JPH01114669U - - Google Patents
Info
- Publication number
- JPH01114669U JPH01114669U JP888288U JP888288U JPH01114669U JP H01114669 U JPH01114669 U JP H01114669U JP 888288 U JP888288 U JP 888288U JP 888288 U JP888288 U JP 888288U JP H01114669 U JPH01114669 U JP H01114669U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- substrate support
- vacuum
- vacuum container
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図は本考案の一実施例の説明図、第２図は
第１図Ａ部の拡大断面図、第３図は従来の基板加
熱装置の説明図、第４図は第３図Ｂ部の拡大断面
図である。
１…基板、２…駆動機構保持台、３，３′…真
空用窓、４…真空容器、５…Ｘ―Ｙ移動機構、６
…２軸回転導入器、７…基板支持台、８…基板支
持台保持棒、１１…熱遮蔽円筒、１３，１４…ロ
ーラ、１５…外軸、１６…内軸、１７…ドーナツ
状円盤。
Fig. 1 is an explanatory diagram of an embodiment of the present invention, Fig. 2 is an enlarged sectional view of section A in Fig. 1, Fig. 3 is an explanatory diagram of a conventional substrate heating device, and Fig. 4 is an explanatory diagram of section B in Fig. 3. FIG. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Drive mechanism holding stand, 3, 3'... Vacuum window, 4... Vacuum container, 5... X-Y movement mechanism, 6
... Two-axis rotation introducer, 7 ... Substrate support stand, 8 ... Substrate support stand holding rod, 11 ... Heat shielding cylinder, 13, 14 ... Roller, 15 ... Outer shaft, 16 ... Inner shaft, 17 ... Donut-shaped disk.
Claims (1)
あつて、基板の周縁部を支持するリング状の基板
支持台と、同基板支持台のリング軸芯延長上の真
空容器を構成する壁に設けられた真空用窓と、同
真空用窓を挾んで上記基板支持台と対向して配置
された赤外線源とを有することを特徴とする基板
加熱装置。 A device for heating a substrate placed in a vacuum container, which is installed on a ring-shaped substrate support that supports the peripheral edge of the substrate, and on a wall that forms the vacuum container on an extension of the ring axis of the substrate support. 1. A substrate heating device comprising: a vacuum window; and an infrared source disposed opposite the substrate support with the vacuum window in between.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP888288U JPH01114669U (en) | 1988-01-28 | 1988-01-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP888288U JPH01114669U (en) | 1988-01-28 | 1988-01-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01114669U true JPH01114669U (en) | 1989-08-02 |
Family
ID=31215136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP888288U Pending JPH01114669U (en) | 1988-01-28 | 1988-01-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01114669U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06260543A (en) * | 1991-11-26 | 1994-09-16 | Applied Materials Inc | Surface volatile matter detection device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5939927B2 (en) * | 1978-07-13 | 1984-09-27 | 沖電気工業株式会社 | MOS drive circuit |
-
1988
- 1988-01-28 JP JP888288U patent/JPH01114669U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5939927B2 (en) * | 1978-07-13 | 1984-09-27 | 沖電気工業株式会社 | MOS drive circuit |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06260543A (en) * | 1991-11-26 | 1994-09-16 | Applied Materials Inc | Surface volatile matter detection device |