JPH01130526U - - Google Patents
Info
- Publication number
- JPH01130526U JPH01130526U JP2779388U JP2779388U JPH01130526U JP H01130526 U JPH01130526 U JP H01130526U JP 2779388 U JP2779388 U JP 2779388U JP 2779388 U JP2779388 U JP 2779388U JP H01130526 U JPH01130526 U JP H01130526U
- Authority
- JP
- Japan
- Prior art keywords
- fork
- heat treatment
- boat
- treatment furnace
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 4
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
Description
第１図は、本考案の半導体ウエハー熱処理炉用
ボートローデイングフオークの縦断面図であり、
第２図は、第１図のＡ―Ａ′断面図である。第３
図は、本考案を、熱処理炉システムに応用した断
面図である。第４図は、従来の半導体ウエハー熱
処理炉用ボートローデイングフオークの外観図、
第５図は、第４図の縦断面である。
１ａ，１ｂ，１ｃ……ヒーター、２ａ，２ｂ，
２ｃ……熱電対、３……断熱材、４……シリコン
カーバイト、５……ガス加熱ヒーター、６……石
英管、７……半導体ウエハー、８……半導体ウエ
ハー積載用ボート、９……フオーク温度コントロ
ーラ、１０……フオーク用ガス供給システム、１
１……フオーク移動レール、１２……半導体ウエ
ハー熱処理炉ヒーター、１３……プロセス用石英
管、１４……熱処理炉。
FIG. 1 is a longitudinal cross-sectional view of a boat loading fork for a semiconductor wafer heat treatment furnace of the present invention;
FIG. 2 is a sectional view taken along the line AA' in FIG. Third
The figure is a sectional view of the present invention applied to a heat treatment furnace system. Figure 4 is an external view of a conventional boat loading fork for semiconductor wafer heat treatment furnaces.
FIG. 5 is a longitudinal section of FIG. 4. 1a, 1b, 1c...heater, 2a, 2b,
2c...Thermocouple, 3...Insulating material, 4...Silicon carbide, 5...Gas heating heater, 6...Quartz tube, 7...Semiconductor wafer, 8...Semiconductor wafer loading boat, 9... Fork temperature controller, 10...Gas supply system for fork, 1
DESCRIPTION OF SYMBOLS 1... Fork moving rail, 12... Semiconductor wafer heat treatment furnace heater, 13... Quartz tube for process, 14... Heat treatment furnace.
Claims (1)
ハーを積載したボートを載せ、該熱処理炉内へボ
ートと半導体ウエハーの移動を行なうボートロー
デイングフオークにおいて、フオーク内部にフオ
ーク加熱ヒーター、ヒーター出力の制御に用いる
温度モーター用熱電対及び、フオーク積載部への
プロセスガス供給機構を具備したことを特徴とし
た半導体ウエハー熱処理炉用ボートローデイング
フオーク。 In a boat loading fork that carries a boat loaded with semiconductor wafers in a semiconductor wafer heat treatment furnace system and moves the boat and semiconductor wafers into the heat treatment furnace, there is a fork heating heater inside the fork, and a temperature motor used to control the heater output. A boat loading fork for a semiconductor wafer heat treatment furnace characterized by being equipped with a thermocouple and a process gas supply mechanism to the fork loading section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2779388U JPH01130526U (en) | 1988-03-01 | 1988-03-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2779388U JPH01130526U (en) | 1988-03-01 | 1988-03-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01130526U true JPH01130526U (en) | 1989-09-05 |
Family
ID=31250598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2779388U Pending JPH01130526U (en) | 1988-03-01 | 1988-03-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01130526U (en) |
-
1988
- 1988-03-01 JP JP2779388U patent/JPH01130526U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH01130526U (en) | ||
| JPH0187531U (en) | ||
| JPH02146424U (en) | ||
| JPH0240476Y2 (en) | ||
| JPS63155630U (en) | ||
| JPS6194550U (en) | ||
| JPS6314994U (en) | ||
| JPH0566054U (en) | Temperature control device for heating furnace | |
| JPH0332211B2 (en) | ||
| JPS5987821A (en) | Oxidization | |
| JPS6312831U (en) | ||
| JPS63105059U (en) | ||
| JPS6175126U (en) | ||
| JPH0320435U (en) | ||
| JPH01106900U (en) | ||
| JPS6260227A (en) | High speed oxidation device | |
| JPS60250637A (en) | Thermal oxide heating furnace of semiconductor substrate | |
| JPH0192128U (en) | ||
| JPH02106600U (en) | ||
| JPS6389975U (en) | ||
| JPS63159751U (en) | ||
| JPH0389387U (en) | ||
| JPS6041848B2 (en) | High temperature diffusion furnace | |
| JPH02140298U (en) | ||
| JPH0221731U (en) |