JPH0113212B2 - - Google Patents
Info
- Publication number
- JPH0113212B2 JPH0113212B2 JP56058724A JP5872481A JPH0113212B2 JP H0113212 B2 JPH0113212 B2 JP H0113212B2 JP 56058724 A JP56058724 A JP 56058724A JP 5872481 A JP5872481 A JP 5872481A JP H0113212 B2 JPH0113212 B2 JP H0113212B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- substrate temperature
- indium
- substrate
- insb
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 42
- 239000013078 crystal Substances 0.000 claims description 23
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 18
- 229910052738 indium Inorganic materials 0.000 claims description 13
- 238000007740 vapor deposition Methods 0.000 claims description 12
- 239000004065 semiconductor Substances 0.000 claims description 11
- 239000002131 composite material Substances 0.000 claims description 10
- 229910052787 antimony Inorganic materials 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 7
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 5
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 2
- 239000010408 film Substances 0.000 description 12
- 238000000354 decomposition reaction Methods 0.000 description 10
- 239000010409 thin film Substances 0.000 description 9
- -1 InSb compound Chemical class 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 7
- 230000008021 deposition Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 239000010445 mica Substances 0.000 description 3
- 229910052618 mica group Inorganic materials 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 230000005355 Hall effect Effects 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- FAWGZAFXDJGWBB-UHFFFAOYSA-N antimony(3+) Chemical compound [Sb+3] FAWGZAFXDJGWBB-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- KWLSQQRRSAWBOQ-UHFFFAOYSA-N dipotassioarsanylpotassium Chemical compound [K][As]([K])[K] KWLSQQRRSAWBOQ-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02549—Antimonides
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Hall/Mr Elements (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56058724A JPS57173934A (en) | 1981-04-18 | 1981-04-18 | Manufacture of indium-antimony system compound crystal semiconductor |
| US06/361,939 US4468415A (en) | 1981-03-30 | 1982-03-25 | Indium-antimony complex crystal semiconductor and process for production thereof |
| AT82102605T ATE20629T1 (de) | 1981-03-30 | 1982-03-27 | Indium-antimon-halbleiter mit komplexer kristalliner struktur und verfahren zu seiner herstellung. |
| EP82102605A EP0062818B2 (en) | 1981-03-30 | 1982-03-27 | Process of producing a hall element or magnetoresistive element comprising an indium-antimony complex crystal semiconductor |
| DE8282102605T DE3271874D1 (en) | 1981-03-30 | 1982-03-27 | Indium-antimony complex crystal semiconductor and process for production thereof |
| KR8201347A KR860000161B1 (ko) | 1981-03-30 | 1982-03-29 | 인듐 안티몬계 복합 결정반도체 및 그 제조방법 |
| US06/620,645 US4539178A (en) | 1981-03-30 | 1984-06-14 | Indium-antimony complex crystal semiconductor and process for production thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56058724A JPS57173934A (en) | 1981-04-18 | 1981-04-18 | Manufacture of indium-antimony system compound crystal semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57173934A JPS57173934A (en) | 1982-10-26 |
| JPH0113212B2 true JPH0113212B2 (cs) | 1989-03-03 |
Family
ID=13092443
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56058724A Granted JPS57173934A (en) | 1981-03-30 | 1981-04-18 | Manufacture of indium-antimony system compound crystal semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57173934A (cs) |
-
1981
- 1981-04-18 JP JP56058724A patent/JPS57173934A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57173934A (en) | 1982-10-26 |
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