JPH01275780A - Clad vessel - Google Patents
Clad vesselInfo
- Publication number
- JPH01275780A JPH01275780A JP10707688A JP10707688A JPH01275780A JP H01275780 A JPH01275780 A JP H01275780A JP 10707688 A JP10707688 A JP 10707688A JP 10707688 A JP10707688 A JP 10707688A JP H01275780 A JPH01275780 A JP H01275780A
- Authority
- JP
- Japan
- Prior art keywords
- clad
- crucible
- vessel
- coating
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910000575 Ir alloy Inorganic materials 0.000 claims abstract description 9
- 150000004767 nitrides Chemical class 0.000 claims abstract description 9
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 6
- 238000005253 cladding Methods 0.000 claims abstract 2
- 150000001247 metal acetylides Chemical class 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 abstract description 14
- 229910052741 iridium Inorganic materials 0.000 abstract description 9
- 229910052715 tantalum Inorganic materials 0.000 abstract description 5
- 238000011109 contamination Methods 0.000 abstract description 4
- 229910007948 ZrB2 Inorganic materials 0.000 abstract description 3
- VWZIXVXBCBBRGP-UHFFFAOYSA-N boron;zirconium Chemical compound B#[Zr]#B VWZIXVXBCBBRGP-UHFFFAOYSA-N 0.000 abstract description 2
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 abstract 1
- 229910019918 CrB2 Inorganic materials 0.000 abstract 1
- 229910003862 HfB2 Inorganic materials 0.000 abstract 1
- 229910033181 TiB2 Inorganic materials 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 19
- 238000000576 coating method Methods 0.000 description 19
- 239000013078 crystal Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000002844 melting Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- ZFZQOKHLXAVJIF-UHFFFAOYSA-N zinc;boric acid;dihydroxy(dioxido)silane Chemical compound [Zn+2].OB(O)O.O[Si](O)([O-])[O-] ZFZQOKHLXAVJIF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、高温で使用するクラッド容器に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a clad container used at high temperatures.
(従来技術とその問題点)
従来、WSTaなどの高融点金属より成る容器の表面に
、Ir又はIr合金を被覆したクラッド容器が、高温ガ
ラスや金属酸化物を含む鉱石の溶解用るつぼなどの用途
に考えられていた。(Prior art and its problems) Conventionally, clad containers made of a high-melting point metal such as WSTa and coated with Ir or Ir alloy have been used for applications such as crucibles for melting ores containing high-temperature glass and metal oxides. was considered.
ところで、上記クラッド容器は、耐酸化性に優れている
が、高温で使用するので、経時的にIr又はIr合金の
被膜の結晶粒が粗大化し、粒界からの他の元素による浸
入汚染や被膜の機械的強度の低下で、クラッド容器の寿
命が短いものであった。By the way, the above-mentioned clad container has excellent oxidation resistance, but since it is used at high temperatures, the crystal grains of the Ir or Ir alloy coating become coarse over time, causing contamination and other elements to enter the coating from the grain boundaries. The life of the clad container was shortened due to the decrease in mechanical strength.
(発明の目的)
本発明は、上記問題点を解決すべくなされたもので、長
寿命のクラッド容器を提供することを目的とするもので
ある。(Object of the Invention) The present invention was made to solve the above problems, and an object of the present invention is to provide a clad container with a long life.
(問題点を解決するための手段)
上記問題点を解決するための本発明のクラッド容器は、
W又はTaより成る容器の内面又は内外両面に、Ir又
はIr合金を主成分として窒化物、炭化物、ほう化物の
いずれかが分散された材料が、被覆されていることを特
徴とするものである。(Means for solving the problems) The clad container of the present invention for solving the above problems includes:
The inner or outer surfaces of the container made of W or Ta are coated with a material containing Ir or Ir alloy as the main component and dispersed with any of nitrides, carbides, and borides. .
本発明のクラッド容器において、W又はTaより成る容
器の内面又は内外両面に、前記材料が被覆されている理
由は、高温でのIr又はIr合金の被膜の結晶粒の粗大
化が抑制されるからである。In the clad container of the present invention, the inner surface or both the inner and outer surfaces of the container made of W or Ta are coated with the above material because it suppresses coarsening of the crystal grains of the Ir or Ir alloy coating at high temperatures. It is.
被覆は、スパッタリングで行うのが良い。これはイオン
ブレーティング、真空蒸着、湿式めっきでは、Ir又は
Ir合金に窒化物、炭化物、ほう化物を分散させるのが
困難であるからである。The coating is preferably performed by sputtering. This is because it is difficult to disperse nitrides, carbides, and borides in Ir or Ir alloys by ion blasting, vacuum deposition, or wet plating.
このように窒化物、炭化物、ほう化物を分散させたIr
又はIr合金より成る材料を被覆したクラッド容器は、
耐酸化性に優れ、しかも被膜中には窒化物、炭化物、ほ
う化物のいずれかが分散されていて、高温での結晶粒の
成長が抑えられていることから、粒界からの他の元素に
よる浸入汚染や被膜の機械的強度の低下が無く、長寿命
となる。Ir containing nitrides, carbides, and borides dispersed in this way
Or a clad container coated with a material made of Ir alloy,
It has excellent oxidation resistance, and the coating contains nitrides, carbides, and borides, which suppresses the growth of crystal grains at high temperatures. There is no infiltration of contamination or a decrease in the mechanical strength of the coating, resulting in a long service life.
窒化物としては、BN、HfN、TaN、ZrN、Ti
Nが用いられ、炭化物としては、B、C。Nitrides include BN, HfN, TaN, ZrN, Ti
N is used, and the carbides include B and C.
TiC,ZrC,HfC,VC,NbC5TaCが用い
られ、ほう化物としては、T IB 2、ZrB2、H
fB2、CrB、が用いられる。TiC, ZrC, HfC, VC, NbC5TaC are used, and as borides, T IB 2, ZrB2, H
fB2, CrB, is used.
これら窒化物、炭化物、ほう化物の分散量としては、0
.02体積%未満では高温での結晶粒の成長を抑制する
効果が薄く、10体積%を超えると結晶粒の成長を抑制
する効果が変わらなくなるので、それらの量としては0
.02〜10体積%が好ましい。The amount of dispersion of these nitrides, carbides, and borides is 0.
.. If the amount is less than 0.02% by volume, the effect of suppressing the growth of crystal grains at high temperatures will be weak, and if it exceeds 10% by volume, the effect of suppressing the growth of crystal grains will not change.
.. 02 to 10% by volume is preferred.
さらに膜厚としては0.1μm未満ではW又はTaの酸
化を防止する効果が薄く、100μmを超えると長寿命
化に対する被覆時間の割合が高くなるので、膜厚の厚さ
としては
0.1〜100μmの範囲が好ましい。Furthermore, if the film thickness is less than 0.1 μm, the effect of preventing oxidation of W or Ta will be weak, and if it exceeds 100 μm, the ratio of coating time to longer life will increase, so the film thickness should be 0.1~ A range of 100 μm is preferred.
以下具体的な実施例と従来例について説明する。Specific examples and conventional examples will be described below.
(実施例1)
IrとBHの2つのターゲットを同時に用いて、肉厚5
++un、高さ100mm、内径80mmの断面コの字
形W製るつぼの内面に、次の条件でIr−BN2.5体
積%を厚さ5μmまで二元同時にスパッタリングして、
クラッドるつぼを得た。(Example 1) Using two targets of Ir and BH at the same time,
++un, on the inner surface of a W crucible with a U-shaped cross section and a height of 100 mm and an inner diameter of 80 mm, 2.5 volume % of Ir-BN was sputtered simultaneously to a thickness of 5 μm under the following conditions,
Got a clad crucible.
Arガス : 1. Qx 1O−3TorrIr:
DC2にW1スパッタ速度 1000A/m1nBN
: RF IKW 、スパッタ速度 25人/mi
n高周波電源: 13.56MHz
W製るつぼ:自公転
(実施例2)
IrとTiCの2つのターゲットを同時に用いて、肉厚
5Il]ffl、高さ100mm、内径8011110
の断面コの字形W製るつぼの内外面に、次の条件でIr
−TiC2,5体積%を厚さ10μmまで二元同時にス
パッタリングして、クラッドるつぼを得た。Ar gas: 1. Qx 1O-3TorrIr:
DC2 to W1 sputtering speed 1000A/m1nBN
: RF IKW, sputtering speed 25 people/mi
n High frequency power source: 13.56 MHz Crucible made of W: Rotation and revolution (Example 2) Using two targets of Ir and TiC at the same time, wall thickness 5Il]ffl, height 100mm, inner diameter 8011110
Ir was applied to the inner and outer surfaces of a W crucible with a U-shaped cross section under the following conditions.
A clad crucible was obtained by dual-sputtering TiC2.5% by volume to a thickness of 10 μm.
Arガス : 1O−3Torr
Ir:DC2KW、スパッタ速度 1000A/m1n
TiC: RF IKW 、スパッタ速度 25人
/min高周波電源: 13.56MHz
W製るつぼ:自転
(実施例3)
IrとZrBzの2つのターゲットを同時に用いて、肉
厚5mm、高さ100mm、内径80mmの断面コの字
形Ta製るつぼの内面に、次の条件でIr−Z r B
、5体積%を厚さ20μmまで二元同時にスパッタリン
グして、クラッドるつぼを得た。Ar gas: 1O-3Torr Ir: DC2KW, sputtering speed 1000A/m1n
TiC: RF IKW, sputtering speed 25 people/min High frequency power source: 13.56 MHz W crucible: Autorotation (Example 3) Using two targets of Ir and ZrBz at the same time, a Ir-Z r B was applied to the inner surface of a Ta crucible with a U-shaped cross section under the following conditions.
, 5% by volume were simultaneously sputtered to a thickness of 20 μm to obtain a clad crucible.
Arガス : 1O−3Torr
Ir:DC2KW、スパッタ速度 1000A/m1n
ZrL : RF 2KW 、スパッタ速度 50八
/min高周波電源: 13.56MHz
Ta製るつぼ:自公転
(実施例4)
IrSPt、TaNの3つのターゲットを同時に用いて
、肉厚5mm、高さ100mm、内径80止の断面コの
字形Ta製るつぼの内外面に、次の条件でIrとP t
20wt%とTaN1.O体積%となるように厚さ1
0μmまで三元同時にスパッタリングして、クラッドる
つぼを得た。Ar gas: 1O-3Torr Ir: DC2KW, sputtering speed 1000A/m1n
ZrL: RF 2KW, sputtering speed 508/min High frequency power source: 13.56MHz Ta crucible: Rotation (Example 4) Using three targets of IrSPt and TaN at the same time, wall thickness 5mm, height 100mm, inner diameter 80mm Ir and Pt were applied to the inner and outer surfaces of a Ta crucible with a U-shaped cross section.
20wt% and TaN1. Thickness 1 so that O volume %
A clad crucible was obtained by simultaneous three-dimensional sputtering down to 0 μm.
Arガス : 10−’Torr
I r : DC2KW、スパッタ速度 1000A
/m1nP t : DCO,4KW、スパッタ速度
200人/m1nT a N : RF O,5KW、
スパッタ速度 12人/min高周波電源: 13.
56!JHz
Ta製るつぼ:自公転
(従来例)
実施例1で用いたW製るつぼの内外面に、Irを厚さ1
0μmまでスパッタリングしてクラッドるつぼを得た。Ar gas: 10-'Torr Ir: DC2KW, sputtering speed 1000A
/m1nPt: DCO, 4KW, sputtering speed 200 people/m1nT aN: RF O, 5KW,
Sputtering speed: 12 people/min High frequency power supply: 13.
56! JHz Ta crucible: Rotation and revolution (conventional example) Ir was applied to the inner and outer surfaces of the W crucible used in Example 1 to a thickness of 1
A clad crucible was obtained by sputtering down to 0 μm.
然して上記実施例1〜4のクラッドるつぼと従来例のク
ラッドるつぼに、アルカリ亜鉛硼珪酸ガラスを500g
入れ、Ar雰囲気、温度1500℃、1時間で使用した
。これを10回繰り返した処、従来例のクラッドるつぼ
は、内面からIr被膜が3μm削られたのに対し、実施
例1のるつぼは、Ir−BN被膜が0.5μm1実施例
2のるつぼは、Ir−TiC被膜が0.4μm、実施例
3のるつぼは、Ir−ZrB2被膜が0.5μm、実施
例4のるつぼはIr−Pt−TaN被膜が0.5μmの
夫々内面から削られたにとどまった。However, 500 g of alkali zinc borosilicate glass was added to the clad crucibles of Examples 1 to 4 and the conventional clad crucible.
It was used in an Ar atmosphere at a temperature of 1500° C. for 1 hour. When this was repeated 10 times, the Ir coating was removed by 3 μm from the inner surface of the conventional clad crucible, whereas the Ir-BN coating was removed by 0.5 μm from the crucible of Example 1. The Ir-TiC coating was 0.4 μm in the crucible of Example 3, the Ir-ZrB2 coating was 0.5 μm, and the Ir-Pt-TaN coating was 0.5 μm in the crucible of Example 4. Ta.
次に実施例1〜4及び従来例のクラッドるつぼの底部を
、大気中で直接ヒータ加熱して温度約1000℃で20
時間保持した処、従来例のクラッドるつぼは、10時間
ではIr被膜が減量しなかったが、Ir被膜の結晶粒の
粗大化が著しく、限界状態となり、20時間ではIr被
膜が破壊され、8g減量したのに対し、実施例1〜4の
クラッドるつぼは、全て被膜の結晶粒の成長が認められ
ず、減量もしなかった。Next, the bottoms of the clad crucibles of Examples 1 to 4 and the conventional example were directly heated in the atmosphere with a heater at a temperature of about 1000°C for 20 minutes.
In the conventional clad crucible, the weight of the Ir coating did not decrease after 10 hours, but the crystal grains of the Ir coating became extremely coarse, reaching a limit state, and after 20 hours, the Ir coating was destroyed, resulting in a weight loss of 8 g. On the other hand, in all of the clad crucibles of Examples 1 to 4, no growth of crystal grains in the coating was observed and no weight loss was observed.
これらのことから本発明のクラッドるつぼは、従来のク
ラッドるつぼに比さて金属酸化物の溶解用るつぼとして
著しく寿命が長く、また耐消耗性に優れていることが判
る。These results show that the clad crucible of the present invention has a significantly longer life as a crucible for dissolving metal oxides than conventional clad crucibles, and has excellent wear resistance.
(発明の効果)
以上詳述した通り本発明のクラッド容器は、被膜の結晶
粒の粗大化が抑制され、粒界から他の元素による浸入汚
染や被膜の機械的強度の低下が無いので、長寿命である
。また長時間使用しても被膜は減量せず、耐消耗性に優
れている。しかも容器全体を完全被覆した場合は大気中
でも長寿命のものとなる。(Effects of the Invention) As detailed above, the clad container of the present invention suppresses the coarsening of the crystal grains in the coating, prevents contamination from entering from grain boundaries with other elements, and reduces the mechanical strength of the coating, so it can last for a long time. It is the lifespan. Furthermore, the coating does not lose weight even after long-term use, and has excellent wear resistance. Furthermore, if the entire container is completely coated, it will have a long life even in the atmosphere.
出願人 田中貴金属工業株式会社Applicant: Tanaka Kikinzoku Kogyo Co., Ltd.
Claims (1)
r又はIr合金を主成分として窒化物、炭化物、ほう化
物のいずれかが分散された材料が、被覆されていること
を特徴とするクラッド容器。1. On the inner or outer surfaces of a container made of W or Ta, I
A cladding container characterized in that it is coated with a material containing an r or Ir alloy as a main component and one of nitrides, carbides, and borides dispersed therein.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10707688A JPH01275780A (en) | 1988-04-28 | 1988-04-28 | Clad vessel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10707688A JPH01275780A (en) | 1988-04-28 | 1988-04-28 | Clad vessel |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01275780A true JPH01275780A (en) | 1989-11-06 |
Family
ID=14449873
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10707688A Pending JPH01275780A (en) | 1988-04-28 | 1988-04-28 | Clad vessel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01275780A (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60200979A (en) * | 1984-03-26 | 1985-10-11 | Tanaka Kikinzoku Kogyo Kk | Clad vessel |
JPS60200982A (en) * | 1984-03-26 | 1985-10-11 | Tanaka Kikinzoku Kogyo Kk | Clad material |
JPS6220847A (en) * | 1985-07-18 | 1987-01-29 | Hitachi Ltd | Metallic material having fine crystal grain and its production |
-
1988
- 1988-04-28 JP JP10707688A patent/JPH01275780A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60200979A (en) * | 1984-03-26 | 1985-10-11 | Tanaka Kikinzoku Kogyo Kk | Clad vessel |
JPS60200982A (en) * | 1984-03-26 | 1985-10-11 | Tanaka Kikinzoku Kogyo Kk | Clad material |
JPS6220847A (en) * | 1985-07-18 | 1987-01-29 | Hitachi Ltd | Metallic material having fine crystal grain and its production |
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