JPH01108741A - マスクとウェハのプリアライメント方法 - Google Patents
マスクとウェハのプリアライメント方法Info
- Publication number
- JPH01108741A JPH01108741A JP62267303A JP26730387A JPH01108741A JP H01108741 A JPH01108741 A JP H01108741A JP 62267303 A JP62267303 A JP 62267303A JP 26730387 A JP26730387 A JP 26730387A JP H01108741 A JPH01108741 A JP H01108741A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- wafer
- stage
- alignment
- camera
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 21
- 238000003780 insertion Methods 0.000 claims description 4
- 230000037431 insertion Effects 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 38
- 230000003287 optical effect Effects 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 230000002518 glial effect Effects 0.000 description 7
- 238000001514 detection method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 210000004498 neuroglial cell Anatomy 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62267303A JPH01108741A (ja) | 1987-10-21 | 1987-10-21 | マスクとウェハのプリアライメント方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62267303A JPH01108741A (ja) | 1987-10-21 | 1987-10-21 | マスクとウェハのプリアライメント方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01108741A true JPH01108741A (ja) | 1989-04-26 |
| JPH0520888B2 JPH0520888B2 (enrdf_load_stackoverflow) | 1993-03-22 |
Family
ID=17442954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62267303A Granted JPH01108741A (ja) | 1987-10-21 | 1987-10-21 | マスクとウェハのプリアライメント方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01108741A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5440394A (en) * | 1991-05-01 | 1995-08-08 | Canon Kabushiki Kaisha | Length-measuring device and exposure apparatus |
-
1987
- 1987-10-21 JP JP62267303A patent/JPH01108741A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5440394A (en) * | 1991-05-01 | 1995-08-08 | Canon Kabushiki Kaisha | Length-measuring device and exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0520888B2 (enrdf_load_stackoverflow) | 1993-03-22 |
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