JPH01113332U - - Google Patents
Info
- Publication number
- JPH01113332U JPH01113332U JP936388U JP936388U JPH01113332U JP H01113332 U JPH01113332 U JP H01113332U JP 936388 U JP936388 U JP 936388U JP 936388 U JP936388 U JP 936388U JP H01113332 U JPH01113332 U JP H01113332U
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- vacuum processing
- electrode
- cylindrical
- dry etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims 1
- 238000009413 insulation Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図及び第２図は本考案の第１及び第２の実
施例の断面図、第３図は従来のドライエツチング
装置の断面図である。
１……真空処理室、２……対向電極、３……試
料、４……試料載置電極、５，５ａ，５ｂ……整
合回路、６，６ａ，６ｂ……ＲＦ電源、７……絶
縁体、８……円筒状電極、９……電力導入端子、
１０，１０ａ，１０ｂ……スイツチ。
1 and 2 are sectional views of first and second embodiments of the present invention, and FIG. 3 is a sectional view of a conventional dry etching apparatus. 1... Vacuum processing chamber, 2... Counter electrode, 3... Sample, 4... Sample mounting electrode, 5, 5a, 5b... Matching circuit, 6, 6a, 6b... RF power supply, 7... Insulation body, 8... cylindrical electrode, 9... power introduction terminal,
10, 10a, 10b...switch.
Claims (1)
れた円板状の試料載置電極と対向電極とを有する
ドライエツチング装置において、前記真空処理室
内にはその内壁を清掃するための真空処理室と同
軸の円筒状電極が設けられていることを特徴とす
るドライエツチング装置。 In a dry etching apparatus having a cylindrical vacuum processing chamber, a disk-shaped sample mounting electrode and a counter electrode provided in the vacuum processing chamber, the vacuum processing chamber includes a vacuum processing chamber for cleaning the inner wall of the vacuum processing chamber. A dry etching device characterized by being provided with a cylindrical electrode coaxial with the cylindrical electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP936388U JPH01113332U (en) | 1988-01-26 | 1988-01-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP936388U JPH01113332U (en) | 1988-01-26 | 1988-01-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01113332U true JPH01113332U (en) | 1989-07-31 |
Family
ID=31216048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP936388U Pending JPH01113332U (en) | 1988-01-26 | 1988-01-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01113332U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004082008A1 (en) * | 2003-03-14 | 2004-09-23 | Research Institute Of Innovative Technology For The Earth | Cvd apparatus and method for cleaning cvd apparatus |
| JP2009065171A (en) * | 2003-03-14 | 2009-03-26 | Research Institute Of Innovative Technology For The Earth | Film forming method using cvd device |
-
1988
- 1988-01-26 JP JP936388U patent/JPH01113332U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004082008A1 (en) * | 2003-03-14 | 2004-09-23 | Research Institute Of Innovative Technology For The Earth | Cvd apparatus and method for cleaning cvd apparatus |
| JP2009065171A (en) * | 2003-03-14 | 2009-03-26 | Research Institute Of Innovative Technology For The Earth | Film forming method using cvd device |