JPH01160651U - - Google Patents

Info

Publication number
JPH01160651U
JPH01160651U JP5823088U JP5823088U JPH01160651U JP H01160651 U JPH01160651 U JP H01160651U JP 5823088 U JP5823088 U JP 5823088U JP 5823088 U JP5823088 U JP 5823088U JP H01160651 U JPH01160651 U JP H01160651U
Authority
JP
Japan
Prior art keywords
voltage
lens
amplifier
setting device
threshold voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5823088U
Other languages
Japanese (ja)
Other versions
JPH076610Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5823088U priority Critical patent/JPH076610Y2/en
Publication of JPH01160651U publication Critical patent/JPH01160651U/ja
Application granted granted Critical
Publication of JPH076610Y2 publication Critical patent/JPH076610Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の一実施例の構成を示すブロ
ツク図、第2図は従来のイオン注入装置の構成を
示す概略平面図である。 1……電圧設定器、2,3……増幅器、4……
Qレンズ電極、5,6……比較器、8……ビーム
コントローラ。
FIG. 1 is a block diagram showing the structure of an embodiment of this invention, and FIG. 2 is a schematic plan view showing the structure of a conventional ion implantation apparatus. 1... Voltage setting device, 2, 3... Amplifier, 4...
Q lens electrode, 5, 6... comparator, 8... beam controller.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] イオンビームを収束するためのQレンズ電極と
、このQレンズ電極に印加するQレンズ電圧を設
定する電圧設定器と、この電圧設定器からの設定
電圧を増幅して前記Qレンズ電極に印加する増幅
器と、前記電圧設定器の設定電圧に連動して変化
する上側閾値電圧と下側閾値電圧と前記増幅器の
出力電圧とを常時比較し、前記増幅器の出力電圧
が前記上側閾値電圧および下側閾値電圧の範囲か
ら外れた時にQレンズ電圧異常検出信号を発生す
る比較器と、この比較器からのQレンズ電圧異常
検出信号の入力に応答してイオン注入対象物への
イオンビームの照射を停止させるビームコントロ
ーラとを備えたイオン注入装置。
A Q lens electrode for converging the ion beam, a voltage setting device for setting the Q lens voltage applied to the Q lens electrode, and an amplifier for amplifying the set voltage from the voltage setting device and applying it to the Q lens electrode. The output voltage of the amplifier is constantly compared with the upper threshold voltage and the lower threshold voltage that change in conjunction with the set voltage of the voltage setting device, and the output voltage of the amplifier is set to the upper threshold voltage and the lower threshold voltage. A comparator that generates a Q lens voltage abnormality detection signal when the voltage is out of the range of An ion implanter equipped with a controller.
JP5823088U 1988-04-27 1988-04-27 Ion implanter Expired - Lifetime JPH076610Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5823088U JPH076610Y2 (en) 1988-04-27 1988-04-27 Ion implanter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5823088U JPH076610Y2 (en) 1988-04-27 1988-04-27 Ion implanter

Publications (2)

Publication Number Publication Date
JPH01160651U true JPH01160651U (en) 1989-11-08
JPH076610Y2 JPH076610Y2 (en) 1995-02-15

Family

ID=31284054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5823088U Expired - Lifetime JPH076610Y2 (en) 1988-04-27 1988-04-27 Ion implanter

Country Status (1)

Country Link
JP (1) JPH076610Y2 (en)

Also Published As

Publication number Publication date
JPH076610Y2 (en) 1995-02-15

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