JP7768895B2 - 効果的な磁気電力伝送のためのｒｆシールド構造を有する変圧器型アイソレータ - Google Patents

効果的な磁気電力伝送のためのｒｆシールド構造を有する変圧器型アイソレータ

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Publication number
JP7768895B2
JP7768895B2 JP2022562423A JP2022562423A JP7768895B2 JP 7768895 B2 JP7768895 B2 JP 7768895B2 JP 2022562423 A JP2022562423 A JP 2022562423A JP 2022562423 A JP2022562423 A JP 2022562423A JP 7768895 B2 JP7768895 B2 JP 7768895B2
Authority
JP
Japan
Prior art keywords
primary
transformer
shield
type isolator
radial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022562423A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023522614A (ja
JP2023522614A5 (https=
Inventor
ベンジャミン・ニール
モピデヴィ・ヘマ・スワループ
ピース・ジョン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of JP2023522614A publication Critical patent/JP2023522614A/ja
Publication of JP2023522614A5 publication Critical patent/JP2023522614A5/ja
Application granted granted Critical
Publication of JP7768895B2 publication Critical patent/JP7768895B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/24—Magnetic cores
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/28—Coils; Windings; Conductive connections
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/34—Special means for preventing or reducing unwanted electric or magnetic effects, e.g. no-load losses, reactive currents, harmonics, oscillations, leakage fields
    • H01F27/36—Electric or magnetic shields or screens
    • H01F27/363—Electric or magnetic shields or screens made of electrically conductive material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/34—Special means for preventing or reducing unwanted electric or magnetic effects, e.g. no-load losses, reactive currents, harmonics, oscillations, leakage fields
    • H01F27/36—Electric or magnetic shields or screens
    • H01F27/366—Electric or magnetic shields or screens made of ferromagnetic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F38/00—Adaptations of transformers or inductances for specific applications or functions
    • H01F38/14—Inductive couplings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32697—Electrostatic control
    • H01J37/32706—Polarising the substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2022562423A 2020-04-14 2021-03-23 効果的な磁気電力伝送のためのｒｆシールド構造を有する変圧器型アイソレータ Active JP7768895B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202063010019P 2020-04-14 2020-04-14
US63/010,019 2020-04-14
PCT/US2021/023670 WO2021211269A1 (en) 2020-04-14 2021-03-23 Transformer isolator having rf shield structure for effective magnetic power transfer

Publications (3)

Publication Number Publication Date
JP2023522614A JP2023522614A (ja) 2023-05-31
JP2023522614A5 JP2023522614A5 (https=) 2024-04-02
JP7768895B2 true JP7768895B2 (ja) 2025-11-12

Family

ID=78083665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022562423A Active JP7768895B2 (ja) 2020-04-14 2021-03-23 効果的な磁気電力伝送のためのｒｆシールド構造を有する変圧器型アイソレータ

Country Status (5)

Country Link
US (1) US20230134296A1 (https=)
JP (1) JP7768895B2 (https=)
KR (1) KR20230002643A (https=)
CN (1) CN115769320A (https=)
WO (1) WO2021211269A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12523690B2 (en) 2021-03-17 2026-01-13 Advanced Energy Industries, Inc. Capacitance sensing systems and methods
JPWO2024004256A1 (https=) * 2022-06-29 2024-01-04
WO2025126437A1 (ja) * 2023-12-14 2025-06-19 東京エレクトロン株式会社 プラズマ処理装置
KR20250117020A (ko) * 2024-01-26 2025-08-04 삼성전자주식회사 기판 처리 장치
US20250266281A1 (en) * 2024-02-15 2025-08-21 Advanced Energy Industries, Inc. Electrostatic wafer clamping and sensing system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190164729A1 (en) 2017-11-30 2019-05-30 Lam Research Corporation Ferrite Cage RF Isolator For Power Circuitry
US20200035409A1 (en) 2018-07-25 2020-01-30 Lam Research Corporation Magnetic shielding for plasma sources
JP2022552224A (ja) 2019-10-08 2022-12-15 ラム リサーチ コーポレーション 基板処理システムの基板支持体の発熱体のための電源分離回路

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4837556A (en) * 1985-04-15 1989-06-06 Kabushiki Kaisha Nihon Denzai Kogyo Kenkyusho Signal transmission device
US5442956A (en) * 1992-06-03 1995-08-22 Trw Inc. Torque sensor for a power assist steering system
KR20000068364A (ko) * 1997-07-03 2000-11-25 후루까와 준노스께 분리형 트랜스포머 및 분리형 트랜스포머를 이용한전송제어장치
US7084728B2 (en) * 2003-12-15 2006-08-01 Nokia Corporation Electrically decoupled integrated transformer having at least one grounded electric shield
EP2169692B1 (en) * 2008-09-26 2011-07-06 Bruker Biospin SA High voltage step-up dry power transformer and power supply unit comprising at least one such transformer
US8755204B2 (en) * 2009-10-21 2014-06-17 Lam Research Corporation RF isolation for power circuitry
WO2012082854A2 (en) * 2010-12-17 2012-06-21 Mattson Technology, Inc. Inductively coupled plasma source for plasma processing
US12125631B2 (en) * 2018-08-06 2024-10-22 Google Llc Shielded electrical transformer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190164729A1 (en) 2017-11-30 2019-05-30 Lam Research Corporation Ferrite Cage RF Isolator For Power Circuitry
US20200035409A1 (en) 2018-07-25 2020-01-30 Lam Research Corporation Magnetic shielding for plasma sources
JP2022552224A (ja) 2019-10-08 2022-12-15 ラム リサーチ コーポレーション 基板処理システムの基板支持体の発熱体のための電源分離回路

Also Published As

Publication number Publication date
US20230134296A1 (en) 2023-05-04
JP2023522614A (ja) 2023-05-31
KR20230002643A (ko) 2023-01-05
CN115769320A (zh) 2023-03-07
WO2021211269A1 (en) 2021-10-21

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