JPH01166955U - - Google Patents
Info
- Publication number
- JPH01166955U JPH01166955U JP6395488U JP6395488U JPH01166955U JP H01166955 U JPH01166955 U JP H01166955U JP 6395488 U JP6395488 U JP 6395488U JP 6395488 U JP6395488 U JP 6395488U JP H01166955 U JPH01166955 U JP H01166955U
- Authority
- JP
- Japan
- Prior art keywords
- beam irradiation
- charged beam
- view
- holder
- perspective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004020 conductor Substances 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
Description
第１図は保持台と荷電ビーム集束レンズとの関
係を示す斜視図であつて集束レンズについては断
面が示されている。第２図は保持台の回転によつ
てフレミング右手則にしたがつて保持台に渦電流
が発生する様子を示す斜視図である。第３図は渦
電流による反作用磁界で主磁束等が乱され電子ビ
ームがフレミング左手則にしたがつて偏向される
様子を示すもので、第３図Ａは斜視図、第３図Ｂ
は同図Ａの―線にそう断面図である。第４図
はこの考案の実施例を示すもので、保持台の平面
図、第５図は第４図の―線にそう断面図であ
る。第６図は、この考案による保持台の製造工程
を説明するための斜視図、第７図Ａ，Ｂ，Ｃは保
持台の他の製造工程を説明するための斜視図であ
る。
２……保持台、３……線状導体、４……絶縁体
、５……金属板、１３……銅線、１４……マシナ
ブル・セラミツクス。
FIG. 1 is a perspective view showing the relationship between the holding table and the charged beam focusing lens, and the focusing lens is shown in cross section. FIG. 2 is a perspective view showing how eddy currents are generated in the holding table according to Fleming's right-hand rule due to rotation of the holding table. Figure 3 shows how the main magnetic flux is disturbed by the reaction magnetic field caused by eddy currents and the electron beam is deflected according to Fleming's left-hand rule. Figure 3A is a perspective view, and Figure 3B is a perspective view.
is a cross-sectional view taken along the line ``-'' in Figure A. FIG. 4 shows an embodiment of this invention, in which a plan view of the holding stand is shown, and FIG. 5 is a sectional view taken along the line --- in FIG. FIG. 6 is a perspective view for explaining the manufacturing process of the holding table according to this invention, and FIGS. 7A, B, and C are perspective views for explaining other manufacturing processes of the holding table. 2... Holding stand, 3... Linear conductor, 4... Insulator, 5... Metal plate, 13... Copper wire, 14... Machinable ceramics.
Claims (1)
絶縁体または高抵抗体により形成し、この保持台
の荷電ビーム照射面上に、蓄積電荷放出のための
導体を点状または線状に分散して配置したことを
特徴とする荷電ビーム照射装置。 A holder that holds and moves the wafer to be processed is formed of an insulator or a high-resistance material, and conductors for releasing accumulated charges are dispersed in dots or lines on the charged beam irradiation surface of this holder. A charged beam irradiation device characterized in that the charged beam irradiation device is arranged at
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6395488U JPH067556Y2 (en) | 1988-05-17 | 1988-05-17 | Charged beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6395488U JPH067556Y2 (en) | 1988-05-17 | 1988-05-17 | Charged beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01166955U true JPH01166955U (en) | 1989-11-22 |
| JPH067556Y2 JPH067556Y2 (en) | 1994-02-23 |
Family
ID=31289438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6395488U Expired - Lifetime JPH067556Y2 (en) | 1988-05-17 | 1988-05-17 | Charged beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH067556Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020179415A (en) * | 2019-04-26 | 2020-11-05 | 三菱パワー株式会社 | Lamination molding device and modification method of the same |
-
1988
- 1988-05-17 JP JP6395488U patent/JPH067556Y2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020179415A (en) * | 2019-04-26 | 2020-11-05 | 三菱パワー株式会社 | Lamination molding device and modification method of the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH067556Y2 (en) | 1994-02-23 |
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