JPH01173040A - Glass pattern for photoengraving - Google Patents

Abstract

PURPOSE:To very quickly execute a vacuum forming work for raising the adhesion of a pattern and a metallic stock by dispersing transparent and hard granules on a protective layer provided on the surface of the pattern at the time of generating the photoengraving use glass pattern used for metallic working by etching. CONSTITUTION:On the pattern part surface of a glass plate in which a pattern 1 has been formed on one face, a transparent resin in which finely ground-down glass granules 4 are disposed is applied and allowed to flow by using a nozzle, and it is brought to coating, by which a protective film 3 is formed. In such a case, the composition of the transparent resin in which the glass granules 4 have been dispersed in constituted of 5-20% SiO2, 20-50% transparent resin and 40-70% alcohol which are all shown by wt.%, and it is brought to high temperature treatment at 150-180 deg.C in order to allow the protective film to adhere closely. The surface of the formed glass pattern goes to an uneven state of 0.1-0.5mum by a roughness unit Ra because of the glass granules 4. Also, the vacuum formation which has required one minute on an average usually can be executed in 15-30sec.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a glass pattern used in a plate-making process when manufacturing metal products by photoetching, electroforming, or the like.

[Conventional technology]

The plate-making process when manufacturing metal products using the photo-etching method uses photoresist coated with a thickness of 0.
A process in which a glass pattern is closely attached to a metal material with a thickness of 10 to 0.30 mm, and then exposed to light to print the pattern onto the metal material.

The glass pattern used in this plate-making process consists of a glass plate 2 and a pattern l formed on its upper surface, as shown in Figure 3. This glass pattern is used as an original plate and is applied to metal materials many times. Since baking is performed, the pattern surface is coated with a protective film 3. Then, as shown in FIG. 2(a), when the metal material 5 coated with photoresist 6 on both sides is sandwiched between two glass patterns from both sides, each patterned surface is placed so as to face the metal material 5. Next, the glass pattern and the metal material are brought together using an opening/closing device (not shown), evacuated to bring them into close contact, and exposed to ultraviolet rays as shown in FIG. 2(b). After exposure, the metal material is microfabricated through a development process and an ethoching process.

[Problem that the invention seeks to solve]

The process of bringing the glass pattern and metal material into close contact in the above conventional process requires precision and requires vacuuming, but the surface of the glass plate is flat, and the glass pattern itself is large in size as described above. Currently, it takes time to completely bring the glass pattern and the metal material into close contact. Moreover, the vacuum is drawn from the edge of the glass plate, but since the pattern area is located in the center of the glass plate, a vacuum is generated.If exposure is performed with incomplete vacuum, so-called "vacuum fog" may occur. This phenomenon occurs, causing light to go around to the bottom of the pattern, causing a problem in that the plate dimensions shift.

[Means for solving problems]

Therefore, the present invention has attempted to solve this problem by dispersing transparent hard particles in a protective layer on the pattern surface in a plate-making glass pattern used for metal processing by photoetching.

As the transparent hard particles, finely crushed glass can be suitably used, but transparent hard polymer particles that do not melt in the transparent resin that is the protective layer may also be used.

[Function] By dispersing transparent hard particles in the protective layer on the pattern surface, its maintenance is improved! Hard particles are exposed on the surface of the layer, forming irregularities of 0.1 to 0.5 μm in roughness units (Ra) on the surface of the protective layer, creating air passages between the glass pattern and the metal material. , vacuuming can be easily performed.

〔Example〕

Examples will be described below with reference to the drawings.

Figure 1 is a sectional view of the glass pattern of the present invention, Figure 2 (a)
is a cross-sectional view showing the state before the metal material and the glass pattern are brought into close contact, FIG. 2(b) is a cross-sectional view showing the state in which the metal material and the glass pattern are brought into close contact and exposed, and FIG. 3 is the conventional glass pattern. FIG.

1 is a pattern, 2 is a glass plate, 3 is a protective film, 4 is a hard grain, 5 is a metal material, and 6 is a photoresist.

As shown in Figure 1, a glass plate with a thickness of about 6 mm (!100 cm x 80 mm width) with pattern 1 formed on one side.
) A transparent resin containing finely ground glass grains 4 dispersed therein was poured onto the patterned surface of the glass plate using a nozzle from above the patterned surface of the glass plate, and was coated to form a protective film 3. The composition of the transparent resin in which the glass particles 4 are dispersed is as follows:
SiO□5~20, transparent resin 20~50, alcohol (
Solvent) 40-70 (wt%). Next, the glass pattern was dried at room temperature to remove the solvent, and then treated at a high temperature of 150 to 180°C to adhere the protective film.

The surface of the formed glass pattern has a roughness of 0.1 to 0.0 in roughness units (Ra) due to the glass particles 4 solidified on the surface.
There were irregularities of 5 μm.

The degree of vacuuming can be checked by looking at the image quality, as if the vacuuming is insufficient, the plate dimensions of the product will shift, and the movement of the Newton ring on the glass surface can be detected and its movement stopped. You can check it at that stage.

While the conventional glass pattern required an average of 1 minute to draw a vacuum, the glass pattern of the present invention allows the vacuum to be drawn in an average of 15 to 30 seconds, which is more than half the speed of the conventional glass pattern.

〔Effect of the invention〕

By dispersing transparent hard particles in the protective layer, it is possible to perform the vacuum operation extremely quickly to improve the adhesion between the glass pattern and the metal material during the plate-making process, reducing the number of product defects caused by the pattern. Additionally, the strength of the glass pattern has been improved, making it able to withstand multiple exposure steps.

[Brief explanation of the drawing]

Figure 1 is a sectional view of the glass pattern of the present invention, Figure 2 (a)
is a cross-sectional view showing the state before the metal material and the glass pattern are brought into close contact, FIG. 2(b) is a cross-sectional view showing the state in which the metal material and the glass pattern are brought into close contact and exposed, and FIG. 3 is the conventional glass pattern. FIG. 1 is a pattern, 2 is a glass plate, 3 is a protective film, 4 is a hard grain, 5 is a metal material, and 6 is a photoresist. Applicant Dai Nippon Printing Co., Ltd. Agent Patent Attorney (1) Nobuhiko (3 others) (Ref.

Claims (1)

[Claims] A plate-making glass pattern used for metal processing by photo-etching, characterized in that transparent hard particles are dispersed in a protective layer on the pattern surface.