JPH01130321A - Production of magnetic disk - Google Patents

Production of magnetic disk

Info

Publication number
JPH01130321A
JPH01130321A JP62289778A JP28977887A JPH01130321A JP H01130321 A JPH01130321 A JP H01130321A JP 62289778 A JP62289778 A JP 62289778A JP 28977887 A JP28977887 A JP 28977887A JP H01130321 A JPH01130321 A JP H01130321A
Authority
JP
Japan
Prior art keywords
film
targets
particles
magnetic
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62289778A
Other languages
Japanese (ja)
Other versions
JPH0450652B2 (en
Inventor
Akimasa Ishii
章聖 石井
Katsuhisa Enjiyouji
円成寺 勝久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP62289778A priority Critical patent/JPH01130321A/en
Publication of JPH01130321A publication Critical patent/JPH01130321A/en
Publication of JPH0450652B2 publication Critical patent/JPH0450652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16HGEARING
    • F16H61/00Control functions within control units of change-speed- or reversing-gearings for conveying rotary motion ; Control of exclusively fluid gearing, friction gearing, gearings with endless flexible members or other particular types of gearing
    • F16H61/66Control functions within control units of change-speed- or reversing-gearings for conveying rotary motion ; Control of exclusively fluid gearing, friction gearing, gearings with endless flexible members or other particular types of gearing specially adapted for continuously variable gearings
    • F16H61/662Control functions within control units of change-speed- or reversing-gearings for conveying rotary motion ; Control of exclusively fluid gearing, friction gearing, gearings with endless flexible members or other particular types of gearing specially adapted for continuously variable gearings with endless flexible members
    • F16H61/66254Control functions within control units of change-speed- or reversing-gearings for conveying rotary motion ; Control of exclusively fluid gearing, friction gearing, gearings with endless flexible members or other particular types of gearing specially adapted for continuously variable gearings with endless flexible members controlling of shifting being influenced by a signal derived from the engine and the main coupling
    • F16H61/66259Control functions within control units of change-speed- or reversing-gearings for conveying rotary motion ; Control of exclusively fluid gearing, friction gearing, gearings with endless flexible members or other particular types of gearing specially adapted for continuously variable gearings with endless flexible members controlling of shifting being influenced by a signal derived from the engine and the main coupling using electrical or electronical sensing or control means

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Mechanical Engineering (AREA)

Abstract

PURPOSE:To improve magnetic characteristics by providing at least plural sets of targets for forming underlying films and forming the underlying films as multiple layers, thereby changing the particle shape so as to approximate the same to a columnar shape. CONSTITUTION:The underlying films 26, 27 are formed as the multiple layers by using at least plural sets of the targets 22-25 at the time of producing a magnetic disk. The grain constitution to constitute the underlying films 26, 27 is, therefore, approximated to the columnar shape in the section viewed from the direction perpendicular to the carrying direction of a disk substrate. The magnetic anisotropy is made small and the difference in the coercive force Hc in the carrying direction and the direction perpendicular thereof of the disk substrate is lessened. The reproduced output at the time of reproduction is thereby fluctuated to a lesser extent and the modulation and noises are sufficiently suppressed.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、インライン型スパッタ法により下地膜、磁気
記録膜および保護膜を形成する磁気ディスクの製造方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method of manufacturing a magnetic disk in which a base film, a magnetic recording film, and a protective film are formed by an in-line sputtering method.

(従来の技術) 従来より、例えば第3図に示すようなインライン型スパ
ッタ装置を用いて金属薄膜型の磁気ディスクを製造する
ことが試みられている。
(Prior Art) Conventionally, attempts have been made to manufacture metal thin film type magnetic disks using, for example, an in-line type sputtering apparatus as shown in FIG.

第3図において、1はスパッタ装置を構成する真空容器
であり、この真空容器1内には、下地膜(例えば、cr
膜)を形成するための一対の第1ターゲット2,3と、
磁気記録膜(例えばC0NiCr膜)を形成するための
一対の第2ターゲット4.5と、保護膜(例えば、C膜
)を形成するための一対の第3ターゲツト6.7と、が
矢印Aで示すディスク基板の搬送方向に順次収納されて
いる。
In FIG. 3, reference numeral 1 denotes a vacuum container constituting the sputtering apparatus.
a pair of first targets 2 and 3 for forming a film);
A pair of second targets 4.5 for forming a magnetic recording film (for example, C0NiCr film) and a pair of third targets 6.7 for forming a protective film (for example, C film) are indicated by arrow A. They are sequentially stored in the transport direction of the disk substrates shown.

このように構成されたスパッタ装置において、まず、C
rターゲット2,3を用いて環状マグネトロンスパッタ
を行なって、Cr粒子を飛来させて基板8上に所定の厚
さの下地膜となるCr膜9を形成し、次いでこのCr膜
9上にCON r Crターゲット4,5を用いて環状
マグネトロンスパッタを行ない、CON i Cr粒子
を飛来させて磁気記録膜となるC0NiCr膜10を所
定の厚さに形成し、ざらにCターゲット6.7を用いて
環状マグネトロンスパッタを行ない、C粒子を飛来させ
てCoNiCr膜10上にC膜11を所定の厚さに形層
する(第4図および第5図、参照)。
In the sputtering apparatus configured in this way, first, C.
Annular magnetron sputtering is performed using r targets 2 and 3 to cause Cr particles to fly to form a Cr film 9 as a base film of a predetermined thickness on the substrate 8, and then CON r is deposited on this Cr film 9. Annular magnetron sputtering is performed using Cr targets 4 and 5 to cause CON i Cr particles to fly to form a C0NiCr film 10 to a predetermined thickness, which will become a magnetic recording film. Magnetron sputtering is performed to make carbon particles fly and form a carbon film 11 to a predetermined thickness on the CoNiCr film 10 (see FIGS. 4 and 5).

こうして、磁気ディスクが製造される。In this way, a magnetic disk is manufactured.

(発明が解決しようとする問題点) しかしながら、このような従来の磁気ディスクの製造方
法にあっては、製造された磁気ディスクの膜断面は、第
4図および第5図に示すような粒構成となっていた。す
なわち、第4図に示すように、ディスク基板の搬送方向
(矢印A、参照)に対して垂直な方向からみた断面では
、Cr膜9のCr粒子9AおよびCoNiCr膜10の
C0NiCr粒子10Aは弓状にそれぞれ湾曲した形状
となっているが、これに対して第5図に示すようにディ
スク基板の搬送方向(■印B、参照)がらみた断面では
、Cr膜9のCr粒子9BおよびCoNiCr膜10の
CoN i Cr粒子10Bは柱状の形状となっている
(Problems to be Solved by the Invention) However, in such a conventional magnetic disk manufacturing method, the film cross section of the manufactured magnetic disk has a grain structure as shown in FIGS. 4 and 5. It became. That is, as shown in FIG. 4, in a cross section viewed from a direction perpendicular to the transport direction of the disk substrate (see arrow A), the Cr particles 9A of the Cr film 9 and the C0NiCr particles 10A of the CoNiCr film 10 have an arcuate shape. On the other hand, as shown in FIG. 5, in a cross section taken along the disk substrate transport direction (■ mark B, see), the Cr particles 9B of the Cr film 9 and the CoNiCr film 10 are curved. The CoN i Cr particles 10B have a columnar shape.

このようにCr粒子9A、9BおよびCoNiCr粒子
10A、10Bのそれぞれの形状がディスク基板の搬送
方向とその垂直方向において異なるため、磁気異方性が
大きくなる。その結果、保磁力Hcはディスク基板の搬
送方向とその垂直方向においてその差(ΔHc)が大き
くなり、再生時には再生出力が変動し、モジュレーショ
ンやノイズが大きくなるという問題点があった。
As described above, since the shapes of the Cr particles 9A, 9B and the CoNiCr particles 10A, 10B are different in the transport direction of the disk substrate and in the direction perpendicular thereto, the magnetic anisotropy becomes large. As a result, the difference (ΔHc) between the coercive force Hc in the transport direction of the disk substrate and in the direction perpendicular to the disk substrate becomes large, resulting in a problem that the reproduction output fluctuates during reproduction and modulation and noise become large.

(問題点を解決するための手段) 本発明は、このような従来の問題点に鑑みてなされたも
のであって、少なくとも下地膜を形成するためのターゲ
ットを複数組設けて多層となるように下地膜を形成する
ことにより、粒子形状を柱状に近づくように変えて磁気
特性の改善を図った磁気ディスクの製造方法を提供する
ことを目的としている。
(Means for Solving the Problems) The present invention has been made in view of such conventional problems. It is an object of the present invention to provide a method for manufacturing a magnetic disk in which the particle shape is changed to be closer to a columnar shape by forming a base film, thereby improving magnetic properties.

この目的を達成するために、本発明は、スパッタ法で基
板上に下地膜、磁気記録膜および保護膜を形成する磁気
ディスクの製造方法において、少なくとも複数組のター
ゲットを用いて多層となるように前記下地膜を形成する
ようにしたものである。
To achieve this object, the present invention provides a method for manufacturing a magnetic disk in which a base film, a magnetic recording film, and a protective film are formed on a substrate by a sputtering method, in which at least a plurality of sets of targets are used to form a multilayer film. The base film is formed.

(作用) 本発明では、少なくとも下地膜を形成するためのターゲ
ットを複数組設けて下地膜が多層となるように形成した
ため、ディスク基板の搬送方向に対して垂直となる方向
からみた断面において、下地膜を構成する粒構成が柱状
に近づく。
(Function) In the present invention, since at least a plurality of sets of targets for forming the base film are provided to form the base film in multiple layers, the bottom film is The grain structure that makes up the earth's membrane approaches a columnar shape.

したがって、磁気異方性が小さくなり、ディスク基板の
搬送方向とその垂直方向において保磁力HCはその差が
小さくなる。その結果、再生時の再生出力は変動が小さ
くなり、モジュレーションやノイズを充分抑制すること
ができる。
Therefore, the magnetic anisotropy is reduced, and the difference in coercive force HC between the disk substrate conveying direction and the direction perpendicular thereto becomes small. As a result, fluctuations in the reproduction output during reproduction are reduced, and modulation and noise can be sufficiently suppressed.

(実施例) 以下、本発明の実施例を図面に基づいて説明する。(Example) Embodiments of the present invention will be described below based on the drawings.

第1図は本発明を実施するためのインライン型スパッタ
装置を示す図である。
FIG. 1 is a diagram showing an in-line sputtering apparatus for implementing the present invention.

まず、装置を説明すると、第1図において、21はイン
ライン型スパッタ装置を構成する真空容器であり、この
真空容器21内は所定の真空度に保持されている。
First, to explain the apparatus, in FIG. 1, reference numeral 21 is a vacuum vessel constituting an in-line sputtering apparatus, and the inside of this vacuum vessel 21 is maintained at a predetermined degree of vacuum.

真空容器21内にはディスク基板の搬送方向(矢印A、
参照)に、まず−組の第1ターゲツト22.23および
一組の第2ターゲット24,25がそれぞれ設置される
。第1ターゲツト22゜23は、下地膜となる例えば第
1Cr膜26を形成するためのものであり、また第2タ
ーゲツト24.25は、下地膜となる第2Or膜27を
形成するためのものである。
Inside the vacuum container 21, there are directions in the transport direction of the disk substrate (arrow A,
(see), a set of first targets 22, 23 and a set of second targets 24, 25 are respectively installed. The first targets 22 and 23 are for forming, for example, a first Cr film 26, which will be a base film, and the second targets 24 and 25 are for forming a second Or film 27, which will be a base film. be.

次に、真空容器21内には第2ターゲツト24゜25に
つづいてディスク基板の搬送方向に、−組の第3ターゲ
ット28.29および一組の第4ターゲット30.31
が設置される。第3ターゲット28.29は、磁気記録
膜となる、例えば第1CONiCr膜32を形成するた
めのものでおり、第4ターゲット30.31は磁気記録
膜となる第2CoN i Cr膜33を形成するための
ものである。
Next, in the vacuum container 21, following the second target 24, 25, there are a negative set of third targets 28, 29 and a set of fourth targets 30, 31 in the transport direction of the disk substrate.
will be installed. The third targets 28 and 29 are for forming the first CONiCr film 32, which will become a magnetic recording film, and the fourth targets 30 and 31 are for forming the second CoN i Cr film 33, which will become a magnetic recording film. belongs to.

次に、真空容器21内には第4ターゲツト30゜31に
つづいてディスク基板の搬送方向に一組の第5ターゲッ
ト34.35が設@される。第5ターゲット34.35
は保護膜となる、例えばC膜を形成するためのものであ
る。なお、前記第1゜第2ターゲツト22〜25と第3
.第4ターゲツト28〜31とは例えば10cmの間隔
をおいて設置される。また、第1.第2ターゲツト22
〜25および第3.第4ターゲツト28〜31は、ここ
ではそれぞれ2組づつ設置するようにしたが、これに限
定されるものでなく2組以上設置する方が効果が大きい
Next, in the vacuum chamber 21, a set of fifth targets 34, 35 are provided following the fourth targets 30, 31 in the transport direction of the disk substrate. 5th target 34.35
is for forming a protective film, for example, a C film. Note that the first and second targets 22 to 25 and the third
.. The fourth targets 28 to 31 are placed at intervals of, for example, 10 cm. Also, 1st. Second target 22
~25 and 3rd. Although two sets of the fourth targets 28 to 31 are installed here, the present invention is not limited to this, and it is more effective to install two or more sets of the fourth targets 28 to 31.

次に、前述したインライン型スパッタ装置を用いて磁気
ディスクを製造する製造方法を説明する。
Next, a manufacturing method for manufacturing a magnetic disk using the above-described in-line sputtering apparatus will be described.

まず矢印Aで示す搬送方向に沿って基板36を真空容器
21内へ搬送する。基板36としてはアルミニウム製基
板よりもキズがなく平滑性に優れている円盤状のガラス
板を用いる。
First, the substrate 36 is transported into the vacuum container 21 along the transport direction shown by arrow A. As the substrate 36, a disk-shaped glass plate is used, which is free from scratches and has superior smoothness than an aluminum substrate.

次に、Crを用いて第1ターゲット22.23から環状
マグネトロンスパッタを行なってCr粒子を飛来させて
基板、36上に下地膜となる所定の厚さの第10r膜2
6を形成し、次いでこの第1Cr膜26上にCrを用い
て環状マグネトロンスパッタを行なって第2ターゲット
24.25からCr粒子を飛来させて下地膜となる所定
の厚さの第2Cr膜27を形成する。
Next, annular magnetron sputtering is performed using Cr from the first target 22, 23 to make Cr particles fly, and a 10r film 2 of a predetermined thickness is formed on the substrate 36 to become a base film.
6 is formed on this first Cr film 26, and then annular magnetron sputtering is performed using Cr on this first Cr film 26 to cause Cr particles to fly from the second target 24, 25 to form a second Cr film 27 of a predetermined thickness that will become a base film. Form.

次に、第2Or膜27上にC0NiCrを用いて環状マ
グネトロンスパッタを行なって第3ターゲット28.2
9からC0NiCr粒子を飛来さ   −せて磁気記録
膜となる所一定の厚さの第1CoNiCrlli32を
形成し、゛次いでこの第1 CON rCrCr膜上2
上ON i Crを用いて環状マグネトロンスパッタを
行なつ”で第4ターゲツト30゜31からC0NlCr
粒子を飛来させて磁気記録膜となる所定の厚さの第20
ON + cr膜33を形成する。
Next, annular magnetron sputtering is performed on the second Or film 27 using C0NiCr to form a third target 28.2.
9 to form a first CoNiCr particle 32 of a certain thickness which will become a magnetic recording film, and
Perform annular magnetron sputtering using ONiCr on the fourth target from 30°31 to C0NlCr.
A 20th film of a predetermined thickness that becomes a magnetic recording film by flying particles
An ON + Cr film 33 is formed.

最摸に、第2CON r cr膜33上にCを用いて環
状マグネトロンスパッタを行なって第5ターゲット34
.35からC粒子を飛来させて所定の厚さの保護膜とな
るC膜37を形成する。こうして、磁気ディスクが製造
される。
First, annular magnetron sputtering is performed using C on the second CON r CR film 33 to form a fifth target 34.
.. C particles are made to fly from C particles 35 to form a C film 37 that serves as a protective film with a predetermined thickness. In this way, a magnetic disk is manufactured.

製造された磁気ディスクの膜断面は第2図に示される。A film cross section of the manufactured magnetic disk is shown in FIG.

第2図において、第1Cr膜26と第2Or膜27とが
全体としてCr膜38を構成しており、第1CONiC
r膜32と第2CON+cr膜33とが全体としてCO
N i Qr膜39を構成している。
In FIG. 2, the first Cr film 26 and the second Or film 27 constitute a Cr film 38 as a whole, and the first CONiC
The r film 32 and the second CON+CR film 33 are CO as a whole.
A N i Qr film 39 is formed.

第1Cr膜26を構成する第1Cr粒子26Aと第20
r膜27を構成する第20r粒子27Aは、それぞれ小
ざな弓状に形成されるが、第1Cr粒子26Aと第20
r粒子27Aを積層した全体のCr粒子の形状は、第5
図に示すCr粒子9Bが示すような柱形状に近づく。す
なわち、Cr膜38は多層に分割された第1.第2Or
粒子26A、27Aから構成されるので、多層に分割す
ればするほど、Cr粒子の形状は直線的な柱形状に近づ
くことになる。
The first Cr particles 26A and the 20th Cr particles constituting the first Cr film 26
The 20th r particles 27A constituting the r film 27 are each formed in a small arch shape, but the first Cr particles 26A and the 20th Cr particles 27A
The shape of the entire Cr particle in which the r particles 27A are laminated is the fifth
The Cr particles 9B shown in the figure approach a columnar shape as shown. That is, the Cr film 38 is divided into multiple layers. 2nd Or
Since it is composed of particles 26A and 27A, the more it is divided into multiple layers, the closer the shape of the Cr particles becomes to a linear columnar shape.

同様に、第1CONiCr膜32を構成する第1CON
iCr粒子32Aと、第2CON r cr膜33を構
成する第2CoN i Cr粒子33Aを積層した全体
のC’oNiCr粒子は、第5図に示すCON i C
r粒子10Aが示すような柱形状に近づく。
Similarly, the first CON that constitutes the first CONiCr film 32
The entire C'oNiCr particles in which the iCr particles 32A and the second CoN i Cr particles 33A constituting the second CON r cr film 33 are stacked are the CON i Cr particles shown in FIG.
It approaches a columnar shape as shown by the r particle 10A.

すなわち、第2図の矢印Aで示すディスク基板の搬送方
向に対して垂直な方向からみた膜断面における粒構成は
、第5図に示す粒構成に近いものとなる。
That is, the grain structure in the cross section of the film viewed from the direction perpendicular to the transport direction of the disk substrate, indicated by arrow A in FIG. 2, is close to the grain structure shown in FIG. 5.

したがって、磁気異方性は小さくなり、保磁力HCはデ
ィスク基板の搬送方向とその垂直方向においてその差(
ΔHC)が小さくなり、再生時の再生出力の変動はわず
かとなる。その結果、モジュレーションやシイズを充分
抑制することができる。
Therefore, the magnetic anisotropy becomes smaller, and the coercive force HC is the difference (
ΔHC) becomes small, and fluctuations in reproduction output during reproduction become slight. As a result, modulation and noise can be sufficiently suppressed.

なお、本実施例においては、第3.第4ターゲツト28
〜31を設けてC0NiCr膜39を分割するようにし
たが、必ずしも分割させる必要はなく、Cr膜38を分
割させるだけでも良い。
Note that in this embodiment, the third. 4th target 28
31 is provided to divide the C0NiCr film 39, but it is not necessarily necessary to divide the Cr film 38.

(発明の効果) 以上説明してきたように、本発明によれば、少なくとも
複数組のターゲットを設けて下地膜となるCr膜を複数
組に分割するようにしたため、その粒構成を柱形状に近
づけることができる。このため、磁気異方性は小さくな
り、保磁力はディスク基板の搬送方向とのその垂直方向
においてその差が小さくなり、再生時の再生出力の変動
が小さくなる。その結果、モジュレーションやノイズを
充分抑制することができる。
(Effects of the Invention) As explained above, according to the present invention, at least a plurality of sets of targets are provided to divide the Cr film serving as the base film into a plurality of sets, so that the grain structure of the Cr film approaches a columnar shape. be able to. Therefore, the magnetic anisotropy becomes smaller, the difference in coercive force in the direction perpendicular to the transport direction of the disk substrate becomes smaller, and fluctuations in reproduction output during reproduction become smaller. As a result, modulation and noise can be sufficiently suppressed.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明を実施するために用いるインライン型ス
パッタ装置の概略図、 第2図は本発明に係る製造方法により製造された磁気デ
ィスクの膜断面を示す半断面図、第3図は従来の製造方
法を実施するために用いるインライン型スパッタ装置の
概略図、第4図および第5図は従来の製造方法により製
造されせた磁気ディスクの膜断面を示す各半断面図であ
る。 21・・・真空容器、 22.23・・・第1ターゲツト、 24.25・・・第2ターゲツト、 26・・・第1Cr膜、 27・・・第2Cr膜、 28.29・・・第3ターゲツト、 30.31・・・第4ターゲツト、 32−・・第1CONiCr膜、 33−・・第2CoN i Cr膜、 34.35・・・第5ターゲツト、 36・・・基板、 37・・・C膜(保護膜)、 3B−Crtl@(下地膜)、 39・・・CoNiCr膜(磁気記録膜)。 特許出願人 日本板硝子株式会社 代理人 弁理士 宮 内 佐一部
FIG. 1 is a schematic diagram of an in-line sputtering apparatus used to carry out the present invention, FIG. 2 is a half-sectional view showing a film cross section of a magnetic disk manufactured by the manufacturing method according to the present invention, and FIG. 3 is a conventional A schematic diagram of an in-line sputtering apparatus used to carry out the manufacturing method, and FIGS. 4 and 5 are half sectional views showing the film cross section of a magnetic disk manufactured by the conventional manufacturing method. 21... Vacuum vessel, 22.23... First target, 24.25... Second target, 26... First Cr film, 27... Second Cr film, 28.29... Second target. 3 target, 30.31... Fourth target, 32-... First CONiCr film, 33-... Second CoNiCr film, 34.35... Fifth target, 36... Substrate, 37... - C film (protective film), 3B-Crtl@ (base film), 39... CoNiCr film (magnetic recording film). Patent applicant: Nippon Sheet Glass Co., Ltd. Representative Patent attorney: Sabetsu Miyauchi

Claims (1)

【特許請求の範囲】[Claims] スパッタ法で基板上に下地膜、磁気記録膜および保護膜
を形成する磁気ディスクの製造方法において、少なくと
も複数組のターゲットを用いて多層となるように前記下
地膜を形成することを特徴とする磁気ディスクの製造方
法。
A magnetic disk manufacturing method in which a base film, a magnetic recording film, and a protective film are formed on a substrate by a sputtering method, characterized in that the base film is formed in a multilayered manner using at least a plurality of sets of targets. Disc manufacturing method.
JP62289778A 1987-11-17 1987-11-17 Production of magnetic disk Granted JPH01130321A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62289778A JPH01130321A (en) 1987-11-17 1987-11-17 Production of magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62289778A JPH01130321A (en) 1987-11-17 1987-11-17 Production of magnetic disk

Publications (2)

Publication Number Publication Date
JPH01130321A true JPH01130321A (en) 1989-05-23
JPH0450652B2 JPH0450652B2 (en) 1992-08-14

Family

ID=17747637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62289778A Granted JPH01130321A (en) 1987-11-17 1987-11-17 Production of magnetic disk

Country Status (1)

Country Link
JP (1) JPH01130321A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0249215A (en) * 1988-05-27 1990-02-19 Hitachi Ltd Magnetic recording medium and production thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5977621A (en) * 1982-10-26 1984-05-04 Matsushita Electric Ind Co Ltd Vertical magnetic recording medium
JPS61196430A (en) * 1985-02-27 1986-08-30 Toshiba Corp Production of magnetic recording medium
JPS629526A (en) * 1985-07-02 1987-01-17 リン・デ−タ・コ−ポレ−シヨン Medium for disc
JPS63131317A (en) * 1986-11-20 1988-06-03 Matsushita Electric Ind Co Ltd Magnetic recording medium
JPS63211121A (en) * 1987-02-27 1988-09-02 Hitachi Ltd Production of thin multi-layered film
JPS6414715A (en) * 1987-07-08 1989-01-18 Fuji Electric Co Ltd Magnetic recording medium

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5977621A (en) * 1982-10-26 1984-05-04 Matsushita Electric Ind Co Ltd Vertical magnetic recording medium
JPS61196430A (en) * 1985-02-27 1986-08-30 Toshiba Corp Production of magnetic recording medium
JPS629526A (en) * 1985-07-02 1987-01-17 リン・デ−タ・コ−ポレ−シヨン Medium for disc
JPS63131317A (en) * 1986-11-20 1988-06-03 Matsushita Electric Ind Co Ltd Magnetic recording medium
JPS63211121A (en) * 1987-02-27 1988-09-02 Hitachi Ltd Production of thin multi-layered film
JPS6414715A (en) * 1987-07-08 1989-01-18 Fuji Electric Co Ltd Magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0249215A (en) * 1988-05-27 1990-02-19 Hitachi Ltd Magnetic recording medium and production thereof

Also Published As

Publication number Publication date
JPH0450652B2 (en) 1992-08-14

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