JPH01158942U - - Google Patents

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Publication number
JPH01158942U
JPH01158942U JP3564689U JP3564689U JPH01158942U JP H01158942 U JPH01158942 U JP H01158942U JP 3564689 U JP3564689 U JP 3564689U JP 3564689 U JP3564689 U JP 3564689U JP H01158942 U JPH01158942 U JP H01158942U
Authority
JP
Japan
Prior art keywords
inert gas
treatment chamber
gas
surface treatment
supply pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3564689U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3564689U priority Critical patent/JPH01158942U/ja
Publication of JPH01158942U publication Critical patent/JPH01158942U/ja
Pending legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の装置の原理を説明する図、
第2図はこの考案の装置を具体的に示す正面図、
第3図は同平面図である。 1……放電洗浄室(表面処理室)、10……ヘ
リウムガス供給装置(不活性ガス供給装置)、1
8……供給管、19……不活性ガスボンベ、20
……トラツプ、S……試料。
Figure 1 is a diagram explaining the principle of the device of this invention.
Figure 2 is a front view specifically showing the device of this invention;
FIG. 3 is a plan view of the same. 1... Discharge cleaning chamber (surface treatment chamber), 10... Helium gas supply device (inert gas supply device), 1
8... Supply pipe, 19... Inert gas cylinder, 20
...Trap, S...sample.

Claims (1)

【実用新案登録請求の範囲】 内部を高真空状態とするとともに不活性ガスを
導入し、試料の表面から表面ガスを除去する処理
を施す表面処理室を備えたアルミニウム材中のガ
ス分折装置であつて、 表面処理室に不活性ガス供給装置が設けられ、
不活性ガス供給装置が、供給管を介して表面処理
室に接続された不活性ガスボンベと、供給管の途
中に設けられ、かつ不活性ガスに含まれている不
純物を除去するトラツプとよりなるアルミニウム
材中のガス分析装置。
[Scope of Claim for Utility Model Registration] A gas spectrometer in aluminum material equipped with a surface treatment chamber that creates a high vacuum inside and introduces an inert gas to remove surface gas from the surface of the sample. An inert gas supply device is installed in the surface treatment chamber,
The inert gas supply device consists of an inert gas cylinder connected to the surface treatment chamber via a supply pipe, and a trap installed in the middle of the supply pipe to remove impurities contained in the inert gas. Gas analysis device in wood.
JP3564689U 1989-03-28 1989-03-28 Pending JPH01158942U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3564689U JPH01158942U (en) 1989-03-28 1989-03-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3564689U JPH01158942U (en) 1989-03-28 1989-03-28

Publications (1)

Publication Number Publication Date
JPH01158942U true JPH01158942U (en) 1989-11-02

Family

ID=31262290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3564689U Pending JPH01158942U (en) 1989-03-28 1989-03-28

Country Status (1)

Country Link
JP (1) JPH01158942U (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59183368A (en) * 1983-04-01 1984-10-18 Sumitomo Metal Ind Ltd Analysis of gas in metal
JPS60122741A (en) * 1983-12-08 1985-07-01 Hitachi Cable Ltd Manufacture of parent material for optical fiber

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59183368A (en) * 1983-04-01 1984-10-18 Sumitomo Metal Ind Ltd Analysis of gas in metal
JPS60122741A (en) * 1983-12-08 1985-07-01 Hitachi Cable Ltd Manufacture of parent material for optical fiber

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