JPH01120533A - Liquid crystal element and its production - Google Patents
Liquid crystal element and its productionInfo
- Publication number
- JPH01120533A JPH01120533A JP27877187A JP27877187A JPH01120533A JP H01120533 A JPH01120533 A JP H01120533A JP 27877187 A JP27877187 A JP 27877187A JP 27877187 A JP27877187 A JP 27877187A JP H01120533 A JPH01120533 A JP H01120533A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- liquid crystal
- crystal element
- substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000011521 glass Substances 0.000 claims abstract description 89
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 238000000576 coating method Methods 0.000 claims abstract description 29
- 239000011248 coating agent Substances 0.000 claims abstract description 26
- 239000003973 paint Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 18
- 238000010304 firing Methods 0.000 claims description 9
- 239000011347 resin Substances 0.000 abstract description 8
- 229920005989 resin Polymers 0.000 abstract description 8
- 229920001721 polyimide Polymers 0.000 abstract description 7
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 7
- 125000006850 spacer group Chemical group 0.000 abstract description 6
- 239000009719 polyimide resin Substances 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 238000013329 compounding Methods 0.000 abstract 1
- 239000000565 sealant Substances 0.000 abstract 1
- 230000035807 sensation Effects 0.000 abstract 1
- 230000000007 visual effect Effects 0.000 abstract 1
- 238000004040 coloring Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 239000003566 sealing material Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- 239000004416 thermosoftening plastic Substances 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 239000002320 enamel (paints) Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- QNVRIHYSUZMSGM-UHFFFAOYSA-N hexan-2-ol Chemical compound CCCCC(C)O QNVRIHYSUZMSGM-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
Abstract
Description
【発明の詳細な説明】
Ｅ産業上の利用分野］
この発明は、表示の着色を防止でき、かつ視角依存性の
少ない液晶素子とその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application] The present invention relates to a liquid crystal element that can prevent display coloring and has little viewing angle dependence, and a method for manufacturing the same.
［従来の技術］ 第４図は、従来の液晶素子を示すものである。[Conventional technology] FIG. 4 shows a conventional liquid crystal element.
この液晶素子は、液晶層ｌが透明電極２と配向膜３を備
える２枚の透明基板４でサンドイッチされ、その外周部
がシールＩ／１５て封着されたもので、透明基板４．４
のギャップがスペーサ６によって規制されて゛いる。In this liquid crystal element, a liquid crystal layer 1 is sandwiched between two transparent substrates 4 having a transparent electrode 2 and an alignment film 3, and the outer periphery of the two is sealed with a seal I/15.
The gap is regulated by the spacer 6.
この液晶素子にあっては、表示の着色を防止するととも
に、視野角を拡大するために、一方の透明基板４の内面
に微細な凹凸７が形成されている。In this liquid crystal element, fine irregularities 7 are formed on the inner surface of one transparent substrate 4 in order to prevent coloring of the display and to expand the viewing angle.
この液晶素子の凹凸７は、フッ酸などにより透明基板４
を化学的にエツチングしたり、機械的に研削したりする
ことによって製造していた。The unevenness 7 of the liquid crystal element is removed from the transparent substrate 4 by using hydrofluoric acid or the like.
It was manufactured by chemically etching or mechanically grinding.
［発明が解決しようとする問題点］
上記従来の液晶素子にあっては、透明基板４面に設けら
れた凹凸７が、幅や高さが不均一である上に、凹から凸
への又は凸から凹への変化が滑らかでなく角（！りが多
いなど、その形状が極めて不規則的で乱れたものであっ
たので、表示部の着色効果を十分緩和できず、また視野
角を十分法げることかできない不都合があった。[Problems to be Solved by the Invention] In the conventional liquid crystal element described above, the unevenness 7 provided on the surface of the transparent substrate 4 is uneven in width and height, and also has irregularities from concave to convex. The change from convex to concave was not smooth and the shape was extremely irregular and disordered, with many corners (!), so the coloring effect on the display could not be sufficiently alleviated, and the viewing angle could not be sufficiently reduced. There was an inconvenience that nothing could be done about it.
また、このような液晶素子を製造する際には、上記のよ
うなフッ酸エツチング、研摩処理等の基板表面処理の工
程を要していたため、作業の複雑化および作業管理の煩
雑化などという問題もあった。In addition, when manufacturing such liquid crystal elements, substrate surface treatment processes such as hydrofluoric acid etching and polishing treatment as described above are required, resulting in problems such as complicated work and complicated work management. There was also.
そこで、この発明は、上述の問題点を解消し、表示の着
色が緩和され、かつ視野角の広い液晶素子を効率良く提
供することを目的としている。SUMMARY OF THE INVENTION It is therefore an object of the present invention to solve the above-mentioned problems and to efficiently provide a liquid crystal element in which coloring of the display is alleviated and the viewing angle is wide.
ｒ問題点を解決するための手段］、
第１発°明の液晶素子は、基板と配向膜の間に、ガラス
ペースト中にガラスフリットを分散させてなる塗料から
なり、かつ微細な凹凸が設けられたガラス塗膜を形成し
たものである。[Means for Solving Problems]] The liquid crystal element of the first invention is made of a paint made of a glass paste with glass frit dispersed between the substrate and the alignment film, and is provided with fine irregularities. A glass coating film is formed.
また第２発明の製造方法は、第１発明の液晶素子を製造
する方法であって、基板上に、ガラスペースト中にガラ
スフリットを分散させてなる塗料を塗布した後、萌記ガ
ラスフリットの軟化温度より低温にて焼成処理を施し、
次いでこの上に配向膜を形成するものである。Further, the manufacturing method of the second invention is a method of manufacturing the liquid crystal element of the first invention, which comprises applying a paint made of glass frit dispersed in glass paste onto the substrate, and then softening the glass frit. Baking treatment is performed at a lower temperature than the
Next, an alignment film is formed thereon.
そしてこのような第１発明の液晶素子にあっては、基板
に直接微細な凹凸が設けられていた従来の液晶素子に比
較して、幅や高さがより均一でかつ滑らかに変化する凹
凸が一様に分散した形状の乙のとなるので、表示部の着
色が少なく、視角依存性の少ない液晶素子となる。また
第２発明の製造方法にあっては、この表示部の着色が少
なく視角依存性の少ない第１発明の液晶素子を効率良く
かつ再現良く製造することができる利点がある。The liquid crystal element of the first invention has unevenness that changes width and height more uniformly and smoothly, compared to conventional liquid crystal elements in which minute unevenness is provided directly on the substrate. Since the shape is uniformly dispersed, the display portion is less colored, resulting in a liquid crystal element with less viewing angle dependence. Further, the manufacturing method of the second invention has the advantage that the liquid crystal element of the first invention, which has less coloring in the display portion and less viewing angle dependence, can be manufactured efficiently and with good reproducibility.
以下、この発明を図面に基いて詳細に説明する。Hereinafter, this invention will be explained in detail based on the drawings.
第１図は、この発明の液晶素子の一例を示すものである
。FIG. 1 shows an example of a liquid crystal element of the present invention.
第１図中符号１が液晶層で、この液晶層Ｉが、透明電極
２と配向膜３を備える２枚の透明基板４゜４でサンドイ
ッチされ、その外周部がシール材５で封着されたもので
、透明基板４．４のギャップがスペーサ６によって規制
されて、この液晶素子となっている。ここで、この液晶
素子が従来の液晶素子と異なる点は、一方の透明基板°
４と配向膜３との間に、ガラスペースト中にガラスフリ
ットを分散させてなる塗料からなり、かつ微細な凹凸８
が設けられたガラス塗膜９が形成されたことである。Reference numeral 1 in FIG. 1 is a liquid crystal layer, and this liquid crystal layer I is sandwiched between two transparent substrates 4° 4 each having a transparent electrode 2 and an alignment film 3, and its outer periphery is sealed with a sealing material 5. The gap between the transparent substrates 4.4 is regulated by the spacers 6 to form this liquid crystal element. The difference between this liquid crystal element and conventional liquid crystal elements is that one transparent substrate is
4 and the alignment film 3, there is a paint made of a glass paste with glass frit dispersed therebetween, and a fine unevenness 8.
This means that a glass coating film 9 is formed.
上記ガラスペーストおよびガラスフリットには、石英ガ
ラス（Ｓ＋Ｏｔ）等任意のものが選ばれて使用されてよ
いが、このガラスフリットはガラスペーストよりも高い
軟化温度を有していることが必須である。また、このガ
ラスフリットは、粒径が２０μｍ以下程以下法状のもの
が好適に使用される。For the glass paste and glass frit, any material such as quartz glass (S+Ot) may be selected and used, but it is essential that the glass frit has a higher softening temperature than the glass paste. Further, this glass frit having a particle size of about 20 μm or less and a regular shape is preferably used.
そして、このガラスフリットは、上記ガラスペースト中
に３０重量％程度の１度で配合され、さらに例えば２−
エチルヘキシルアルコール：エチルセルロース−９二１
などのビヒクル中に分散されて塗料とされた後に、使用
に供される。Then, this glass frit is blended into the glass paste at a concentration of about 30% by weight, and further, for example, 2-
Ethylhexyl alcohol: Ethylcellulose-921
It is used after being dispersed in a vehicle such as paint to make a paint.
また、上記塗料か塗布されて形成される凹凸８は、周期
２００μｎ以下程度に形成されることか望ましい。また
、この凹凸８の高低差は、上記ガラスフリットの粒径に
よって決まるものであるので、通常５μｍとなる。Further, it is desirable that the unevenness 8 formed by applying the above-mentioned paint be formed with a period of about 200 μn or less. Further, the difference in height of the unevenness 8 is determined by the particle size of the glass frit, so it is usually 5 μm.
またこのような凹凸８を育する塗膜９の上に設けられる
上記配向膜３は、流動性を有する状態で基板に塗布され
その後、硬化せしめられて配向膜となるような物質によ
って形成されるもので、熱硬化性の物質、特にポリイミ
ドなどの熱硬化性樹脂等が好適に使用されるが、これに
限られず、熱可塑性の物質が使用されてもよい。Further, the alignment film 3 provided on the coating film 9 that grows such unevenness 8 is formed of a material that is applied to the substrate in a fluid state and then hardened to become an alignment film. Thermosetting substances, particularly thermosetting resins such as polyimide, etc. are preferably used, but the material is not limited thereto, and thermoplastic substances may also be used.
このような液晶素子にあっては、ガラスペースト中にガ
ラスフリットが分散された塗料からなるガラス塗膜９が
形成されて、その表面に微細な凹凸８が設けられている
ので、基板４に直接凹凸７が設けられていた従来の液晶
素子に比較して、幅や高さがより均一でかつ滑らかに変
化する凹凸８が一様に分布した形状のものとなる。In such a liquid crystal element, a glass coating film 9 made of a paint in which glass frit is dispersed in glass paste is formed, and its surface is provided with fine irregularities 8, so that it can be directly applied to the substrate 4. Compared to the conventional liquid crystal element in which the unevenness 7 is provided, the liquid crystal element has a shape in which the unevenness 8 is uniformly distributed and the width and height are more uniform and change smoothly.
次に、第２発明の製造方法は、第１発明の液晶素子を製
造する方法であって、基板上に、ガラスペースト中にガ
ラスフリットを分散させてなる塗料を塗布した後、前記
ガラスフリットの軟化温度より低温にて焼成処理を施し
、次いでこの上に配向膜を形成するものである。Next, the manufacturing method of the second invention is a method of manufacturing the liquid crystal element of the first invention, in which a paint comprising a glass frit dispersed in a glass paste is applied onto the substrate, and then the glass frit is dispersed in the glass paste. A firing process is performed at a temperature lower than the softening temperature, and then an alignment film is formed thereon.
以下、この製造方法の一例を工程順に詳細に説明する。Hereinafter, an example of this manufacturing method will be explained in detail in the order of steps.
〔工程１〕
ガラスペースト中にガラスフリットを分散させた塗料を
作成する。ここで使用されるガラスフリットは、上述の
ように、ガラスペースト′よりも軟化温度が高く、また
粒径２０μｍ以下程以下法状のものである。この粒径の
ガラスフリットは、例えばふるいなどを用いて分級され
るが、このふるいのメツシュ数を変えることにより所望
の大きさの６のが得られ、これによって、後工程で形成
される凹凸８の幅や高さなどの大きさを適宜変えること
ができる。そして、ガラスペースト中に上記ガラスフリ
ットを所定濃度配合し、さらに、２−ヘキシルアルコー
ル／エチルセルロース系などのビヒクル中に分散させて
、塗料を作成する。[Step 1] Create a paint with glass frit dispersed in glass paste. As mentioned above, the glass frit used here has a higher softening temperature than the glass paste' and has a grain size of about 20 μm or less. Glass frit of this particle size is classified using, for example, a sieve, and by changing the number of meshes on this sieve, the desired size of glass frit can be obtained. The width, height, etc. of the image can be changed as appropriate. Then, the glass frit is blended at a predetermined concentration into a glass paste, and further dispersed in a vehicle such as 2-hexyl alcohol/ethyl cellulose to prepare a paint.
〔工程２〕
透明基板４上に透明電極２を形成する。この透明電極２
には、インジウム・スズ酸化物（ＩＴＯ）等が好適に使
用され、スパッタリング法や真空蒸着法などによって、
厚さ０．Ｉμｍ程度に被着されて、透明電極２となる。[Step 2] A transparent electrode 2 is formed on a transparent substrate 4. This transparent electrode 2
Indium tin oxide (ITO) is suitably used for this purpose, and can be formed by sputtering or vacuum evaporation.
Thickness 0. The transparent electrode 2 is deposited to a thickness of about I μm.
〔工程３〕
ｎη記〔工程１〕で得た塗料を、上記透明電極２上に塗
布して、厚さ１．０μｍ程度のガラス塗膜９を形成する
。ここでこの塗布の方法には、スクリーン印刷法が好適
に採用されるが、この他にも、スピンコード法やはけ塗
り法などの方法が採られてもよい。[Step 3] The paint obtained in Step 1 is applied onto the transparent electrode 2 to form a glass coating film 9 with a thickness of about 1.0 μm. Here, a screen printing method is suitably employed as the coating method, but other methods such as a spin cord method and a brush coating method may also be employed.
〔工程４〕
次いで、焼成処理を施す。この焼成処理は、上記塗料中
のガラスペーストの軟化温度よりも高く、かつ上記ガラ
スフリットの軟化温度よりも低い温度において行われる
ことが必須である。すなわち、４８０〜５００℃程度の
温度に加熱された通常のエナメル塗布焼付炉などを利用
して行なう。この温度における焼成によれば、上記塗料
中の溶剤が揮散するとともに、塗料中のガラスペースト
分だけが溶融して、ガラスフリット分が溶融せずに元の
形状を保持したまま残る。そして、これが冷却されると
、ガラスフリットの周面が転写されてなる凹凸８が一様
に分散された表面を有するガラス塗膜９が得られる。こ
の凹凸８は、使用したガラスフリットの粒径を反映した
幅や高さを有し、例えば幅１００μｍ、高さ５μｍ程度
の大きさのものである。[Step 4] Next, a firing treatment is performed. It is essential that this firing treatment be performed at a temperature higher than the softening temperature of the glass paste in the paint and lower than the softening temperature of the glass frit. That is, the process is carried out using a normal enamel coating and baking furnace heated to a temperature of about 480 to 500°C. By firing at this temperature, the solvent in the paint evaporates, and only the glass paste in the paint melts, while the glass frit remains unmelted and retains its original shape. When this is cooled, a glass coating film 9 having a surface in which irregularities 8 formed by transferring the peripheral surface of the glass frit are uniformly distributed is obtained. The unevenness 8 has a width and height that reflect the particle size of the glass frit used, and is, for example, about 100 μm wide and 5 μm high.
ここで、上記の焼成処理温度を、特に上記ガラスフリッ
トの軟化温度よりも１０〜２０℃程度低い温度とするこ
とが、より好ましい。この温度は、上記ガラスフリット
が球状を保ったまま表面だけがわずかに溶融し始める程
度の温度であるため、この温度の焼成処理によればこの
ガラスフリットの表面がだれて、この表面上の角ぼりゃ
でこぼこがとれた滑らかな凹凸８が得られる。Here, it is more preferable to set the above-mentioned firing treatment temperature to a temperature that is approximately 10 to 20°C lower than the softening temperature of the glass frit. This temperature is such that only the surface of the glass frit starts to melt slightly while maintaining its spherical shape, so if the firing process is performed at this temperature, the surface of the glass frit will sag and the corners on this surface will be slightly melted. Smooth unevenness 8 with no unevenness can be obtained.
Ｃ工程５〕
次に、上記凹凸８を有する塗膜９の表面上に、配向膜３
を形成する。この配向膜３には、ポリイミドやポリアミ
ド等の熱硬化性樹脂が好適に使用され、流動性を有する
状態で塗布されて、その後硬化仕しめられて配向膜３と
される。塗布にはスクリーン印刷法、オフセット印刷法
、スピンコード法、はけ塗り法などが採られ、厚さ０．
１μｍ程度の配向膜３とする。また、この配向膜３には
、上記のような熱硬化性樹脂以外にも、熱可塑性の物質
などが使用されてもよい。Step C5] Next, on the surface of the coating film 9 having the unevenness 8, an alignment film 3 is applied.
form. A thermosetting resin such as polyimide or polyamide is suitably used for this alignment film 3, and is applied in a fluid state and then hardened to form the alignment film 3. Screen printing method, offset printing method, spin code method, brush coating method, etc. are used for coating, and the thickness is 0.
The alignment film 3 is about 1 μm thick. Further, in addition to the above-mentioned thermosetting resin, a thermoplastic substance or the like may be used for the alignment film 3.
〔工程６〕
〔工程！〕〜〔工程５〕により得られた基板と、上記各
工程の内、ガラス塗膜９を形成する工程〔工程１〕〔工
程３〕、およびその焼成処理工程〔工程４〕を除く他は
同様に作成して得た基板とを、その配向膜３，３間士が
対向するように配置するとともに、この２枚の基板４．
４間のギャップをスペーサ６によって規制し、その外周
部をシール材５で封着する。そして、この内部を液晶層
ｌとした液晶素子を作成する。さらに、このような液晶
素子にあっては、上記基板４．４の外面上に適宜偏向板
や反射板等が貼着されてもよい。[Process 6] [Process! ] to [Step 5] and the same except for the step of forming the glass coating film 9 [Step 1], [Step 3], and the firing treatment step [Step 4] among the above steps. The two substrates 4 and 4 are placed so that the alignment films 3 and 3 are facing each other, and the two substrates 4 and 4 are placed so that the alignment films 3 and 3 are facing each other.
4 is regulated by a spacer 6, and its outer periphery is sealed with a sealing material 5. Then, a liquid crystal element with a liquid crystal layer l inside this is created. Further, in such a liquid crystal element, a polarizing plate, a reflecting plate, etc. may be appropriately attached on the outer surface of the substrate 4.4.
以上ここでは、上記凹凸８を有するガラス塗膜９を透明
電極２の上に形成した例について述べたが、このガラス
塗膜９は基板４上に直接形成され、その上に透明電極２
が設けられてもよい。また、上記配向膜３の下のいずれ
かの層の間には、必要に応じ適宜下地層などが設けられ
てもよい。Here, an example has been described in which the glass coating film 9 having the unevenness 8 is formed on the transparent electrode 2. However, this glass coating film 9 is directly formed on the substrate 4, and the transparent electrode 2 is placed on it.
may be provided. Furthermore, an appropriate base layer or the like may be provided between any of the layers below the alignment film 3, if necessary.
このような液晶素子の製造方法によれば、ガラスペース
ト中にガラスフリットを分散させてなる塗料からなり、
かつ凹凸８を設けた塗膜９を形成した後、このガラスフ
リットの軟化温度より低温にて焼成処理を施したので、
幅や高さがより均一な凹凸８が一様に分散した塗膜９面
が容易に得られる。またここで得られた凹凸８は、ガラ
スフリットの球面が転写されるとともに、焼、酸処理に
よってガラスフリット表面の角ぼりゃでこぼこが除かれ
るので、滑らかに変化する均一な凹凸８となるものであ
る。According to the manufacturing method of such a liquid crystal element, the paint is made of a glass paste with glass frit dispersed therein.
After forming the coating film 9 with the unevenness 8, a firing treatment was performed at a temperature lower than the softening temperature of the glass frit.
A surface of the coating film 9 in which the irregularities 8 having more uniform width and height are uniformly dispersed can be easily obtained. In addition, the unevenness 8 obtained here is a uniform unevenness 8 that changes smoothly because the spherical surface of the glass frit is transferred and the rough edges and irregularities on the surface of the glass frit are removed by baking and acid treatment. be.
［実施例］
第１発明の液晶素子の一実施例を作成した。この液晶素
子は、第１図に示したものと同等の構造を有してなるＴ
Ｎ型のものである。図中符号４゜４はそれぞれガラス製
の基板である。これら基板４．４には、それぞれＩＴＯ
製の透明電極２．２が設けられている。そして一方の透
明電極２の上には、厚さ０．１μｍのポリイミド製の配
向膜３が設けられている。また、他方の透明電極２の上
には微細な凹凸８が設けられたガラス塗膜９が形成され
ている。この微細な凹凸８は、高低差が平均４．０μ、
周期が平均１００μのらのである。そしてさらにこのガ
ラス塗膜９の上にはポリイミド製の配向膜３が設けられ
ている。さらに、これら基板４．４間のギャップは、直
径ｌＯμｍのスペーサ６によって規制されており、また
２枚の基板４゜４間の間隙はシール材５によって密閉さ
れている。[Example] An example of the liquid crystal element of the first invention was created. This liquid crystal element has a structure similar to that shown in FIG.
It is of type N. Reference numerals 4 and 4 in the figure each indicate a glass substrate. Each of these substrates 4.4 is made of ITO.
A transparent electrode 2.2 made of On one transparent electrode 2, an alignment film 3 made of polyimide and having a thickness of 0.1 μm is provided. Moreover, a glass coating film 9 having fine irregularities 8 is formed on the other transparent electrode 2 . This fine unevenness 8 has an average height difference of 4.0μ,
The average period is 100μ. Further, on this glass coating film 9, an alignment film 3 made of polyimide is provided. Further, the gap between these substrates 4.4 is regulated by a spacer 6 having a diameter of 10 μm, and the gap between the two substrates 4.4 is sealed by a sealing material 5.
次に、この液晶素子の製造方法を説明する。Next, a method for manufacturing this liquid crystal element will be explained.
まず通常の方法で基板４上にＩＴＯをスパッタリング法
により蒸着して厚さ０．１μｍの透明電極２とした。First, ITO was deposited on the substrate 4 by sputtering in a conventional manner to form a transparent electrode 2 having a thickness of 0.1 μm.
次に、ガラスペースト（奥野製薬工業（味）製）の中に
粒径２０μｍのガラスフリットを３重量％配合した後、
均一に分散させてガラス塗料を作成した。ここで、使用
したガラスペーストおよびガラスフリットの軟化温度は
、それぞれ４１５℃、４５０℃のものとした。Next, after blending 3% by weight of glass frit with a particle size of 20 μm into glass paste (manufactured by Okuno Pharmaceutical Industries (Aji)),
A glass paint was created by uniformly dispersing it. Here, the softening temperatures of the glass paste and glass frit used were 415°C and 450°C, respectively.
このガラス塗料を上記ＩＴＯ製の透明電極２上にスクリ
ーン印刷して、厚さ１．０μのガラス塗膜９を設け、次
いで、５００℃の温度で焼成処理を施した。この焼成処
理後のガラス塗膜９の表面には、微細な凹凸８が形成さ
れていた。This glass paint was screen printed on the transparent electrode 2 made of ITO to form a glass coating film 9 with a thickness of 1.0 μm, and then fired at a temperature of 500°C. Fine irregularities 8 were formed on the surface of the glass coating film 9 after this baking treatment.
次に、上記ガラス塗膜８上にポリイミド樹脂を１０００
人の膜厚になるようにオフセット印刷した後、このポリ
イミド樹脂を２００℃で１時間熱処理して硬化させ、配
向膜３とした。Next, 1000% of polyimide resin was applied on the glass coating film 8.
After offset printing to a human film thickness, this polyimide resin was heat-treated at 200° C. for 1 hour to harden it, and an alignment film 3 was obtained.
さらに、配向膜３をラビング処理した。このラビング処
理は、上下基板４．４を合わせた際に、この基板４．４
に対して鉛直方向になるように行った。Furthermore, the alignment film 3 was subjected to a rubbing treatment. This rubbing process is performed when the upper and lower substrates 4.4 are combined.
The direction was perpendicular to .
このようにして作成した配向膜３の表面上には、先のガ
ラス塗膜９面上の凹凸８が転写されていた。The unevenness 8 on the surface of the glass coating film 9 was transferred onto the surface of the alignment film 3 thus created.
この微細な凹凸８を表面粗度計によって測定した。The fine irregularities 8 were measured using a surface roughness meter.
この結果を、従来の液晶素子に使用されていた基板４面
の微細な凹凸７の表面粗度と比較して、第２図に示す。The results are shown in FIG. 2 in comparison with the surface roughness of fine irregularities 7 on the surface of the substrate 4 used in a conventional liquid crystal element.
第２図より明らかなように、この実施例におけ−る凹凸
８は従来のものに比べ、その周期や幅、高低差などが均
一で、かつ滑らかに変化する乙のであった。As is clear from FIG. 2, the unevenness 8 in this embodiment was more uniform in period, width, height difference, etc. and changed smoothly compared to the conventional one.
次いで、他方、通常の方法で基板４上に、透明電極２、
配向膜３を順次形成した。Next, on the other hand, a transparent electrode 2,
Alignment films 3 were sequentially formed.
これら透明基板４．４の周辺部に、シール材５として熱
硬化型樹脂をスクリーン印刷した後、基板４にスペーサ
６となるガラス粉末を散布し、その後基板４．４を張り
合わせて、１７０℃に加熱してこの熱硬化型樹脂を硬化
させた。次いで、基板４．４間に形成された間隙に、Ｎ
ｐ液晶を封入し、液晶セルとし、このセルの上面側基板
４の外側には偏向板、下面側基板４の外側には反射板を
貼着して、液晶素子とした。After screen-printing a thermosetting resin as a sealing material 5 on the periphery of these transparent substrates 4.4, glass powder that will become a spacer 6 is sprinkled on the substrate 4, and then the substrates 4.4 are pasted together and heated to 170°C. This thermosetting resin was cured by heating. Next, N is applied to the gap formed between the substrates 4.4.
A p-liquid crystal was sealed to form a liquid crystal cell, and a polarizing plate was attached to the outside of the upper substrate 4 of this cell, and a reflecting plate was attached to the outside of the lower substrate 4 to form a liquid crystal element.
このようにして得られた実施例の液晶素子と従来の液晶
素子について、それぞれの視角依存性と表示部の着色を
調べた。The viewing angle dependence and coloring of the display portion of the liquid crystal element of the example thus obtained and the conventional liquid crystal element were investigated.
（視角依存性）
液晶素子を水平にセットし、法線方向から順次視角を変
えて表示の色、コントラストなど表示品位を観察した。(Viewing angle dependence) The liquid crystal element was set horizontally, and the viewing angle was sequentially changed from the normal direction to observe display quality such as display color and contrast.
結果を第１表に示す。The results are shown in Table 1.
注）Ｏ：表示品位が視角０°と同じ
△：表示品位が視角０°より低下
×：表示が全く視認できない
第１表の結果から、この発明の液晶素子は、従来のらの
に比較して視角依存性がさらに改善されていることが判
明した。Note) O: The display quality is the same as the viewing angle of 0°. △: The display quality is lower than the viewing angle of 0°. It was found that the viewing angle dependence was further improved.
（表示色）
国際照明委員会（ＣＩ Ｅ）によって規定された標準光
源Ｃを液晶素子に照射した時の液晶素子の表示色を測定
し、（ｘｙ）−色度図にプロットした。(Display Color) The display color of the liquid crystal element when the liquid crystal element was irradiated with standard light source C specified by the International Commission on Illumination (CIE) was measured and plotted on an (xy)-chromaticity diagram.
結果を第３図に示す。The results are shown in Figure 3.
第３図の結果から、この発明の液晶素子は、従来のもの
に比較して表示色がより光源色に近く、着色が少ないこ
とが判明した。From the results shown in FIG. 3, it was found that the liquid crystal element of the present invention had a display color closer to the light source color and was less colored than the conventional liquid crystal element.
［発明の効果コ
以上説明したように、第１発明の液晶素子では、基板と
配向膜の間に、ガラスペースト中にガラスフリットを分
散させてなる塗料からなり、かつ微細な凹凸が設けられ
たガラス塗膜が形成されたものであるので、幅や高さが
より均一で滑らかに変化する凹凸が一様に分散されたガ
ラス塗膜面が得られる。したがって、第１発明によれば
、屈折率異方性とギャップの関係から生じる表示部の着
色が少なく、視角依存性の少ない液晶素子を提供するこ
とができる。[Effects of the Invention] As explained above, in the liquid crystal element of the first invention, a paint made of a glass paste with glass frit dispersed therein is formed between the substrate and the alignment film, and fine irregularities are provided. Since a glass coating film is formed, it is possible to obtain a glass coating surface with uniformly dispersed irregularities whose width and height change more uniformly and smoothly. Therefore, according to the first aspect of the invention, it is possible to provide a liquid crystal element in which the display portion is less colored due to the relationship between the refractive index anisotropy and the gap and has less viewing angle dependence.
また第２発明の製造方法は、基板上に、ガラスペースト
中にガラスフリットを分散させてなる塗料を塗布した後
、このガラスフリットの融点より低温にて焼成処理を施
し、次いでこの上に配向膜を形成する方法であるので、
表示部の着色が少なく、視角依存性の少ない第１発明の
液晶素子を効率良くかつ再現良く製造することができる
。Further, in the manufacturing method of the second invention, after coating a paint made of a glass frit dispersed in a glass paste on a substrate, a baking treatment is performed at a temperature lower than the melting point of the glass frit, and then an alignment film is applied on the substrate. Since it is a method of forming
The liquid crystal element of the first invention, in which the display portion is less colored and has less viewing angle dependence, can be manufactured efficiently and with good reproducibility.
第１図は、この発明の液晶素子の一例を示す断面図、第
２図は、一実施例と従来例の液晶素子におけるそれぞれ
の凹凸の設けられた表面の粗度を測定した結果を示すグ
ラフ、第３図はそれぞれの表示色を調べた結果を示す（
ｉｃｙ）−色度図、第４図は従来の液晶素子を示す断面
である。
３・・・・・・配向膜、 ４・・・・・・基板、８・
・・・・・凹凸、 ９・・・・・・ガラス塗膜。FIG. 1 is a cross-sectional view showing an example of the liquid crystal element of the present invention, and FIG. 2 is a graph showing the results of measuring the roughness of the uneven surface of the liquid crystal elements of one embodiment and a conventional example. , Figure 3 shows the results of examining each display color (
icy)-chromaticity diagram, FIG. 4 is a cross section showing a conventional liquid crystal element. 3...Alignment film, 4...Substrate, 8.
...Irregularities, 9...Glass coating.
Claims (4)
フリットを分散させてなる塗料からなり、かつ微細な凹
凸が設けられたガラス塗膜が形成されたことを特徴とす
る液晶素子。(1) A liquid crystal element characterized in that a glass coating film made of a paint made by dispersing glass frit in a glass paste and provided with fine irregularities is formed between a substrate and an alignment film.
の軟化温度より高温であることを特徴とする特許請求の
範囲第１項記載の液晶素子。(2) The liquid crystal element according to claim 1, wherein the softening temperature of the glass frit is higher than the softening temperature of the glass paste.
分散させてなる塗料を塗布した後、前記ガラスフリット
の軟化温度より低温にて焼成処理を施し、次いでこの上
に配向膜を形成することを特徴とする液晶素子の製造方
法。(3) After applying a paint consisting of a glass frit dispersed in a glass paste onto the substrate, a baking treatment is performed at a temperature lower than the softening temperature of the glass frit, and then an alignment film is formed on the coating. Characteristic method for manufacturing liquid crystal elements.
温度より１０〜２０℃低い温度であることを特徴とする
特許請求の範囲第３項記載の液晶素子の製造方法。(4) The method for manufacturing a liquid crystal element according to claim 3, wherein the firing temperature is 10 to 20° C. lower than the softening temperature of the glass frit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27877187A JPH01120533A (en) | 1987-11-04 | 1987-11-04 | Liquid crystal element and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27877187A JPH01120533A (en) | 1987-11-04 | 1987-11-04 | Liquid crystal element and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01120533A true JPH01120533A (en) | 1989-05-12 |
Family
ID=17601956
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27877187A Pending JPH01120533A (en) | 1987-11-04 | 1987-11-04 | Liquid crystal element and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01120533A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0613037A2 (en) * | 1993-01-29 | 1994-08-31 | Sharp Kabushiki Kaisha | A liquid crystal display apparatus,a method for producing the same,and a substrate |
| US5579141A (en) * | 1993-07-23 | 1996-11-26 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus having regions with different pretilt angles |
| US5594570A (en) * | 1993-07-30 | 1997-01-14 | Sharp Kabushiki Kaisha | Liquid crystal display device and method for producing the same |
| US5627667A (en) * | 1993-01-29 | 1997-05-06 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus, a method for producing the same, and a substrate |
| US5666178A (en) * | 1993-07-30 | 1997-09-09 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus having plural regions of different aligning conditions and method for producing the same |
-
1987
- 1987-11-04 JP JP27877187A patent/JPH01120533A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0613037A2 (en) * | 1993-01-29 | 1994-08-31 | Sharp Kabushiki Kaisha | A liquid crystal display apparatus,a method for producing the same,and a substrate |
| EP0613037A3 (en) * | 1993-01-29 | 1994-11-02 | Sharp Kk | A liquid crystal display apparatus,a method for producing the same,and a substrate. |
| US5627667A (en) * | 1993-01-29 | 1997-05-06 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus, a method for producing the same, and a substrate |
| US5657102A (en) * | 1993-01-29 | 1997-08-12 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus, a method for producing the same, and a substrate having an alignment layer with different degrees of roughness |
| US5691792A (en) * | 1993-01-29 | 1997-11-25 | Sharp Kabushiki Kaisha | Method for producing a liquid crystal display apparatus by irradiating an aligning film with light to reduce pretilt angles of liquid crystal molecules thereof |
| US5579141A (en) * | 1993-07-23 | 1996-11-26 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus having regions with different pretilt angles |
| US5594570A (en) * | 1993-07-30 | 1997-01-14 | Sharp Kabushiki Kaisha | Liquid crystal display device and method for producing the same |
| US5652634A (en) * | 1993-07-30 | 1997-07-29 | Sharp Kabushiki Kaisha | Multiple domain liquid crystal display device with particular reference orientation directions and method for producing the same |
| US5666178A (en) * | 1993-07-30 | 1997-09-09 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus having plural regions of different aligning conditions and method for producing the same |
| US5689322A (en) * | 1993-07-30 | 1997-11-18 | Sharp Kabushiki Kaisha | Liquid crystal display device having regions with different twist angles |
| US5855968A (en) * | 1993-07-30 | 1999-01-05 | Sharp Kabushiki Kaisha | Liquid crystal display device and method for producing the same |
| US6013335A (en) * | 1993-07-30 | 2000-01-11 | Sharp Kabushiki Kaisha | Liquid crystal display apparatus and method for processing the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR920010016B1 (en) | Liquid crystal display device and color filter for use with the liquid crystal display device and method of making the color filter | |
| JP2654940B2 (en) | Manufacturing method of electro-optical element | |
| JPH075479A (en) | Production of ferromagnetic liquid crystal element | |
| JP2000047200A (en) | Diffusive reflector, liquid crystal display device using that, and its production | |
| JPH01120533A (en) | Liquid crystal element and its production | |
| JPH01120532A (en) | Liquid crystal element and its production | |
| JPS61173221A (en) | Formation of liquid crystal display device | |
| JPH01120531A (en) | Liquid crystal element and its production | |
| JPH04136916A (en) | Liquid crystal panel and production of liquid crystal panel | |
| JPH0146852B2 (en) | ||
| JPH02217823A (en) | Production of liquid crystal display device | |
| JPH04308816A (en) | Reflection type liquid crystal display device and production thereof | |
| JPS6263918A (en) | Liquid crystal element | |
| JPH02201424A (en) | Production of liquid crystal display device | |
| JPH01120530A (en) | Liquid crystal element and its production | |
| JPS63123015A (en) | Manufacture of curved surface liquid crystal cell | |
| KR100488585B1 (en) | The method for making modulator using in electro-optical apparatus | |
| JPS63129321A (en) | Ferroelectric liquid crystal element and its production | |
| JPH02311802A (en) | Formation of color filter of color liquid crystal display element | |
| JP2720780B2 (en) | Method for manufacturing reflective electrode plate | |
| JPH01241520A (en) | Liquid crystal display device | |
| JPS61173222A (en) | Liquid crystal display device | |
| JPH04296721A (en) | Color filter and its manufacture, and liquid crystal display device using the same | |
| JPH07230090A (en) | Liquid crystal display device and its production | |
| JPH02123329A (en) | Color filter |