JPH0256712A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH0256712A JPH0256712A JP20731488A JP20731488A JPH0256712A JP H0256712 A JPH0256712 A JP H0256712A JP 20731488 A JP20731488 A JP 20731488A JP 20731488 A JP20731488 A JP 20731488A JP H0256712 A JPH0256712 A JP H0256712A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- hardness
- protective layer
- protecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 60
- 239000010409 thin film Substances 0.000 title claims description 16
- 239000010410 layer Substances 0.000 claims abstract description 68
- 239000012790 adhesive layer Substances 0.000 claims abstract description 5
- 239000011241 protective layer Substances 0.000 claims description 40
- 239000004020 conductor Substances 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 5
- 239000010408 film Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 8
- 239000003822 epoxy resin Substances 0.000 abstract description 2
- 229920000647 polyepoxide Polymers 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 229910015806 BaTiO2 Inorganic materials 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- 235000019589 hardness Nutrition 0.000 description 14
- 239000000463 material Substances 0.000 description 7
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000006247 magnetic powder Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 102000003812 Interleukin-15 Human genes 0.000 description 1
- 108090000172 Interleukin-15 Proteins 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は薄膜磁気ヘッドに関し、更に詳述すれば、保護
層が２層構造に設けられた薄膜磁気ヘッドに関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a thin film magnetic head, and more specifically to a thin film magnetic head having a two-layered protective layer.
（従来の技術）
従来より、薄膜磁気ヘッドは第２図（Ａ）及び（Ｂ）に
図示するように構成されており、その保護層は５ｉ０１
や＾１２０３等を用いた単層構造から成っている。(Prior Art) Conventionally, a thin film magnetic head has been constructed as shown in FIGS. 2(A) and 2(B), and its protective layer is 5i01.
It consists of a single layer structure using materials such as 1203 and 1203.
すなわち、図において、フェライト或はサファイア等の
耐摩耗性材料によって設けられる基板１上に、センダス
ト、アモルファス等により形成した複数の磁性Ｎ２、導
電性金属から成るコイル導体層３、コイル導体層３と磁
性層２間の絶縁材およびギャップ材となる絶縁層４、磁
性層２を記録媒体５の走行による摩耗から保護する保護
層６をスパッタ、電着等の方法により付着しフォトエツ
チングして所定形状に加工し、最後に接着層７を介して
保護板８を貼り合わせている。That is, in the figure, on a substrate 1 made of a wear-resistant material such as ferrite or sapphire, a plurality of magnetic N2 made of sendust, amorphous, etc., a coil conductor layer 3 made of a conductive metal, and a coil conductor layer 3 made of a conductive metal. An insulating layer 4 that serves as an insulating material and a gap material between the magnetic layers 2, and a protective layer 6 that protects the magnetic layer 2 from wear due to the running of the recording medium 5 are deposited by sputtering, electrodeposition, etc., and then photoetched to form a predetermined shape. Finally, a protective plate 8 is attached via an adhesive layer 7.
（発明が解決しようとする問題点）
しかしながら、上述のような構成において、センダスト
やアモルファスのようにビッカース硬度（Ｉｌｖ）が６
００〜７００程度の材料を磁極として用いた場合、先に
述べたような材料の保護層は磁極に比較して硬いため、
磁気媒体の摺動により第２図（Ａ）中１００のような偏
摩耗を生じ、磁性層にスペーシング・ロスを発生させた
。(Problem to be solved by the invention) However, in the above-mentioned structure, the Vickers hardness (Ilv) is 6 like sendust and amorphous.
When a material of about 0.00 to 700 is used as the magnetic pole, the protective layer made of the above-mentioned material is harder than the magnetic pole, so
Sliding of the magnetic medium caused uneven wear as shown at 100 in FIG. 2(A), resulting in spacing loss in the magnetic layer.
一方、磁極より軟らかいか、同程度の硬度の材料を保護
層に適用した場合、保護層の摩耗がひどく、第２図（Ｂ
）中１１０のような窪みを生じて磁性粉が付着した。On the other hand, when a material that is softer than the magnetic pole or has a similar hardness is applied to the protective layer, the wear of the protective layer is severe, as shown in Figure 2 (B
) A depression like 110 was formed and the magnetic powder was attached.
本発明の目的は、上記事情に基づいて行われたもので、
磁性層に偏摩耗を生じさせずかつ摩耗速度を遅くしてヘ
ッド寿命が長い保護層を有する、薄膜磁気ヘッドを提供
することにある。The purpose of the present invention was achieved based on the above circumstances, and
It is an object of the present invention to provide a thin film magnetic head having a protective layer that does not cause uneven wear on the magnetic layer and slows down the wear rate so that the head life is long.
（問題点を解決するための手段および作用）すなわち、
本発明の上記目的は、基板上に磁性層、コイル導体層お
よび絶縁層を形成し、成膜の最上層の保護層上に接着剤
層を介して保護板が貼着されてなる薄膜磁気ヘッドにお
いて、前記保護層が硬度の異なる２層構造から成り、磁
性層に近接した第１の保護層が該磁性層と略同等かこれ
よりも小さい硬度を有し、第２の保護層は前記磁性層よ
りも大きい硬度を有することを特徴とする薄膜磁気ヘッ
ドにより達成される。(Means and actions for solving problems) That is,
The above-mentioned object of the present invention is to form a thin-film magnetic head in which a magnetic layer, a coil conductor layer, and an insulating layer are formed on a substrate, and a protective plate is attached to the uppermost protective layer of the film through an adhesive layer. wherein the protective layer has a two-layer structure with different hardness, the first protective layer close to the magnetic layer has a hardness approximately equal to or smaller than that of the magnetic layer, and the second protective layer has a hardness substantially equal to or smaller than the magnetic layer. This is achieved by a thin-film magnetic head characterized by a hardness greater than that of the magnetic layer.
磁性層に隣接する第１の保護層の硬度を磁性層と等しい
か、これよりも小さい値に設けることにより、記録媒体
の摺動による摩耗が磁性層よりも保護層に早く及び、従
って、磁性層の偏摩耗は解消される。一方、磁性層およ
び前記第１の保護層の摩耗進行を緩く抑えるために、保
護板よりも前記磁性層および第１の保護層に近い位置に
設けた第２の保ｇＩＮにより摩耗阻止効果が高められる
。By setting the hardness of the first protective layer adjacent to the magnetic layer to a value equal to or smaller than that of the magnetic layer, the wear due to the sliding of the recording medium reaches the protective layer faster than the magnetic layer, and therefore the magnetic Uneven wear of the layers is eliminated. On the other hand, in order to slow down the progression of wear on the magnetic layer and the first protective layer, a second retainer GIN is provided at a position closer to the magnetic layer and the first protective layer than the protective plate, increasing the wear prevention effect. It will be done.
本発明者は、種々実験を行ったところ、磁性層のビッカ
ース硬度（Ｈｖ）が例えば６００〜７００ ｋｇ／ｍｒ
ｒｆのとき、第１の保護層をＨｖ＋ ＜７００ 、第２
の保護層を７００≦Ｈｖｚ≦２０００の範囲の硬度を有
する材料でそれぞれ成膜することにより、偏摩耗がなく
かつヘッド寿命の長い好適な薄膜磁気ヘッドが得られた
。そしてこれら硬度が得られるものとして、第１の保護
層では、ＭｇＯ−３ｉＯｚ系、ＺｒＯ２，Ｚｒ０ｚ・Ｓ
ｉｎ□系、 ＭｎＯ，Ｍｎ０−５ｉＯｚ系、 Ｎｉｐ、
Ｎｉ０１ＳｉＯｚ系。The inventor conducted various experiments and found that the Vickers hardness (Hv) of the magnetic layer was, for example, 600 to 700 kg/mr.
When rf, the first protective layer is Hv+ <700, the second
A suitable thin film magnetic head free from uneven wear and having a long head life was obtained by forming the protective layer from a material having a hardness in the range of 700≦Hvz≦2000. The first protective layer is made of MgO-3iOz, ZrO2, Zr0z・S, which can obtain these hardnesses.
in□ system, MnO, Mn0-5iOz system, Nip,
Ni01SiOz series.
Ｆｅｄ、 Ｆｅ０９ＳｉＯｚ系、 Ｃｏｏ、 Ｃｏ０−
５ｉ０２系、 ＺｎＯ。Fed, Fe09SiOz system, Coo, Co0-
5i02 series, ZnO.
ＺｎＯ−Ｓｉｎ、系、 Ｇｅ０ｚ、 ＧｅＯ２−５ｉＯ
ｚ系、 ５ｎＯｚ＋ＳｎＯ，・５ｉ０２系、 Ｐｂ
Ｏ，ＰｂＯ９Ｓｉｆｔ系、 Ｔｉｅ、 ＴｉＯ２−３
ｉＯｚ系、が挙げられ、第２の保護層では前記第１の保
８！層より硬いＳｉＯ□、 Ａｌｚ（ｈ、 ＭｇＯ，Ｓ
ｉＮ、 ＢＮが挙げられる。ZnO-Sin, system, Ge0z, GeO2-5iO
z series, 5nOz+SnO, 5i02 series, Pb
O, PbO9Sift system, Tie, TiO2-3
In the second protective layer, the first protective layer 8! SiO□, Alz(h, MgO,S
Examples include iN and BN.
（実施例） 以下、図面により本発明の実施例を詳説する。(Example) Hereinafter, embodiments of the present invention will be explained in detail with reference to the drawings.
第１図は本発明の薄膜磁気ヘッドの断面図を示しており
、本発明の薄膜磁気ヘッドをその製造プロセスに従って
説明する。FIG. 1 shows a sectional view of the thin film magnetic head of the present invention, and the thin film magnetic head of the present invention will be explained according to its manufacturing process.
回において、フェライト基板１０上にスパッタ法により
Ｃｏ Ｎｂ Ｚｒ合金の強磁性体を約１５μｍ付着して
下部磁性層１１を形成した。次に絶縁層１２を形成し、
その上に巻線となる Ｃｕ、 Ａｇ等の導電体をスパッ
タ法で付着し所定形状のコイル導体Ｎ１３を形成しコイ
ル導体層１３と上部磁性層１５とを絶縁するため第２の
絶縁層１４を形成した。Ｃｏ Ｎｂ Ｚｒ合金の金属磁
性材料をスパッタ法で約１５μｍ付着し上部磁性層１５
を形成した。次に、本発明の要部である保護層１６を上
部磁性層１５上に形成した。上部磁性層１５上に隣接し
て設けられる第１の保護層１６ａはＭｇＯ・ＳｉＯ□（
ＭｇＯ・ＳｉＯ□組成： ＭｇＯ５０モル％。In step 1, a ferromagnetic material of CoNbZr alloy was deposited to a thickness of about 15 μm on the ferrite substrate 10 by sputtering to form the lower magnetic layer 11. Next, an insulating layer 12 is formed,
A conductor such as Cu or Ag, which will become a winding, is deposited thereon by sputtering to form a coil conductor N13 in a predetermined shape, and a second insulating layer 14 is formed to insulate the coil conductor layer 13 and the upper magnetic layer 15. Formed. A metal magnetic material of CoNbZr alloy is deposited to a thickness of about 15 μm by sputtering to form the upper magnetic layer 15.
was formed. Next, a protective layer 16, which is the essential part of the present invention, was formed on the upper magnetic layer 15. The first protective layer 16a provided adjacently on the upper magnetic layer 15 is made of MgO・SiO□(
MgO・SiO□ Composition: MgO 50 mol%.
５ｉＯｚ ５０モル％）から成り、スパッタ法（真空度
＝ ２ Ｘ １０−７Ｔｏｒｒ以下、成膜速度〜４００
人／Ｍ、陰極電力−Ｉ ＫＷ、 Ａｒガス圧＝ ３Ｘ１
０−’Ｔｏｒｒ）により最大厚が４０μｍに形成されて
ビッカース硬度Ｈν＝５９０ｋｇ ／ ｍ ｒｒｒを得
ている。更にこの第１の保護層１６ａを機械加工により
平坦化した後、第１の保護層に積層して第２の保護層１
６ｂを設けている。5iOz 50 mol%), sputtering method (degree of vacuum = 2 x 10-7 Torr or less, film formation rate ~ 400
Person/M, cathode power - I KW, Ar gas pressure = 3X1
0-'Torr) to have a maximum thickness of 40 μm, obtaining a Vickers hardness Hv=590 kg/m rrr. Furthermore, after flattening the first protective layer 16a by machining, a second protective layer 1 is formed by laminating the first protective layer 16a.
6b is provided.
なお、平坦化は第２の保護層を成膜後、この第２の保護
層に適用してもよい。前記第２の保８ｉ層１６ｂはＳｉ
ｎ、から成り、スパッタ法（成膜条件は第１層と同じ）
により３０μｍに形成して、ビッカース硬度ｔｌｖ ＝
７５０ ｋｇ ／ ｍ ｒｒ（を得て要る。保ＳＩＪ
’Ｗ１６を成膜後、前記保護層１６上面にエポキシ樹脂
の接着剤層１７を塗布してＢａＴｉＯ３の保護板１８を
接着している。Note that planarization may be applied to the second protective layer after the second protective layer is formed. The second protective layer 16b is made of Si.
sputtering method (film formation conditions are the same as the first layer)
The Vickers hardness tlv =
750 kg/mrr (required.
After forming W16, an epoxy resin adhesive layer 17 is applied to the upper surface of the protective layer 16, and a BaTiO3 protective plate 18 is adhered thereto.
以上のように構成した薄膜磁気ヘッド面に記録媒体を１
０００時間走行させて偏摩耗および摩耗量を観察した。A recording medium is placed on the surface of the thin film magnetic head configured as described above.
After running for 1,000 hours, uneven wear and wear amount were observed.
偏摩耗はオプティカルフラットにより干渉縞を観察し、
下部及び上部磁性層ＩＬ１５と第１の保護Ｎ１６ａ と
の段差を調べることにより行い、偏摩耗はＶ＆認されな
かった。Uneven wear can be detected by observing interference fringes using an optical flat.
This was done by examining the level difference between the lower and upper magnetic layers IL15 and the first protection layer N16a, and no uneven wear was observed.
また、絶対摩耗量はデプスマーカーにより計測したとこ
ろ、１．５μｍであり、磁性粉の付着等番よ見られなか
った。Further, the absolute amount of wear was measured using a depth marker and was 1.5 μm, and no adhesion of magnetic powder was observed.
下記表１は、前記実施例と同様の方法により、保ｉｉ層
を変えて成膜した際の偏摩耗状態と、比較のためにＳｉ
Ｏ□の単層構造の保ｉｉ層の偏摩耗状態の観察結果を示
す。Table 1 below shows the uneven wear state when the protective II layer was changed and formed by the same method as in the above example, and for comparison, the Si
The observation results of the uneven wear state of the protective layer II of the single-layer structure of O□ are shown.
表１
表１から明らかなとおり、前述したビ・ンカース硬度の
組み合せを持つ２層構造においては偏摩耗は観察されな
かった。Table 1 As is clear from Table 1, uneven wear was not observed in the two-layer structure having the above-mentioned combination of vinyl hardness.
（発明の効果）
以上記載したとおり、本発明の薄膜磁気ヘッドによれば
、保護層を２層構造に設け、磁性層に隣接した第１の保
護層は硬度が磁性層と略同等かこれよりも柔らかく設け
られ、かつ第２の保護層は磁性層よりも硬く設けられた
ことにより、偏摩耗の発生が防止されると共にヘッド寿
命の長い薄膜磁気ヘッドが得られる。(Effects of the Invention) As described above, according to the thin film magnetic head of the present invention, the protective layer is provided in a two-layer structure, and the first protective layer adjacent to the magnetic layer has a hardness that is approximately equal to or greater than that of the magnetic layer. Since the second protective layer is made softer and the second protective layer is made harder than the magnetic layer, uneven wear is prevented and a thin-film magnetic head with a long head life can be obtained.
第１図は本発明に基づいて構成される薄ＩＩ！磁気ヘッ
ドの断面図、第２図は（八）及び（Ｂ）は従来構造の薄
膜磁気ヘッドの断面図である。
１０：Ｚｎ−フェライト基板 １１：下部磁性層１２：
第１の非磁性絶縁層 １３：コイル導体層１４：第２の
非磁性絶縁層 １５：上部磁性層１６ａ ：第１の保護
層 １６ｂ；第２の保護層１７：接着側層
１８：保護板第 １
図
第２図
（Ｂ）
１ｎ
手
続
ネ甫
正
書
平成１年１月
１１日FIG. 1 shows Thin II constructed according to the present invention! A cross-sectional view of a magnetic head. FIGS. 2(8) and 2(B) are cross-sectional views of a thin-film magnetic head having a conventional structure. 10: Zn-ferrite substrate 11: Lower magnetic layer 12:
First non-magnetic insulating layer 13: Coil conductor layer 14: Second non-magnetic insulating layer 15: Upper magnetic layer 16a: First protective layer 16b; Second protective layer 17: Adhesive side layer
18: Protective Board No. 1 Figure 2 (B) 1n Procedure Neho Official Book January 11, 1999
Claims (1)
成膜の最上層の保護層上に接着剤層を介して保護板が貼
着されてなる薄膜磁気ヘッドにおいて、前記保護層が硬
度の異なる２層構造から成り、磁性層に近接した第１の
保護層が該磁性層と略同等かこれよりも小さい硬度を有
し、第２の保護層は前記磁性層よりも大きい硬度を有す
ることを特徴とする薄膜磁気ヘッド。Form a magnetic layer, coil conductor layer and insulating layer on the substrate,
In a thin film magnetic head in which a protective plate is attached to the uppermost protective layer of the film through an adhesive layer, the protective layer has a two-layer structure with different hardness, and the first layer is adjacent to the magnetic layer. A thin film magnetic head characterized in that a protective layer has a hardness substantially equal to or lower than that of the magnetic layer, and a second protective layer has a hardness greater than that of the magnetic layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20731488A JPH0256712A (en) | 1988-08-23 | 1988-08-23 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20731488A JPH0256712A (en) | 1988-08-23 | 1988-08-23 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0256712A true JPH0256712A (en) | 1990-02-26 |
Family
ID=16537719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20731488A Pending JPH0256712A (en) | 1988-08-23 | 1988-08-23 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0256712A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2834375A1 (en) * | 2001-12-28 | 2003-07-04 | Commissariat Energie Atomique | INTEGRATED MAGNETIC HEAD FOR MAGNETIC RECORDING AND METHOD OF MANUFACTURING THE MAGNETIC HEAD |
| US7064925B2 (en) * | 2002-12-06 | 2006-06-20 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic head for reducing projection of retrieving and writing unit from float surface, and magnetic recording/retrieving apparatus using the same |
-
1988
- 1988-08-23 JP JP20731488A patent/JPH0256712A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2834375A1 (en) * | 2001-12-28 | 2003-07-04 | Commissariat Energie Atomique | INTEGRATED MAGNETIC HEAD FOR MAGNETIC RECORDING AND METHOD OF MANUFACTURING THE MAGNETIC HEAD |
| WO2003056548A1 (en) * | 2001-12-28 | 2003-07-10 | Commissariat A L'energie Atomique | Integrated magnetic head for magnetic recording and method for making same |
| US7064925B2 (en) * | 2002-12-06 | 2006-06-20 | Hitachi Global Storage Technologies Japan, Ltd. | Magnetic head for reducing projection of retrieving and writing unit from float surface, and magnetic recording/retrieving apparatus using the same |
| US7460335B2 (en) | 2002-12-06 | 2008-12-02 | Hitachi Global Technologies Japan, Ltd. | Magnetic head having first and second protective films with different coefficients of linear expansion |
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