JPH01159588A - Box for heat treating furnace - Google Patents

Box for heat treating furnace

Info

Publication number
JPH01159588A
JPH01159588A JP62318207A JP31820787A JPH01159588A JP H01159588 A JPH01159588 A JP H01159588A JP 62318207 A JP62318207 A JP 62318207A JP 31820787 A JP31820787 A JP 31820787A JP H01159588 A JPH01159588 A JP H01159588A
Authority
JP
Japan
Prior art keywords
gas
pipe
box
heat treatment
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62318207A
Other languages
Japanese (ja)
Inventor
Akiyoshi Kawamura
明義 川村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP62318207A priority Critical patent/JPH01159588A/en
Publication of JPH01159588A publication Critical patent/JPH01159588A/en
Pending legal-status Critical Current

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  • Ceramic Capacitors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Furnace Charging Or Discharging (AREA)
  • Furnace Details (AREA)

Abstract

PURPOSE: To stabilize the quality of an article and save the amount of gas consumption by forming a gas spray hole in an atmospheric gas passage formed along and inner wall of a chamber, and connecting a gas introduction pipe protruding externally of the chamber. CONSTITUTION: A heat treatment chamber 1 is adapted such that an atmospheric gas passage pipe 3 is disposed in a pan shaped chamber member 2 of a heat insulating material, and a gas introduction pipe 4 is jointed with the pipe 3. A gas injection hole 5 is formed which is opened inwardly of the chamber member 2. The gas introduction pipe 4 penetrates the chamber member 2 from the outside of the chamber member 2 and is joined with the pipe 3. Gas introduced from the pipe 4 as indicated by an arrow is injected from the gas injection hole 5 after passage through the pipe 3. Hereby, since an article to be heat treated in the chamber makes contact with fresh atmospheric gas at all times, quality of an article is stabilized. Further, the amount of gas consumption is saved with short time replacement of the atmosphere in the chamber.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はセラミックチップコンデンサやセラミックチッ
プ抵抗等のセラミック電子部品に銀焼付や抵抗焼付を行
なう熱処理炉用圧に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a heat treatment furnace pressure for performing silver baking or resistance baking on ceramic electronic components such as ceramic chip capacitors and ceramic chip resistors.

(従来技術) 一般に、セラミックチップコンデンサやセラミックチッ
プ抵抗等のセラミック電子部品では、連続式もしくはバ
ッチ式の熱処理炉を用いて、銀電極や抵抗膜が焼き付け
られる。
(Prior Art) Generally, in ceramic electronic components such as ceramic chip capacitors and ceramic chip resistors, silver electrodes and resistive films are baked using a continuous or batch heat treatment furnace.

従来、銀電極や抵抗膜の焼付が行なわれるセラミック電
子部品は、板状の匣の上に載置もしくは箱形の匣内に収
容され、連続式もしくはバッチ式の熱処理炉中にて所定
の雰囲気の下で熱処理されていた。
Conventionally, ceramic electronic components on which silver electrodes and resistive films are baked are placed on a plate-shaped case or housed in a box-shaped case, and heated in a continuous or batch-type heat treatment furnace in a predetermined atmosphere. It was heat treated under

しかしながら、上記のように、板状の匣や箱形の匣を用
いて熱処理を行なう場合、 ・熱処理炉の内部をガスタイト構造にする必要がある、 ・雰囲気置換に時間がかかる、 ・雰囲気確保に大量のガスが必要、 ・被熱処理物が常に新鮮な雰囲気ガスに接触している保
証がない、 ・連続炉の場合、炉内を複数の雰囲気の異なる領域に分
割することが困難である、 といった問題があった。
However, as mentioned above, when performing heat treatment using a plate-shaped box or a box-shaped box, there are the following problems: - It is necessary to have a gas-tight structure inside the heat treatment furnace, - It takes time to replace the atmosphere, - It is difficult to secure the atmosphere. A large amount of gas is required; - There is no guarantee that the object to be heat treated is always in contact with fresh atmospheric gas; - In the case of a continuous furnace, it is difficult to divide the inside of the furnace into multiple areas with different atmospheres. There was a problem.

(発明の目的) 本発明の目的は、セラミックチップコンデンサやセラミ
ックチップ抵抗等のセラミック電子部品、に銀焼付や抵
抗焼付を行なうに際し、均一な熱処理が任意の雰囲気の
もとて効率よく行なうことができる熱処理炉用口を提供
することである。
(Objective of the Invention) The object of the present invention is to efficiently perform uniform heat treatment in any atmosphere when performing silver baking or resistance baking on ceramic electronic components such as ceramic chip capacitors and ceramic chip resistors. It is an object of the present invention to provide a heat treatment furnace opening that can be used.

(発明の構成) このため、本発明は、内部に被熱処理物を収容し、熱処
理炉内にて上記被熱処理物を熱処理する匣であって、上
記匣はその内周壁に沿って雰囲気ガス供給通路が形成さ
れており、この雰囲気ガス供給通路には上記匣内に雰囲
気ガスを噴出するガス噴出口が開設され、さらに上記雰
囲気ガス供給通路には匣の外方に突出するガス導入バイ
ブが接続されており、このガス導入パイプを通して熱処
理炉の外から上記匣の内部に雰囲気ガスが供給されるよ
うにしたことを特徴としている。
(Structure of the Invention) Therefore, the present invention provides a box that houses a heat-treated object therein and heat-treats the heat-treated object in a heat treatment furnace, wherein the box is supplied with an atmospheric gas along its inner circumferential wall. A passage is formed in the atmospheric gas supply passage, and a gas outlet for spouting atmospheric gas into the box is opened in the atmospheric gas supply passage, and a gas introduction vibrator protruding outward from the box is connected to the atmospheric gas supply passage. It is characterized in that atmospheric gas is supplied from outside the heat treatment furnace to the inside of the box through this gas introduction pipe.

上記匣の内部に収容された被熱処理物には、熱処理炉の
外部から、上記ガス導入パイプを通してガス噴出口より
任意の雰囲気ガスが任意の時間供°給される。
An arbitrary atmospheric gas is supplied from the outside of the heat treatment furnace to the object to be heat treated housed inside the box from the gas outlet through the gas introduction pipe for an arbitrary period of time.

(発明の効果) 本発明によれば、匣内部には、常に、新鮮な雰囲気ガス
が供給されるので、被熱処理物は絶えず新鮮な雰囲気ガ
スに接し、製品の品質が安定する一方、匣内の雰囲気置
換が短時間で完了し、雰囲気ガスの消費量が削減され、
しかも温度域毎に雰囲気ガスの切換が容易に行なえる。
(Effects of the Invention) According to the present invention, since fresh atmospheric gas is always supplied inside the box, the object to be heat treated is constantly in contact with the fresh atmospheric gas, and the quality of the product is stabilized. Atmosphere replacement is completed in a short time, reducing the consumption of atmospheric gas,
Moreover, the atmospheric gas can be easily changed for each temperature range.

(実施例) 以下、添付の図面を参照して本発明の詳細な説明する。(Example) Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

本発明に係る熱処理炉用口の一実施例の斜視図を第1図
に示す。
A perspective view of an embodiment of the heat treatment furnace port according to the present invention is shown in FIG.

上記熱処理用匣1は、耐熱性を有するセラミック材料、
金属材料からなる四角形の皿状の圧部材2の内部に横断
面が円形の耐熱性を有する雰囲気ガス供給通路としての
パイプ3を配置し、このパイプ3にガス導入パイプ4を
接合したものである。
The heat treatment box 1 is made of a heat-resistant ceramic material,
A pipe 3 having a circular cross section and serving as a heat-resistant atmospheric gas supply passage is arranged inside a rectangular dish-shaped pressure member 2 made of a metal material, and a gas introduction pipe 4 is connected to this pipe 3. .

上記パイプ3は圧部材2の内部寸法に合致するように形
成される。そして、上記パイプ3には、圧部材2の内方
に向かって開口するガス噴出口5が所定のピッチで形成
されている。上記ガス導入パイプ4は圧部材2の外方か
らこの圧部材2を貫通してパイプ3に接合される。
The pipe 3 is formed to match the internal dimensions of the pressure member 2. In the pipe 3, gas jet ports 5 that open toward the inside of the pressure member 2 are formed at a predetermined pitch. The gas introduction pipe 4 passes through the pressure member 2 from outside the pressure member 2 and is joined to the pipe 3.

上記ガス導入パイプ4の一端より、矢印Alで示すよう
に、上記ガス導入パイプ4に導入されたガスは、置部材
2内のパイプ3を通り、このパイプ3に形成されたガス
噴出口5より、矢印A、で示すように、置部材2内に噴
出する。
The gas introduced into the gas introduction pipe 4 from one end of the gas introduction pipe 4 passes through the pipe 3 in the mounting member 2 and from the gas outlet 5 formed in this pipe 3, as shown by the arrow Al. , as shown by arrow A, is ejected into the mounting member 2.

第1図の熱処理炉用口Iの使用例を第2図ないし第4図
に示す。
Examples of the use of the heat treatment furnace port I shown in FIG. 1 are shown in FIGS. 2 to 4.

第2図および第3図に示す使用例は、連続式熱処理炉に
おける使用例を示すもので、トンネル状の連続式熱処理
炉の炉体6内を矢印A、で示す向きに一方向に搬送され
る耐熱性材料よりなるコンベアベルト7上に、被熱処理
物(図示せず。)を収容した熱処理炉用口lが載置され
る。熱処理炉用口1はコンベアベルト上に一段もしくは
曳数段、積み重ねられるとともに、各熱処理炉用口lの
ガス導入パイプ4は、連続式熱処理炉の炉体6にその内
部を走るコンベアベルト7に沿って設けられた窓8から
、上記炉体6の外に突出する。
The example of use shown in FIGS. 2 and 3 shows an example of use in a continuous heat treatment furnace. On a conveyor belt 7 made of a heat-resistant material, a heat treatment furnace opening l containing an object to be heat treated (not shown) is placed. The heat treatment furnace ports 1 are stacked in one or several stages on a conveyor belt, and the gas introduction pipe 4 of each heat treatment furnace port 1 is connected to the conveyor belt 7 running inside the furnace body 6 of the continuous heat treatment furnace. It projects out of the furnace body 6 through a window 8 provided along it.

ガス導入パイプ4の連続式熱処理炉の炉体6の上記窓8
からの各突出端には、第3図に示すように、エアーカッ
プラ9の一端が結合される。各エアーカップラ9の他端
にはまた、ガス供給カップラ14が接続される。このガ
ス供給カップラ14は、ロータリジョンイト11の廻り
に矢印A4で示す向きに移動するロークリ式ガス供給装
置12のガス供給バイブ13の先端に取り付けられる。
The above-mentioned window 8 of the furnace body 6 of the continuous heat treatment furnace of the gas introduction pipe 4
As shown in FIG. 3, one end of an air coupler 9 is coupled to each protruding end of the air coupler 9. As shown in FIG. A gas supply coupler 14 is also connected to the other end of each air coupler 9 . This gas supply coupler 14 is attached to the tip of the gas supply vibrator 13 of the rotary type gas supply device 12 that moves around the rotary joint 11 in the direction shown by arrow A4.

上記ロータリ式ガス供給装置12は、熱処理炉用口1が
矢印A3で示す向きに連続的に移動するに伴って、その
ガス供給パイプ13が矢印A4で示す向きに移動し、各
熱処理炉用匣l内に、そのガス導入パイプ4からパイプ
3を通して、ガスを供給する。これにより、上記各熱処
理炉用匣!内に収容されている被熱処理物には、常に、
新鮮な雰囲気ガスが接するとともに、上記各熱処理炉用
匣l内のガス雰囲気の均一性が増す。また、ロークリ式
ガス供給装置12により、連続式熱処理炉の炉体6内の
温度域毎に雰囲気ガスの切換を行なうことも容易になる
In the rotary gas supply device 12, as the heat treatment furnace port 1 continuously moves in the direction shown by the arrow A3, the gas supply pipe 13 moves in the direction shown by the arrow A4, and the gas supply pipe 13 moves in the direction shown by the arrow A4. Gas is supplied from the gas introduction pipe 4 through the pipe 3 into the tank. As a result, each of the above heat treatment furnace boxes! The heat-treated objects housed in the
As fresh atmospheric gas comes into contact with the heat treatment furnace, the uniformity of the gas atmosphere inside each of the heat treatment furnace boxes increases. Furthermore, the low-pressure type gas supply device 12 makes it easy to switch the atmospheric gas for each temperature range within the furnace body 6 of the continuous heat treatment furnace.

第4図に示す使用例は、バッチ式熱処理炉における使用
例を示すものである。このバッチ式熱処理炉では、ベー
ス16上に炉体17が固定され、この炉体I7の炉床1
7a上にスペーサ18aを介して配置された合板18上
に、第1図の熱処理炉用匣lが複数段、積み重ねられる
。そして、各熱処理炉用匣Iのガス導入パイプ4は上記
炉体17に設けられた窓19より、上記炉体17の外に
突出する。各熱処理炉用匣lのガス導入バイブ4の炉体
17からの突出部分には、ガス供給装置21が接続され
る。これにより、上記各熱処理炉用匣i内にはガス供給
装置21より雰囲気ガスが供給され、所定の昇温パター
ンに従い、上記各熱処理炉用匣1内の被熱処理物を熱処
理することができる。
The example of use shown in FIG. 4 shows an example of use in a batch type heat treatment furnace. In this batch type heat treatment furnace, a furnace body 17 is fixed on a base 16, and a hearth 1 of this furnace body I7.
The heat treatment furnace boxes 1 shown in FIG. 1 are stacked in multiple stages on the plywood 18 placed on the plywood 7a via the spacer 18a. The gas introduction pipe 4 of each heat treatment furnace box I projects out of the furnace body 17 through a window 19 provided in the furnace body 17. A gas supply device 21 is connected to a protruding portion of the gas introduction vibe 4 of each heat treatment furnace box 1 from the furnace body 17. Thereby, atmospheric gas is supplied from the gas supply device 21 into each of the heat treatment furnace boxes i, and the objects to be heat treated in each of the heat treatment furnace boxes 1 can be heat treated according to a predetermined temperature increase pattern.

なお、第1図の実施例において、熱処理炉用匣lのバイ
ブ3は横断面形状が四角形状であってもよい。また、具
体的には図示しないが、熱処理炉用匣はバイブ3を四角
形の枠形状に形成し、この枠形状に合致するように形成
されたペイプ3を覆うように四角形状の耐熱性を有する
底板を上記バイブ3に接合する一方、上記バイブ3にガ
ス導入パイプ4を接合した構造を有していてもよい。
In the embodiment shown in FIG. 1, the vibrator 3 of the heat treatment furnace box 1 may have a rectangular cross-sectional shape. Further, although not specifically shown, the heat treatment furnace box has a vibrator 3 formed in a rectangular frame shape, and has a rectangular heat resistant shape so as to cover the tape 3 formed to match the frame shape. It may have a structure in which the bottom plate is joined to the vibrator 3 and the gas introduction pipe 4 is joined to the vibrator 3.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る熱処理炉用匣の一実施例の斜視図
、 第2°図および第3図は夫々第1図の熱処理炉用匣の連
続式焼成炉での使用例の説明図、第4図は第1図の熱処
理炉用匣のバッチ式焼成炉での使用例の説明図である。 ■・・・熱処理炉用匣、  2・・・匣部材、3・・・
バイブ、   4・・・ガス導入パイプ、5・・・ガス
噴出口。 特許出願人 株式会社 村田製作所
FIG. 1 is a perspective view of an embodiment of the heat treatment furnace casing according to the present invention, and FIGS. 2 and 3 are explanatory views of an example of use of the heat treatment furnace casing of FIG. 1 in a continuous firing furnace, respectively. , FIG. 4 is an explanatory diagram of an example of use of the heat treatment furnace box of FIG. 1 in a batch type firing furnace. ■... Box for heat treatment furnace, 2... Box member, 3...
Vibrator, 4... Gas introduction pipe, 5... Gas spout. Patent applicant Murata Manufacturing Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] (1)内部に被熱処理物を収容し、熱処理炉内にて上記
被熱処理物を熱処理する匣であって、上記匣はその内周
壁に沿って雰囲気ガス供給通路が形成されており、この
雰囲気ガス供給通路には上記匣内に雰囲気ガスを噴出す
るガス噴出口が開設され、さらに上記雰囲気ガス供給通
路には匣の外方に突出するガス導入パイプが接続されて
おり、このガス導入パイプを通して熱処理炉の外から上
記匣の内部に雰囲気ガスが供給されるようにしたことを
特徴とする熱処理炉用匣。
(1) A box that houses an object to be heat treated inside and heat-treats the object to be heat treated in a heat treatment furnace, wherein the box has an atmospheric gas supply passage formed along its inner circumferential wall, and the box has an atmosphere gas supply passage formed along its inner circumferential wall. A gas outlet for spouting atmospheric gas into the box is provided in the gas supply passage, and a gas introduction pipe protruding outward from the box is connected to the atmospheric gas supply passage. A box for a heat treatment furnace, characterized in that atmospheric gas is supplied into the box from outside the heat treatment furnace.
JP62318207A 1987-12-14 1987-12-14 Box for heat treating furnace Pending JPH01159588A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62318207A JPH01159588A (en) 1987-12-14 1987-12-14 Box for heat treating furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62318207A JPH01159588A (en) 1987-12-14 1987-12-14 Box for heat treating furnace

Publications (1)

Publication Number Publication Date
JPH01159588A true JPH01159588A (en) 1989-06-22

Family

ID=18096630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62318207A Pending JPH01159588A (en) 1987-12-14 1987-12-14 Box for heat treating furnace

Country Status (1)

Country Link
JP (1) JPH01159588A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015031487A (en) * 2013-08-06 2015-02-16 Jfeスチール株式会社 Atmosphere heat treatment furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015031487A (en) * 2013-08-06 2015-02-16 Jfeスチール株式会社 Atmosphere heat treatment furnace

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