JPH01165761A - Member ensuring slight friction, seizing resistance and slight wear in atmosphere - Google Patents
Member ensuring slight friction, seizing resistance and slight wear in atmosphereInfo
- Publication number
- JPH01165761A JPH01165761A JP32454087A JP32454087A JPH01165761A JP H01165761 A JPH01165761 A JP H01165761A JP 32454087 A JP32454087 A JP 32454087A JP 32454087 A JP32454087 A JP 32454087A JP H01165761 A JPH01165761 A JP H01165761A
- Authority
- JP
- Japan
- Prior art keywords
- friction
- amorphous
- alloy
- slight
- atmosphere
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 229910001080 W alloy Inorganic materials 0.000 claims abstract description 9
- 229910045601 alloy Inorganic materials 0.000 abstract description 11
- 239000000956 alloy Substances 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 9
- 229910052721 tungsten Inorganic materials 0.000 abstract description 8
- 229910052742 iron Inorganic materials 0.000 abstract description 6
- 229910052759 nickel Inorganic materials 0.000 abstract description 6
- 229910052804 chromium Inorganic materials 0.000 abstract description 5
- 238000004544 sputter deposition Methods 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 230000000573 anti-seizure effect Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- -1 indium and gallium Chemical class 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 239000010705 motor oil Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、雰囲気中における低摩擦性、耐焼付性並びに
低摩耗性部材に係り、特に潤滑下ないしドライ条件下の
いずれにおいても摩擦係数が小さく、耐摩耗性に優れた
部材に関する。Detailed Description of the Invention [Industrial Field of Application] The present invention relates to low friction, anti-seizure, and low wear members in an atmosphere, and particularly those having a low coefficient of friction under both lubricated and dry conditions. It relates to a member that is small and has excellent wear resistance.
[従来の技術]
各種機器の軸受や、シール部材、その他、部材間で摺動
が行なわれるものには、摩擦係数が小さく耐焼付性に優
れると共に、耐摩耗性に優れ摺動による摩耗も少ないこ
とが要求される。[Conventional technology] Bearings of various equipment, seal members, and other parts where sliding occurs between members have a low coefficient of friction and excellent seizure resistance, as well as excellent wear resistance and little wear due to sliding. This is required.
このような要求に対応するため、摺動部表面に摩擦摩耗
性能改善のための皮膜を形成する方法がある、低摩擦性
、耐焼付性を重視する場合には、金、銀、鉛、すす、イ
ンジウム、ガリウム等の金属やMO52、WS2、弗素
樹脂等の軟質皮膜を用いる。耐摩耗性を重視する場合は
、硬質クロムメツキやセラミックス等の硬い皮膜を用い
る。In order to meet these demands, there is a method of forming a film on the surface of the sliding part to improve friction and wear performance.If low friction and seizure resistance are important, gold, silver, lead, soot, etc. , metals such as indium and gallium, and soft coatings such as MO52, WS2, and fluororesin. If wear resistance is important, use a hard coating such as hard chrome plating or ceramics.
[発明が解決しようとする問題点コ
このように、低摩擦及び耐焼付性能改善のための皮膜と
、耐摩耗性能改善のための皮膜はその機能が異なってお
り、双方の性能を満たす材料は少ないのが現状である。[Problems to be solved by the invention] As described above, the functions of the coating for improving low friction and anti-seizure performance and the coating for improving wear resistance are different, and the material that satisfies the performance of both is The current situation is that there are few.
低摩擦性、耐焼付性、耐摩耗性を兼ね備えた材料は、優
れた摺動用の皮膜として実用範囲が広い。このため、雰
囲気中において摩擦係数が小さく、焼損荷重が大きく、
また摩擦による摩耗量の少ない部材であって、しかも低
コストで提供される低摩擦性、耐焼付性並びに低摩耗性
部材の開発が望まれていた。Materials that have low friction, seizure resistance, and wear resistance have a wide range of practical applications as excellent sliding coatings. Therefore, the friction coefficient is small in the atmosphere, the burnout load is large,
Furthermore, it has been desired to develop a member with low frictional properties, anti-seizure properties, and low abrasion properties that can be provided at a low cost and which has a small amount of wear due to friction.
[問題点を解決するための手段]
本発明の雰囲気中における低摩擦性、耐焼付性並びに低
摩耗性部材は、W(タングステン)合金のアモルファス
コーティングを施してなることを特徴とする。[Means for Solving the Problems] The member of the present invention that exhibits low friction, seizure resistance, and low wear in an atmosphere is characterized by being coated with an amorphous coating of W (tungsten) alloy.
通常、合金は固体状態では結晶化しているが合金組成を
限定して溶融状態から超急冷凝固させるなど、固体形成
の過程で原子配列に長周期的規則性を形成させない方法
を適用すると、結晶構造を持たず、液体に類似したアモ
ルファス構造が得られ、このような合金をアモルファス
合金という。Normally, alloys are crystallized in the solid state, but if you apply a method that does not create long-period regularity in the atomic arrangement during the solid formation process, such as by limiting the alloy composition and solidifying it by ultra-rapid cooling from the molten state, the crystal structure An amorphous structure resembling that of a liquid is obtained, and such an alloy is called an amorphous alloy.
アモルファス合金は、多くは過飽和固溶体の均一な単相
合金であって、従来の実用金属に比べて高い強度を保有
し、かつ組成に応じて非常に高い耐食性をはじめ種々の
特性を示す。本発明者らは、このようなアモルファス合
金の特性を活用する研究を行なった結果、W系アモルフ
ァス合金は雰囲気中での摩擦係数が低く、またそれ故に
摩耗も少ないという特異な性質を具有することを見出し
、本発明を完成した。Amorphous alloys are mostly homogeneous single-phase alloys of supersaturated solid solutions, have higher strength than conventional practical metals, and exhibit various properties, including very high corrosion resistance, depending on their composition. The present inventors have conducted research to utilize the characteristics of such amorphous alloys, and have found that W-based amorphous alloys have the unique property of having a low coefficient of friction in an atmosphere, and therefore less wear. They discovered this and completed the present invention.
[作用]
W系アモルファス合金は、雰囲気中における摩擦係数が
小さく、焼損荷重は大きい。[Function] The W-based amorphous alloy has a small friction coefficient in the atmosphere and a large burnout load.
また、高硬度で、耐摩耗性が著しく高く摩擦による摩耗
量は極めて少ない。In addition, it has high hardness and extremely high wear resistance, and the amount of wear due to friction is extremely small.
このため、W合金のアモルファスコーティングを施した
部材は、極めて低摩擦性、耐焼付性で低摩耗性のものと
なる。Therefore, a member coated with an amorphous W alloy coating has extremely low friction, seizure resistance, and low abrasion.
[実施例] 以下に本発明の実施例について説明する。[Example] Examples of the present invention will be described below.
本発明の部材はW合金のアモルファスコーティングを施
してなるものである。The member of the present invention is formed by applying an amorphous coating of W alloy.
W系アモルファス合金としては、Wを11〜75原子%
含有するものが好ましい6W含有量が11原子%未満で
あっても、75原子%を超えても、アモルファスとなり
難く、低摩擦性、耐焼付性、低摩耗性を実現することが
難しい。As a W-based amorphous alloy, W is contained in an amount of 11 to 75 atomic%.
Even if the preferred 6W content is less than 11 atom % or more than 75 atom %, it is difficult to become amorphous and it is difficult to achieve low friction, seizure resistance, and low abrasion.
特に好ましいW系アモルファス合金は、原子%で、 W:10以上75以下 Fe:30以上50以下 Ni: 3以上10以下 Cr: 7以上20以下 を含む低摩擦アモルファス合金である。Particularly preferable W-based amorphous alloys include, in atomic %, W: 10 or more and 75 or less Fe: 30 or more and 50 or less Ni: 3 or more and 10 or less Cr: 7 or more and 20 or less It is a low-friction amorphous alloy containing
上記の組成は、スパッタデポジション法により、ターゲ
ットに5US304の円板とその円板の上にWの薄くて
小さい円板を置いた複合ターゲットにより容易に得るこ
とができる。この様な複合ターゲットのWの円板の数や
大きさを変えて、アモルファス組成の範囲を調べた結果
、Wの含有量が約10原子パーセントから約75原子パ
ーセントの間で、アモルファス構造をとることがわかっ
た。The above composition can be easily obtained by a sputter deposition method using a composite target consisting of a 5US304 disk and a thin, small W disk placed on top of the disk. As a result of investigating the range of amorphous composition by changing the number and size of W disks in such a composite target, we found that an amorphous structure is formed when the W content is between about 10 atomic percent and about 75 atomic percent. I understand.
この他に、本発明の目的に用いることのできるW系アモ
ルファス合金として、本出願人より特願昭60−510
36号で提案された下記の、■のものでWを10〜75
原子%含むものも挙げられる。In addition, as a W-based amorphous alloy that can be used for the purpose of the present invention, the present applicant has filed a patent application No. 60-510.
W is 10 to 75 with the following ■ that was proposed in issue 36.
Also included are those containing atomic percent.
■ Taと、Ti% Zr、Nb%Wよりなる群から選
ばれる1種または2種以上の元素とを含み、残部は実質
的にNiよりなり、含有率はTaが10原子%以上、前
記群から選ばれる1種または2種以上の元素がTaとの
含量で15〜80原子%であるアモルファス合金。■ Contains Ta and one or more elements selected from the group consisting of Ti% Zr and Nb% W, with the remainder essentially consisting of Ni, with a Ta content of 10 atomic% or more, An amorphous alloy in which the content of one or more elements selected from Ta is 15 to 80 atomic %.
■ Taと、Ti、Zr% Nb、Wよりなる群から選
ばれる1種または2種以上の元素とFeおよび/又はC
Oとを含み、残部は実質的にNiよりなり、含有率はT
aとTi、Zr、Nb及びWよりなる群から選ばれる1
種または2種以上とが、含量で15〜80原子%であり
、かつTaが10原子%以上であり、Feおよび/又は
COが75原子%以下でありNiが7原子%以上である
アモルファス合金。■ Ta, one or more elements selected from the group consisting of Ti, Zr% Nb, and W, and Fe and/or C
O, the remainder is essentially Ni, and the content is T.
a and 1 selected from the group consisting of Ti, Zr, Nb and W
an amorphous alloy in which the content of the species or two or more species is 15 to 80 atomic %, Ta is 10 atomic % or more, Fe and/or CO is 75 atomic % or less, and Ni is 7 atomic % or more .
このようなW系アモルファス合金であれば、低摩擦性、
耐焼付性、低摩耗性に加えて、例えば塩酸や硝酸あるい
は更に酸化剤を含むような過酷な腐食性環境においても
著しく高い耐食性を示す。Such a W-based amorphous alloy has low friction and
In addition to seizure resistance and low abrasion properties, it also exhibits extremely high corrosion resistance even in harsh corrosive environments that contain hydrochloric acid, nitric acid, or even oxidizing agents.
本発明において、W系アモルファスコーティング膜の膜
厚が薄いと、十分な特性の改善効果が得られす、また、
膜厚が厚くても特性の向上は望めずコスト高となる上に
、膜の剥離の問題が生じる。In the present invention, if the film thickness of the W-based amorphous coating film is thin, a sufficient property improvement effect can be obtained;
Even if the film is thick, no improvement in characteristics can be expected, resulting in increased costs, and the problem of film peeling occurs.
従って、W系アモルファスコーティング膜の厚さは、部
材の規模や使用目的に応じて、十分な特性が得られる範
囲で適宜決定する。Therefore, the thickness of the W-based amorphous coating film is appropriately determined depending on the scale of the member and the purpose of use, within a range that provides sufficient characteristics.
W系アモルファスコーティング膜の形成方法は・特にス
パッタデポジション法に限定されず、他の種々の方法で
も良い。The method for forming the W-based amorphous coating film is not particularly limited to the sputter deposition method, and various other methods may be used.
なお、W系アモルファスコーティングを施す部材の基材
としては、特に制限はなく、金属、セラミックス、樹脂
等のいずれでも良い。Note that the base material of the member to which the W-based amorphous coating is applied is not particularly limited, and may be any of metals, ceramics, resins, etc.
以下、実験例について説明する。An experimental example will be explained below.
実験例l
5US304ステンレス鋼のビン及びディスクに、スパ
ッタリングにより、下記組成のW系アモルファスコーテ
ィングを施しく膜厚:10μm)、それぞれの試料及び
コーティングを施していないものについて下記方法で摩
擦試験(潤滑条件下)を行なった。Experimental Example 1 5US304 stainless steel bottles and disks were coated with a W-based amorphous coating with the following composition by sputtering (film thickness: 10 μm), and each sample and the uncoated sample were subjected to a friction test (lubrication conditions) using the following method. below) was performed.
比較例として、Ta系アモルファスコーティングを施し
たこと以外は同様のビン及びディスクを用意し、同じ方
法で摩擦試験を行なった。さらに、コーティングを施さ
ない5US304のビン及びディスクについても同じ試
験を行なった。As a comparative example, similar bottles and disks were prepared except that they were coated with a Ta-based amorphous coating, and a friction test was conducted in the same manner. Additionally, the same tests were conducted on uncoated 5US304 bottles and discs.
W系アモルファス組成(原子%)
W:50%
Fe:38.2%
Ni:4.2%
Cr:9.6%
Ta系アモルファス組成(原子%)
Ta : 50%
Fe:36.2%
Ni:4.2%
Cr:9.6%
実験装置:TT600A型摩擦試験機(3ビン・オン・
ディスク型)
試験片:3ビン、及びディスク型
実験条件: SAE#20エンジン油中にて摩擦温度=
60℃
摩擦面積:0.59cm’
荷重と速度:第1図に示すダイヤグラ
ムに従って変化させた。ひとつの条件
について5分ずつの実験を行った。W-based amorphous composition (atomic %) W: 50% Fe: 38.2% Ni: 4.2% Cr: 9.6% Ta-based amorphous composition (atomic %) Ta: 50% Fe: 36.2% Ni: 4.2% Cr: 9.6% Experimental equipment: TT600A type friction tester (3-bin on-board)
Disk type) Test piece: 3 bottles and disk type Experimental conditions: Friction temperature = in SAE #20 engine oil
60°C Friction area: 0.59 cm' Load and speed: Changed according to the diagram shown in FIG. The experiment was conducted for 5 minutes for each condition.
測定項目:焼損荷重(摩擦係数が急上昇した点を焼損点
とした)、摩擦係数測定
供試材料及び組み合せは第1表に示す通りとした。Measurement items: Burnout load (the point where the friction coefficient suddenly increased was defined as the burnout point), friction coefficient measurement sample materials and combinations were as shown in Table 1.
結果を第1表及び第2図に示す。The results are shown in Table 1 and Figure 2.
第1表
なお、試験後の表面の状態を光学顕微鏡にて観察したと
ころ、W系アモルファスを施したものは一部にランニン
グトレースが見られる場合もあるが、他は損傷もなく、
良好な状態であった。 。Table 1: When the surface condition after the test was observed using an optical microscope, running traces were observed in some parts of the surface coated with W-based amorphous, but otherwise there was no damage.
It was in good condition. .
実験例2
SUS304ステンレス鋼部材に、下記組成のW系アモ
ルファスコーティング又はTi系アモルファスコーティ
ングを20μm厚さに施した部材あるいは施していない
部材に対して、下記条件で対5US304製ステンレス
鋼Fretting試験(ドライ条件)を行ない、平均
摩擦係数及び摩耗量を測定した。結果を第2表に示す。Experimental Example 2 A SUS304 stainless steel member was subjected to a Fretting test (dry conditions), and the average coefficient of friction and amount of wear were measured. The results are shown in Table 2.
W系アモルファス組成(原子%) W:22% Fe:61% Ni: 3% Cr:14% Ti系アモルファス組成(原子%) Ti:37 % Fe : 46 % Ni: 5 % Cr:14 % Fretting試験条件は次の通りである。W-based amorphous composition (atomic%) W: 22% Fe:61% Ni: 3% Cr: 14% Ti-based amorphous composition (atomic %) Ti: 37% Fe: 46% Ni: 5% Cr: 14% Fretting test conditions are as follows.
荷重:14N
速度:11000rp
振幅:約50μm
゛第2表
以上の結果から、本発明の如く、W系アモルファスコー
ティングを施した部材は、潤滑条件、ドライ条件のいず
れにおいても、雰囲気中での摩擦係数が低く、耐焼付性
、耐摩耗性にも優れることが明らかである。Load: 14N Speed: 11000rpm Amplitude: Approximately 50μm From the results shown in Table 2, it can be seen that the members coated with the W-based amorphous coating as in the present invention have a low coefficient of friction in the atmosphere under both lubricated and dry conditions. It is clear that the material has low corrosion resistance and excellent seizure resistance and abrasion resistance.
[発明の効果]
以上詳述した通り、本発明によれば、雰囲気中での摩擦
係数が小さく、従って、摩耗も少ない上に、耐焼付性に
優れた部材が提供される。また、本発明の部材はW合金
のアモルファス合金でコーティングされているものであ
るから、耐腐食性能にも優れている。従って、各種機器
用軸受、電子顕微鏡の載物台、その他、シール材などと
して極めて好適である。[Effects of the Invention] As described in detail above, according to the present invention, a member is provided which has a small coefficient of friction in an atmosphere, has little wear, and has excellent seizure resistance. Furthermore, since the member of the present invention is coated with an amorphous W alloy, it also has excellent corrosion resistance. Therefore, it is extremely suitable as a bearing for various devices, a stage for an electron microscope, and as a sealing material.
第1図は実験例1における摩擦試験の荷重ダイヤグラム
、第2図は実験例1における試験結果を示すグラフであ
る。
代 理 人 弁理士 重 野 剛FIG. 1 is a load diagram of the friction test in Experimental Example 1, and FIG. 2 is a graph showing the test results in Experimental Example 1. Agent Patent Attorney Tsuyoshi Shigeno
Claims (1)
施してなることを特徴とする雰囲気中における低摩擦性
、耐焼付性並びに低摩耗性部材。(1) A member having low friction, seizure resistance, and low wear in an atmosphere, characterized by being coated with an amorphous tungsten alloy coating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32454087A JPH01165761A (en) | 1987-12-22 | 1987-12-22 | Member ensuring slight friction, seizing resistance and slight wear in atmosphere |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32454087A JPH01165761A (en) | 1987-12-22 | 1987-12-22 | Member ensuring slight friction, seizing resistance and slight wear in atmosphere |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01165761A true JPH01165761A (en) | 1989-06-29 |
Family
ID=18166941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32454087A Pending JPH01165761A (en) | 1987-12-22 | 1987-12-22 | Member ensuring slight friction, seizing resistance and slight wear in atmosphere |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01165761A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4836828A (en) * | 1971-09-07 | 1973-05-31 | ||
JPS60152651A (en) * | 1984-01-20 | 1985-08-10 | Res Dev Corp Of Japan | Amorphous alloy containing nitrogen |
JPS6394611A (en) * | 1986-10-09 | 1988-04-25 | Tdk Corp | Manufacture of co amorphous magnetic film |
JPS63125665A (en) * | 1986-11-12 | 1988-05-28 | Nec Corp | Production of thin amorphous ta-w alloy film |
JPS63125663A (en) * | 1986-11-12 | 1988-05-28 | Nec Corp | Production of thin amorphous ta-w alloy film |
-
1987
- 1987-12-22 JP JP32454087A patent/JPH01165761A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4836828A (en) * | 1971-09-07 | 1973-05-31 | ||
JPS60152651A (en) * | 1984-01-20 | 1985-08-10 | Res Dev Corp Of Japan | Amorphous alloy containing nitrogen |
JPS6394611A (en) * | 1986-10-09 | 1988-04-25 | Tdk Corp | Manufacture of co amorphous magnetic film |
JPS63125665A (en) * | 1986-11-12 | 1988-05-28 | Nec Corp | Production of thin amorphous ta-w alloy film |
JPS63125663A (en) * | 1986-11-12 | 1988-05-28 | Nec Corp | Production of thin amorphous ta-w alloy film |
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