JPH09161223A - Thin-film magnetic head and magnetic disk recording and reproducing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To embody a thin-film magnetic head having good wear resistance and low tacky adhesiveness. SOLUTION: The surface region of an amorphous protective film 10 contg. carbon is composed of a fluorine-contained film. This amorphous protective film 10 contg. the carbon is composed of carbon protective films consisting of hydrogeneous amorphous carbon, hydrogenous amorphous silicon carbide (hydrogen content 5 to 50%), etc. The film thickness over the entire apart of the protective film is specified to 4 to 25nm and the fluorine-contained layer of its surface region is preferably 1 to 5nm. Fluorine is not incorporated into the protective film of the region where the film comes into direct contact with a magnetic material forming the head and is incorporated into the surface layer part apart by >=3nm than this region. The fluorine content of the fluorine- contained film is preferably 5 to 30atm.%.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film magnetic head suitable for use in a so-called head flying type high recording density magnetic disk device, in which a magnetic head floats on a magnetic disk rotating at high speed, and a method for manufacturing the same. The present invention relates to a magnetic disk recording / reproducing apparatus, and more particularly to a thin film magnetic head having a protective film formed on a surface of a magnetic head slider facing a magnetic disk, a manufacturing method thereof, and a magnetic disk recording / reproducing apparatus using the same.

[0002]

2. Description of the Related Art In recent years, the recording density of a magnetic disk recording / reproducing apparatus (hereinafter, abbreviated as a magnetic disk apparatus) has been rapidly increasing with an increase in the amount of information handled. In order to improve the recording density of the magnetic disk device, the flying height of the thin film magnetic head above the magnetic disk surface is set to 100.
Although it is necessary to set the height to nm or less, when the flying height is reduced in this way, the magnetic head slider has a greater chance of coming into contact with or colliding with the surface of the magnetic disk rotating at high speed. For this reason, it is necessary that the protective film formed on the air bearing surface of the magnetic head slider be thin and tough and have high abrasion resistance.

Recently, an MR head (magneto-resistive reading head) has been used to realize ultra-high density recording. However, unlike the conventional inductive head, the MR head is made of a magnetic material. Because it has the drawback of being easily corroded,
It has also become necessary for the protective film to have a role of preventing corrosion of the magnetic material.

In addition to high density, miniaturization of the apparatus itself is required, and it is also important that the head has a small adhesiveness to the disk surface in order to correspond to a low torque small motor used therein. . In order to meet such various demands, a proposal of adopting a protective film made of hydrogen-containing amorphous carbon is described in, for example, Japanese Patent Publication No. 6-103586. Hydrogen-containing amorphous carbon, which is also called diamond-like carbon, is a promising material that has excellent wear resistance and does not leave dust during sliding. However, with the recent miniaturization of equipment, when the adhesive property becomes important,
In particular, friction at the time of rising is large, which has become a problem.

[0005]

SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the above-mentioned conventional problems, and as a result, a highly reliable thin film having good wear resistance and low tackiness. A magnetic head, a method for manufacturing the same, and a magnetic disk recording / reproducing apparatus using the same.

[0006]

The above object of the present invention is to provide a protective film for a magnetic film with a protective film containing fluorine (F) atoms in the surface region of an amorphous protective film containing carbon. Can be achieved more effectively. A typical example of the amorphous protective film containing carbon is a protective film made of at least one of a hydrogen-containing amorphous carbon film and a hydrogen-containing amorphous silicon carbide film.

The inventors of the present invention have so far conducted various experimental studies on an amorphous protective film containing carbon in order to realize a protective film having good wear resistance and low tackiness. As a result, when at least 5 atomic% or more of F atoms are present on the surface of the protective film and the film has a C—F bond, the oil repellency on the surface of the protective film is different from that of the lubricant on the surface of the disk which is usually used. It was found that the effect was produced and the friction at the time of rising and rising was significantly reduced.

This point can also be said for hydrogen-containing amorphous carbon and amorphous materials generally containing carbon other than hydrogen-containing amorphous silicon carbide as a protective film. By mixing fluorine atoms in the surface area,
Similar effects can be expected.

The air bearing surface protection film of the magnetic head is required to be thin as described above, and in high density recording / reproduction,
Usually, the film thickness is suppressed to 25 nm or less. As a limit of thinning, as a result of evaluating the nucleation process of the film at the initial stage of film formation by ellipsometry, it was found that at least 4 nm or more is necessary for the film to be continuous.

On the other hand, in the formation of the protective film, when an F atom is introduced into a portion of the head which is in direct contact with the magnetic substance at the initial stage of film formation, an oxidation reaction by the F atom proceeds to the magnetic substance,
May cause corrosion. Therefore, at least 3n from the magnetic material
A protective film layer containing no F atom is required for m or more. After all, considering the balance of the thickness of the entire protective film, the thickness of the surface layer containing F atoms is 22 nm when the total thickness of the protective film is 25 nm, and 4 nm when the total thickness is minimum. Can be up to 1 nm, i.e.
It is possible to select in the range of 22 nm. Also, from the viewpoint of the effect of introducing F atoms, if the thickness is less than 1 nm, a sufficient oil repellency effect cannot be obtained.

Next, the concentration of F atoms introduced into the film is preferably in the range of 5 to 30 atom%. If it is less than 5%, there is a difference from the case of 0% in the evaluation as a film such as the measurement of the contact angle of the film surface, but the effect is not sufficient when the frictional force is actually compared in the actual machine test.

On the other hand, when the F atom content exceeds 30% in the film, the structure of the matrix forming the film changes, and the film becomes porous and soft. Further, as will be described later, since hydrogen is usually present in the film-forming atmosphere in the layer into which F atoms are introduced, there is a concerted reaction in which F atoms taken into the film are extracted as HF by hydrogen during film formation. It is not easy to introduce 30 atom% or more into the film.

As a method of forming an amorphous protective film containing carbon in which F atoms are introduced in the surface region, there are two methods as described below.

The first forming method is a well-known plasma-enhanced chemical vapor deposition method (CVD method) in which a hydrocarbon gas such as methane or ethylene is used as a carbon source on a magnetic body serving as a head.
Thus, the hydrogen-containing amorphous carbon film (aC: H) is previously formed as a protective film. From the time when the film thickness reaches a predetermined film thickness of 3 nm or more, the hydrocarbon gas serving as the carbon source is added to the general formula CxHyFz such as CF ₄ , C ₂ F ₆ , C ₂ H ₂ F _4, etc.
(However, x = 1 or 2; y = 0 or an integer of 1 to 5; z = 1 to an integer of 6; y + z = 2x or 2x +
The hydrogen-containing amorphous carbon film (aC: H: F) containing fluorine is formed by mixing the fluorine-containing gas represented by 2) and at least one fluorine source gas of SF ₆ gas.

As a result, a hydrogen-containing amorphous carbon film containing fluorine is formed on the surface layer. The fluorine content in the surface layer portion of the hydrogen-containing amorphous carbon film can be easily controlled to a desired amount by adjusting the mixing amount of the fluorine source gas with respect to the hydrocarbon gas. Preferably, the mixed amount of gas is changed stepwise or continuously to increase the amount of fluorine toward the surface layer portion and form a concentration gradient so that the content on the outermost surface is maximized.

By mixing silane gas as a silicon source together with the above-mentioned hydrocarbon gas as a carbon source, a protective film composed of a hydrogen-containing amorphous silicon carbide film (a-SiC: H) can be obtained. If a fluorine source gas is mixed in the middle of the formation of the film as in the case of the hydrogen-containing amorphous carbon film, the hydrogen-containing and fluorine-containing amorphous silicon carbide film (a-Si) is formed on the surface layer portion.
C: H: F) is obtained.

In the second forming method, a protective film containing no fluorine is formed in advance in the same step as in the first step of the first forming method to a required thickness, and then the surface of the protective film is exposed to fluorine plasma. It is a method in which fluorine is introduced into the surface layer portion by exposing it to the.

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described more specifically with reference to the drawings. FIG. 1 is a partially cutaway perspective view showing an example of a magnetic disk recording / reproducing apparatus employing a thin-film magnetic head according to the present invention. This apparatus comprises a magnetic disk (recording medium) 14 for recording information, a magnetic disk 14
(Not shown) for rotating the magnetic disk 14
A magnetic head slider 15 equipped with a magnetic head for writing information to or reading information from the magnetic disk 14;
It comprises an actuator 16 and a voice coil motor 17 that support the magnetic head slider 15 and determine the target position of the magnetic disk 14 and an air filter (not shown) that keeps the inside of the magnetic disk device clean.

The magnetic disk 14 was manufactured by the following known method. First, a nickel-phosphorus film was formed on an aluminum-magnesium alloy disk by plating to a thickness of 10 μm, and the surface thereof was polished. A 100-micron chromium film was formed thereon by sputtering, and a 50 nm-thick cobalt alloy film was formed by sputtering. Finally, an amorphous carbon film having a thickness of several tens nm was formed as a protective film on the disk surface by a sputtering method, and then a perfluoroether-based lubricating film having a film thickness of 6 nm was attached to the surface.

As the magnetic head slider 15, a magnetic head slider equipped with a thin film magnetic head manufactured in an embodiment described later is used. When a sliding test was performed on the magnetic recording / reproducing apparatus thus configured, the total number of rotations when the reproduction output decreased to 70% was 50,000, and at this time, both heads were placed on the surface. It was confirmed that there was no flaw, and good results were obtained as an apparatus.

[0021]

【Example】

<Embodiment 1> One embodiment of a thin film magnetic head according to the present invention will be sequentially described with reference to the manufacturing process chart shown in FIG.

As shown in the sectional view of FIG. 2A, a laminated body of thin film magnetic heads is formed on the slider substrate 1 made of AlTiC (Al ₂ O ³ TiC, aluminum oxide / titanium carbide) by a known method. Formed. That is, the slider substrate 1
After the lower magnetic film 2 is formed on the above by a sputtering method and an insulating material such as silicon dioxide or polyimide is formed thereon,
A laminate having a structure in which the coil conductor 4 was embedded in the insulating layer 3 was formed by a pattern forming technique such as etching.
An upper magnetic film 5 was formed on these laminated bodies to form a laminated body 6 of a thin film magnetic head.

In the steps up to this point, as shown in FIG.
As shown in a perspective view of FIG. 2 '), a pattern of a large number of laminates 6 was simultaneously formed on the slider substrate 1 by using a thin film process. Note that the thickness direction of the substrate 1 is the length direction of the slider.

Then, as shown in the sectional view of FIG.
An insulator such as alumina or silicon oxide was deposited on the laminate 6 by a sputtering method to form an insulating protective film 7. Then, as shown in the perspective view of FIG. 2 (b), the substrate 1 is cut into rectangular strips at the portions A and B indicated by alternate long and short dash lines in FIG. That is, the laminated body 6 covered with the insulating protective layer 7 is cut and separated for each row arranged in a straight line.

After cutting, the end face 8 was turned up, and the end face 8 was ground and polished to form an air supporting surface 9 as shown in FIG. 2 (c). The air support surface 9 is formed on the same plane of the head and the slider. On this air supporting surface 9, the protective film 10 of the present invention was formed by the following method.

A method of forming the protective film 10 will be described below with reference to the sectional view of FIG. An amorphous silicon film having a film thickness of 3 nm is formed on the entire surface of the air supporting surface 9 by a magnetron sputtering method using a silicon as a target.
It was set to 0. Conditions of deposition, 13.56 MHz high frequency power 200 W, pressure 0.67 Pa (Pascal), and the argon flow 20SCCM (S tandard C ubic c m / m inute). When a material containing carbon is used for the slider substrate 1, there is no problem in adhesion with the amorphous carbon-based protective film 10 formed on the substrate, and the adhesive layer 20 can be omitted.

Next, 13.56 using methane gas as a raw material
A hydrogen-containing amorphous carbon film 21 having a thickness of 10 nm was formed by using a parallel plate type high frequency plasma CVD method of MHz. The formation conditions are a cathode coupling method in which a high frequency is applied to the substrate side, a high frequency power of 150 W and a methane gas flow rate of 10 SC.
CM and pressure were 6.7 Pa. The hydrogen content of this film is H
The FS (H ydrogen F orward S cattering ) analysis, was about 36%.

Next, the film forming chamber of the plasma CVD apparatus was once evacuated to a high vacuum, and this time, CF ₄ gas 15 was used as a fluorine source.
SCCM and 10 SCCM of methane gas were mixed and flowed, and a hydrogen-containing fluorine-containing amorphous carbon film 22 having a thickness of 5 nm was formed at a pressure of 10.0 Pa and a high frequency power of 250 W. Under the same conditions as this time, a C—F bond in the hydrogen-containing fluorine-containing amorphous carbon film separately prepared on the silicon substrate was measured by the FT-IR method and converted into the F atom concentration. It was 8.8%. Thus, the protective film 2 having a thickness of 10 nm and containing no fluorine
A protective film 22 containing fluorine having a thickness of 5 nm was laminated on the layer No. 1 to form a laminated protective film 10 having a total film thickness of 15 nm.

When the contact angle of the protective film 22 into which this fluorine was introduced was measured, it was 120 degrees with respect to pure water. This is considerably larger than the hydrogen-containing amorphous carbon film containing no fluorine, which had a contact angle of 70 degrees under the same conditions.

As described above, as shown in FIG. 2D, the thin film magnetic head 2 having the protective film 10 on the air supporting surface.
A slider block equipped with 3 was manufactured.

FIG. 3 is a process drawing of the magnetic head slider. FIG. 3A shows the entire magnetic head slider obtained by cutting out one slider from the magnetic head slider block on which the thin film magnetic head 23 is mounted. Shows the appearance of. After forming the protective film 10, the magnetic head slider was subjected to rail processing by the following method.

The rail functions to control the flow of air so that the head slider is levitated on the magnetic disk rotating at a high speed by a desired amount (around 100 nm). If the flying height of the rail becomes extremely small (50n
m or less), the pad may be a projection-shaped pad for contact recording. Regardless of the shape, the processing method is the same.

First, as shown in FIG. 3B, a positive type organic resist that serves as an etching mask was printed on the protective film 10 by a roll coat printing method. This was exposed and developed by a normal photolithography method to form a rail pattern mask 11.

As shown in FIG. 3C, this mask 11
By using an ion milling method using an argon gas, a material other than the rail pattern was removed to a predetermined depth to form a rail-shaped residual mask 12.

As shown in FIG. 3D, the residual mask 12 was removed to form a rail 13 having a protective film 10 to complete a magnetic head slider.

The characteristics of the thin film magnetic head thus manufactured were evaluated by the following methods. First, with the head attached to a gimbal spring, the head was rotated over a disk with standard lubricating oil, and the frictional force at the start of rotation was measured. As a result, a good low tack property of 1.8 gf / HGA (head gimbal assembly) was obtained.

Further, using a rotating disk for wear resistance, in addition to the deceleration low flying test, CSS (C onstant S tart
S top) A wear test was conducted. In the deceleration low flying test, the tangential velocity of the disk was 5 m / s, the flying height was 20 nm, and the
There is no problem even after 500 hours under the condition of 0 rpm, and the flying height is 4
In the CSS wear test at 0 nm, no damage was observed even after 50,000 rotations, and good wear resistance was obtained.

In addition to the constitutional example of the protective film 22, hydrogen-containing fluorine-containing amorphous carbon film 22 having various compositions was prepared by changing the fluorine content, and at the same time, the hydrogen-containing amorphous carbon as the base was formed. The case where the hydrogen content of the membrane 21 was also changed was investigated. The results are shown in Table 1.

Sample No. in the table. 1 is the present embodiment, sample N
o. 2 to 4 are other examples, and sample No. 5-
6 shows comparative examples, respectively. Further, the upper part of the table shows the protective film 2 that does not contain fluorine as the base of the protective film 10.
1 and the lower part shows the protective film 22 containing fluorine formed on the protective film 21. In the column of film constitution, a-C: H is a hydrogen-containing amorphous carbon film, a-C: H: F is a hydrogen-containing amorphous carbon film containing fluorine, and the numerical values indicate respective film thicknesses. ing.

[0040]

[Table 1]

<Embodiment 2> In this embodiment, the hydrogen-containing amorphous silicon carbide film is used as the basic material for the protective film 10 instead of the hydrogen-containing amorphous carbon film of Embodiment 1. . Hereinafter, after forming the air supporting surface 9 shown in FIG. 2C by the same method as in Example 1, the protective film 10 of the present invention was formed by the following method.

The adhesive layer 20 was not formed, and a hydrogen-containing amorphous silicon carbide film 21 was formed to a thickness of 10 nm as a base layer by using a parallel plate type high frequency plasma CVD method of 13.56 MHz using a mixed gas of methane gas and silane gas as a raw material. Formed. The forming conditions are an anode coupling method in which a high frequency is applied to the counter electrode side, a high frequency power of 150 W, a methane gas flow rate of 10 SCCM, a silane gas flow rate of 5 SCCM, and a pressure of 10.
It was set to 0 Pa. The hydrogen content of this film was about 45% by HFS analysis.

Next, the film forming chamber of the plasma CVD apparatus was once evacuated to a high vacuum, and 15 SCCM of CF ₄ gas and 10 SCCM of C ₂ H ₂ F ₄ gas were mixed and made to flow as a fluorine source gas at a pressure of 10.0 Pa. A hydrogen-containing fluorine-containing amorphous silicon carbide film 22 having a thickness of 5 nm was formed at a high-frequency power of 250 W. The film formed on the silicon substrate under the same conditions as this time was FT-
When the C—F bond in the film was measured by the IR method and converted into the concentration of F atoms, it was about 12.5%.

When the contact angle of this film was measured, it was 130 ° with respect to pure water. It can be seen that this is considerably larger than the hydrogen-containing amorphous silicon carbide film containing no fluorine, which had a contact angle of 70 degrees under the same conditions.

As described above, as shown in FIG. 2D, a slider block in which the thin film magnetic head slider 23 having the protective film 10 on the air supporting surface was mounted was manufactured.
Next, as shown in FIG. 3A, one slider is cut out from the magnetic head slider block, and the first embodiment is carried out.
Rail processing was performed in the same manner as in (1) to complete a magnetic head slider as shown in FIG.

The characteristics of the manufactured thin film magnetic head were evaluated by the following methods. First, with the head attached to a gimbal spring, the head was rotated over a disk with standard lubricating oil, and the frictional force at the start of rotation was measured. As a result, 1.6
Good low tack properties of gf / HGA (head gimbal assembly) were obtained.

For abrasion resistance, a rotating disk was used, and a CSS abrasion test was conducted in addition to the deceleration low flying test. In the deceleration low flying test, the tangential velocity of the disk is 5m.
/ S, flying height 20 nm, 500 at 2000 rpm
There was no problem even after a lapse of time, and in the CSS wear test at a flying height of 40 nm, no damage was observed even after 50,000 rotations, and good wear resistance was obtained.

As in the case of Example 1, hydrogen-containing fluorine-containing amorphous silicon carbide films 22 of various compositions were prepared by changing the fluorine content in addition to the constitutional example of the protective film 22, and at the same time. The case was investigated where the hydrogen content of the underlying hydrogen-containing amorphous silicon carbide film 21 was also changed. The results are shown in Table 2.

Sample No. in the table is 1 is the present embodiment,
Sample No. 2 to 4 are other examples, and sample N
o. 5-6 has shown the comparative example, respectively. Further, the upper part of the table shows the protective film 21 containing no fluorine, which is a base of the protective film 10, and the lower part shows the protective film 22 containing fluorine, which is formed on the protective film 21. In addition, a-SiC: H in the film structure column is a hydrogen-containing amorphous silicon carbide film,
a-SiC: H: F is a hydrogen-containing amorphous silicon carbide film containing fluorine, and the numerical values indicate respective film thicknesses.

[0050]

[Table 2]

<Example 3> After the protective film 21 containing no fluorine was formed in the same manner as in Examples 1 and 2, the fluorine content as the protective film 22 in the surface layer portion was increased with the film thickness, and the concentration gradient to the amount of fluorine was obtained. A hydrogen-containing fluorine-containing amorphous carbon film or a hydrogen-containing fluorine-containing amorphous silicon carbide film 22 was prepared. The manufacturing method in this case is basically the same manufacturing process as in Examples 1 and 2 in that the mixing amount of the fluorine source gas is increased as the film thickness increases in the process of forming the protective film 22. We were able to.

[0052]

As described above in detail, according to the present invention, the intended purpose can be achieved. That is, since the surface region of the protective film is composed of the fluorine-containing film, it is possible to realize an excellent thin film magnetic head having good wear resistance, lubricity and low tackiness. By adopting such a thin-film magnetic head, it was possible to realize a compact, highly reliable, high-density magnetic recording / reproducing apparatus compatible with a low torque motor.

[Brief description of the drawings]

FIG. 1 is a partially cutaway perspective view for explaining an embodiment of a magnetic disk recording / reproducing apparatus according to the present invention.

FIG. 2 is a manufacturing process diagram showing an embodiment of a thin film magnetic head according to the present invention.

FIG. 3 is a process chart for forming rails on a magnetic head slider on which the thin film magnetic head of FIG. 2 is mounted.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Slider substrate, 2 ... Lower magnetic layer, 3 ... Insulating layer, 4 ... Coil conductor, 5 ... Upper magnetic layer, 6 ... Laminated body of thin film magnetic head, 7 ... Insulating protective film, 8 ... End surface, 9 ... Air support Surface, 10 ... Protective film, 11 ... Rail pattern mask, 12 ... Remaining mask, 13 ... Rail, 14 ... Magnetic disk, 15 ... Magnetic head slider, 16 ... Actuator, 17 ... Voice coil motor, 20 ... Adhesive layer, 21 ... Hydrogen-containing amorphous carbon film or hydrogen-containing amorphous silicon carbide film, 22 ... Hydrogen-containing fluorine-containing amorphous carbon film or hydrogen-containing fluorine-containing amorphous silicon carbide film, 23 ... Thin-film magnetic head.

Claims (10)

[Claims] 1. A magnetic head in which an amorphous protective film containing carbon is formed on a surface of a magnetic head slider facing a magnetic disk, and fluorine atoms are added to a surface region of the amorphous protective film.
A thin film magnetic head containing about 30 atomic%. 2. The amorphous protective film containing carbon comprises at least one of hydrogen-containing amorphous carbon and hydrogen-containing amorphous silicon carbide, and the hydrogen content in the protective film is from 5 to 50 atomic%. The thin film magnetic head according to claim 1, wherein 3. The thin film magnetic head according to claim 1, wherein the film thickness of the surface region of the protective film containing fluorine atoms is at least 1 nm, and the film thickness of the entire protective film is at least 4 nm. 4. An amorphous protective film containing carbon having a total film thickness of 4 to 25 nm and having a surface region of 1 to 22 n.
2. The thin film magnetic head according to claim 1, wherein m contains a fluorine atom, and an amorphous protective film containing carbon containing no fluorine is formed in a region of at least 3 nm on the magnetic body formed on the slider. 5. The thin film magnetic head according to claim 1, wherein an air flow control rail or a contact recording protrusion pad portion is provided on the protective film. 6. A method of manufacturing a thin film magnetic head, wherein an amorphous protective film containing carbon is formed on a surface of a magnetic head slider facing a magnetic disk by a plasma enhanced chemical vapor deposition method using a hydrocarbon gas as a carbon source. From the step of previously forming a hydrogen-containing amorphous carbon film (a-C: H) as a protective film, and from the time when the film thickness reaches a predetermined film thickness of 3 nm or more, to the hydrocarbon gas serving as the carbon source, A hydrogen-containing amorphous carbon film (aC: H :) containing fluorine in the surface region by mixing a fluorine source gas.
F) forming the thin film magnetic head. 7. A method of manufacturing a thin film magnetic head, wherein an amorphous protective film containing carbon is formed on a surface of a magnetic head slider facing a magnetic disk, wherein a hydrocarbon gas is used as a carbon source and a silane gas is used as a silicon source. By plasma enhanced chemical vapor deposition,
From the step of forming a hydrogen-containing amorphous silicon carbide film (a-SiC: H) as a protective film in advance, and from the time when the film thickness reaches a predetermined film thickness of 3 nm or more, fluorine raw material gas is further mixed to the surface. Hydrogen-containing amorphous silicon carbide film containing fluorine in the region (a-
And a step of forming SiC: H: F). 8. A fluorine source gas is represented by the general formula CxHyFz.
(However, x = 1 or 2; y = 0 or an integer of 1 to 5; z = 1 to an integer of 6; y + z = 2x or 2x +
8. The method of manufacturing a thin-film magnetic head according to claim 6 or 7, comprising at least one of a fluorine-containing gas and SF ₆ gas represented by 2). 9. A hydrogen-containing amorphous carbon film (a-C: H: F) containing fluorine in the surface region by mixing a fluorine source gas or a hydrogen-containing amorphous silicon carbide film (a-) containing fluorine. Si
In the step of forming C: H: F), the amount of fluorine source gas is changed stepwise or continuously to increase the amount of fluorine toward the surface layer so that the content of the outermost surface becomes maximum. 8. The method of manufacturing a thin film magnetic head according to claim 6, which is a step of forming a concentration gradient. 10. A magnetic disk recording / reproducing apparatus constituted by using the thin film magnetic head according to claim 1. Description: