JPH01211221A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPH01211221A JPH01211221A JP3619488A JP3619488A JPH01211221A JP H01211221 A JPH01211221 A JP H01211221A JP 3619488 A JP3619488 A JP 3619488A JP 3619488 A JP3619488 A JP 3619488A JP H01211221 A JPH01211221 A JP H01211221A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- protective film
- substrate
- magnetic film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 27
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000956 alloy Substances 0.000 claims abstract description 13
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 13
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 9
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 7
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 6
- 229910003460 diamond Inorganic materials 0.000 claims description 8
- 239000010432 diamond Substances 0.000 claims description 8
- -1 composed of Co Substances 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 abstract description 40
- 238000005260 corrosion Methods 0.000 abstract description 40
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract description 12
- 230000000694 effects Effects 0.000 abstract description 5
- 238000010030 laminating Methods 0.000 abstract description 4
- 239000010408 film Substances 0.000 description 125
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 230000007547 defect Effects 0.000 description 7
- 230000005494 condensation Effects 0.000 description 6
- 238000009833 condensation Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000012792 core layer Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910020676 Co—N Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気記録媒体に係り、特に、磁気ディスク及び
磁気テープの記録媒体として用いるに好適な磁気記録媒
体に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium, and particularly to a magnetic recording medium suitable for use as a recording medium for magnetic disks and magnetic tapes.
磁気記録媒体は基板上に磁性膜を介して保護膜を積層す
る構成が採用されており、磁性膜の合金組成について改
良されたもの、あるいは保護膜の組成について改良され
たものが各種提案されている。Magnetic recording media employ a structure in which a protective film is laminated on a substrate via a magnetic film, and various proposals have been made for improving the alloy composition of the magnetic film or for improving the composition of the protective film. There is.
前者に属するものとしては、磁性膜材料を「Ｃｏ −Ｎ
ｉ合金Ｊ ＋Ｔｉ、Ｃｒ、Ｚｒ、Ｎｂ、Ｍｏ、Ｔａお
よびＷとしたもの（特開昭５５−１０５３０２号公報）
、磁性膜組成をＣｏ −１０〜５５ ａｔ％Ｎｉ−３〜
４．５ａｔ％０したもの（特開昭５６−１５０１４号公
報）、磁性膜組成をＧｏ−９〜２２．５ａｔ％Ｃｒ−Ｙ
、Ｚｒ、Ｔｉ、Ｍｏ、Ｈｆ、Ｒｕ、ＡＱとしたもの（特
開昭５８−１８９３４９号公報）さらに磁性膜組成をＧ
ｏ −Ｈｆ・ｐｔ又はＣｏ−Ｚｒ−Ｐｔとしたもの（
特開昭５９−１１６９２５号公報）が知られている。一
方。As for those belonging to the former, the magnetic film material is “Co-N
i alloy J + Ti, Cr, Zr, Nb, Mo, Ta and W (Japanese Patent Laid-Open No. 105302/1983)
, the magnetic film composition is Co-10~55 at%Ni-3~
4.5at%0 (Japanese Unexamined Patent Publication No. 56-15014), the magnetic film composition is Go-9 to 22.5at%Cr-Y
, Zr, Ti, Mo, Hf, Ru, and AQ (Japanese Unexamined Patent Publication No. 189349/1983).
o -Hf・pt or Co-Zr-Pt (
JP-A-59-116925) is known. on the other hand.
後者に属するものとしては、保護膜をグラファイト＋ダ
イヤモンドの混在層としたもの（特開昭５３−１４３２
０６号公報）、炭化水素のプラズマ重合薄膜による保護
膜上にグラファイト、ダイヤモンド、ＳｉＣ，ＷＣ％Ｔ
ｉＣ，ＷｂＣ，Ｂ、としたもの（特開昭６１−１０５７
２０号公報）が知られている。One that belongs to the latter category is one in which the protective film is a mixed layer of graphite and diamond (Japanese Patent Laid-Open No. 53-1432).
No. 06), graphite, diamond, SiC, WC%T on a protective film made of a hydrocarbon plasma polymerized thin film.
iC, WbC, B (Japanese Unexamined Patent Publication No. 1057-1988
No. 20) is known.
前者に属するものは磁気記録特性の向上が図れ、後者に
属するものは耐摩耗性の向上が図れる。Those belonging to the former category can improve magnetic recording characteristics, and those belonging to the latter can improve wear resistance.
しかし、上記従来技術においては、磁性膜あるいは保護
膜に対する周辺部材との電気化学作用については何ら考
慮されておらず、磁気記録媒体が大気腐食によって損傷
する恐れがあった。However, in the above-mentioned prior art, no consideration is given to the electrochemical action of the magnetic film or the protective film with surrounding members, and there is a risk that the magnetic recording medium may be damaged by atmospheric corrosion.
即ち、磁気記録媒体は、第９図に示されるように、基板
１上に磁性膜２を介して保護膜３が直接積層されており
、これらの層には電気化学作用を抑制するための処理が
施されていない。すなわち、磁性膜２は通常ＣＯを主体
とする合金より成り。That is, in the magnetic recording medium, as shown in FIG. 9, a protective film 3 is directly laminated on a substrate 1 via a magnetic film 2, and these layers are treated to suppress electrochemical action. is not applied. That is, the magnetic film 2 is usually made of an alloy mainly composed of CO.
その厚さは２０〜２００ｎｍ程度になっている。Its thickness is about 20 to 200 nm.
また基板１はガラス、セラミックスあるいは磁性膜２よ
り大気腐食性に優れたＣｉより構成されており、その厚
さは磁性膜２より厚く数μｍ以上になっている。さらに
保護膜３は導電性で、かつ磁性膜２より大気腐食性に優
れたグラファイトカーボンより構成され、その厚さは２
０〜２００ｎｍ程度になっている。ところが、保護膜３
には、製造時あるいは使用時に微小欠陥（ピンホール）
４が形成されることがあり、微小欠陥４が形成された保
護膜３上に、大気中の水分あるいは腐食性成分が結露す
ると、結露水５が微小欠陥４を介して磁性膜２へ浸入し
、保護膜３が腐食損傷することがある。The substrate 1 is made of glass, ceramics, or Ci, which is more resistant to atmospheric corrosion than the magnetic film 2, and its thickness is several μm or more, which is thicker than the magnetic film 2. Furthermore, the protective film 3 is made of graphite carbon, which is conductive and more resistant to atmospheric corrosion than the magnetic film 2, and has a thickness of 2.
It is about 0 to 200 nm. However, the protective film 3
micro defects (pinholes) during manufacturing or use.
4 may be formed, and when moisture or corrosive components in the atmosphere condenses on the protective film 3 on which the micro defects 4 are formed, the condensed water 5 penetrates into the magnetic film 2 through the micro defects 4. , the protective film 3 may be damaged by corrosion.
ここで、腐食損傷による形態を詳細に観察すると、腐食
損傷部分６が保護膜３あるいは基板１に沿って進行し、
磁性膜２あるいは保護膜３がふくれることによって腐食
の進行が増大し、最終的には磁気記録媒体が使用不可能
になる程度に腐食損傷部分６が拡大されることがある。Here, when observing the form of corrosion damage in detail, the corrosion damage part 6 progresses along the protective film 3 or the substrate 1,
As the magnetic film 2 or the protective film 3 swells, the progress of corrosion increases, and the corrosion-damaged portion 6 may eventually become enlarged to the extent that the magnetic recording medium becomes unusable.
この腐食損傷の程度は、基板１あるいは保護膜３の材料
が大気腐食性に優れるほど顕著にｍ察された。これは。The degree of this corrosion damage was observed to be more pronounced as the material of the substrate 1 or the protective film 3 was more resistant to atmospheric corrosion. this is.
基板１あるいは保護膜３がカソードとなり、磁性膜２が
アノードとなるガルバニック作用によって腐食が加速さ
れているものと考えられる。It is considered that the corrosion is accelerated by galvanic action in which the substrate 1 or the protective film 3 serves as a cathode and the magnetic film 2 serves as an anode.
本発明の目的は、磁性膜を一方の電極とし、基板あるい
は保護膜を他方の電極とする電気化学作用に伴なう腐食
を抑制することができる磁気記録媒体を提供することに
ある。An object of the present invention is to provide a magnetic recording medium that can suppress corrosion caused by electrochemical action in which a magnetic film is used as one electrode and a substrate or a protective film is used as the other electrode.
前記目的を達成するために、本発明は、基板上に磁性膜
を介して保護膜を積層し、基板と磁性膜との層間又は磁
性膜と保護膜との層間のうち少なくとも一方の層間に絶
縁性膜による層を形成し、核層の厚さ方向における電気
抵抗を１０５〜１０１０Ω／ｃｍ２としたものである。In order to achieve the above object, the present invention laminates a protective film on a substrate via a magnetic film, and provides insulation between at least one of the layers between the substrate and the magnetic film or between the magnetic film and the protective film. The core layer is formed with a layer made of a synthetic film, and the electrical resistance in the thickness direction of the core layer is set to 105 to 1010 Ω/cm2.
さらに、磁性膜をＣ０１ＮｉおよびＺｒを主体とする合
金で構成し、絶縁性膜をＺｒＯ２主体の酸化物あるいは
ダイヤモンド性カーボンで構成したものである。Furthermore, the magnetic film is composed of an alloy mainly composed of CO1Ni and Zr, and the insulating film is composed of an oxide mainly composed of ZrO2 or diamond carbon.
又さらに保護１摸を複数の領域に分割し、各領域を互い
に不連続な状態で分散配置したものである。Furthermore, one protection sheet is divided into a plurality of areas, and each area is distributed and arranged in a discontinuous manner.
保護膜に微小欠陥が生じると共に保護膜上に結露水が生
じても、磁性膜を一方の電極とし、基板あるいは保護膜
を他方の電極とする電気化学的作用としての回路が絶縁
性膜によって遮断され、大気腐食によって磁気記録媒体
が損傷するのが抑制される。Even if minute defects occur in the protective film and condensation water forms on the protective film, the insulating film will block the electrochemical circuit that uses the magnetic film as one electrode and the substrate or protective film as the other electrode. This suppresses damage to the magnetic recording medium due to atmospheric corrosion.
又磁性膜をＧｏ、Ｎｉ及びＺｒを主体とする合金で構成
し、絶縁性膜をＺｒを主体とする合金で構成し、絶縁性
膜をＺｒＯ２主体の酸化物あるいはダイヤモンド性カー
ボンで構成すれば、各層の密着性が増し、大気腐食の進
行をさらに抑制することができる。Furthermore, if the magnetic film is made of an alloy mainly composed of Go, Ni, and Zr, the insulating film is made of an alloy mainly composed of Zr, and the insulating film is made of an oxide mainly composed of ZrO2 or diamond carbon, The adhesion between each layer is increased, and the progress of atmospheric corrosion can be further suppressed.
又さらに、保護膜を複数の領域に分割した場合。Furthermore, when the protective film is divided into multiple regions.
結露水と接触する保護膜の面積が小さくなるので。Because the area of the protective film that comes into contact with condensed water becomes smaller.
保護膜を複数の領域に分割しないときよりも大気腐食の
進行が抑制される。Progress of atmospheric corrosion is more suppressed than when the protective film is not divided into a plurality of regions.
以下１本発明の一実施例を第１図に基づいて説明する。 An embodiment of the present invention will be described below with reference to FIG.
第１図において、保持板１０は３■厚であり、Ａ２合金
で構成されている。保持板１０上には３μｍ厚のＮｉメ
ツキ製基板１２が積層されている・基板１２上には１１
００ｎ厚のＳｉＣ製絶縁性膜１４がプラズマＣＶＤによ
って積層されている。In FIG. 1, the holding plate 10 has a thickness of 3 mm and is made of A2 alloy. A Ni-plated substrate 12 with a thickness of 3 μm is laminated on the holding plate 10. On the substrate 12, 11
A SiC insulating film 14 having a thickness of 00 nm is laminated by plasma CVD.
さらに絶縁性膜１４上には５０ｎｍ厚の磁性膜１６が積
層されている。磁性膜１６はＣｒ５％で、Ｎ ｉ ９％
含有ＣＯ基合金より構成されている。さらに磁性膜１６
上には１０ｎｍ厚のＳｉＣ製絶縁性膜１８がプラズマＣ
ＶＤによって積層されている。絶縁性膜１８上には５０
ｎｍ厚のグラファイトカーボン製保護膜２０が積層され
ている。Furthermore, a 50 nm thick magnetic film 16 is laminated on the insulating film 14. The magnetic film 16 is made of 5% Cr and 9% Ni.
It is composed of a CO-based alloy. Furthermore, the magnetic film 16
A 10 nm thick SiC insulating film 18 is placed on top of the plasma C.
Laminated by VD. 50 on the insulating film 18
A graphite carbon protective film 20 having a thickness of nm is laminated.
上記構成における磁気記録媒体は、基板１２と磁性膜１
６間の電気抵抗が５ Ｘ １０５Ω／ａｌになっており
、磁性膜１６と保護膜２０間の電気抵抗が１０８Ω／ｃ
ｍ２になっている。The magnetic recording medium with the above configuration includes a substrate 12 and a magnetic film 1.
The electrical resistance between the magnetic film 16 and the protective film 20 is 5 x 105Ω/al, and the electrical resistance between the magnetic film 16 and the protective film 20 is 108Ω/c
It is now m2.
上記構成における磁気記録媒体を８５℃、９５％ＲＨの
デシケータ中に１００時間保持し、腐食損傷量を調査し
たところ、磁性を失っている腐食損傷による磁性膜１６
は全表面の０．０１％以下であった。なお、前記と同じ
条件で、保護膜２０を有しないものの場合には、磁性膜
１６の腐食損傷は２．３％であった。When the magnetic recording medium with the above configuration was kept in a desiccator at 85° C. and 95% RH for 100 hours and the amount of corrosion damage was investigated, it was found that the magnetic film 16 due to corrosion damage had lost its magnetism.
was less than 0.01% of the total surface. Note that under the same conditions as above, in the case of the magnetic film 16 without the protective film 20, the corrosion damage to the magnetic film 16 was 2.3%.
ここで、絶縁膜１４．１８の電気抵抗を１０５〜１ｏ１
０Ω／ｃｍ２に規定したのは、電気抵抗を１０５Ω／ｃ
ｍ２以下にしたのでは、腐食損傷の進行を十分に抑制す
ることができなくなるためである。一方、電気抵抗を１
０１０Ω／ｃｍ２以上にしたのでは、腐食損傷の進行が
飽和領域に達するだけで、絶縁性膜が厚くなり、製造コ
ストが上昇すると共に製造作業が困難になり、効果がそ
れほど良くならないためである。Here, the electrical resistance of the insulating film 14.18 is set to 105 to 1o1.
The electric resistance is set to 0Ω/cm2, which is 105Ω/c.
This is because if it is less than m2, it will not be possible to sufficiently suppress the progress of corrosion damage. On the other hand, the electric resistance is 1
This is because if it is set to 0.010 Ω/cm2 or more, the progress of corrosion damage will only reach the saturation region, the insulating film will become thicker, the manufacturing cost will increase, the manufacturing work will become difficult, and the effect will not be as good.
前記実施例においては、磁性膜１６の両面に絶縁性膜１
４．１８を設けたものについて述べたが、第２図に示さ
れるように、磁性膜１６と保護膜２０との間にのみ絶縁
性膜１８を形成するか、あるいは、第３図に示されるよ
うに、磁性膜１６を基板１２との間にのみ絶縁性膜１４
を形成することも可能である。In the embodiment described above, the insulating film 1 is provided on both sides of the magnetic film 16.
4.18 has been described, but as shown in FIG. 2, the insulating film 18 is formed only between the magnetic film 16 and the protective film 20, or as shown in FIG. The insulating film 14 is placed only between the magnetic film 16 and the substrate 12.
It is also possible to form
第２図に示す構成の場合には、保護膜２０に微小欠陥２
２が生じても、絶縁性膜１８に微小欠陥２２が生じるま
で結露水２４が磁性膜１６に浸入することはない。一方
、第３図のものは、保護膜２０に微小欠陥２２が生じた
場合、結露水２４が磁性膜１６に浸入するが、結露水２
４が基板１２側へ浸入するのが絶縁性膜１４によって抑
制される。この結果、第２図および第３図に示されるも
のを、第１図に示されるものと同一の条件下で腐食損傷
状況を調査したところ、第２図のものは腐食損傷状況が
０．０３％であり、第３図のものの腐食損傷状況が０．
０７％であった。In the case of the configuration shown in FIG.
2, the dew condensation water 24 will not penetrate into the magnetic film 16 until a minute defect 22 occurs in the insulating film 18. On the other hand, in the case shown in FIG. 3, when a minute defect 22 occurs in the protective film 20, condensed water 24 enters the magnetic film 16;
4 from entering the substrate 12 side is suppressed by the insulating film 14. As a result, when we investigated the corrosion damage status of the items shown in Figures 2 and 3 under the same conditions as those shown in Figure 1, we found that the corrosion damage status of the item shown in Figure 2 was 0.03. %, and the corrosion damage status of the one in Figure 3 is 0.
It was 0.7%.
次に、磁気記録媒体として、第２図に示されるように、
磁性膜１６と保護膜２０との間にのみ絶縁性１８を形成
し、磁性膜１６をＮｉ５〜１５％、Ｚｒ２〜１０％含有
Ｃｏ基合金で構成し、絶縁性膜２０をＺｒＯ□およびダ
イヤモンド性カーボンで構成し、他の層の材料を第１図
のものと同様なもので構成し、第１図のものと同様な腐
食試験を行なったところ、腐食損傷量はＺｒＯ２および
ダイヤモンド性カーボンが共に０．０１％以下であるこ
とか確認された。これにより、磁性膜１６の片側にのみ
絶縁性膜１８を設けても、第１図に示すものと同様な腐
食損傷量にすることが可能となる。これは、磁性膜１６
をＣｏ、Ｎｉ、Ｚｒの合金としたことにより磁性膜自体
の耐食性を向上させることができたこと、さらには絶縁
性膜をＺｒＯ２およびダイヤモンド性カーボンとするこ
とによってこれらの層間の密着性が他の組成のものより
も優れたことに起因していると考えられる６次に、第４
図に示されるように、保護膜２０を複数の島状の領域に
分割し、各島状の保護膜２０Ａの大きさを１０〜３０μ
ｍ×５０−１００μｍとし、厚さを５０ｎｍとし、各島
状の保護膜２０Ａの間をＺｒＯ２による絶縁性膜１８に
よって埋めるようにしたものを構成し、第１図のものと
同様な腐食試験を行なったところ、腐食損傷量が０゜０
４％であった。Next, as a magnetic recording medium, as shown in FIG.
The insulating film 18 is formed only between the magnetic film 16 and the protective film 20, the magnetic film 16 is made of a Co-based alloy containing 5 to 15% Ni and 2 to 10% Zr, and the insulating film 20 is made of ZrO□ and diamond-based alloy. When a corrosion test similar to that shown in Fig. 1 was conducted using carbon and the other layers were made of the same materials as those shown in Fig. 1, the amount of corrosion damage was the same for both ZrO2 and diamond carbon. It was confirmed that it was 0.01% or less. As a result, even if the insulating film 18 is provided only on one side of the magnetic film 16, it is possible to achieve the same amount of corrosion damage as shown in FIG. This is the magnetic film 16
By using an alloy of Co, Ni, and Zr, we were able to improve the corrosion resistance of the magnetic film itself, and by using ZrO2 and diamond carbon as the insulating film, the adhesion between these layers was improved compared to other layers. It is thought that this is due to the fact that the composition is superior to that of the 6th and 4th order.
As shown in the figure, the protective film 20 is divided into a plurality of island-like regions, and the size of each island-like protective film 20A is 10 to 30 μm.
20 nm x 50-100 .mu.m, the thickness was 50 nm, and the space between each island-shaped protective film 20A was filled with an insulating film 18 made of ZrO2, and a corrosion test similar to that in Fig. 1 was conducted. As a result, the amount of corrosion damage was 0°0.
It was 4%.
本実施例の場合には、結露水２４は保護膜２０上に生じ
ても、島状の保護膜２０Ａが分散配置されているので、
保護膜２０が一面に形成されている場合よりも保護膜２
０と結露水２４との接触面積が小さくなり、磁性膜１６
の大気腐食の進行を抑制することができる。これは、磁
性膜１６を一方の電極とし、保護膜２０を他方の電極と
するガルバニック作用に伴なう腐食損傷量は保護膜２０
と結露水２４との接触面積に比例するが、保護膜２ｏと
結露水２４との接触面積の減少によって腐食損傷量が減
少したことに起因していると考えられる。In the case of this embodiment, even if the condensed water 24 occurs on the protective film 20, since the island-shaped protective films 20A are distributed,
When the protective film 20 is formed over one surface, the protective film 2
The contact area between the magnetic film 16 and the dew condensation water 24 becomes smaller.
The progress of atmospheric corrosion can be suppressed. This means that the amount of corrosion damage caused by galvanic action with the magnetic film 16 as one electrode and the protective film 20 as the other electrode is the same as that of the protective film 20.
Although it is proportional to the contact area between the protective film 2o and the dew condensation water 24, it is thought that this is due to a decrease in the amount of corrosion damage due to a decrease in the contact area between the protective film 2o and the dew condensation water 24.
又、第５図に示されるように、島状の保護膜２０Ａと磁
性膜１６との間に絶縁性膜１８を形成すれば、第４図の
ものよりも結露水２４が磁性膜１６へ浸入するのを抑制
することができる。Furthermore, if an insulating film 18 is formed between the island-shaped protective film 20A and the magnetic film 16 as shown in FIG. It is possible to prevent this from happening.
又、基板１２上に各膜を積層する場合、第６図に示され
るように、基板１２上に凹凸１２Ａあるいは溝を形成し
、この凹凸１２Ａ上に凹凸１２Ａとほぼ同じような形状
の絶縁性膜１４、磁性膜１６、絶縁性膜１８を積層すれ
ば、これらの層を積層するための作業が容易に行なうこ
とができる。In addition, when laminating each film on the substrate 12, as shown in FIG. 6, an unevenness 12A or a groove is formed on the substrate 12, and an insulating film having a shape almost the same as the unevenness 12A is formed on the unevenness 12A. By laminating the film 14, magnetic film 16, and insulating film 18, the work for laminating these layers can be easily performed.
又、基板１２上に凹凸１２Ａを形成する場合、第７図及
び第８図に示されるように、磁気ディスクの円周方向に
に形成すれば、磁気ヘッドの径方向の速度が磁気ディス
クの回転方向よりも高速度の場合には、磁気ヘッドの移
動をスムースに行なうことが可能となる。In addition, when forming the unevenness 12A on the substrate 12, if it is formed in the circumferential direction of the magnetic disk as shown in FIGS. If the speed is higher than the direction, the magnetic head can be moved smoothly.
このように、前記各実施例においては、磁性膜１６の両
面のうち少なくとも一方の面に絶縁性膜を形成するよう
にしたため、大気腐食による損傷の進行が抑制され、磁
気記録媒体の長寿命化および信頼性の向上が図れると共
に、使用環境の拡大が図れる。さらに磁性膜として高価
な耐食性の優れたものを用いなくても大気腐食による腐
食損傷量が抑制されるので、コスト低減に寄与すること
ができる。As described above, in each of the above embodiments, since the insulating film is formed on at least one of both surfaces of the magnetic film 16, the progress of damage due to atmospheric corrosion is suppressed, and the life of the magnetic recording medium is extended. In addition to improving reliability, it is also possible to expand the usage environment. Furthermore, since the amount of corrosion damage due to atmospheric corrosion is suppressed without using an expensive magnetic film with excellent corrosion resistance, it can contribute to cost reduction.
以上説明したように、本発明によれば、基板の両面のう
ち少なくとも一方の面に絶縁性膜による膜を形成し、磁
性膜を一方の電極とし、基板あるいは保護膜を他方の電
極とする電気化学的作用による回路を絶縁性膜によって
遮断するようにしたため、大気腐食による腐食損傷の減
少が図れ、磁気記録媒体の長寿命化および信頼性の向上
に寄与することができる。さらに磁性膜及び絶縁性膜を
特定の組成とすることによって密着性の向上が図れる。As explained above, according to the present invention, an insulating film is formed on at least one of both surfaces of the substrate, and the magnetic film is used as one electrode, and the substrate or the protective film is used as the other electrode. Since the circuit caused by chemical action is cut off by the insulating film, corrosion damage due to atmospheric corrosion can be reduced, contributing to a longer life and improved reliability of the magnetic recording medium. Furthermore, adhesion can be improved by making the magnetic film and the insulating film have specific compositions.
又さらに、保護膜を複数の領域に分割することによって
腐食損傷をより減少させることが可能となる。Furthermore, by dividing the protective film into multiple regions, corrosion damage can be further reduced.
第１図は本発明の第１実施例を示す要部断面図、第２図
は本発明の第２実施例を示す要部断面図、第３図は本発
明の第３実施例を示す要部断面図、第４図は本発明の第
４実施例を示す要部断面図、第５図は本発明の第５実施
例を示す要部断面図。
第６図は本発明の第６実施例を示す要部断面図、第７図
は磁気ディスクの斜視図、第８図は本発明の第７実施例
を示す要部断面図、第９図は従来例の要部断面図である
。
１０・・・保持板、
１２・・・基板、
１４．１８・・・絶縁性膜。
１６・・・磁性膜、
２０・・・保護膜、
２２・・・微小欠陥。
２４・・・結露水。FIG. 1 is a sectional view of essential parts showing a first embodiment of the present invention, FIG. 2 is a sectional view of essential parts showing a second embodiment of the invention, and FIG. 3 is a sectional view of essential parts showing a third embodiment of the invention. FIG. 4 is a cross-sectional view of a main part showing a fourth embodiment of the present invention, and FIG. 5 is a cross-sectional view of a main part showing a fifth embodiment of the present invention. FIG. 6 is a sectional view of a main part showing a sixth embodiment of the present invention, FIG. 7 is a perspective view of a magnetic disk, FIG. 8 is a sectional view of a main part showing a seventh embodiment of the invention, and FIG. FIG. 2 is a sectional view of a main part of a conventional example. 10... Holding plate, 12... Substrate, 14.18... Insulating film. 16... Magnetic film, 20... Protective film, 22... Micro defect. 24... Condensation water.
Claims (1)
性膜との層間または磁性膜と保護膜との層間のうち少な
くとも一方の層間に絶縁性膜による層を形成し、該層の
厚さ方向における電気抵抗を１０＾５〜１０＾１＾０Ω
／ｃｍ＾２としてなる磁気記録媒体。 ２、磁性膜をＣｏ、ＮｉおよびＺｒを主体とする合金で
構成し、絶縁性膜をＺｒＯ＿２主体の酸化物あるいはダ
イヤモンド性カーボンで構成してなる請求項１記載の磁
気記録媒体。 ３、保護膜を複数の領域に分割し、各領域を互いに不連
続な状態で分散配置してなる請求項１または２記載の磁
気記録媒体。[Claims] 1. A protective film is laminated on a substrate via a magnetic film, and an insulating film is formed between at least one of the layers between the substrate and the magnetic film or between the magnetic film and the protective film. The electrical resistance in the thickness direction of the layer is 10^5 to 10^1^0Ω.
/cm^2 magnetic recording medium. 2. The magnetic recording medium according to claim 1, wherein the magnetic film is composed of an alloy mainly composed of Co, Ni and Zr, and the insulating film is composed of an oxide mainly composed of ZrO_2 or diamond carbon. 3. The magnetic recording medium according to claim 1 or 2, wherein the protective film is divided into a plurality of regions, and each region is disposed in a discontinuous manner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63036194A JP2610925B2 (en) | 1988-02-18 | 1988-02-18 | Magnetic recording media |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63036194A JP2610925B2 (en) | 1988-02-18 | 1988-02-18 | Magnetic recording media |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01211221A true JPH01211221A (en) | 1989-08-24 |
| JP2610925B2 JP2610925B2 (en) | 1997-05-14 |
Family
ID=12462915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63036194A Expired - Lifetime JP2610925B2 (en) | 1988-02-18 | 1988-02-18 | Magnetic recording media |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2610925B2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60258727A (en) * | 1984-06-06 | 1985-12-20 | Denki Kagaku Kogyo Kk | Magnetic storage medium |
| JPS6246423A (en) * | 1985-08-23 | 1987-02-28 | Matsushita Electric Ind Co Ltd | Vertical recording medium |
-
1988
- 1988-02-18 JP JP63036194A patent/JP2610925B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60258727A (en) * | 1984-06-06 | 1985-12-20 | Denki Kagaku Kogyo Kk | Magnetic storage medium |
| JPS6246423A (en) * | 1985-08-23 | 1987-02-28 | Matsushita Electric Ind Co Ltd | Vertical recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2610925B2 (en) | 1997-05-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4928454B2 (en) | Electrostatic chuck and electrode sheet for electrostatic chuck | |
| JPH0416853B2 (en) | ||
| JPS63160011A (en) | Magnetic recording medium | |
| KR20110119619A (en) | Method of manufacturing reflective mask blanks for euv lithography | |
| US20160275973A1 (en) | Devices including an overcoat that includes a low thermal conductivity layer | |
| JP2005339680A (en) | Magnetic head | |
| JPH01211221A (en) | Magnetic recording medium | |
| JPS59211968A (en) | Unit cell for phosphoric acid-type fuel cell | |
| JPH06260178A (en) | Device material anti-corrosive covering method for molten salt and anti-corrosive covering material | |
| JPS61216109A (en) | Thin film magnetic head | |
| JP2785650B2 (en) | Protective layer for magnetic head slider | |
| JPS61222021A (en) | Magnetic recording medium | |
| JP2626737B2 (en) | Solid lubrication film structure of magnetic recording media | |
| JPH01138610A (en) | Magnetic disk | |
| JP3385093B2 (en) | Stacked magnetic head | |
| JPS62146418A (en) | Thin film magnetic head | |
| JPH01138612A (en) | Magnetic disk | |
| JPH0376539B2 (en) | ||
| JPS5853021A (en) | Multilayer magnetic thin film | |
| JPH02125831A (en) | Multilayer clad fe-ni series high magnetically permeable alloy and magnetic head | |
| JPH10188506A (en) | Protective layer for magnetic head slider | |
| JPS61189958A (en) | Thermal head | |
| JPH0447524A (en) | Magnetic recording medium | |
| JPH0256712A (en) | Thin film magnetic head | |
| JPH09161223A (en) | Thin-film magnetic head and magnetic disk recording and reproducing device |