JPH01106558U - - Google Patents
Info
- Publication number
- JPH01106558U JPH01106558U JP76888U JP76888U JPH01106558U JP H01106558 U JPH01106558 U JP H01106558U JP 76888 U JP76888 U JP 76888U JP 76888 U JP76888 U JP 76888U JP H01106558 U JPH01106558 U JP H01106558U
- Authority
- JP
- Japan
- Prior art keywords
- mask
- charged particle
- particle beam
- ground electrode
- lithography system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 2
- 238000002039 particle-beam lithography Methods 0.000 claims 2
- 230000002265 prevention Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP76888U JPH01106558U (enExample) | 1988-01-07 | 1988-01-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP76888U JPH01106558U (enExample) | 1988-01-07 | 1988-01-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01106558U true JPH01106558U (enExample) | 1989-07-18 |
Family
ID=31200080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP76888U Pending JPH01106558U (enExample) | 1988-01-07 | 1988-01-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01106558U (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009115957A (ja) * | 2007-11-05 | 2009-05-28 | Hoya Corp | マスクブランク及び転写用マスクの製造方法 |
| JP2018178226A (ja) * | 2017-04-19 | 2018-11-15 | ムラテック工業株式会社 | 表面処理用治具 |
-
1988
- 1988-01-07 JP JP76888U patent/JPH01106558U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009115957A (ja) * | 2007-11-05 | 2009-05-28 | Hoya Corp | マスクブランク及び転写用マスクの製造方法 |
| TWI479256B (zh) * | 2007-11-05 | 2015-04-01 | Hoya Corp | 製造空白光罩及轉印光罩之方法 |
| JP2018178226A (ja) * | 2017-04-19 | 2018-11-15 | ムラテック工業株式会社 | 表面処理用治具 |