JP7816866B2 - 基板処理装置、及び基板処理方法 - Google Patents

基板処理装置、及び基板処理方法

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Publication number
JP7816866B2
JP7816866B2 JP2021196119A JP2021196119A JP7816866B2 JP 7816866 B2 JP7816866 B2 JP 7816866B2 JP 2021196119 A JP2021196119 A JP 2021196119A JP 2021196119 A JP2021196119 A JP 2021196119A JP 7816866 B2 JP7816866 B2 JP 7816866B2
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JP
Japan
Prior art keywords
density
drying
substrate
detection unit
supercritical fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021196119A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022142723A5 (https=
JP2022142723A (ja
Inventor
眞高 御所
励二郎 山中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to KR1020220027988A priority Critical patent/KR20220129467A/ko
Priority to TW111108303A priority patent/TW202242983A/zh
Priority to US17/689,199 priority patent/US11901197B2/en
Priority to CN202210220366.4A priority patent/CN115083953A/zh
Publication of JP2022142723A publication Critical patent/JP2022142723A/ja
Priority to US18/392,552 priority patent/US12237178B2/en
Publication of JP2022142723A5 publication Critical patent/JP2022142723A5/ja
Application granted granted Critical
Publication of JP7816866B2 publication Critical patent/JP7816866B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
JP2021196119A 2021-03-16 2021-12-02 基板処理装置、及び基板処理方法 Active JP7816866B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020220027988A KR20220129467A (ko) 2021-03-16 2022-03-04 기판 처리 장치 및 기판 처리 방법
TW111108303A TW202242983A (zh) 2021-03-16 2022-03-08 基板處理裝置及基板處理方法
US17/689,199 US11901197B2 (en) 2021-03-16 2022-03-08 Substrate processing apparatus and substrate processing method
CN202210220366.4A CN115083953A (zh) 2021-03-16 2022-03-08 基板处理装置和基板处理方法
US18/392,552 US12237178B2 (en) 2021-03-16 2023-12-21 Substrate processing apparatus and substrate processing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021042031 2021-03-16
JP2021042031 2021-03-16

Publications (3)

Publication Number Publication Date
JP2022142723A JP2022142723A (ja) 2022-09-30
JP2022142723A5 JP2022142723A5 (https=) 2024-09-20
JP7816866B2 true JP7816866B2 (ja) 2026-02-18

Family

ID=83426515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021196119A Active JP7816866B2 (ja) 2021-03-16 2021-12-02 基板処理装置、及び基板処理方法

Country Status (1)

Country Link
JP (1) JP7816866B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025229866A1 (ja) * 2024-04-30 2025-11-06 東京エレクトロン株式会社 基板処理装置および基板処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012243776A (ja) 2011-05-13 2012-12-10 Tokyo Electron Ltd 基板処理装置、基板処理方法および記憶媒体

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20120041014A (ko) * 2010-10-20 2012-04-30 세메스 주식회사 기판처리방법
KR102010264B1 (ko) * 2016-10-10 2019-08-13 세메스 주식회사 기판 처리 장치, 그리고 이의 공정 유체 모니터링 장치 및 모니터링 방법

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012243776A (ja) 2011-05-13 2012-12-10 Tokyo Electron Ltd 基板処理装置、基板処理方法および記憶媒体

Also Published As

Publication number Publication date
JP2022142723A (ja) 2022-09-30

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