JPH01119595A - Material for single crystal growing crucible - Google Patents

Material for single crystal growing crucible

Info

Publication number
JPH01119595A
JPH01119595A JP27803387A JP27803387A JPH01119595A JP H01119595 A JPH01119595 A JP H01119595A JP 27803387 A JP27803387 A JP 27803387A JP 27803387 A JP27803387 A JP 27803387A JP H01119595 A JPH01119595 A JP H01119595A
Authority
JP
Japan
Prior art keywords
single crystal
formation
crucible
crystal grains
grain boundaries
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27803387A
Other languages
Japanese (ja)
Inventor
Koichi Sakairi
弘一 坂入
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP27803387A priority Critical patent/JPH01119595A/en
Publication of JPH01119595A publication Critical patent/JPH01119595A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)

Abstract

PURPOSE:To prevent the formation of coarse crystal grains at the high temp. of a crucible and to avert the leakage of liquid from the cracks generated from grain boundaries by using Ir contg. a specific ratio of Zr as a material. CONSTITUTION:The material for the single crystal growing crucible is formed of pure Ir into which Zr is incorporated at 200-10,000ppm by weight. The plate material obtd. by melting this material, subjecting the melt to hot casting at a prescribed temp. and further, subjecting the casting repeatedly to hot rolling at prescribed temps. exhibits high hardness at 800-1,500 deg.C as compared to the plate material obtd. by treating the pure Ir in the same manner. The formation of the coarse crystal grains is admitted with the latter but the former is finely crystalline when the structures of these two materials are observed after heating at 1,500 deg.C. The formation of the coarse grains is not hampered with the above-mentioned material if the content of Zr is below 200ppm. Zr segregates in the grain boundaries and workability is deteriorated if the content exceeds 10,000ppm.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、単結晶育成用の容器である“るつぼパを作る
為の材料の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to improvements in materials for making a crucible, which is a container for growing single crystals.

(従来の技術とその問題点) イリジウムは、高い融点と耐蝕性を併せ持ち、単結晶育
成用の容器等の製作に用いられている。
(Prior Art and Its Problems) Iridium has both a high melting point and corrosion resistance, and is used for manufacturing containers for growing single crystals.

特にYAGなとの単結晶を育成する場合に、2000°
Cにさらされる“るつぼ°゛は結晶粒が粗大化し易く、
粗大化した結晶粒界から発生したクラックより液洩れが
生じるものである。このような事故を防止するには、高
温での結晶粒の粗大化を防止することが必要になる。
Especially when growing single crystals such as YAG,
In a crucible exposed to C, crystal grains tend to become coarse,
Liquid leakage occurs due to cracks generated from coarse grain boundaries. In order to prevent such accidents, it is necessary to prevent crystal grains from becoming coarser at high temperatures.

(発明の目的) 本発明は、上記事情に鑑みなされたもので、高温での結
晶粒の粗大化を防止できる単結晶育成るつぼ用材料を提
供することを目的とするものである。
(Object of the Invention) The present invention was made in view of the above circumstances, and an object of the present invention is to provide a material for a single crystal growth crucible that can prevent coarsening of crystal grains at high temperatures.

(問題点を解決するための手段) 上記問題点を解決するための本発明の単結晶育成るつぼ
用材料は、純イリジウムに、重量比で200ppm〜1
10000ppのジルコニウムが含有されていることを
特徴とするものである。
(Means for Solving the Problems) In order to solve the above problems, the single crystal growth crucible material of the present invention contains pure iridium in a weight ratio of 200 ppm to 1.
It is characterized by containing 10,000 pp of zirconium.

上記の如くジルコニウムの含有量を200ppm〜10
000pp−とした理由は、200ppm未満では高温
での結晶粒の粗大化を防げず、110000ppを超え
ると粒界にジルコニウムが偏析し、加工性が劣化するか
らである。
As mentioned above, the zirconium content is 200 ppm to 10
The reason why it is set at 000 pp- is that if it is less than 200 ppm, coarsening of crystal grains at high temperatures cannot be prevented, and if it exceeds 110,000 ppm, zirconium segregates at the grain boundaries and the workability deteriorates.

(作用) 本発明の単結晶育成るつぼ用材料は、前述の如き成分組
成であるので、高温での結晶粒の粗大化を防止できて、
結晶粒界からクラックが発生することが無い。
(Function) Since the material for a single crystal growth crucible of the present invention has the above-mentioned composition, coarsening of crystal grains at high temperatures can be prevented,
Cracks do not occur from grain boundaries.

(実施例) 本発明の単結晶育成るつぼ用材料の一実施例を説明する
。純イリジウムに、ジルコニウムを1000pp−含有
する材料を溶解し、1500℃で熱間鋳造を行い、さら
に1000°Cで熱間圧延を繰返して、厚さ1mの板材
を得た。
(Example) An example of the material for a single crystal growth crucible of the present invention will be described. A material containing 1000 pp- of zirconium was dissolved in pure iridium, hot cast at 1500°C, and hot rolled at 1000°C repeatedly to obtain a plate material with a thickness of 1 m.

一方、従来例として、純イリジウムを溶解し、1500
℃で熱間鋳造を行い、さらに1000’Cで熱間圧延を
繰返して、厚さ1mの板材を得た。
On the other hand, as a conventional example, pure iridium was dissolved and 1500
Hot casting was carried out at 100°C, and hot rolling was repeated at 1000'C to obtain a plate material with a thickness of 1 m.

これら実施例及び従来例の板材を800〜1500℃ま
での温度で5分間加熱した後、表面硬さを測定した処、
第1図のグラフに示すような結果を得た。
After heating the plate materials of these examples and conventional examples at a temperature of 800 to 1500°C for 5 minutes, the surface hardness was measured.
The results shown in the graph of FIG. 1 were obtained.

このグラフで判るように実施例の単結晶育成るつぼ用材
料は従来例の単結晶育成るつぼ材料に比し、HV硬さが
高いことが判る。
As can be seen from this graph, the single crystal growth crucible material of the example has higher HV hardness than the conventional single crystal growth crucible material.

また前記実施例及び従来例の材料を、1500°Cで加
熱後の組織を観察した処、従来例の材料は第2図aに示
す如(結晶粒の粗大化が見られたのに対し、実施例の材
料は第2図すに示す如く結晶粒が微細であった。
Furthermore, when we observed the structures of the materials of the above embodiment and the conventional example after heating them at 1500°C, we found that the materials of the conventional example showed coarsening of the crystal grains, as shown in Fig. 2a. The material of the example had fine crystal grains as shown in Figure 2.

(発明の効果) 以上の説明で判るように本発明の単結晶育成るつぼ用材
料は、高温での結晶粒の粗大化を防止できて、結晶粒が
微細であるので、硬さが高く、結晶粒界からクランクが
発生することが無いので、液洩れの無い単結晶育成るつ
ぼを作ることができるという効果がある。
(Effects of the Invention) As can be seen from the above explanation, the material for single crystal growth crucibles of the present invention can prevent coarsening of crystal grains at high temperatures and has fine crystal grains, so it has high hardness and crystallization. Since cranks do not occur from grain boundaries, it is possible to create a single crystal growth crucible without liquid leakage.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例の単結晶育成るつぼ用材料と従
来例の単結晶育成るつぼ用材料の熱処理温度と表面硬さ
を示すグラフ、第2図aは従来例の単結晶育成るつぼ用
材料の組織を示す図、第2図すは本発明の実施例の単結
晶育成るつぼ用材料の組織を示す図である。 出願人  田中貴金属工業株式会社 第1図 1友   (°0) 第2図(Q) 第2図(b)
Figure 1 is a graph showing the heat treatment temperature and surface hardness of the single crystal growth crucible material of the embodiment of the present invention and the conventional single crystal growth crucible material, and Figure 2a is the graph for the conventional single crystal growth crucible material. FIG. 2 is a diagram showing the structure of a material for a single crystal growth crucible according to an embodiment of the present invention. Applicant Tanaka Kikinzoku Kogyo Co., Ltd. Figure 1 1 friend (°0) Figure 2 (Q) Figure 2 (b)

Claims (1)

【特許請求の範囲】[Claims] 純イリジウムに、重量比で200ppm〜10000p
pmのジルコニウムが含有されていることを特徴とする
単結晶育成るつぼ用材料。
200ppm to 10000p in weight ratio to pure iridium
A single crystal growth crucible material characterized by containing pm zirconium.
JP27803387A 1987-11-02 1987-11-02 Material for single crystal growing crucible Pending JPH01119595A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27803387A JPH01119595A (en) 1987-11-02 1987-11-02 Material for single crystal growing crucible

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27803387A JPH01119595A (en) 1987-11-02 1987-11-02 Material for single crystal growing crucible

Publications (1)

Publication Number Publication Date
JPH01119595A true JPH01119595A (en) 1989-05-11

Family

ID=17591712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27803387A Pending JPH01119595A (en) 1987-11-02 1987-11-02 Material for single crystal growing crucible

Country Status (1)

Country Link
JP (1) JPH01119595A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08311584A (en) * 1995-03-15 1996-11-26 Natl Res Inst For Metals Refractory superalloy
WO2004007782A1 (en) * 2002-07-13 2004-01-22 Johnson Matthey Public Limited Company Alloy
WO2006119116A3 (en) * 2005-04-29 2006-12-21 Medtronic Vascular Inc Use of platinum group metals in vascular devices and method of texturing platinum group metals
CN108421824A (en) * 2018-03-12 2018-08-21 陕西三毅有岩材料科技有限公司 Iridium plate and its processing method, iridium crucible

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57156400A (en) * 1981-03-23 1982-09-27 Hitachi Metals Ltd Crucible for preparing single crystal
JPS5832099A (en) * 1981-08-21 1983-02-24 Hitachi Metals Ltd Preparation of single crystal

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57156400A (en) * 1981-03-23 1982-09-27 Hitachi Metals Ltd Crucible for preparing single crystal
JPS5832099A (en) * 1981-08-21 1983-02-24 Hitachi Metals Ltd Preparation of single crystal

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08311584A (en) * 1995-03-15 1996-11-26 Natl Res Inst For Metals Refractory superalloy
WO2004007782A1 (en) * 2002-07-13 2004-01-22 Johnson Matthey Public Limited Company Alloy
US7481971B2 (en) 2002-07-13 2009-01-27 Johnson Matthey Public Limited Company Iridium alloy
WO2006119116A3 (en) * 2005-04-29 2006-12-21 Medtronic Vascular Inc Use of platinum group metals in vascular devices and method of texturing platinum group metals
US7309353B2 (en) 2005-04-29 2007-12-18 Medtronic Vascular, Inc. Use of platinum group metals in vascular devices and method of texturing platinum group metals
CN108421824A (en) * 2018-03-12 2018-08-21 陕西三毅有岩材料科技有限公司 Iridium plate and its processing method, iridium crucible

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