JPH01212887A

JPH01212887A - Cassette type vertical conveyance continuous furnace

Info

Publication number: JPH01212887A
Application number: JP3714588A
Authority: JP
Inventors: Seishirou Munehira; 聖士郎宗平
Original assignee: Individual
Current assignee: Individual
Priority date: 1988-02-19
Filing date: 1988-02-19
Publication date: 1989-08-25

Abstract

PURPOSE:To eliminate any restriction on the use of material, to keep an atmosphere clean and to make quality uniform, in equipment, compact and a manufacturing line unmanned and automated, by a method wherein a chamber is provided in a heat generating body, a lifter hatch is elevated at a lower part, and a hatch at an upper part. CONSTITUTION:When a cassette 1 is transferred to a lifter 19, a motion is made such that the interior of an upper subchamber 12 is replaced with vacuum or atmosphere, and a hatch 8 is raised. The cassette 1 at an uppermost stage is transferred to an intermediate position by means of a transfer arm 14, and the hatch 8 is lowered and brought into an airtight state. With an upper door 18 opened, the lifter 19 is raised. The lifter hatch 4 is lowered to a lower limit, and the cassette 1 is transferred from the intermediate position onto the lifter hatch 4. The lifter hatch 4 is raised from a lower limit to the intermediate position, and the lifter hatch 4 is rotated to a position where a claw 1a is not collided with a claw catch 5a. The lifter hatch 4 is then raised, and is restored to its original position before the claw 1a passes the claw catch 5a and is brought into airtight contact with a lower seal plate 5, and is raised again to bring it into an airtight state.

Description

【発明の詳細な説明】（産業上の利用分野）この発明は、半導体等の製造時要求される清浄度及び耐
腐食性、自動化に対応させるための熱処理炉及び化学反
応炉に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a heat treatment furnace and a chemical reaction furnace to meet the cleanliness and corrosion resistance required in the production of semiconductors and the like, as well as automation.

（従来の技術）従来、清浄度の高い処理の場合、処理材の炉内での搬送
は、発塵等の問題のためバッチ式で行われていた。(Prior Art) Conventionally, in the case of high-cleanliness processing, processing materials were transported in a furnace in a batch manner due to problems such as dust generation.

（考案が解決しようとする課題）バッチ式でラインを自動化すると、装置が大型化し、設
置場所を太き（取り、装置自体もコストが高くなってい
る。(Problem that the invention aims to solve) When automating a batch-type line, the equipment becomes larger, requires more space to install, and the cost of the equipment itself becomes higher.

またバッチ式であるため、処理品が不均一になるため、
炉内の一部しか使用されていなかった。Also, since it is a batch process, the processed products may be uneven.
Only part of the furnace was in use.

本発明は、これらの課題を解決するためになされたもの
である。The present invention has been made to solve these problems.

（課題を解決するための手段）処理材（１ｄ）をカセット（１）に取り込み、このカセ
ット（１）を重力と反対方向に押し上げ、最下段のカセ
ット（１）を逆止めすることにより連続的に垂直に搬送
する。また上サブチャンバー（１２）及び下サブチャン
バー（１１）を設け、ハツチ（８）及びリフターハツチ
（４）にｍ密構造とすることによリ、連続的に雰囲気中
または真空中にて処理を行う。(Means for solving the problem) The processing material (1d) is taken into the cassette (1), this cassette (1) is pushed up in the opposite direction to gravity, and the lowest cassette (1) is reverse-locked to continuously Convey perpendicular to. In addition, an upper subchamber (12) and a lower subchamber (11) are provided, and the hatch (8) and lifter hatch (4) have an m-tight structure, so that processing can be performed continuously in an atmosphere or in a vacuum. .

（作用）図面にもとすいて説明すると、第１図において、発熱体
（３）内に熱伝導性、輻射透過性及び耐熱性のチャンバ
ー（２）を設け、その下部に下シールプレート（５）、
上に上シールプレート（６）を連結ボルト（７）にて密
着させ、下シールプレート（５）の下にカセット（１）
を持ち上げるリフターハツチ（４）を設ける。このリフ
ターハツチ（４）は、リフターハツチガイド（１０）に
よりロータリーアクチエーター　（２０）と３位置シリ
ンダー（２１）に連結される。(Function) To explain briefly in the drawings, in Fig. 1, a thermally conductive, radiation transmitting and heat resistant chamber (2) is provided in the heating element (3), and a lower seal plate (5) is provided at the bottom of the chamber (2). ),
The upper seal plate (6) is tightly attached to the top using the connecting bolt (7), and the cassette (1) is placed under the lower seal plate (5).
A lifter hatch (4) is provided to lift the. This lifter hatch (4) is connected to a rotary actuator (20) and a three-position cylinder (21) by a lifter hatch guide (10).

上部にはハツチ（８）を設け、ハツチガイド（９）によ
りシリンダー（２３）と連結される。そして上部及び下
部にはそれぞれ上サブチャンバー（１２）と下サブチャ
ンバー（１１）内にあって、上ｍ　（１８）及び下扉（
１７）により外気との機密が保たれるようになっており
、それぞれ上ロータリーアクチエーター（１６）と上移
載アーム（１４）及び下口−タリーアクチエーター（１
５）と下移載アーム（１３）により機密された中でカセ
ット（１）の移載を行う。A hatch (8) is provided at the top and is connected to the cylinder (23) by a hatch guide (9). The upper and lower parts are located in an upper subchamber (12) and a lower subchamber (11), respectively, with an upper m (18) and a lower door (
17) to maintain confidentiality from the outside air, and the upper rotary actuator (16), upper transfer arm (14), and lower entrance-tally actuator (1
5) and the lower transfer arm (13) to transfer the cassette (1) in a confidential manner.

上ｉ　（１Ｂ）　、下１ｉ　（１７）の他にカセット（
１）をリサイクルさせるためのりフタ−（１９）がシリ
ンダー（２３）に連続される。In addition to upper i (1B) and lower i (17), there is also a cassette (
A lid (19) for recycling 1) is connected to the cylinder (23).

またカセット（１）は第４図に示す構造にて、ツメ（ｌ
ａ）とカセットの相互位置決めをする位置決めピン（ｌ
ｂ）と位置決め穴（１ｃ）を設け、処理材（ｌｄ）を収
納する。In addition, the cassette (1) has the structure shown in Fig. 4, and has a tab (l).
a) and the cassette.
b) and a positioning hole (1c) are provided to accommodate the processing material (ld).

次に動作を第１図において説明する。Next, the operation will be explained with reference to FIG.

１、上サブチャンバー（１２）内を真空または雰囲気に
置換し、ハツチ（８）を上昇させる。1. Replace the inside of the upper subchamber (12) with vacuum or atmosphere, and raise the hatch (8).

２、最上段のカセット（１）を上移載チーム（１４）に
て中間位置まで移送し、ハツチ軸）を下降機密させる。2. The uppermost cassette (1) is transferred to the intermediate position by the upper transfer team (14), and the hatch shaft is lowered to make it secure.

３、リフター（１９）を上昇させると共に上ｍ（１Ｂ）
を開き、カセット（１）をリフター（１９）に１多裁す
る。3. Raise the lifter (19) and raise the upper m (1B)
Open the cassette (1) and load it into the lifter (19).

４、リフクー（１９）を下降させると共に上！（１８）
を閉じ機密する。4. Lower Rifuku (19) and raise it! (18)
Close and Confidential.

５、リフター（１９）上のカセット（１）内の処理材（
１ｄ）をマニュピレータ−等にて未処理材と置き換え６
、下移載アーム（１３）にて、リフター（１９）上のカ
セット（１）を下サブチャンバー（１１）内に中間移送
する。5. Processing material in the cassette (1) on the lifter (19) (
Replace 1d) with untreated material using a manipulator etc. 6
, the cassette (1) on the lifter (19) is intermediately transferred into the lower sub-chamber (11) by the lower transfer arm (13).

７、下扉（１７）を閉じ、下サブチャンバー（１１）内
を真空または雰囲気に置換する。7. Close the lower door (17) and replace the inside of the lower subchamber (11) with vacuum or atmosphere.

８、リフターハツチ（４）を下限まで下降させ、カセッ
ト（１）を中間位置よりリフターハツチ（４）上に移載
する。8. Lower the lifter hatch (4) to the lower limit and transfer the cassette (1) from the intermediate position onto the lifter hatch (4).

９、第２図に示す、下限より第３図に示す中間位置まで
リフターハンチ（４）を上昇させ、Ｂ−Ｂ線断面図の示
す位置より、ｃ’−ｃ線断面図の示す様にリフターハツ
チ（４）をツメ（１ａ）とツメ受（５ａ）が当たらない
位置に回転させる。9. Raise the lifter hatch (4) from the lower limit shown in FIG. 2 to the intermediate position shown in FIG. Rotate (4) to a position where the claw (1a) and the claw holder (5a) do not touch each other.

１０、リフターハツチ（４）を上昇させ、ツメ（１ａ）
が・ツメ受（５ａ）を過ぎ、下シールプレート（５）と
機密接触する前に元の位ｆｉｎ−Ｂ線断面図の位置に戻
し再度上昇機密する。10. Raise the lifter hatch (4) and release the claw (1a)
・Before passing the claw receiver (5a) and coming into sealed contact with the lower seal plate (5), it is returned to its original position as shown in the fin-B line sectional view and raised again to seal.

上記１−１ｏのサイクルをくり返すことにより連続運転
を行う。Continuous operation is performed by repeating the cycle 1-1o above.

（実施例）（イ）清浄度を必要とされる、半導体等の連続処理装置（ｎ）腐食性雰囲気を必要とされる、半導体等の連続処
理装置（ハ）超高温を必要とされる、ファインセラミック等の
連続処理装置（ニ）高真空を必要とされる、半導体等の連続処理装置（考案の効果）この様に構成された搬送方法を行うことにより、（イ）
カセット（１）、チャンバー（２）等の材質により種々
の雰囲気に対応でき、構造も比較的間車なため余り材質
の使用制限を受けない。(Example) (a) Continuous processing equipment for semiconductors etc. that requires cleanliness (n) Continuous processing equipment for semiconductors etc. that requires a corrosive atmosphere (c) Requires ultra-high temperatures Continuous processing equipment for fine ceramics, etc. (d) Continuous processing equipment for semiconductors, etc. that requires high vacuum (effects of the invention) By carrying out the transport method configured in this way, (b)
Various atmospheres can be accommodated depending on the materials of the cassette (1), chamber (2), etc., and since the structure is relatively compact, there are no restrictions on the use of materials.

（’Ｉ＋）炉内において可動部がなく搬送するので、す
べり等による発塵の恐れがなく清浄な雰囲気を保てる。('I+) Since there are no moving parts and the product is transported within the furnace, there is no risk of dust generation due to slipping, etc., and a clean atmosphere can be maintained.

（八）連続的に処理がなされるため、品質の均−性及び
装置のコンパクト化が計れる。(8) Since the process is carried out continuously, uniformity of quality and compactness of the equipment can be achieved.

（＝）製造ラインの自動化、無人化が計れる。(=) Production lines can be automated and unmanned.

[Brief explanation of the drawing]

第１ＩＦは縦断面図、第２図、第３図は各動作時の形態
を示す。第４図はカセット単体の構造を示す。１はカセッＬ、ｌａはツメ、　ｌｂは位置決めピン。Ｉｃは位置決め穴、　ｌｄは処理材、２はチャンバー。３は発熱体１４はリフターハツチ、５は下シールプレー
ト、　５ａはツメ受、６は上シールプレート。７は連結ボルト　８はハツチ、９はハツチガイド。１０はリフターハツチガイド、１１は下サブチャンバー
、１２は上サブチャンバー、１３は下移載アーム５１４
は上移載アーム、１５は下口−ターアクチエーター、１
６は上ロータリーアクチエーター、　１７は下扉。１８は上扉、１９はリフター、２０はロータリーアクチ
エ−クー、　２１は３位置シリンダー、２２シリンダー
。２３シリンダー１吉　也午中１片友ノ、　七ミ４−を士部池」］ＬThe first IF is a vertical cross-sectional view, and FIGS. 2 and 3 show the configuration during each operation. FIG. 4 shows the structure of a single cassette. 1 is the cassette L, la is the tab, and lb is the positioning pin. Ic is the positioning hole, ld is the treated material, and 2 is the chamber. 3 is a heating element 14 is a lifter hatch, 5 is a lower seal plate, 5a is a claw holder, and 6 is an upper seal plate. 7 is a connecting bolt, 8 is a hatch, and 9 is a hatch guide. 10 is a lifter hatch guide, 11 is a lower subchamber, 12 is an upper subchamber, 13 is a lower transfer arm 514
15 is the upper transfer arm, 15 is the lower actuator, 1
6 is the upper rotary actuator, 17 is the lower door. 18 is the upper door, 19 is the lifter, 20 is the rotary actuator, 21 is the 3-position cylinder, and 22 is the cylinder. 23 cylinders 1 Yoshiya, 1 Katatomo in the morning, 7 Mi 4- in Shibeike”]L

Claims

[Claims] 1. A chamber (2) is provided in the heating element (3), and the treatment material (1d) is introduced by raising and lowering a lifter hatch (4) at the bottom and a hatch (8) at the top. Cassette (1)
A cassette-type vertical conveyance continuous furnace 2 for vertically conveying continuously, the cassette (1) is provided with a claw (1a), and the lower seal plate (5) is provided with a claw receiver (5a), as described in claim 1. A cassette type vertical conveyance continuous furnace 3 according to claim 1, comprising a lower subchamber (11) and an upper subchamber (12) provided outside the lifter hatch (4) and the hatch (8). furnace