JPH01115235U - - Google Patents
Info
- Publication number
- JPH01115235U JPH01115235U JP956088U JP956088U JPH01115235U JP H01115235 U JPH01115235 U JP H01115235U JP 956088 U JP956088 U JP 956088U JP 956088 U JP956088 U JP 956088U JP H01115235 U JPH01115235 U JP H01115235U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- electrode
- reaction
- heating
- semiconductor manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 4
- 239000012495 reaction gas Substances 0.000 claims 4
- 239000004065 semiconductor Substances 0.000 claims 4
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP956088U JPH01115235U (id) | 1988-01-29 | 1988-01-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP956088U JPH01115235U (id) | 1988-01-29 | 1988-01-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01115235U true JPH01115235U (id) | 1989-08-03 |
Family
ID=31216407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP956088U Pending JPH01115235U (id) | 1988-01-29 | 1988-01-29 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01115235U (id) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5372460A (en) * | 1976-12-10 | 1978-06-27 | Hitachi Ltd | Plasma cvd unit |
JPS57134925A (en) * | 1981-02-16 | 1982-08-20 | Kokusai Electric Co Ltd | Plasma cvd film producer |
JPS61154036A (ja) * | 1984-12-26 | 1986-07-12 | Mitsubishi Chem Ind Ltd | グロ−放電装置 |
JPS62203330A (ja) * | 1986-03-04 | 1987-09-08 | Denkoo:Kk | 反応管洗浄手段を備えた半導体熱処理装置 |
JPS62245626A (ja) * | 1986-04-18 | 1987-10-26 | Furendo Tec Kenkyusho:Kk | 半導体製造装置 |
-
1988
- 1988-01-29 JP JP956088U patent/JPH01115235U/ja active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5372460A (en) * | 1976-12-10 | 1978-06-27 | Hitachi Ltd | Plasma cvd unit |
JPS57134925A (en) * | 1981-02-16 | 1982-08-20 | Kokusai Electric Co Ltd | Plasma cvd film producer |
JPS61154036A (ja) * | 1984-12-26 | 1986-07-12 | Mitsubishi Chem Ind Ltd | グロ−放電装置 |
JPS62203330A (ja) * | 1986-03-04 | 1987-09-08 | Denkoo:Kk | 反応管洗浄手段を備えた半導体熱処理装置 |
JPS62245626A (ja) * | 1986-04-18 | 1987-10-26 | Furendo Tec Kenkyusho:Kk | 半導体製造装置 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH01115235U (id) | ||
JPS62107439U (id) | ||
JPH0178026U (id) | ||
JPS6239059Y2 (id) | ||
JPS63159755U (id) | ||
JPS6324826U (id) | ||
JPS5624938A (en) | High pressure oxidizing apparatus | |
JPH0345634U (id) | ||
JPS61183962U (id) | ||
JPS6375034U (id) | ||
JPH0341848U (id) | ||
JPS59186799U (ja) | 高温熱処理炉用電熱装置 | |
JPH064558Y2 (ja) | 高周波加熱装置 | |
JPS6392198U (id) | ||
JPS61203298U (id) | ||
JPS6237200U (id) | ||
JPS62126362U (id) | ||
JPH0252331U (id) | ||
JPS5885104U (ja) | 高周波加熱装置 | |
JPS6294626U (id) | ||
JPS63131125U (id) | ||
JPS63123096U (id) | ||
JPS62167094U (id) | ||
JPH0188397U (id) | ||
JPH0241400U (id) |