にスムーズに排出する必要がある。そのため従来
例のように第1電極12の終端部を支持フランジ16に
固定した構造ではバッファガスの通流を妨げるので改良
する余地があった。
(Problems to be Solved by the Invention) In the conventional metal vapor laser device, as shown in FIG. A gap A is provided to absorb the liquid. Further, the terminal end of the first electrode 12 is fixed to a support flange 16. However, in this conventional laser device, the first electrode 12 and the plasma tube 9
There is a problem in that powder of the heat insulating material 10 and other impurities are blown out from the gap A provided between the plasma tube 9 and the plasma tube 9, making the discharge unstable. Furthermore, in order to maintain stable discharge within the plasma tube 9, it is necessary to prevent impurities from entering the plasma tube 9 as much as possible. Therefore, it is necessary to smoothly discharge the impurity gas in the heat insulating material 10 to the outside of the main body 1. Therefore, the structure in which the terminal end of the first electrode 12 is fixed to the support flange 16 as in the conventional example impedes the flow of buffer gas, so there is room for improvement.

本発明は上記課題にかんがみてなされたものでプラズマ
チューブ内を高温に維持する必要がある金属蒸気レーザ
装置において、プラズマチューブの健全性と、放電の安
定性を向上し得る金属蒸気レーザ装置を提供することを
目的とする。
The present invention has been made in view of the above problems, and provides a metal vapor laser device that can improve the integrity of the plasma tube and the stability of discharge in a metal vapor laser device that requires maintaining the inside of the plasma tube at a high temperature. The purpose is to

[発明の構成コ (課題を解決するための手段) 一対の円筒状第1電極間で起こさせた放電により蒸発さ
れた金属蒸気を内部に充たすプラズマチューブと、この
プラズマチューブ内に充たされた金属蒸気をレーザ媒質
としてレーザ共振器を形成してなる光共振器とを具備し
た金属蒸気レーザ装置において、前記プラズマチューブ
と第1?1!極との間に円筒状第2電極を挿入してなる
ことを特徴とする金属蒸気レーザ装置。
[Configuration of the Invention (Means for Solving the Problems) A plasma tube filled with metal vapor evaporated by a discharge caused between a pair of cylindrical first electrodes; In a metal vapor laser device comprising an optical resonator formed by forming a laser resonator using metal vapor as a laser medium, the plasma tube and a first?1! A metal vapor laser device comprising a cylindrical second electrode inserted between the electrode and the electrode.

(作用) 第1電極とプラズマチューブとの間に第2電極を挿入す
ることによって断熱材へのバッフ7ガスの通流がスムー
ズになり、しかも断熱材の粉末とか不純物がプラズマチ
ューブ内に混入し難くなる。このことによりプラズマチ
ューブ内の不純物濃度を低下させ放電を安定化し、もっ
て高出力で安定なレーザ出力を得ることができる。
(Function) By inserting the second electrode between the first electrode and the plasma tube, the flow of the buff 7 gas to the heat insulating material becomes smooth, and furthermore, powder of the heat insulating material and impurities are not mixed into the plasma tube. It becomes difficult. This reduces the impurity concentration within the plasma tube and stabilizes the discharge, thereby making it possible to obtain high and stable laser output.

(実施例) 第1図を参照しながら本発明の一実施例を説明する。(Example) An embodiment of the present invention will be described with reference to FIG.

第1図は本発明の一実施例の要部の概略構成を示してお
り、耐2図の従来装置と同一部分には同一符号を付して
おり、発振管本体以外の付属構成物については省略しで
ある。また、重複する部分の説明も省略する。
FIG. 1 shows a schematic configuration of the main parts of an embodiment of the present invention. The same parts as the conventional device shown in FIG. It is omitted. Further, explanations of overlapping parts will also be omitted.

この実施例装置が従来例と異なるところは発振管本体1
とウィンドウ13を支持する支持フランジ16との間に
第1電極12aを設け、この第1電極12aの先端部と
プラズマチューブ9の間に円筒状第2電極15を挿入し
たことである。この第2電極15は先端部をプラズマチ
ューブ9の先端に接触させ反対側の終端部は主電極12
aに接触させないように第1電極12aよりやや直径が
小さく形成されている。また、第2電極15の他端と第
1電極12aとの間には隙間Bが設けられている。
The difference between this embodiment device and the conventional example is that the oscillation tube body 1
and a support flange 16 that supports the window 13, and a cylindrical second electrode 15 is inserted between the tip of the first electrode 12a and the plasma tube 9. The second electrode 15 has its tip in contact with the tip of the plasma tube 9, and its opposite end is connected to the main electrode 12.
It is formed to have a slightly smaller diameter than the first electrode 12a so as not to contact the first electrode 12a. Further, a gap B is provided between the other end of the second electrode 15 and the first electrode 12a.

しかして、上記実施例において、放電は第1電極12a
間で発生する。軸方向の電界も従来例の場合第1電極1
2間で均等に分布すると考えられる。しかしながら、本
発明のように第2電極15をプラズマチューブ9と第1
電極12aとの間に挿入した場合、第2電極15の内部
電界は小さくなり、その分軸方向電界は奥部の蒸気密度
の濃いプラズマチューブ9の部分で集中することになり
、励起を活発に行うことができ、もって発振効率を向上
するのに有利となる。また、第1電極12aとこの第2
電極15間には適当な隙間Bが設けられているため、支
持フランジ16の一方から他方へ流れるように供給した
バッファガスの断熱材10中への通流がスムーズに行な
えるようになる。
Therefore, in the above embodiment, the discharge occurs at the first electrode 12a.
Occurs between. In the conventional example, the electric field in the axial direction is also limited to the first electrode 1.
It is thought that it is evenly distributed between the two. However, as in the present invention, the second electrode 15 is connected to the plasma tube 9 and the first electrode.
When inserted between the second electrode 12a and the second electrode 12a, the internal electric field of the second electrode 15 becomes smaller, and the axial electric field is concentrated in the deep part of the plasma tube 9 where the vapor density is high, actively excitation. This is advantageous in improving the oscillation efficiency. Moreover, the first electrode 12a and this second electrode 12a
Since a suitable gap B is provided between the electrodes 15, the buffer gas supplied so as to flow from one side of the support flange 16 to the other can smoothly flow into the heat insulating material 10.

さらに断熱材10中の不純物ガスの本体1外への排出が
充分行えプラズマチューブ9内の不純物濃度を低く抑え
ることにより放電を安定に維持することを可能できる。
Furthermore, the impurity gas in the heat insulating material 10 can be sufficiently discharged to the outside of the main body 1, and by keeping the impurity concentration in the plasma tube 9 low, it is possible to maintain stable discharge.

なお、発振管本体1の寿命は大部分プラズマチューブ9
内に配置された金属蒸気源14の寿命によって決定され
る。この金属蒸気はプラズマチューブ9の端部の低温部
で凝縮されるため、この第2電極15をタンタル又はタ
ングステンの様な焼結金属を用いればそのヒートポンプ
作用により、金属蒸気はこの部分で再び高温部に環流さ
れ寿命が大幅に増大することが期待される。
Note that the lifespan of the oscillation tube body 1 is mostly due to the plasma tube 9.
is determined by the lifetime of the metal vapor source 14 located within. Since this metal vapor is condensed at the low temperature part at the end of the plasma tube 9, if a sintered metal such as tantalum or tungsten is used for the second electrode 15, the metal vapor will return to a high temperature at this part due to its heat pump action. It is expected that the product life will be greatly increased by being recycled to the parts.

[発明の効果] 本発明に係る金属蒸気レーザ装置は第1電極とプラズマ
チューブとの間に挿入した第2電極によって断熱材中の
粉末とか不純物がプラズマチューブ内へ混入することを
防ぎ、かつ断熱材中へのバッファガスの通流を良好にし
、しかも不純物濃度を低くすることによって放電を安定
に維持することができる。また、レーザ発振能力も電界
を金属蒸気濃度の高いプラズマチューブ内で集中させる
効果から大幅に増大することが可能となる。
[Effects of the Invention] The metal vapor laser device according to the present invention prevents powder and impurities in the heat insulating material from entering the plasma tube by the second electrode inserted between the first electrode and the plasma tube. By improving the flow of buffer gas into the material and lowering the impurity concentration, it is possible to maintain stable discharge. Furthermore, the laser oscillation ability can be greatly increased due to the effect of concentrating the electric field in the plasma tube with high metal vapor concentration.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る金属蒸気レーザ装置の一実施例を
示す縦断面図、第2図は従来の金属蒸気レーザ装置を端
部ブロックで示す縦断面図である。 1・・・・・・・・・発振管本体 2.3・・・共振器ミラー 4・・・・・・・・・バッファガス供給装置5・・・・
・・・・・電源 6・・・・・・・・・放電回路 7・・・・・・・・・バッファガス排気装置8・・・・
・・・・・冷却装置 9・・・・・・・・・プラズマチューブ10・・・・・
・・・・断熱材 11・・・・・・・・・保護管 12・・・・・・・・・主電極 13・・・・・・・・−ウィンドウ 14・・・・・・・・・金属蒸気源 15・・・・・・・・・第2電極 16・・・・・・・・−支持フランジ ASB・・・・・・隙間 出願人     株式会社 東芝 代理人 弁理士 須 山 佐 −
FIG. 1 is a longitudinal sectional view showing an embodiment of a metal vapor laser device according to the present invention, and FIG. 2 is a longitudinal sectional view showing a conventional metal vapor laser device with an end block. 1...Oscillator tube body 2.3...Resonator mirror 4...Buffer gas supply device 5...
...Power source 6...Discharge circuit 7...Buffer gas exhaust device 8...
...Cooling device 9...Plasma tube 10...
...Insulating material 11...Protection tube 12...Main electrode 13...-Window 14...・Metal vapor source 15...Second electrode 16...-Support flange ASB...Gap Applicant Toshiba Corporation Patent attorney Sasa Suyama -

Claims (1)

【特許請求の範囲】[Claims] 一対の円筒状第1電極間で、起こさせた放電により蒸発
された金属蒸気を内部に充たすプラズマチューブと、こ
のプラズマチューブ内に充たされた金属蒸気をレーザ媒
質としてレーザ共振器を形成してなる光共振器とを具備
した金属蒸気レーザ装置において、前記プラズマチュー
ブと第1電極との間に円筒状第2電極を挿入してなるこ
とを特徴とする金属蒸気レーザ装置。
A plasma tube is formed between a pair of cylindrical first electrodes, the inside of which is filled with metal vapor evaporated by the generated discharge, and a laser resonator is formed using the metal vapor filled in this plasma tube as a laser medium. What is claimed is: 1. A metal vapor laser device comprising an optical resonator, characterized in that a cylindrical second electrode is inserted between the plasma tube and the first electrode.
JP4045388A 1988-02-23 1988-02-23 Metal steam laser device Pending JPH01214182A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4045388A JPH01214182A (en) 1988-02-23 1988-02-23 Metal steam laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4045388A JPH01214182A (en) 1988-02-23 1988-02-23 Metal steam laser device

Publications (1)

Publication Number Publication Date
JPH01214182A true JPH01214182A (en) 1989-08-28

Family

ID=12581058

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4045388A Pending JPH01214182A (en) 1988-02-23 1988-02-23 Metal steam laser device

Country Status (1)

Country Link
JP (1) JPH01214182A (en)

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