JPH01132751A - Clad vessel - Google Patents
Clad vesselInfo
- Publication number
- JPH01132751A JPH01132751A JP29019587A JP29019587A JPH01132751A JP H01132751 A JPH01132751 A JP H01132751A JP 29019587 A JP29019587 A JP 29019587A JP 29019587 A JP29019587 A JP 29019587A JP H01132751 A JPH01132751 A JP H01132751A
- Authority
- JP
- Japan
- Prior art keywords
- oxides
- vessel
- dispersed
- alloy
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 10
- 229910001362 Ta alloys Inorganic materials 0.000 claims abstract description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 229910000629 Rh alloy Inorganic materials 0.000 abstract description 8
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 8
- 238000004544 sputter deposition Methods 0.000 abstract description 7
- 230000003647 oxidation Effects 0.000 abstract description 4
- 238000007254 oxidation reaction Methods 0.000 abstract description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- 239000010953 base metal Substances 0.000 abstract 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 6
- 238000005253 cladding Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
- ZFZQOKHLXAVJIF-UHFFFAOYSA-N zinc;boric acid;dihydroxy(dioxido)silane Chemical compound [Zn+2].OB(O)O.O[Si](O)([O-])[O-] ZFZQOKHLXAVJIF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、高温で使用するクラッド容器に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a clad container used at high temperatures.
（従来技術とその問題点）
従来、Ｔａ又はＴａ合金にＲｈ又はＲｈ合金を被覆した
クラッド容器は高温ガラスや金属酸化物を含む鉱石溶解
用るつぼや真空蒸着用のトレー、ボートなどに広く用い
られていた。これは耐酸化性に優れているが、高温で使
用するので使用時間と共にＲｈ又はＩ？ｈ合金膜の結晶
粒が粗大化し、粒界からの他の元素による浸入汚染や膜
の機械的強度の低下でクラッド容器の寿命が短いという
欠点があった。(Prior art and its problems) Conventionally, clad containers in which Ta or Ta alloy is coated with Rh or Rh alloy have been widely used in crucibles for melting ores containing high-temperature glass and metal oxides, trays for vacuum evaporation, boats, etc. was. This has excellent oxidation resistance, but since it is used at high temperatures, it becomes Rh or I over time. The crystal grains of the h-alloy film become coarse, contamination from other elements enters through the grain boundaries, and the mechanical strength of the film decreases, resulting in a short life span of the cladding container.
本発明は上記欠点に鑑みなされたものであり、長寿命の
容器を提供することを目的とする。The present invention has been made in view of the above-mentioned drawbacks, and it is an object of the present invention to provide a container with a long life.
（問題点を解決するための手段）
本発明は、Ｔａ又はＴａ合金に、酸化物を分散させたＲ
ｈ又はＲｈ合金が被覆されていることを特徴とするクラ
ッド容器である。(Means for Solving the Problems) The present invention provides an R
This is a clad container characterized by being coated with h or Rh alloy.
本発明において、酸化物を分散させたＲｈ又はＲｈ合金
を用いるのは、Ｒｈの融点が１９６０℃と高く、しかも
高温における結晶粒の粗大化が起こりにくいからである
。しかし、酸化物を分散させたＲｈやＲｈ合金を板にす
るなどの加工が困難なため被覆することとした。被覆は
スパッタリングにて行うのが良い。これはイオンブレー
ティングや真空蒸着や湿式めっきでは、Ｒｈ又はＲｈ合
金に酸化物を分散させるのが困難な為である。In the present invention, Rh or Rh alloy in which oxides are dispersed is used because Rh has a high melting point of 1960° C. and grains are less likely to coarsen at high temperatures. However, since it is difficult to process Rh or Rh alloy in which oxides are dispersed into a plate, it was decided to coat the metal. The coating is preferably performed by sputtering. This is because it is difficult to disperse oxides in Rh or Rh alloys by ion blasting, vacuum deposition, or wet plating.
このように酸化物を分散させたＲｈ又はＲｈ合金を被覆
したるつぼは耐酸化性に優れ、しかも被膜中には酸化物
が分散していて高温での結晶粒の成長が抑えられている
ことから長寿命のものとなる。A crucible coated with Rh or Rh alloy with oxides dispersed in this way has excellent oxidation resistance, and the oxides are dispersed in the coating, which suppresses the growth of crystal grains at high temperatures. It will have a long life.
なお、酸化物を分散したＲｈ合金としては、Ｒｈ−ｐｔ
−酸化物、Ｒｈ−１ｒ−酸化物などがある。Note that Rh-pt is a Rh alloy with oxides dispersed in it.
-oxide, Rh-1r-oxide, etc.
また酸化物としてはＡｌｚＯｉ、ＺｒＯ，、Ｙ ｚ Ｏ
ｓなどがあり、その酸化物の分散量としては、０．０２
体積％未満では高温での結晶粒の成長を抑制する効果が
薄く、１０体積％を超えると酸化物がクラッド容器内で
溶かすガラス等と反応するので、酸化物の量としては、
０．０２〜ｌＯ体積％が好ましい。さらに被膜の厚さと
しては、０．１μｍ未満ではＴａ又はＴａ合金の酸化を
防止する効果が薄く、１００μｍを超えると効果（長寿
命化）に対する被覆時間の割合が高くなるので、被膜の
厚さとしては０．１〜１００μｍの範囲が好ましい。In addition, as oxides, AlzOi, ZrO, Y z O
s, etc., and the amount of dispersion of its oxide is 0.02
If it is less than 10% by volume, the effect of suppressing the growth of crystal grains at high temperatures will be weak, and if it exceeds 10% by volume, the oxide will react with the glass etc. to be melted in the cladding container, so the amount of oxide is as follows:
0.02 to 10% by volume is preferred. Furthermore, if the thickness of the coating is less than 0.1 μm, the effect of preventing oxidation of Ta or Ta alloy will be weak, and if it exceeds 100 μm, the ratio of coating time to the effect (longer life) will be high. The preferred range is 0.1 to 100 μm.
以下、実施例と従来例について説明する。Examples and conventional examples will be described below.
（実施例１）
ＲｈとＹ２Ｏ，の２つのターゲットを同時に用いて、肉
厚５ｍ、高さ１００ｍｍ、内径８０ｍの断面コの字形Ｔ
ａ製るつぼの内壁に次の条件でＲｈ ＹｚＯｉ２．５
体積％を厚さ５μｍまで２元同時スパッタリングした。(Example 1) Using two targets Rh and Y2O at the same time, a U-shaped cross section T with a wall thickness of 5 m, a height of 100 mm, and an inner diameter of 80 m was prepared.
Rh YzOi2.5 was applied to the inner wall of a crucible made of A under the following conditions.
Two-dimensional simultaneous sputtering was performed to a thickness of 5 μm by volume.
Ａｒガス １．０ｘｌＯ−’Ｔ ｏ ｒ ｒＲｈ
ＤＣ２ＫＷ、スパッタ速度 １０００人／ｍ１ｎＹｚ
Ｏ＊ ＲＦ Ｉ ＫＷ、スパッタ速度 ２５人／ｍ
ｉｎ高周波電源 １３．５６Ｍ Ｈｚ
Ｔａ製るつぼ 自公転
これを実施品ｌとする。Ar gas 1.0xlO-'T o r rRh
DC2KW, sputtering speed 1000 people/m1nYz
O* RF I KW, sputtering speed 25 people/m
in high frequency power supply 13.56 MHz Ta crucible Rotation and revolution This is the actual product 1.
（実施例２）
Ｒｈ Ｚｒ０ｚ０．１体積％のターゲットを用いて、
実施例１と同一形状のＴａ製るつぼの内外壁に次の条件
でＲｈ−Ｚｒ０□０．１体積％を厚さ１０μｍマグネト
ロンスパッタリングした。(Example 2) Using a target containing RhZr0z0.1% by volume,
Rh-Zr0□0.1% by volume was magnetron sputtered to a thickness of 10 μm on the inner and outer walls of a Ta crucible having the same shape as in Example 1 under the following conditions.
Ａｒガス １．０Ｘ１０−３Ｔ ｏ ｒ ｒＩｒ
”１ｒＯｔ ＲＦ Ｉ ＫＷ、スパッタ速度２００
０人／ｍｉｎ高周波電源 １３．５６Ｍ Ｈｚ
Ｔａ製るつぼ 自転
これを実施晶２とする。Ar gas 1.0X10-3T or rIr
"1rOt RF I KW, sputtering speed 200
0 people/min High frequency power supply 13.56 MHz Ta crucible Rotation This is used as practical crystal 2.
（従来例）
実施例１で用いたＴａ製るつぼの内外壁にＲｈを１０μ
ｍスパッタリングしたものを従来品とした。(Conventional Example) 10μ of Rh was applied to the inner and outer walls of the Ta crucible used in Example 1.
The conventional product was one subjected to m-sputtering.
次に、上記実施品１．２と従来品にアルカリ亜鉛硼珪酸
ガラスを５００ｇ入れＡｒ雰囲気、温度約り２００℃×
６０分間で使用した。これを１０回くり返したところ、
従来品は５μｍその容器の表面から削られたのに対し、
実施品１は２μｍ、実施品２は１μｍ削られたにとどま
った。Next, 500 g of alkali zinc borosilicate glass was added to the above implementation product 1.2 and the conventional product in an Ar atmosphere at a temperature of about 200°C.
It was used for 60 minutes. After repeating this 10 times,
Whereas the conventional product had 5 μm removed from the surface of the container,
Execution product 1 was removed by 2 μm, and implementation product 2 was removed by only 1 μm.
次に、従来品、実施品２の容器の底部を大気中で直接ヒ
ーター加熱して温度約１０００℃で２０時間保持したと
ころ、従来品は１０時間では減量しなかったが、Ｒｈ被
膜の結晶粒の粗大化が著しく限界状態となり、２０時間
ではＲｈ被膜が破壊されＴａが殆んど酸化されたのに対
し、実施品２は被膜の結晶粒の成長は認められず、減量
もしなかった。Next, when the bottoms of the containers of the conventional product and implementation product 2 were directly heated with a heater in the atmosphere and held at a temperature of approximately 1000°C for 20 hours, the conventional product did not lose weight in 10 hours, but the crystal grains of the Rh coating The coarsening of the film reached a critical limit, and after 20 hours, the Rh film was destroyed and most of the Ta was oxidized, whereas in Example 2, no growth of crystal grains in the film was observed and no weight loss was observed.
これらのことから本発明のクラッドるつぼは従来品に比
べて金属酸化物の溶解用るつぼとして著しく寿命が長く
、また耐消耗性にも優れていることがわかる。From these results, it can be seen that the clad crucible of the present invention has a significantly longer service life as a crucible for dissolving metal oxides than conventional crucibles, and also has excellent wear resistance.
尚、上記実施例ではＴａに酸化物を分散したＲｈを直接
被覆したが、必要に応じＴａとＲｈの拡散を防止するた
めの拡散防止層を介在するようにしてもよいものである
。In the above embodiment, Ta is directly coated with Rh in which an oxide is dispersed, but a diffusion prevention layer may be provided to prevent the diffusion of Ta and Rh, if necessary.
（発明の効果）
以上詳述したように本発明によれば、耐消耗性の優れた
長寿命のクラッド容器を提供することができる。しかも
、Ｔａ製容器を完全に被覆すれば大気中でも長寿命のも
のかえられる。(Effects of the Invention) As detailed above, according to the present invention, it is possible to provide a clad container with excellent wear resistance and long life. Moreover, if the Ta container is completely coated, it can have a long life even in the atmosphere.
出願人 田中貴金属工業株式会社Applicant: Tanaka Kikinzoku Kogyo Co., Ltd.
Claims (1)
合金が被覆されていることを特徴とするクラッド容器。Rh or Rh with oxide dispersed in Ta or Ta alloy
A clad container characterized by being coated with an alloy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62290195A JP2565938B2 (en) | 1987-11-17 | 1987-11-17 | Clad container |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62290195A JP2565938B2 (en) | 1987-11-17 | 1987-11-17 | Clad container |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01132751A true JPH01132751A (en) | 1989-05-25 |
| JP2565938B2 JP2565938B2 (en) | 1996-12-18 |
Family
ID=17752985
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62290195A Expired - Lifetime JP2565938B2 (en) | 1987-11-17 | 1987-11-17 | Clad container |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2565938B2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5515550A (en) * | 1978-07-18 | 1980-02-02 | Matsushita Electric Works Ltd | Smoke sensor |
| JPS60200978A (en) * | 1984-03-26 | 1985-10-11 | Tanaka Kikinzoku Kogyo Kk | Clad vessel |
-
1987
- 1987-11-17 JP JP62290195A patent/JP2565938B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5515550A (en) * | 1978-07-18 | 1980-02-02 | Matsushita Electric Works Ltd | Smoke sensor |
| JPS60200978A (en) * | 1984-03-26 | 1985-10-11 | Tanaka Kikinzoku Kogyo Kk | Clad vessel |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2565938B2 (en) | 1996-12-18 |
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