JPH0116556B2 - - Google Patents
Info
- Publication number
- JPH0116556B2 JPH0116556B2 JP60237404A JP23740485A JPH0116556B2 JP H0116556 B2 JPH0116556 B2 JP H0116556B2 JP 60237404 A JP60237404 A JP 60237404A JP 23740485 A JP23740485 A JP 23740485A JP H0116556 B2 JPH0116556 B2 JP H0116556B2
- Authority
- JP
- Japan
- Prior art keywords
- pure water
- ultrapure water
- primary pure
- octafluorocyclobutane
- piping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910021642 ultra pure water Inorganic materials 0.000 claims description 24
- 239000012498 ultrapure water Substances 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 239000004341 Octafluorocyclobutane Substances 0.000 claims description 11
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 claims description 11
- 235000019407 octafluorocyclobutane Nutrition 0.000 claims description 11
- 238000005342 ion exchange Methods 0.000 claims description 5
- 229920000915 polyvinyl chloride Polymers 0.000 claims description 5
- 239000004800 polyvinyl chloride Substances 0.000 claims description 5
- 238000000108 ultra-filtration Methods 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 claims description 4
- 244000005700 microbiome Species 0.000 claims description 4
- 230000001954 sterilising effect Effects 0.000 claims description 4
- 239000004014 plasticizer Substances 0.000 claims description 2
- 238000006116 polymerization reaction Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010828 elution Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000005416 organic matter Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 238000000026 X-ray photoelectron spectrum Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 235000015097 nutrients Nutrition 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Physical Water Treatments (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60237404A JPS6297686A (ja) | 1985-10-25 | 1985-10-25 | 超純水製造システム |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60237404A JPS6297686A (ja) | 1985-10-25 | 1985-10-25 | 超純水製造システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6297686A JPS6297686A (ja) | 1987-05-07 |
| JPH0116556B2 true JPH0116556B2 (cs) | 1989-03-24 |
Family
ID=17014886
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60237404A Granted JPS6297686A (ja) | 1985-10-25 | 1985-10-25 | 超純水製造システム |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6297686A (cs) |
-
1985
- 1985-10-25 JP JP60237404A patent/JPS6297686A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6297686A (ja) | 1987-05-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5207836A (en) | Cleaning process for removal of deposits from the susceptor of a chemical vapor deposition apparatus | |
| US4265276A (en) | Plastic tube having a crosslinked thin layer on the surface | |
| EP0671756A1 (en) | Plasma processing apparatus employing a textured focus ring | |
| US4380488A (en) | Process and gas mixture for etching aluminum | |
| EP0298204A2 (en) | Plasma etching with a large molecular mass inert gas | |
| US6397861B1 (en) | Situ plasma clean gas injection | |
| KR950000931A (ko) | 증착 처리시 물체가 수용기에 고착하는 것을 제한하는 방법 | |
| US3806365A (en) | Process for use in the manufacture of semiconductive devices | |
| US5240555A (en) | Method and apparatus for cleaning semiconductor etching machines | |
| JPH04329638A (ja) | 過フッ化炭化水素ポリマ膜を基板に接着する方法および 基板 | |
| EP0418592B1 (en) | Cleaning process for removal of deposits from the susceptor of a chemical vapor deposition apparatus | |
| TW430882B (en) | Plasma film forming method | |
| US4416725A (en) | Copper texturing process | |
| JPH0116556B2 (cs) | ||
| JP5122386B2 (ja) | 半導体用ケース | |
| JPH06220231A (ja) | フッ素樹脂の表面改質法 | |
| JP3644556B2 (ja) | 成膜装置 | |
| JP3327492B2 (ja) | 基体表面からの気相ゴミ除去装置及び除去方法並びにプロセス装置及びプロセスライン | |
| US6875708B2 (en) | Method of producing diamond film and diamond film produced thereby | |
| JPH0371194B2 (cs) | ||
| KR960702185A (ko) | 반도체 기판의 스트립핑, 불활성화 및 부식억제 방법(stripping, passivation and corrosion inhibition of semiconductor substrates) | |
| JPH01246115A (ja) | 炭素または炭素を主成分とする被膜を形成する方法 | |
| JPS58101429A (ja) | ドライエツチング方法 | |
| JPS6377585A (ja) | 超純水製造システム | |
| JPH0492423A (ja) | 半導体集積回路装置の製造方法 |