JPH01133210A - Production for magnetic head - Google Patents
Production for magnetic headInfo
- Publication number
- JPH01133210A JPH01133210A JP28938287A JP28938287A JPH01133210A JP H01133210 A JPH01133210 A JP H01133210A JP 28938287 A JP28938287 A JP 28938287A JP 28938287 A JP28938287 A JP 28938287A JP H01133210 A JPH01133210 A JP H01133210A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- layer
- track width
- magnetic head
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 230000035699 permeability Effects 0.000 claims abstract description 8
- 238000007772 electroless plating Methods 0.000 claims abstract description 7
- 238000009713 electroplating Methods 0.000 claims abstract description 7
- 230000001105 regulatory effect Effects 0.000 claims description 14
- 238000005240 physical vapour deposition Methods 0.000 claims description 9
- 239000000696 magnetic material Substances 0.000 claims description 4
- 238000003754 machining Methods 0.000 claims description 3
- 238000005304 joining Methods 0.000 claims 1
- 230000013011 mating Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 abstract description 11
- 238000004804 winding Methods 0.000 abstract description 8
- 230000004907 flux Effects 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 230000003014 reinforcing effect Effects 0.000 abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000005289 physical deposition Methods 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 16
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910000676 Si alloy Inorganic materials 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- -1 benzium Chemical compound 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/147—Structure or manufacture of heads, e.g. inductive with cores being composed of metal sheets, i.e. laminated cores with cores composed of isolated magnetic layers, e.g. sheets
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
- G11B5/21—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features the pole pieces being of ferrous sheet metal or other magnetic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁気ヘッドの製造方法に関するものである。[Detailed description of the invention] [Industrial application field] The present invention relates to a method of manufacturing a magnetic head.
高密度磁気記録用の磁気ヘッドとして、本発明者らは先
に第１図に示すような磁気ヘッドを提案した。図中のｌ
ａ、ｌｂは非磁性基板、２ａ。The present inventors previously proposed a magnetic head as shown in FIG. 1 as a magnetic head for high-density magnetic recording. l in the diagram
a, lb are non-magnetic substrates, 2a;
２ｂは高透磁率磁性材料から成る磁性層、３は接合用ガ
ラス、４はへウドギャップ、５は巻線窓である。2b is a magnetic layer made of a high permeability magnetic material, 3 is a bonding glass, 4 is a head gap, and 5 is a winding window.
以下、第２図及び第３図で、この磁気ヘッドの製造方法
を説明する。まず、コア半体１ａ、ｌｂを構成する非磁
性フェライトブロック１０片面に、接近してトラック幅
規制溝６を平行に設け、この溝６間に突状７が形成され
る（第２図参照）。なお、コア半体の内の少なくとも一
つには、第３図に示すように突状７と直交する方向にコ
イル溝８が所定の深さの切削によって形成される。次に
この溝６や突状７を形成した側の表面に、蒸着やスパッ
タ法等の薄膜製造技術をもって、高飽和磁束密度を有す
る高透磁率磁性材料より成る磁性層２を一様に形成する
。次いで、磁性薄膜２の上に接合用のガラス３を比較的
厚めに設けた後に、−点鎖線の位置まで研磨する。この
状態を示したのが、第４図及び第５図であり、突状７の
尖端部上にある磁性薄膜２の一部がフラットに研磨され
て平坦部９を形成している。次いで２つのコア半体を、
第６図に示すように、接合用ガラスが互いに対向するよ
うにしてラスボンディングで一体に接合する。そして点
線に沿ってスライスすることにより、第１図に示した磁
気ヘッドが得られる。A method of manufacturing this magnetic head will be described below with reference to FIGS. 2 and 3. First, on one side of the non-magnetic ferrite block 10 constituting the core halves 1a and lb, track width regulating grooves 6 are provided in parallel in close proximity, and protrusions 7 are formed between the grooves 6 (see Fig. 2). . Incidentally, in at least one of the core halves, a coil groove 8 is formed by cutting to a predetermined depth in a direction perpendicular to the protrusion 7, as shown in FIG. Next, on the surface on which the grooves 6 and protrusions 7 are formed, a magnetic layer 2 made of a high magnetic permeability magnetic material having a high saturation magnetic flux density is uniformly formed using a thin film manufacturing technique such as vapor deposition or sputtering. . Next, after a relatively thick bonding glass 3 is provided on the magnetic thin film 2, it is polished to the position indicated by the dashed line. This state is shown in FIGS. 4 and 5, where a portion of the magnetic thin film 2 on the tip of the protrusion 7 is polished flat to form a flat portion 9. Then the two core halves are
As shown in FIG. 6, the bonding glasses are joined together by lath bonding so as to face each other. By slicing along the dotted lines, the magnetic head shown in FIG. 1 is obtained.
ところが上記のような磁気ヘッドに於いては、磁気抵抗
を減少させる為にトラック幅規制溝の深さを深くした場
合、幅と深さの関係によっては、物理蒸着法で磁性膜を
形成すると、第７図に示すようにトラック幅規制溝の開
口部付近に優先的に磁性膜が形成される為に規制溝内部
に膜が形成されない。また、規制溝の底部と側面では入
射角度が大きく異なる為に膜組成が異なると云った、磁
気ヘッドとしての機能を失わせるような重大な問題を生
じる場合があった。However, in the above-mentioned magnetic head, when the depth of the track width regulating groove is increased to reduce magnetic resistance, depending on the relationship between width and depth, if the magnetic film is formed by physical vapor deposition, As shown in FIG. 7, since the magnetic film is preferentially formed near the opening of the track width regulating groove, no film is formed inside the regulating groove. In addition, since the incident angle is greatly different between the bottom and side surfaces of the regulating groove, a serious problem may arise in which the film composition is different, which may cause the magnetic head to lose its function.
本発明は上記磁気ヘッドが持っている、トラック幅規制
溝内の不完全な成膜といった問題を解消し、優れた特性
の磁気ヘッドの製造方法を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to solve the problem of incomplete film formation within the track width regulating groove, which the magnetic head has, and to provide a method for manufacturing a magnetic head with excellent characteristics.
以上のような問題を解決するために、本発明は無電解め
っき法や電解めっき法により、トラック幅規制溝内に磁
性層を形成し、次いで物理蒸着法で磁性層を形成するこ
とで、上記問題を解決したものである。In order to solve the above problems, the present invention forms a magnetic layer in the track width regulating groove by electroless plating method or electrolytic plating method, and then forms the magnetic layer by physical vapor deposition method. It is a problem solved.
つまり、狭くて深い溝の内部に物理蒸着法により磁性膜
を成膜することは困難な為、成膜が容易な無電解めっき
法や電解めっき法で成膜する。だが、これらのめつき法
で成膜できる軟磁性膜は種類が限られ、またその磁性特
性や耐摩耗性も、物理蒸着法で形成されるものに比べて
、劣る場合が多い。Ｑかしながら、磁気ヘッドの磁気特
性には、磁気ギャップ近傍の磁性膜が大きく影響するの
で、その部分だけでも優れた特性の磁性層を形成すれば
、磁気ヘッドとしては十分な性能をもつことができると
考えられる。そこで、−旦めっき法により溝内部に不十
分な特性ながらも、めっき法により磁性層を形成する。That is, since it is difficult to form a magnetic film inside a narrow and deep groove by physical vapor deposition, the film is formed by electroless plating or electrolytic plating, which are easy to form. However, the types of soft magnetic films that can be formed by these plating methods are limited, and their magnetic properties and wear resistance are often inferior to those formed by physical vapor deposition. QHowever, the magnetic properties of a magnetic head are greatly influenced by the magnetic film near the magnetic gap, so if a magnetic layer with excellent properties is formed in that area alone, the magnetic head will have sufficient performance. It is thought that it can be done. Therefore, a magnetic layer is formed inside the groove by a plating method, although the characteristics are insufficient.
その後、機械加工により、磁気ギャップ近傍の磁性層を
取り除き、そこに物理蒸着法により、磁気特性及び耐摩
耗性に優れた磁性層を形成し、よって磁気特性及び耐摺
動性に優れた磁気ヘッドを作製することを可能とした。After that, the magnetic layer near the magnetic gap is removed by machining, and a magnetic layer with excellent magnetic properties and wear resistance is formed thereon by physical vapor deposition, resulting in a magnetic head with excellent magnetic properties and abrasion resistance. This made it possible to create .
以下に、本発明の実施例を図を用いて説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第８図は本発明による磁気ヘッドの一実施例を示す斜視
図で、ｌｌａ、ｌｌｂは非磁性コア基体、１２ａ、１２
ｂはめつき法による磁性層、１３ａ。FIG. 8 is a perspective view showing an embodiment of the magnetic head according to the present invention, where lla and llb are nonmagnetic core substrates, 12a, 12
b Magnetic layer 13a formed by a plating method.
１３ｂは物理蒸着法による磁性膜、１４ａ、１４ｂは接
合用ガラス、１５は保護膜、１６はヘッドギャップ、１
７は巻線窓、１８は磁気記録媒体摺動面である。13b is a magnetic film made by physical vapor deposition, 14a and 14b are bonding glasses, 15 is a protective film, 16 is a head gap, 1
7 is a winding window, and 18 is a magnetic recording medium sliding surface.
次にこの実施例の製造方法を第９図ないし第１３図で説
明する。まず第９図に於いて、非磁性基板１１ａにトラ
ック幅（１０〜２００μｍ）に相当する幅の溝１９を等
間隔に加工する。なお、この溝１９の底面を７字状とす
ることで、非磁性基体１１ａと磁性Ｎｌ２ａの境界が疑
似ギャップとなることを防止している。次に溝１９に垂
直に巻線溝２０と補強溝２１を、溝１９より充分深く形
成する。この巻線溝２０は第８図の巻線窓１７の為であ
り、補強溝２１はリア部にガラス１４ｂを設ける為であ
る。Next, the manufacturing method of this embodiment will be explained with reference to FIGS. 9 to 13. First, in FIG. 9, grooves 19 having a width corresponding to the track width (10 to 200 μm) are formed at equal intervals in the nonmagnetic substrate 11a. Note that by forming the bottom surface of this groove 19 in a 7-shape, the boundary between the nonmagnetic base 11a and the magnetic Nl2a is prevented from forming a pseudo gap. Next, a winding groove 20 and a reinforcing groove 21 are formed perpendicularly to the groove 19 to be sufficiently deeper than the groove 19. This winding groove 20 is for the winding window 17 shown in FIG. 8, and the reinforcing groove 21 is for providing the glass 14b in the rear part.
次にこのように加工された非磁性基体１１ａの表面に、
第１０図に示すように無電解めっき法または電解めっき
法で高飽和磁束密度高透磁率の磁性層１２ａを溝１９の
深さ程度の厚さに形成し、点線の位置まで研磨する。Next, on the surface of the non-magnetic substrate 11a processed in this way,
As shown in FIG. 10, a magnetic layer 12a having a high saturation magnetic flux density and high permeability is formed by electroless plating or electrolytic plating to a thickness approximately equal to the depth of the groove 19, and polished to the position indicated by the dotted line.
次に第１１図に示すように、機械加工によりトラック幅
とほぼ同じかそれよりも小さい深さまで磁性層１２ａを
一部研削する。Next, as shown in FIG. 11, a portion of the magnetic layer 12a is ground by machining to a depth that is approximately equal to or smaller than the track width.
こうして得られた溝の中に、第１２図に示すように、ス
パッタ法により高飽和磁束密度高透磁率磁性層より成る
磁性膜１３ａを、そしてスパッタ法により５ｉＯｚ、Ｃ
ｒの順に成膜し保護膜１５を形成し、接合用ガラス１４
を充填し、その後、点線の位置までガラスを削り取る。As shown in FIG. 12, a magnetic film 13a consisting of a high saturation magnetic flux density and high permeability magnetic layer is placed in the groove thus obtained by sputtering, and 5iOz, C is deposited by sputtering.
A protective film 15 is formed by forming films in the order of r, and a bonding glass 14 is formed.
, and then scrape the glass down to the dotted line.
これによって片方の磁気へラドコア半体が得られる。This yields one magnetic Radcore half.
次にもう片方の磁気へラドコア半体の製造法であるが、
これは第９図の巻線溝２０及び補強溝２１が形成されな
い以外は、前記磁気ヘッドコア半体の製造法と同じであ
る。Next is the manufacturing method for the other half of the magnetic rad core.
This is the same method of manufacturing the magnetic head core half as shown in FIG. 9, except that the winding grooves 20 and reinforcing grooves 21 are not formed.
最後にこのようにして得られた各々のコア半体を第１３
図に示すように、所定の厚さのギャップ材を介して重ね
合わせて熱圧着することでコア半体は接合される。そし
て点線で切断することで第８図に示した磁気ヘッドが得
られる。Finally, each core half obtained in this way was
As shown in the figure, the core halves are joined by overlapping and thermocompression bonding with a gap material of a predetermined thickness interposed therebetween. Then, by cutting along the dotted lines, the magnetic head shown in FIG. 8 is obtained.
なお、非磁性基体１１ａ、Ｉｌｂに用いる材料としては
ジルコニア、チタニア、酸化マンガン、アルミナ、結晶
化ガラス等の酸化物もしくは酸化物を主成分とする材料
。磁性層１２ａ、２ｂにはパーマロイ及びＣｏ−Ｎ１−
Ｐ、 Ｃｏ−Ｐ等のＣ。The material used for the nonmagnetic substrates 11a and Ilb is an oxide or a material containing an oxide as a main component, such as zirconia, titania, manganese oxide, alumina, or crystallized glass. The magnetic layers 12a and 2b are made of permalloy and Co-N1-.
P, C such as Co-P.
−Ｐ係合金。磁性層１３ａ、１３ｂには、非晶質合金と
しては、鉄、ニッケル、コバルトのグループから選択さ
れた一種以上の元素と、リン、炭素、はう素、ケイ素の
グループから選択された一種以上の元素とから成る合金
、またはこれを主成分としてアルミニウム、ゲルマニウ
ム、べＩＪ ＩＪウム、スズ、モリブデン、インジュウ
ム、タングステン、チタン、マンガン、クロム、ジルコ
ニウム、ハフニウム、ニオブ等の元素を添加した合金、
あるいはコバルト、ジルコニウムを主成分として、前述
の添加元素を含んだ合金等がある。また、結晶質合金と
しては、鉄−アルミニウム−ケイ素合金、鉄−ケイ素系
合金並びに鉄−ニッケル合金等がある。さらに、保護膜
１５として用いられる材料には金属Ｃｒとジルコニア、
チタニア、アルミナ、二酸化ケイ素、−酸化ケイ素等が
ある。- P-related alloy. The magnetic layers 13a and 13b contain, as the amorphous alloy, one or more elements selected from the group of iron, nickel, and cobalt, and one or more elements selected from the group of phosphorus, carbon, boron, and silicon. alloys consisting of these elements as main components, or alloys to which elements such as aluminum, germanium, benzium, tin, molybdenum, indium, tungsten, titanium, manganese, chromium, zirconium, hafnium, and niobium are added;
Alternatively, there are alloys containing cobalt and zirconium as main components and the above-mentioned additional elements. Examples of crystalline alloys include iron-aluminum-silicon alloys, iron-silicon alloys, and iron-nickel alloys. Furthermore, the materials used for the protective film 15 include metal Cr, zirconia,
Examples include titania, alumina, silicon dioxide, -silicon oxide, etc.
以上説明したように、本発明によれば、磁性層をめっき
法で形成した後に物理蒸着法で形成した為に、トラック
幅規制溝の内部の成膜が完全になり、よって磁性特性に
優れた磁気ヘッドを提供することができた。As explained above, according to the present invention, since the magnetic layer is formed by the plating method and then by the physical vapor deposition method, the film is completely formed inside the track width regulating groove, and therefore has excellent magnetic properties. We were able to provide magnetic heads.
第１図は従来の磁気ヘッドの斜視図、第２図ないし第６
図は従来の磁気ヘッドの製造方法を説明するための図、
第７図は従来の製造方法の問題点を説明するための図、
第８図は本発明の実施例に係る磁気ヘッドの斜視図、第
９図ないし第１３図はその磁気ヘッドの製造方法を説明
するための図である。
１１ａ、１１ｂ・・・・・・非磁性基体、１２ａ。
１３ａ・・・・・・磁性層、１４・・・・・・接合用ガ
ラス、１９第３図
第４図
第５図
第７図
第８図
第９図FIG. 1 is a perspective view of a conventional magnetic head, and FIGS.
The figure is a diagram for explaining the conventional method of manufacturing a magnetic head.
Figure 7 is a diagram for explaining the problems of the conventional manufacturing method.
FIG. 8 is a perspective view of a magnetic head according to an embodiment of the present invention, and FIGS. 9 to 13 are diagrams for explaining a method of manufacturing the magnetic head. 11a, 11b...Nonmagnetic substrate, 12a. 13a... Magnetic layer, 14... Bonding glass, 19 Fig. 3 Fig. 4 Fig. 5 Fig. 7 Fig. 8 Fig. 9
Claims (2)
性層を設けた第一のコア半体と、第２の非磁性基体に高
透磁率磁性材料から成る磁性層を設けた第二のコア半体
とから構成され、前記第１及び第２の非磁性基体の記録
媒体摺動面に、１本のトラック幅規制溝を設け、前記ト
ラック幅規制溝に前記磁性層が充填されると共に、前記
トラック幅規制溝のトラック幅方向両側に相手コア半体
と衝き合わせた時に互いに平行となる衝き合わせ面を有
し、前記衝き合わせ面の少なくとも一部をもつて前記第
１のコア半体と前記第２のコア半体とを接合して得られ
た磁気ヘッドに於いて、前記磁性層が無電解めつき法ま
たは電解めつき法により形成された層と、物理蒸着法で
形成された層の２層構造となつていることを特徴とする
磁気ヘッドの製造方法。(1) A first core half in which a magnetic layer made of a high magnetic permeability magnetic material is provided on a first nonmagnetic substrate, and a second core half in which a magnetic layer made of a high magnetic permeability magnetic material is provided in a second nonmagnetic substrate. one track width regulating groove is provided on the recording medium sliding surfaces of the first and second nonmagnetic substrates, and the track width regulating groove is filled with the magnetic layer. and has abutment surfaces on both sides in the track width direction of the track width regulating groove that are parallel to each other when abutted against a mating core half, and at least a part of the abutment surfaces In the magnetic head obtained by joining the half body and the second core half body, the magnetic layer is formed by a layer formed by an electroless plating method or an electrolytic plating method, and a layer formed by a physical vapor deposition method. 1. A method for manufacturing a magnetic head, characterized in that the magnetic head has a two-layer structure of two layers.
て、無電解めつき法または電解めつき法により形成され
た層により、トラック幅規制溝の全部または一部を充填
した後、機械加工により再びその深さがトラック幅規制
溝より浅いトラック幅規制溝を形成し、そこに物理蒸着
法で磁性層を形成したことを特徴とする磁気ヘッドの製
造方法。(2) In the magnetic head according to claim (1), after filling all or part of the track width regulating groove with a layer formed by electroless plating or electrolytic plating, A method of manufacturing a magnetic head, comprising forming a track width regulating groove whose depth is shallower than the track width regulating groove by machining, and forming a magnetic layer thereon by physical vapor deposition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28938287A JPH01133210A (en) | 1987-11-18 | 1987-11-18 | Production for magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28938287A JPH01133210A (en) | 1987-11-18 | 1987-11-18 | Production for magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01133210A true JPH01133210A (en) | 1989-05-25 |
Family
ID=17742494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28938287A Pending JPH01133210A (en) | 1987-11-18 | 1987-11-18 | Production for magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01133210A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2658646A1 (en) * | 1990-02-21 | 1991-08-23 | Commissariat Energie Atomique | METHOD OF MAKING A MAGNETIC HEAD WITH TWO MAGNETIC MATERIALS AND HEAD OBTAINED BY THIS PROCESS |
| FR2716996A1 (en) * | 1994-03-07 | 1995-09-08 | Commissariat Energie Atomique | Vertical magnetic head and its production method. |
| US8199410B2 (en) | 2006-09-21 | 2012-06-12 | Polight As | Polymer lens |
-
1987
- 1987-11-18 JP JP28938287A patent/JPH01133210A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2658646A1 (en) * | 1990-02-21 | 1991-08-23 | Commissariat Energie Atomique | METHOD OF MAKING A MAGNETIC HEAD WITH TWO MAGNETIC MATERIALS AND HEAD OBTAINED BY THIS PROCESS |
| FR2716996A1 (en) * | 1994-03-07 | 1995-09-08 | Commissariat Energie Atomique | Vertical magnetic head and its production method. |
| EP0671724A1 (en) * | 1994-03-07 | 1995-09-13 | Commissariat A L'energie Atomique | Vertical magnetic head and manufacturing process |
| US5883765A (en) * | 1994-03-07 | 1999-03-16 | Commissariat A L'energie Atomique | Vertical magnetic head having first and second magnetic materials in specific shapes |
| US6167611B1 (en) | 1994-03-07 | 2001-01-02 | Commissariat A L'energie Atomique | Process for producing a vertical magnetic head |
| US8199410B2 (en) | 2006-09-21 | 2012-06-12 | Polight As | Polymer lens |
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