JPH01106558U - - Google Patents
Info
- Publication number
- JPH01106558U JPH01106558U JP76888U JP76888U JPH01106558U JP H01106558 U JPH01106558 U JP H01106558U JP 76888 U JP76888 U JP 76888U JP 76888 U JP76888 U JP 76888U JP H01106558 U JPH01106558 U JP H01106558U
- Authority
- JP
- Japan
- Prior art keywords
- mask
- charged particle
- particle beam
- ground electrode
- lithography system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 2
- 238000002039 particle-beam lithography Methods 0.000 claims 2
- 230000002265 prevention Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の一実施例を示す断面図、第２
図は本考案の他の実施例を示す要部断面図、第３
図は従来装置を示す要部断面図である。
１０…マスク、１１…ガラス基材、１１ａ…面
取部、１２…金属膜、１３…レジスト膜、２０…
ホルダ、２４，２４ａ…アース電極、２７…金属
糸。
Fig. 1 is a sectional view showing one embodiment of the present invention;
The figure is a sectional view of main parts showing another embodiment of the present invention.
The figure is a sectional view of a main part of a conventional device. DESCRIPTION OF SYMBOLS 10... Mask, 11... Glass base material, 11a... Chamfered part, 12... Metal film, 13... Resist film, 20...
Holder, 24, 24a... Earth electrode, 27... Metal thread.
Claims (1)
設けたマスクの辺部表面側の面取部に露出してい
る金属膜にアース電極を接触させるようにした荷
電粒子ビーム描画装置のマスクチヤージアツプ防
止装置において、前記アース電極の少なくともマ
スク接触部を、カールした金属糸によつて形成し
たことを特徴とする荷電粒子ビーム描画装置のマ
スクチヤージアツプ防止装置。 Mask charge-up for a charged particle beam lithography system in which a ground electrode is brought into contact with the metal film exposed on the chamfered side of the side surface of a mask with a metal film and a resist film provided on the surface of a glass substrate. 1. A mask charge-up prevention device for a charged particle beam lithography system, characterized in that at least a mask contacting portion of the ground electrode is formed of a curled metal thread.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP76888U JPH01106558U (en) | 1988-01-07 | 1988-01-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP76888U JPH01106558U (en) | 1988-01-07 | 1988-01-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01106558U true JPH01106558U (en) | 1989-07-18 |
Family
ID=31200080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP76888U Pending JPH01106558U (en) | 1988-01-07 | 1988-01-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01106558U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009115957A (en) * | 2007-11-05 | 2009-05-28 | Hoya Corp | Method of manufacturing mask blank and transfer mask |
| JP2018178226A (en) * | 2017-04-19 | 2018-11-15 | ムラテック工業株式会社 | Jig for surface treatment |
-
1988
- 1988-01-07 JP JP76888U patent/JPH01106558U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009115957A (en) * | 2007-11-05 | 2009-05-28 | Hoya Corp | Method of manufacturing mask blank and transfer mask |
| TWI479256B (en) * | 2007-11-05 | 2015-04-01 | Hoya Corp | Methods of manufacturing mask blank and transfer mask |
| JP2018178226A (en) * | 2017-04-19 | 2018-11-15 | ムラテック工業株式会社 | Jig for surface treatment |