JPH01155651U - - Google Patents

Description

[Brief explanation of the drawing]

Fig. 1 is a schematic block diagram showing the configuration of an embodiment of this invention, Fig. 2 is a flowchart showing the operation of the injection condition setting device, and Fig. 3 is a schematic diagram showing the angle change of the platen for each injection step. , FIG. 4 is a schematic diagram showing the configuration of a conventional example, FIG. 5 is a schematic diagram showing changes in the angle of the platen, and FIGS. 6 and 7 are sectional views of a sample into which ions are to be implanted. 1...Current integrator, 2...End station controller, 3...Injection condition setting device.

Claims (1)

[Scope of utility model registration request] A current integrator that measures the dose to the sample and generates an injection completion signal when the dose reaches the set dose value, and changes the angle of the platen for holding the sample in the end station to match the set platen angle. an end station controller to perform the injection process, an injection condition input section for inputting injection conditions defining the relationship between the dose amount setting value and the platen angle setting value in each of a plurality of injection steps to be executed sequentially for one sample; an implantation condition storage section that stores the implantation conditions inputted by the implantation condition input section; and a dose amount set value and a platen angle set value for the next implantation step are read from the implantation condition storage section at the initial stage and when the implantation completion signal is generated. an implantation condition setter having an implantation condition setting section that sets a dose amount setting value for the next implantation step for the current integrator and a platen angle setting value for the next implantation step for the end station controller; An ion implanter equipped with